A reflective surface-relief two-layer grating for splitting beams with the polarization-selective property

A polarization-selective beam splitter is presented based on a reflective surface-relief two-layer grating with a metal slab. The grating is composed of two dielectric layers and a metal slab on the substrate. For TE polarization, efficiencies of 97.58% can be diffracted into the reflective −1st order. For TM polarization, two-port output of 47.55% and 47.11% can be split into the 0th order and the −1st order, respectively. Such a polarization-selective beam splitter can be fulfilled by one grating in reflection. The grating depths of two layers are optimized by using rigorous coupled-wave analysis with the given duty cycle of 0.6 and period of 1100 nm. The performance for different incident conditions is investigated when the incident wavelength and angle deviate from the central wavelength and the Bragg angle, respectively. For TM polarization, good uniformity can still be achieved within the given incident wavelength and angle regions. For TE polarization, the reflective polarization-selective beam splitter can have merits of wideband for different incident wavelengths.     

A mixed metal dielectric sandwiched grating for polarization-selective reflection

A mixed metal dielectric sandwiched grating is described for polarization-selective reflection. The novel grating is composed of substrate, metal slab, two dielectric grating layers, and covering layer. The polarization-selective grating is optimized by using rigorous coupled-wave analysis for the usual duty cycle of 0.5. With the optimized grating parameters, reflective efficiency of 96.49% can be diffracted into the −1st order for TE polarization. And two-port output of 48.26%/48.27% can be diffracted into the 0th and the −1st orders for TM polarization. Polarization-selective reflection with good performance can be obtained by the mixed metal dielectric sandwiched grating. The usual duty cycle of 0.5 makes it easy and simple to be fabricated for practical applications. Moreover, the polarization-selective beam splitter based on the mixed metal dielectric sandwiched grating has advantages of wide incident wavelength range for TE polarization and angular bandwidth for TM polarization.     

Connecting-layer-based polarizing beam splitter grating with high efficiency for both TE and TM polarizations

We describe a novel polarizing beam splitter (PBS) of transmission connecting-layer-based grating, which can show high efficiency for TE polarization in the ?1st order and TM polarization in the 0th order. According to the modal method, grating duty cycle and period are prescribed to obtain high efficiency for TM polarization. Using the rigorous coupled-wave analysis, grating depth and thickness of the connecting layer are optimized to achieve high efficiency for TE polarization. The presented PBS has advantages of wideband properties for incident wavelength and angle. Most importantly, the efficiency is improved greatly for TE polarization compared with the reported PBS based on fused-silica grating.     

Polarizing beam splitter of a deep-etched fused-silica grating

We described a highly efficient polarizing beam splitter (PBS) of a deep-etched binary-phase fused-silica grating, where TE- and TM-polarized waves are mainly diffracted in the -1st and 0th orders, respectively. To achieve a high extinction ratio and diffraction efficiency, the grating depth and period are optimized by using rigorous coupled-wave analysis, which can be well explained based on the modal method with effective indices of the modes for TE/TM polarization. Holographic recording technology and inductively coupled plasma etching are employed to fabricate the fused-silica PBS grating. Experimental results of diffraction efficiencies approaching 80% for a TE-polarized wave in the -1st order and more than 85% for a TM-polarized wave in the 0th order were obtained at a wavelength of 1550 nm. Because of its compact structure and simple fabrication process, which is suitable for mass reproduction, a deep-etched fused-silica grating as a PBS should be a useful device for practical applications.     

