生长温度对In_(0.5)Ga_(0.5)As/GaAs量子点尺寸的影响

采用分子束外延(MBE)技术制备In_(0.5)Ga_(0.5)As/GaAs量子点,利用扫描隧道显微镜(STM)对不同衬底温度下生长的样品进行表征分析.研究表明量子点密度随温度升高先增大后减小,其尺寸随温度的升高而增大.另外,量子点以S-K模式生长并受Ostwald熟化机制影响,其尺寸增大所需的能量来自应变能和温度提供的能量,高温条件下表面原子的解吸附作用会限制量子点的生长.     

生长温度对In_(0.5)Ga_(0.5)As/GaAs量子点尺寸的影响

采用分子束外延(MBE)技术制备In_(0.5)Ga_(0.5)As/GaAs量子点,利用扫描隧道显微镜(STM)对不同衬底温度下生长的样品进行表征分析.研究表明量子点密度随温度升高先增大后减小,其尺寸随温度的升高而增大.另外,量子点以S-K模式生长并受Ostwald熟化机制影响,其尺寸增大所需的能量来自应变能和温度提供的能量,高温条件下表面原子的解吸附作用会限制量子点的生长.     

MOCVD法生长Ca_(0.5)In_(0.5)P外延层的近红外光致发光与温度的依赖关系

测量了用金属有机物化学气相沉积(MOCVD)方法在GaAs衬底上生长的Ga_(0.5)In_(0.5)P外延层的近红外光致发光光谱,观察到三个与深能级有关的发光带,其峰值能量分别为1.17,0.99和0.85eV.研究了这些发光带的发光强度,峰值位置和半宽度随温度的变化关系,并初步分析其来源.     

溅射沉积自诱导混晶界面与Ge量子点的生长研究

在不同的沉积温度下采用离子束溅射技术,在Si基底上生长得到分布密度高、尺寸单模分布的圆顶形Ge量子点.研究发现:随沉积温度的升高Ge量子点的分布密度增大,尺寸减小,当沉积温度升高到750 ℃时,溅射沉积15个单原子层厚的Ge原子层,生长得到高度和底宽分别为14.5和52.7 nm的Ge量子点,其分布密度高达1.68×10¹⁰ cm^-2;Ge量子点的形貌、尺寸和分布密度随沉积温度的演变规律与热平衡状态下气相凝聚的量子点不同,具有稳定形状特征和尺寸分布的Ge量子点是 关键词： Ge量子点 离子束溅射沉积 表面原子行为 混晶界面     

量子环中极化子的温度效应

采用求解能量本征方程和LLP幺正变换方法,研究了量子环中极化子的温度效应.数值计算表明:当温度较低时,温度对极化子的基态能量无影响,当温度较高时,极化子的基态能量随温度的升高而增大;还表明极化子的基态能量随电子-声子耦合强度的增大而减小,随电子受限程度的增强(即量子环内径增大或外径减小)而增大,说明其量子尺寸效应非常显著.     

柱形量子点中极化子的温度效应

本文采用精确求解薛定谔方程和幺正变换方法,研究了柱形量子点中极化子的温度效应。结果表明:只有当温度较高时,温度对柱形量子点中极化子的基态能量才有较明显的影响,且基态能量随着温度的升高而增大;极化子的基态能量随电子-体纵光学(LO)声子耦合强度的增大而减小;且基态能量随着柱形量子点半径(柱高)的增大而减小,表现出明显的量子尺寸效应.     

温度对抛物量子点中强耦合磁极化子性质的影响

采用线性组合算符法和LLP变换法,研究了温度对抛物量子点中强耦合磁极化子性质的影响.首次得到了抛物量子点中强耦合磁极化子的基态能量和振动频率随温度的变化规律.结果表明,量子点中强耦合磁极化子的振动频率随温度的升高而减小,随量子点的受限强度、回旋频率和耦合强度的增加而增大.而基态能量随回旋频率、耦合强度和温度变化的规律与磁极化子的状态性质密切相关.磁极化子基态能量和振动频率随量子点的受限强度、回旋频率和耦舍强度的变化情况受温度的显著影响,不过,温度对磁极化子基态能量和振动频率的影响只有在较高温度(O<γ<0.5)时才显现.     

(1-x)(K0.5Na0.5)NbO3-xSrTiO3陶瓷的弛豫铁电性能

通过对(1-x)(K0.5Na0.5)NbO3-xSrTiO3(0≤x≤0.15)陶瓷的相组成、晶体结构和介电性能的研究发现,该陶瓷为单一的钙钛矿结构相.当x含量较小(x＜0.1)时为正交相结构,x≥0.1时转变为四方相结构.随着SrTiO3掺杂量的增加,样品的致密度增加,样品由正常铁电相逐渐向弥散铁电相转变,且相变温度明显下降,其相变峰的半高宽D和临界指数γ,随 x 的增加而增加.样品损耗ε″r(复介电常数虚部)随温度T的变化表明低温时弛豫极化损耗起主要作用,高温时漏导损耗起主要作用.同时介电常数实部ε′r随频率的变化显示(1-x)(K0.5Na0.5)NbO3-xSrTiO3弛豫为德拜弛豫.     

