Ga2Se3／ZnSe异质结分子束外延生长过程中ZnGa2Se4外延层的形成

首次在（１００）ＧａＡｓ衬底上成功地生长出ＺｎＧａ２Ｓｅ４外延薄膜。用分子束外延技术在１００ＧａＡｓ衬底上制备Ｇａ２Ｓｅ３／ＺｎＳｅ异质结时，用５４０℃以上的温度生长出ＺｎＧａ２Ｓｅ外延层。     

ESR研究非晶Ag￣＋导体的晶化

用电子自旋共振（ＥＳＲ）方法对非晶Ａｇ￣＋离子导体０．８５ＡｇＩ～０．１５Ａｇ＿４Ｐ＿２Ｏ＿７的热处理晶化过程进行研究，在样品中掺入微量（约１×１０￣（－３）ｇ／ｇ）的Ｍｎ￣（２＋）或Ｖ￣（４＋）离子作为自旋探针离子，它们的ＥＳＲ谱强度随升温线性减弱，当样品完全晶化时ＥＳＲ谱消失。这样测定的样品完全晶化的温度分别为９８℃（掺Ｍｎ的）和１０８℃（掺Ｖ的）．本文还对Ｍｎ￣（２＋）和Ｖ￣（４＋）的ＥＳＲ谱进行了分析。     

GaAs／GaAlAs多量子阱反射型光调制器及自电光效应器件

采用分子束外延技术生长含有大周期数的ＧａＡｓ／ＧａＡｌＡｓ多量子阶（ＭＱＷ）及分布布喇格反射器（ＤＢＲ）的ＰＩＮ结构器件。研究了量子限制斯塔克效应（ＱＣＳＥ），分布布喇格反射及非对称腔模（ＡＳＦＰ）效应对光的反射调制作用及这三种效应的兼容性对光调制及逻辑器件的重要影响。给出我们研制的反射型光调制器及自电光效应器件的实验结果。对于常通型及常闭型调制器，其两态衬比度可达１０ｄＢ。所研制的ＳＥＥＤ器件，其导通光能耗低于１０ｆＪ／（μｍ）￣２，实现其光学双稳态及Ｒ－Ｓ光触发器工作。     

电场对Au—Ag薄膜结构影响的AFM和VAXPS研究

利用原子力显微镜（ＡＦＭ）和变角Ｘ射线光电子谱（ＶＡＸＰＳ）技术研究了Ａｕ－Ａｇ／ＳｉＯ２体系在直流电场作用下，Ａｕ，Ａｇ电迁移的特点及所引起的薄膜结构的变化，观察到较低温度下Ａｕ，Ａｇ聚集状态的显著变化，发现电迁移过程中Ａｕ－Ａｇ薄膜与ＳｉＯ２基底之间存在界面化学反应，膜层中Ａｕ，Ａｇ，Ｓｉ等元素的化学状态发生了相应的变化，这些结构表明ＳｉＯ２表面上Ａｕ－Ａｇ复合薄膜电迁移不只是一个水平方向的扩     

表面增强拉曼散射(SERS)光谱研究含偶氮基长链脂肪酸薄膜

表面增强拉曼散射（ＳＥＲＳ）光谱研究含偶氮基长链脂肪酸薄膜吴玉清赵冰徐蔚青陶艳春吴英李伯符（吉林大学超分子结构与谱学开放实验室１３００２３）ＳｕｒｆａｃｅＥｎｈａｎｃｅｄＲａｍａｎＳｐｅｃｔｒｏｓｃｏｐｉｃＳｔｕｄｙｏｆＡｚｏｂｅｎｚｅｎｅＣｏｎｔａ...     