共振域矩形介质光栅的逆向设计

采用模态法研究了共振域光栅分束器及闪耀光栅等光学器件的设计原理及逆向设计方法,给出了-1级非偏振闪耀光栅的典型设计示例。研究表明,自准直角入射时,光束在光栅内传输将激发产生离散模,通过调节离散模透过光栅传输时的累积相位差,可对衍射光进行调控,实现偏振(非偏振)分束、偏振(非偏振)闪耀等功能。采用严格耦合波法对基于模态法逆向设计的-1级非偏振石英闪耀光栅的几何参数进行验证,计算结果显示两者非常吻合,证明了该方法的正确性。     

一种条形亚波长径向偏振光栅

提出并设计了一种条形亚波长铝金属径向偏振光栅,用电子束直写方法制成,可以将偏振光偏振面的旋转直接转换为光斑的水平移动,通过定位光斑位移实现旋光角的测量.光栅由12000个单元水平排列组成,每个单元宽1μm,中心单元的格栅方向为0°,左右相邻单元的格栅分别按逆时针和顺时针方向依次旋转30″,最终实现±50°旋光角的测量范围.基于琼斯矩阵建立了光栅的理论模型,并运用严格耦合波理论分析了光栅的偏振特性与光栅脊厚、周期、占空比、入射光波长之间的关系,确定了光栅的最优结构.实验与仿真结果表明,光栅TM波的透过率大于80%、整体消光比大于26dB.这一测量模式不受光功率波动的影响,可以构成无机械旋转的新型旋光仪,或不需要旋转图像平移转换的电力光学传感器.     

Deep silicon grating as high-extinction-ratio polarizing beam splitter

A deep binary silicon grating as high-extinction-ratio reflective polarizing beam splitter （PBS） at the wavelength of 1550 nm is presented. The design is based on the phenomenon of total internal reflection （TIR） by using the rigorous coupled wave analysis （RCWA）. The extinction ratio of the rectangular PBS grating can reach 2.5~105 with the optimum grating period of 397 nm and groove depth of 1.092 μm. The efficiencies of TM-polarized wave in the 0th order and TE-polarized wave in the -1st order can both reach unity at the Littrow angle. Holographic recording technology and inductively coupled plasma （ICP） etching could be used to fabricate the silicon PBS grating.     

Broadband polarizing beam splitter based on the form birefringence of a subwavelength grating in the quasi-static domain

We propose a novel broadband polarizing beam splitter with a compact sandwich structure that has a subwavelength grating in the quasi-static domain as the filling. The design is based on effective-medium theory an anisotropic thin-film theory, and the performance is investigated with rigorous coupled-wave theory. The design results show that the structure can provide a high polarization extinction ratio in a broad spectral range.     

Polarization and Color Separator Using Binary Phase Grating with Subwavelength Period

A data projector using three liquid crystal display panels has a complex optical system. The illuminating optics separate the beam from a light source into three primary colors and separate those into opposite polarizations using multi-layer films and prisms. A reflection grating with the period of subwavelength has high diffraction efficiency for p polarized light and high regularly reflectance for s polarized light. The diffraction angle of a grating largely depends on the wavelength, because a diffractive optical element (DOE) has large chromatic dispersion. The grating with the period of subwavelength can separate the unpolarized light into polarization components effectively using its polarization dependency and can separate white light into color components using its chromatic dispersion simultaneously. The grating makes the optical system simpler and smaller than those with conventional devices. In this paper the efficiency of polarization separation for the grating is calculated by a rigorous analytical method. Next, the condition for color separation is calculated by Snell#x0027;s law, and an optical system using a grating that performs polarization and color separation is proposed. Experimental results of the DOE fabricated are well matched with those of this simulation.     

体布拉格光栅滤波片及其光谱成像应用

利用厚体布拉格光栅的波长选择特性对目标光场进行窄带滤波,是实现高光谱成像的一种新途径。基于严格耦合波理论,设计了体布拉格光栅结构,探索了厚体布拉格光栅的制作工艺,搭建系统光路验证了体布拉格光栅的光谱成像能力。研究结果表明:要获得较窄滤波谱宽,需要提高体布拉格光栅的厚度周期比,并严格控制入射光束发散角;刻写光束质量、震动和偏振会极大地影响制作的光栅条纹面质量,需要从优化写入光的光束均匀性、采用防震措施以及调整两刻写光束偏振一致性等方面优化刻写过程,以提高光栅的衍射效率和质量;验证了体布拉格光栅滤波片进行空间二维面阵成像的能力,宽谱光源透射条件下,通过对入射光束进行准直,滤波谱宽5 nm左右,空间分辨率约4 lines/mm;漫反射条件下,使用体布拉格光栅对进行色散补偿,能够实现较为清晰的成像,空间分辨率约4.9 lines/mm。     

