电化学法涂层导体CeO_2缓冲层外延生长研究

电化学沉积法制备高温超导YBa2Cu3O7-δ涂层导体缓冲层具有工艺简单、设备要求低、易于连续化批量制备等优点。采用电化学沉积法,在双轴织构的Ni-5at.%W(Ni-5W)金属基带上成功制备出了具有良好c轴取向的CeO2缓冲层薄膜。利用X射线衍射、极图、扫描电子显微镜和原子力显微镜等对上述氧化物薄膜的织构、表面形貌等进行表征。重点研究了薄膜厚度、退火温度、退火时间等工艺对薄膜外延生长及其表面形貌的影响,结果表明:电化学沉积方法制备的CeO2缓冲层具有很好的双轴织构、表面平整、均一,粗糙度低,表现出良好的缓冲层性质。结合金属有机化学溶液超导层的制备技术,本工作展示了一条全化学法制备第二代高温超导带材的技术路线,具有很好的应用前景。     

IBAD技术制备涂层导体用YSZ缓冲层长带的研究

在钇钡铜氧(YBCO)高温超导涂层导体制备路线中,离子束辅助沉积技术(IBAD)是两大主流技术路线之一,取得了最为突出的研究成果.本文简要介绍了IBAD技术制备YBCO涂层导体的最新研究进展;并采用离子束辅助沉积技术在哈氏合金(Hastelloy)基底上成功制备了1米长具有钇稳定氧化锆(YSZ)缓冲层的金属基带.采用X射线衍射仪(XRD)分析YSZ缓冲层的取向;利用原子力显微镜(AFM)和扫描电镜(FESEM)观察其表面形貌.获得了可以实际应用的IBAD-YSZ/Hastelloy缓冲层长基带,可以在该基带上研制其他缓冲层以制备YBCO高温超导涂层导体带材.     

基带材料对单层高温超导电缆模型交流损耗的影响

高温超导(HTS)带材的基带可以改变带材的磁场分布,从而影响到带材的交流损耗。从实验和数值分析两个角度计算了不同高温超导带材的自场损耗,并分析了不同基带对带材自场损耗的影响。利用不同高温超导带材制作了多个单层高温超导电缆模型,并从磁性基带的角度分析了各模型的交流损耗特性。结果显示非磁性基带不影响带材的交流损耗。对于超导电缆模型而言,当磁性基带位于模型外侧时,模型外部空间不存在损耗磁通。此外BSCCO模型和YBCO模型的交流损耗特性相似,NY模型和YN模型的损耗相比前两个模型偏大。尤其在低电流区域,YN模型的交流损耗最大。     

高温热处理气氛对低氟MOD法制备YBCO超导薄膜的影响研究

金属有机物沉积法(MOD)制备YBa2Cu3O7-x(YBCO)涂层导体是最具有商业前景的方法之一.本文使用环烷酸铜代替三氟乙酸铜,降低了前驱液中大约50%的氟含量.然后在带有缓冲层(Y2O3/YSZ/CeO2)的Ni-5at.%W基带上采用MOD法制备了YBCO薄膜并系统研究了高温热处理过程中气体流速和氧分压对YBC...     

涂层导体用金属基带表面对过渡层成核的机理研究

涂层导体用金属基带的表面状况对在其上制备的过渡层的形貌和取向有很大影响.在Ni单晶、轧制辅助双轴织构基带(RABiTS)Ni和经过硫化处理的Ni基带三种不同衬底上采用磁控溅射法制备了CeO₂过渡层.结果表明,在Ni单晶和硫化处理的Ni基带上制备的CeO₂薄膜取向较差,而在RABiTS Ni上制备的CeO₂薄膜完全呈c轴取向,表面平整致密.反射高能电子衍射图显示,RABiTS Ni具有的c(2×2)的S超结构对CeO₂薄膜的取向生长起到了很重要的作用. 关键词： 涂层导体 金属基带 超结构 过渡层     

金属有机分解法制备的SrTiO3薄膜的光学特性

采用金属有机分解法（MOD）在石英衬底上沉积了SrTiO3薄膜。所制备的薄膜是晶格常数为a=b=c=3.90?的多晶结构。通过测量190—1100nm波段内的透射光谱，采用包络方法计算了薄膜的光学常数（折射率n和消光系数k）。结果表明，采用MOD方法制备的薄膜的折射率大于采用射频磁控溅射、溶胶—凝胶和化学气相沉积方法制备的薄膜的折射率；薄膜的折射率色散关系满足单振子模型，其中振子强度S0为0.88′1014m-2，振子能量E0为6.40eV；薄膜的禁带宽度为3.68eV。     

在SrTiO3, NdGaO3衬底上生长的HgBa2CaCu2Oy超导薄膜

通过两步法,在SrTiO3, NdGaO3衬底上制备了HgBa2CaCu2Oy 高温超导薄膜,X射线衍射实验结果证明了薄膜是c-轴外延生长的.电阻温度测量表明薄膜的超导零电阻转变温度(Tc)>115K和临界电流Jc>0.4MA/cm2(77K,零磁场),而且重复性很好.扫描电镜实验揭示了薄膜是层状生长的,晶粒是四方形和八角形的,实验证实基于碳酸盐的靶也是适合于制备汞系铜氧化物高温超导膜的.     