MBE和MOCVD生长的AlGaAs／GaAsGRIN—SCH SQW激光器深中心的比较

应用深能级瞬态谱（ＤＬＴＳ）技术详细研究分子束外延（ＭＢＥ）和金属有机物化学汽相淀积（ＭＯＣＶＤ）生长的ＡｌＧａＡｓ／ＧａＡｓ ｇｒａｄｅｄ ｉｎｄｅｘ ｓｅｐａｒａｔｅ ｃｏｎｆｉｎｅｍｅｎｔ ｈｅｔｅｒｏｓｔｒｕｃｔｕｒｅ ｓｉｎｇｌｅ ｑｕａｎｔｕｍ ｗｅｌｌ（ＧＲＩＮ－ＳＣＨ ＳＱＷ）激光器的深中心。结果表明，在激光器的ｎ－ＡｌＧａＡｓ层里除众所周知的ＤＸ中心外，还存在着较大浓度和俘获截面     

GaAs衬底上生长的GaInP_2外延单晶薄膜的杂质污染研究

各种外延技术已被用来在ＧａＡｓ衬底上生长ＧａｘＩｎ１－ｘＰ外延单晶薄膜（ＧａＩｎＰ２／ＧａＡｓ）．很多文献认为,在ＧａＩｎＰ２／ＧａＡｓ生长过程中会被Ｃ杂质污染．我们用高灵敏的ＣＡＭＥＣＡＩＭＳ４Ｆ型二次离子质谱仪直接测量的结果表明,污染ＧａＩｎＰ２／ＧａＡｓ的微量杂质是Ｓｉ,而不是Ｃ．由ＧａＩｎＰ２／ＧａＡｓ在１．１７ｅＶ附近的光致发光峰的峰值随激发强度的变化形状表明了它应属于施主－受主对复合发光．进一步分析表明,施主为处在Ｇａ格位上的Ｓｉ杂质（ＳｉＧａ）,受主为Ｇａ空位（ＶＧａ）．     

MARTIN MARETTA EOSS（EOTAS／NVPS）

ＭＡＲＴＩＮ　ＭＡＲＥＴＴＡ　ＥＯＳＳ（ＥＯＴＡＳ／ＮＶＰＳ）１９９１年９月，ＭａｒｔｉｎＭａｒｉｅｔｔａ公司接收３亿美元的合同，为美军的ＲＡＨ—６６Ｃｏｍａｎｃｈｅ轻型直升机研制光电传感器系统（ＥＯＳＳ）（前身是目标搜索系统／夜视领航传感器（ＴＡＳ...     

语音信号的增强相对谱滤波

提出了在语音信号对数功率谱域和功率谱域顺序滤波的新的增强ＲＡＳＴＡ滤波（ＥＲＡＳＴＡ）方法。语音识别和说话人识别实验表明,ＥＲＡＳＴＡ滤波能够有效地去除加性噪声和卷积噪声的干扰,ＥＲＡＳＴＡ算法与语音信号的失真过程和噪声的功率谱无关。ＥＲＡＳＴＡ方法性能同ＪＲＡＳＴＡ算法类似或更好,且不需要ＪＲＡＳＴＡ 算法中的实时语音信噪比估计。ＥＲＡＳＴＡ 滤波器的设计表明,低频率的谱调制分量可引起语音识别和说话人识别性能的下降,说话人识别较语音识别需要较小的谱时间调制带宽。     

端面附近缺陷在掺铒光纤中引起的振荡

实验研究了由于掺铒光纤（ＥＤＦ）端面附近存在缺陷引起光反射而导致的振荡，这种振荡发生在掺铒光纤放大的自发辐射（ＡＳＥ）谱的峰值波长处，由于较长掺铒光纤的放大的自发辐射谱近似于其小信号增益谱，因此也可以认为发生在掺铒光纤放大器（ＥＤＦＡ）的最大增益处，对其增益产生不良影响。     

Reflectance difference spectroscopy during CdTe/ZnTe interface formation

We have investigated the first stages of epitaxial growth of CdTe on ZnTe and ZnTe on CdTe with reflectance difference (RD) spectroscopy. Spectroscopic RD data show strong optical anisotropy responses at the critical points of the bulk dielectric function at the E₀, E₁ and E₁+Δ₁ interband transitions of ZnTe and CdTe, respectively, which indicate that anisotropic in-plane strain occurs during epitaxial growth. Kinetic RD data taken at the E₁ transition of the respective material exhibit with an accuracy of 1 ML the onset of the formation of misfit dislocations for these material systems.     