Polarization selectivity of two-layer grating sandwiched between two fused-silica substrates

The polarization selectivity is described based on the two-layer grating sandwiched between two fused-silica substrates. The polarization-selective grating can diffract TE polarization with high efficiency and split TM polarization with good uniformity. With the novel structure, the grating can have high efficiency of sandwiched grating and wideband property of two-layer grating. The modal method is applied to analyze the grating, which corresponds well with the results of rigorous coupled-wave analysis. The physical analysis can give the good guideline to optimize the polarization-selective sandwiched two-layer grating effectively. Such a polarization-selective grating can also have merits of high efficiency for TE polarization and wide angular bandwidth for TM polarization based on the two-layer grating sandwiched between two fused-silica substrate. It is easy to clean and protect the grating surface compared with the surface-relief grating.     

用于ICF驱动器的取样光栅的矢量分析与计算

 在ICF的终端光学聚焦系统中，采用取样光栅(BSG)将透射的三倍频光按一定比例送入能量计中进行能量诊断。本文采用精确耦合波矢量分析方法分析了衍射效率与光栅周期、刻槽深度、占空比等的关系，为光栅的实际制作提供了一些有意义的结果。     

Diffraction of an ultrashort pulsed beam with arbitrary polarization state from a volume holographic grating in LiNbO3 crystals

Based on a modified coupled wave theory of Kogelnik, we have studied the diffraction of an ultrashort pulsed beam with an arbitrary polarization state from a volume holographic grating in photorefractive LiNbO₃ crystals. The results indicate that the diffracted intensity distributions in the spectral and temporal domains and the diffraction efficiency of the grating are both changed by the polarization state and spectral bandwidth of the input pulsed beam. A method is given of choosing the grating parameters and input conditions to obtain a large variation range of the spectral bandwidth of the diffracted pulsed beam with an appropriate diffraction efficiency. Our study presents a possibility of using a volume holographic grating recorded in anisotropic materials to shape a broadband ultrashort pulsed beam by modulating its polarization state.     

Polarization effects induced by the bi-layer attenuated phase-shift mask and their impacts on near-field distribution

As ArF projection lithography is approaching 45 nm technology node and beyond, polarization effects induced by mask are remarkable. At this mask dimension, traditional Kirchhoff approximation is invalid. Rigorous mask model is needed for accurate evaluation of mask diffraction. In previous works, many researchers are focus on the single grating layer diffraction. In this paper, Lee's formulation based on rigorous coupled wave analysis is applied to simulate the bi-layer grating diffraction in lithography. Then, polarization states as function of mask and incident light properties are evaluated. At last, the impacts on near-field distribution with different polarization state are further investigated. The image quality becomes worse under TE polarization, when Ta thickness becomes 35 nm, where the phase effects are effectively reduced. There should be a tradeoff between them.     

Optimal design of sub-wavelength metal rectangular gratings for polarizing beam splitter based on effective medium theory

A novel optimal design of sub-wavelength metal rectangular gratings for the polarizing beam splitter (PBS) is proposed. The method is based on effective medium theory and the method of designing single layer antireflection coating. The polarization performance of PBS is discussed by rigorous couple-wave analysis (RCWA) method at a wavelength of 1550~nm. The result shows that sub-wavelength metal rectangular grating is characterized by a high reflectivity, like metal films for TE polarization, and high transmissivity, like dielectric films for TM polarization. The optimal design accords well with the results simulated by RCWA method.     