高温超导长带缓冲层的缺陷分析

实现二代高温超导产业化的关键之一是提高良率。作者在实践中发现,影响带材良率的一个重要因素是存在于带材上的缺陷。对二代高温超导带材中缺陷的研究应该是个一个重要的课题,但是还没有见到过有关的报道,该文对带材中大量出现的典型缺陷进行SEM和EDS分析发现,发现缺陷处有大量C元素,且该C元素存在于抛光基带和缓冲隔离层之间的界面上。由此,推测缺陷产生的根源是抛光带表面的有机物污染,并得到了证实。据此,在抛光工艺中的过滤系统得到了改进,最终良率得到了提高。同时,作者认为,使用SEM-EDS对缺陷进行元素分析,是二代带材开发生产中,对带材缺陷进行快速分析的一种可行方法。     

溶胶-凝胶法制备Y系涂层导体隔离层

本文报道了利用溶胶-凝胶法制备Y系涂层导体CeO2、MgO、SrTiO3隔离层的工作.以无机盐为前驱物获得CeO2、MgO、SrTiO3的溶胶,通过浸蘸涂覆和旋转涂覆把胶体涂覆在织构Ni基带上,然后进行热处理,形成涂层,重复以上过程使涂层达到一定厚度,最后进行高温热处理,得到CeO2、MgO、SrTiO3隔离层.利用扫描电镜分别观察了三种涂层的表面形貌,利用X射线对三种涂层的织构进行了研究.     

第二代高温超导线材研究进展

述评了高温超导第二代线材研究的最新进展,着重介绍了美国AMSC的一种低成本的RABiTS/MOD新技术,涉及基带和超导层的选择,大规模连续制备工艺,钉扎对提高磁场下电流密度的作用,并预测了第二代线材扩大生产规模和商品化的发展前景.     

Universal Texturing Layer for High-Current HTSC Tapes

The inclined substrate deposition method is used to grow MgO layers applicable to set textures incorporated in high-temperature superconductor (HTSCs) tapes with high critical current density. The method makes it possible to obtain polycrystalline sublayers with pronounced textures independently of the substrate crystal structure. Simultaneously, MgO has good adhesion to substrates made of a wide spectrum of materials. This makes the method a universal means for growing texturing buffer layers incorporated in high-current HTSC tapes.     

Electronic and magnetic reconstructions in La0.7Sr0.3MnO3/SrTiO3 heterostructures: a case of enhanced interlayer coupling controlled by the interface

We report on the magnetic coupling of La0.7Sr0.3MnO3 layers through SrTiO3 spacers in La0.7Sr0.3MnO3/SrTiO3 epitaxial heterostructures. Combined aberration-corrected microscopy and electron-energy-loss spectroscopy evidence charge transfer to the empty conduction band of the titanate. Ti d electrons interact via superexchange with Mn, giving rise to a Ti magnetic moment as demonstrated by x-ray magnetic circular dichroism. This induced magnetic moment in the SrTiO3 controls the bulk magnetic and transport properties of the superlattices when the titanate layer thickness is below 1 nm.     

热处理温度对化学溶液沉积GdBiO_3薄膜生长的影响

以铋、钆的硝酸盐等制备前驱溶胶体系,用CSD法在SrTiO3(100)基底上制备出c轴织构良好的可作为涂层导体缓冲层的GdBiO3(GBO)薄膜。首先利用差热分析的结果对GBO薄膜分解过程的吸、放热情况进行了研究,确定了较为适当的有机物分解工艺。在此基础上研究了不同外延成相热处理温度对GBO薄膜生长的影响,并对较高温度处理后样品产生裂纹的原因进行了初步分析。GBO薄膜的相组成和微结构利用XRD和SEM进行分析。研究结果表明,在Ar气氛中适宜于GBO薄膜生长的最佳温度在770℃度附近,在此条件下可以制备出表面平整致密的GBO薄膜。     

Effect of SiC buffer layer on flux pinning property of MgB2 tapes

In this paper we aimed at investigating the flux pinning property of MgB₂ films on hastelloy tapes which are buffered on various thicknesses of SiC layers. We have observed that the increase in thickness of the SiC buffer layer is very closely related with the systematic improvement of the field dependence of the critical current densities (J_c) of MgB₂ tapes while the values of J_c decreased. According to the analysis of the pinning force density (F_p), there exist two pinning sources both in the pure MgB₂ and in the MgB₂ film with the thinnest SiC buffer layer. On the while, the pinning source observed in the MgB₂ films with thicker SiC buffer layers appears to be different from those previously mentioned. The different pinning behaviors of MgB₂ films may suggest that there be an additional pinning center working on the MgB₂ films with thick SiC buffer layers. The microstructural analyses of MgB₂ films confirmed that intra-granular defects and columnar grain boundaries may be a dominant pinning mechanism in the pure MgB₂ and the MgB₂ film with 170 nm-thick SiC buffer layer. For the MgB₂ films with thicker SiC buffer layers, carbon diffusion into the MgB₂ film, which is defined by the Auger electron spectroscopy, may be the origin of the additional pinning mechanism.     