量子环中极化子的温度效应

采用求解能量本征方程和LLP幺正变换方法,研究了量子环中极化子的温度效应.数值计算表明：当温度较低时,温度对极化子的基态能量无影响,当温度较高时,极化子的基态能量随温度的升高而增大;还表明极化子的基态能量随电子—声子耦合强度的增大而减小,随电子受限程度的增强（即量子环内径增大或外径减小）而增大,说明其量子尺寸效应非常显著.     

(Al0.1Ga0.9)0.5In0.5P材料的MOCVD生长温度窗口研究

用来制作光电子器件的(Al0.1Ga0.9)0.5 In0.5P为直接带隙的四元合金材料,对应的发光波长为630 nm,在其LP-MOCVD (low press-metalorganic chemical vapor deposition)外延生长过程中温度的高低成为影响其质量的关键,找到合适的生长温度窗口很有必要.实验中分别在700℃,680℃,670℃和660℃的条件下生长出作为发光二极管有源区的(Al0.1Ga0.9)0.5 In0.5P多量子阱结构,通过PL谱的测试对比分析,找出最佳生长温度在670℃附近.之后对比各外延片的PL谱、表面形貌,并对反应室的气流场进行了模拟,对各温度下生长状况的原因作出了深入分析.分析得到,高温下In组分的再蒸发会引起晶格失配并导致位错;低温下O杂质的并入会形成大量非辐射复合中心影响晶体质量,因此导致了(Al0.1Ga0.9)0.5In0.5P生长温度窗口较窄,文章最后提出In源有效浓度的提高是解决高温生长的一条有效途径.     

Nonuniform composition profile in In0.5Ga0.5As alloy quantum dots

We use cross-sectional scanning tunneling microscopy to examine the shape and composition distribution of In0.5Ga0.5As quantum dots (QDs) formed by capping heteroepitaxial islands. The QDs have a truncated pyramid shape. The composition appears highly nonuniform, with an In-rich core having an inverted-triangle shape. Thus the electronic properties will be drastically altered, relative to the uniform composition generally assumed in device modeling. Theoretical analysis of the QD growth suggests a simple explanation for the unexpected shape of the In-rich core.     

Sb/As intermixing in self-assembled GaSb/GaAs type II quantum dot systems and control of their photoluminescence spectra

The intermixing of Sb and As atoms induced by rapid thermal annealing (RTA) was investigated for type II GaSb/GaAs self-assembled quantum dots (QD) formed by molecular beam epitaxy growth. Just as in InAs/GaAs QD systems, the intermixing induces a remarkable blueshift of the photoluminescence (PL) peak of QDs and reduces the inhomogeneous broadening of PL peaks for both QD ensemble and wetting layer (WL) as consequences of the weakening of quantum confinement. Contrary to InAs/GaAs QDs systems, however, the intermixing has led to a pronounced exponential increase in PL intensity for GaSb QDs with annealing temperature up to 875 °C. By analyzing the temperature dependence of PL for QDs annealed at 700, 750 and 800 °C, activation energies of PL quenching from QDs at high temperatures are 176.4, 146 and 73.9 meV. The decrease of QD activation energy with annealing temperatures indicates the reduction of hole localization energy in type II QDs due to the Sb/As intermixing. The activation energy for the WL PL was found to drastically decrease when annealed at 800 °C where the QD PL intensity surpassed WL.     

Stranski–Krastanow growth of multilayer In(Ga)As/GaAs QDs on Germanium substrate

We have described Stranski–Krastanow growth of multilayer In(Ga)As/GaAs QDs on Ge substrate by MBE. The growth technique includes deposition of a thin germanium buffer layer followed by migration-enhanced epitaxy (MEE) grown GaAs layer at 350°C. The MEE layer was overgrown by a thin low-temperature (475°C) grown GaAs layer with a subsequent deposition of a thick GaAs layer grown at 590°C. The sample was characterized by AFM, cross-sectional TEM and temperature-dependent PL measurements. The AFM shows dense formation of QDs with no undulation in the wetting layer. The XTEM image confirms that the sample is free from structural defects. The 8 K PL emission exhibits a 1051 nm peak, which is similar to the control sample consisting of In(Ga)As/GaAs QDs grown on GaAs substrate, but the observed emission intensity is lower. The similar slopes of Arrhenius plot of the integrated PL intensity for the as-grown QD sample grown on Ge substrate as well as for a reference QD sample grown on GaAs substrate are found to be identical, indicating a similar carrier emission process for both the samples. This in turn indicates coherent formation of QDs on Ge substrate. We presume due to the accumulated strain associated with the self-assembled growth of nanostructures on Ge that nonradiative recombination centers are introduced in the GaAs barrier in between the QD layers, which in turn degrades the overall optical quality of the sample.     