Surface reconstructions of MnAs grown on GaAs(001)

During epitaxial growth of MnAs on GaAs(001) by molecular-beam epitaxy (MBE) the surface exhibits various reconstructions depending on the growth conditions. These reconstructions have been studied during growth by reflection high-energy electron diffraction (RHEED) and reflectance difference spectroscopy (RDS). A feature sensitive to the surface structure was identified in the RD spectra. After growth, the (1×2) and (1×1) reconstructions were cooled down to room temperature and imaged in ultrahigh vacuum with a conventional scanning tunneling microscope (STM). Atomic-scale images of these surfaces are presented.     

Formation of CrSi2 nanoislands on Si(111)7 × 7 and epitaxial growth of silicon overlayers in Si(111)/CrSi2 nanocrystallites/Si heterostructures

Low-energy electron diffraction and differential reflectance spectroscopy are used to study the self-formation of chromium disilicide (CrSi₂) nanoislands on a Si(111) surface. The semiconductor properties of the islands show up even early in chromium deposition at a substrate temperature of 500°C, and the two-dimensional growth changes to the three-dimensional one when the thickness of the chromium layer exceeds 0.06 nm. The maximal density of the islands and their sizes are determined. The MBE growth of silicon over the CrSi₂ nanoislands is investigated, an optimal growth temperature is determined, and 50-nm-thick atomically smooth silicon films are obtained. Ultraviolet photoelectron spectroscopy combined with the ion etching of the specimens with embedded nanocrystallites demonstrates the formation of the valence band, indicating the crystalline structure of the CrSi₂. Multilayer epitaxial structures with embedded CrSi₂ nanocrystallites are grown.     

Reflectance difference spectroscopy study of Ag growth on W(1 1 0)

We report a reflectance difference spectroscopy (RDS) investigation of the epitaxial growth of Ag on the W(1 1 0) surface. Monitoring the growth in real time, the RDS signal at 4.6 eV shows an oscillatory behavior corresponding to the layer-by-layer growth of the first three monolayers. The oscillations are attributed to the variation of the optical anisotropy contributed by the W(1 1 0) substrate and the Ag film. By analyzing the spectral evolution during growth, characteristic optical-electronic fingerprints can be deduced for each added atomic layer. In particular, the binding energy of d-like quantum well states has been used as an indicator for the number of Ag atomic layers and, hence, as a sensitive probe of the Ag thin film growth.     

Properties of the GaAs–Si Interface in Epitaxy through an Aluminum Layer

The interaction of elements near the interface during epitaxial growth of monocrystalline GaAs films through an aluminum layer is investigated by the methods of x-ray photoelectronic spectroscopy and secondary-ion mass spectroscopy.     

Effect of the chromium layer thickness on the morphology and optical properties of heterostructures Si(111)/(CrSi<Subscript>2</Subscript> nanocrystallites)/Si(111)

Growth and the optical properties of epitaxial heterostructures Si(111)/(CrSi₂ nanocrystallites)/Si(111) based on nanosized islands of chromium disilicide (CrSi₂) on Si(111) were studied using low-energy electron diffraction, atomic-force microscopy, and optical reflection and transmission spectroscopy. The heterostructures with thicknesses of 0.1, 0.3, 0.6, 1.0, and 1.5 nm were formed by reactive epitaxy at a temperature of 500°C followed by the epitaxial growth of silicon at 750°C. The specific features of changes in the density and sizes of CrSi₂ islands on the silicon surface were determined at T = 750°C as the chromium layer thickness was increased. It was established that, in the heterostructures with chromium layer thicknesses exceeding 0.6 nm, a small part of faceted Cr₂Si₂ nanocrystallites (NCs) emerge into near-surface region of the silicon, which is confirmed by the data from optical reflectance spectroscopy and an analysis of the spectral dependence of the absorption coefficient. A critical size of NCs is shown to exist above which their shift to the silicon surface is hampered. The decreased density of emerging NCs at chromium layer thicknesses of 1.0–1.5 nm is associated with the formation of coarser NCs within a silicon layer, which is confirmed by the data from differential reflection spectroscopy.     

