Shallow surface etching of organic and inorganic compounds by electrospray droplet impact |
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Authors: | Kenzo Hiraoka Yuji Sakai Daiki Asakawa |
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Institution: | a Clean Energy Research Center, University of Yamanashi, Takeda-4, Kofu 400-8511, Japan b Japan Science and Technology Agency, Naka-ku, Hamamatsu 432-8561, Japan c Electron Optics Sales Division, JEOL Ltd., 2-8-3 Akebono, Tachikawa, Tokyo 190-0012, Japan |
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Abstract: | The electrospray droplet impact (EDI) was applied to bradykinin, polyethylene terephthalate (PET), SiO2/Si, and indium phosphide (InP). It was found that bradykinin deposited on the stainless steel substrate was ionized/desorbed without the accumulation of radiation products. The film thickness desorbed by a single collisional event was found to be less than 10 monolayers. In the EDI mass spectra for PET, several fragment ions were observed but the XPS spectra did not change with prolonged cluster irradiation. The etching rate for SiO2 by EDI was measured to be ∼0.2 nm/min. The surface roughness of InP etched by EDI was found to be one order of magnitude smaller than that etched by 3 keV Ar+ for about the same etching depths. EDI is capable of shallow surface etching with little damage left on the etched surface. |
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Keywords: | Electrospray droplet impact Cluster ion etching Shallow surface etching |
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