Evolution of surface morphology and photoluminescence characteristics of 1.3-μm In0.5Gao.5As/GaAs quantum dots grown by molecular beam epitaxy

Evolution of surface morphology and optical characteristics of 1.3-μm In0.5Gao.5As/GaAs quantum dots (QDs) grown by molecular beam epitaxy (MBE) are investigated by atomic force microscopy (AFM) and photoluminescence (PL). After deposition of 16 monolayers (ML) of In0.5Ga0.5As, QDs are formed and elongated along the [110] direction when using sub-ML depositions, while large size InGaAs QDs with better uniformity are formed when using ML or super-ML depositions. It is also found that the larger size QDs show enhanced PL efficiency without optical nonlinearity, which is in contrast to the elongated QDs.     

温度对Al0.5Ga0.5As/AlAs分布布喇格反射器的反射谱影响

采用光学传输矩阵理论对Al0.5Ga0.5As/AlAs材料分布布喇格反射器(DBR)进行理论研究,分析了－10℃到100℃的范围内,温度变化对不同DBR结构的反射光谱影响.结果表明：随着温度的升高,传统20周期DBR的反射光谱向长波长方向移动,速率约0.05 nm/℃,其中由线热膨胀系数带来的影响小于0.001 nm/℃.当传统DBR的周期数增大时,温度对DBR光谱反射率的影响在减小,同时DBR的反射谱峰值波长发生红移.为了降低温度对DBR反射光谱的影响,提出一种新型的复式DBR结构.分析指出：该复式DBR比传统DBR有更大的反射光谱半峰宽,基本能覆盖同温度的AlGaInP LED电致发光光谱,这对提高LED的出光效率有现实意义.     

Comparison of vacancy and antisite defects in GaAs and InGaAs through hybrid functionals

The formation energies and charge transition levels of vacancy and antisite defects in GaAs and In(0.5)Ga(0.5)As are calculated through hybrid density functionals. In As-rich conditions, the As antisite is the most stable defect in both GaAs and InGaAs, except for n-type GaAs for which the Ga vacancy is favored. The Ga antisite shows the lowest formation energy in Ga-rich conditions. The As antisite provides a consistent interpretation of the defect densities measured at mid-gap for both GaAs/oxide and InGaAs/oxide interfaces.     

Morphological anisotropy during migration enhanced epitaxy of GaAs(0 0 1)

The GaAs(0 0 1) surface morphology and structure during growth by migration enhanced epitaxy (MEE) has been studied by reflection high energy electron diffraction and scanning tunneling microscopy. Changes induced by varying the incident As/Ga flux ratio, growth temperature and the total amount of material deposited in each cycle have been studied and the results compared with GaAs(0 0 1) growth by conventional molecular beam epitaxy (MBE). Comparison of the surface morphology at the end of the Ga and As cycles indicates no clear evidence for any enhancement in the Ga adatom diffusion length during the Ga cycle. However, the morphological anisotropy of the growth front does change significantly and it is proposed that this changing anisotropy during MEE enables Ga adatom diffusion along both azimuths. The surface anisotropy during MEE growth is found to increase with the Ga/As ratio. Although there is a clear correlation between composition and morphology, we have also found that highly ordered and flat surfaces are not necessarily an indication of stoichiometric material. We also attempt to clarify a recent controversy on the structure of the c(4 × 4) reconstruction by studying the surface structure at the end of the As cycle as a function of the As/Ga ratio.     

InAs/GaAs单量子点中电子/空穴自旋弛豫

利用分子束外延制备了三种类型量子点样品,它们分别是:未掺杂样品、n型Si调制掺杂样品和p型Be调制掺杂样品。在5 K温度下,采用共聚焦显微镜系统,测量了单量子点的光致发光谱和时间分辨光谱, 研究了单量子点中三种类型激子(本征激子、负电荷激子和正电荷激子)的电子/空穴自旋翻转时间。它们的自旋翻转时间常数分别为: 本征激子的自旋翻转时间约16 ns, 正电荷激子中电子的自旋翻转时间约2 ns, 负电荷激子中空穴的自旋翻转时间约50 ps。     

Emission and strain in InGaAs/GaAs quantum wells with InAs quantum dots obtained at different temperatures

The photoluminescence (PL), its temperature dependence and X ray diffraction (XRD) have been studied in the symmetric In_0.15Ga_0.85As/GaAs quantum wells (QWs) with embedded InAs quantum dots (QDs), obtained with the variation of QD growth temperatures (470–535 °C). The increase of QD growth temperatures is accompanied by the enlargement of QD lateral sizes (from 12 up to 28 nm) and by the shift non monotonously of PL peak positions. The fitting procedure has been applied for the analysis of the temperature dependence of PL peaks. The obtained fitting parameters testify that in studied QD structures the process of In/Ga interdiffusion between QDs and capping/buffer layers takes place partially. However this process cannot explain the difference in PL peak positions.