SOI基3C-SiC薄膜的光谱表征

本文探索在SOI基片上通过顶层Si直接与碳源反应,反向外延生长3C-SiC薄膜的工艺条件和技术。采用LPCVD技术,以CH4和H2混合气体为反应源,在SOI衬底上生长3C-SiC薄膜。采用X射线衍射分析仪、场发射扫描电子显微镜和傅里叶红外光谱来研究样品的结构和性质;并研究反应前、后样品电压-电容特性的变化。研究结果表明,通过反向外延的方法,能够在SOI基片反向外延生长得到3C-SiC薄膜,但目前的工艺条件有待进一步的改善。     

Self-organized growth of quantum dot-tunnel barrier systems

Surface selective epitaxial growth on patterned substrates is used to fabricate quantum dot-tunnel barrier systems, which can be used as single-electron transistor devices. In the centre of a pre-patterned constriction a self-assembled GaAs quantum dot embedded in barrier material is formed during the molecular beam epitaxial growth of an Al_0.33Ga_0.67As/GaAs heterostructure. The quantum dot is connected via self-aligned tunnelling barriers to source and drain electrodes. In-plane-gate electrodes are also realized within the epitaxial growth process. The paper describes the fabrication process of the device and the characterization of the direct grown quantum dot-tunnel barrier system using scanning-electron microscopy, atomic-force microscopy and transport spectroscopy.     

Electronic structure and simulation of the dielectric function of β-FeSi2 epitaxial films on Si(111)

The optical functions of iron disilicide (β-FeSi₂) thin epitaxial films are calculated from the reflectance spectra in the energy range 0.1–6.2 eV with the use of the Kramers-Kronig (KK) integral relations. A comparison of the results of calculations from the transmittance and reflectance spectra and the data obtained from the reflectance spectra in terms of the Kramers-Kronig relations indicates that the fundamental transition at an energy of 0.87±0.01 eV is a direct transition. An empirical model is proposed for the dielectric function of β-FeSi₂ epitaxial films. Within this model, the specific features in the electronic energy-band structure of the epitaxial films are described in an analytical form. It is shown that the maximum contributions to the dielectric function and the reflectance spectrum in the energy range 0.9–1.2 eV are made by the 2D M ₀-type second harmonic oscillator with an energy of 0.977 eV. This oscillator correlates with the second direct interband transition observed in the energy-band structure of β-FeSi₂.     

Surface processes during growth of InAs/GaAs quantum dot structures monitored by reflectance anisotropy spectroscopy

The time resolved reflectance anisotropy spectroscopy (RAS) measurement at 4.2 eV was used for the optimization of technological parameters for Stranski–Krastanow quantum dot (QD) formation. TMIn dosage and waiting time following InAs deposition during which QD formation takes place were optimized.RAS measurement helps us to study the MOVPE surface processes such as QD formation, dissolution of In from InAs QDs during the growth of GaAs capping layer or recovery of epitaxial surface from As deficiency, when As partial pressure is increased. We have shown, that the recovery of epitaxial surface from As deficiency is rather a slow process of the order of tens of seconds.We have for the first time observed in situ the mechanism of In atoms migration from QDs during GaAs capping layer growth. First the GaAs layer is formed and then the In migration from QDs follows. These two processes do not start at the same time, the In dissolution is delayed. Conclusions extracted from RAS measurement are in agreement with photoluminescence results.