Dynamic evanescent phonon coupling across the La(1-x)Sr(x)MnO3/SrTiO3 interface

The transport and magnetic properties of correlated La0.53Sr0.47MnO3 ultrathin films, grown epitaxially on SrTiO3, show a sharp cusp at the structural transition temperature of the substrate. Using a combination of experiment and first principles theory we show that the cusp is a result of evanescent cross-interface coupling between the charge carriers in the film and a soft phonon mode in the SrTiO3, mediated through linked oxygen octahedral motions. The amplitude of the mode diverges at the transition temperature, and phonons are launched into the first few atomic layers of the film, affecting its electronic state.     

不同生长条件下BiFeO_3薄膜的显微拉曼光谱研究

使用显微拉曼散射技术观察了用脉冲激光沉积方法(PLD)在不同的生长条件下制备的BiFeO3薄膜的拉曼光谱,并且研究了薄膜的结构以及不同的生长条件对薄膜的结构和微结构的影响。与BiFeO3粉末的拉曼光谱比较,我们发现在N2气氛中,在LaNiO3缓冲层上沉积的BiFeO3薄膜具有单一的三方相和最完整的晶格结构。     

Epitaxial growth of La2Zr2O7 buffer layers for YBa2Cu3O7−δ coated conductors on metallic substrates using pulsed laser deposition

In the present work, La₂Zr₂O₇ (LZO) buffer layers were deposited using pulsed laser deposition (PLD) on various metallic substrates including epitaxial pure Ni on a LaAlO₃ (LAO) substrate as well as highly textured Ni–5 at.%W tapes. It is shown that the LZO deposited on pure Ni-buffered LAO exhibits a mixed orientation while LZO on Ni–5 at.%W grows epitaxially. This difference may be explained by the existence of a sulphur superstructure on the surface of Ni–5 at.%W tapes, promoting the epitaxial (0 0 l) nucleation of seed layers. Highly textured YBa₂Cu₃O_7?δ layers were prepared either by using a single buffer layer of LZO or bilayer buffers of CeO₂/LZO on Ni–5 at.%W. The superconducting transition temperature (T_c) increases with the LZO thickness, reaching a value of 90 K with a very narrow transition width (1.5 K) for 240 nm thick LZO layers. Inductive J_c measurements at 77 K in self-field show a value of about 0.96 MA/cm² for the thickest LZO layers, which is comparable to the value observed on standard buffer architectures such as CeO₂/YSZ/Y₂O₃.     

SrTiO3金属-绝缘体-半导体结构的介电与界面特性

采用金属有机分解法在p型Si衬底上制备了SrTiO3（STO）薄膜.研究了STO薄膜金属 绝缘体 半导体(MIS)结构的介电和界面特性.结果表明，STO薄膜显示出优异的介电性能，在10kHz处的介电常数约为105，损耗低于001，这来源于多晶结构和良好的结晶性；MIS结构中的固定电荷密度Nf和界面态密度Dit分别约为15×1012cm-2和(14—35)×1012cm-2eV-1，这主要与Si/STO界面处形成的低介电常数界面层有关. 关键词： SrTiO3薄膜 MIS结构 介电性能 Si/STO界面     

Epitaxial growth of YSZ buffer layer for YBa2Cu3O7−δ coated conductor by reel-to-reel pulsed laser deposition

Yttria-stabilized zirconia (YSZ) buffer layers were deposited on CeO₂ buffered biaxially textured Ni-W substrate by reel-to-reel pulsed laser deposition (PLD) for the application of YBa₂Cu₃O_7−δ (YBCO) coated conductor and the influence of substrate temperature and laser energy on their crystallinity and microstructure were studied. YSZ thin films were prepared with substrate temperature ranging from 600 to 800 °C and laser energy ranging from 120 to 350 mJ. X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) were used to investigate how thin film structure and surface morphology depend on these parameters. It was found that the YSZ films grown at substrate temperature below 600 °C or laser energy above 300 mJ showed amorphous phase, the (0 0 1) preferred orientation and the crystallinity of the YSZ films were improved with increasing the temperature, but the surface roughness increased simultaneously, the SEM images of YSZ films on CeO₂/NiW tapes showed surface morphologies without micro-cracks. Based on these results, we developed the epitaxial PLD-YSZ buffer layer process at the tape transfer speed of 3-4 m/h by the reel-to-reel system for 100 m class long YBCO tapes.