Polarizing beam splitter based on a double-layer subwavelength grating

A Si–ZnS double-layer subwavelength grating is theoretically used as a high-efficient polarizing beam splitter. To design this structure, the rigorous coupled-wave analysis (RCWA) is applied to study the reflectivity and transmissivity for the TE and TM polarization, respectively. Simulation results show that both the zero-order reflection for TE polarization and the zero-order transmission for TM polarization can exceed 90% in a wide tunable working incident angle range from 48° to 72°. Moreover, the proposed polarizing beam splitter has a working wavelength that is in the range of 1500–1600 nm.     

Modal analysis of deep-etched low-contrast two-port beam splitter grating

Modal analysis of a deep-etched low-contrast two-port beam splitter grating under Littrow mounting is presented. The guideline for the design of a subwavelength transmission fused-silica phase grating as high-efficiency grating, polarizing beam splitter (PBS), and two-port beam splitter, is summarized. As an example, a polarization-independent two-port beam splitter grating is designed at wavelength of 1064 nm. We firstly analyzed the physical essence of the grating by the simplified modal method. The guideline for the grating design and the approximate grating parameters are obtained. Then using the rigorous coupled-wave analysis (RCWA) with parameters varying around the approximate ones, optimum grating parameters can be determined. With the design guideline, the time for the rigorous calculation of the grating profile parameters can be reduced significantly.     

亚波长介质偏振分束光栅的衍射特性

 采用严格耦合波理论并结合矩阵LU分解法,分析了亚波长介质光栅的刻槽深度、占空比、入射角、入射波长等参数对TE偏振和TM偏振0级衍射效率的影响。结果表明:在1 550 nm波长处,出现瑞利反常现象。由此提出利用瑞利反常现象设计工作波长为1 550 nm的偏振分束光栅,通过优化设计确定了最佳设计参数,即光栅周期为l0/2,瑞利入射角为30°,刻槽深为0.9l0,占空比为0.5。结果表明,参数优化后的偏振分束光栅可以使TE偏振0级反射波和TM偏振0级透射波同时达到近100%的衍射效率。     

一维增透亚波长光栅的研究

将具有高透射性的亚波长光栅置于微机械波长可调谐垂直腔面发射激光器(VCSEL)的内腔当中可以提高波长的调谐范围,为了使波长调谐范围达到最优则必须优化高透射性的亚波长光栅使其透射率达到最大。利用严格耦合波法分析了亚波长光栅的占空比、周期、厚度和入射角对其透射率的影响并找出最优的光栅参数。通过计算分析可得,对于TE和TM偏振存在最佳的占空比使其透射率达到99.5%。在文中条件下,它们对应的占空比分别为0.23和0.80。而光栅厚度对于TE和TM偏振透射率的影响是周期性的,在一个周期内存在一个最佳值使其透射率达到最高。在文中条件下,TE偏振的厚度周期是150 nm,TM偏振的厚度周期是300 nm。当光栅参数不变时,无论是TE还是TM偏振光,它们的透射率只有在垂直入射光栅时(入射角为0°)才能达到最大。而通过等效介质原理可以得出,周期对透射率没有影响。最后计算了透射率在光栅厚度和占空比同时变化时的变化趋势,并从中得出最优的光栅参数。     

低偏振相关损耗全息光栅波分复用器的设计

对基于掺杂铌酸锂材料的体光栅波分复用器主要结构和光栅记录参量提出了一种优化设计方法.采用严格耦合波理论,对两种偏振不同入射角和不同记录晶体厚度下的器件关键性能参量,如插入损耗和偏振相关损耗等进行了优化.数值结果证明采用优化设计的晶体厚度和光栅记录时的入射角,在获得相当低的偏振相关损耗的同时,也能够获得较低的插入损耗,实现了综合性能优化的波分复用器设计.实验结果证明用优化设计的参量能有效降低波分复用器件的插入损耗和偏振相关损耗.