喷墨打印量子点薄膜：墨水溶剂的选择策略（英文）

喷墨打印制备的量子点（Quantum dots,QDs）薄膜形貌对多层发光器件的性能影响显著（如量子点发光二极管）,其中咖啡环与拱状形貌是典型的薄膜均匀性问题,通过液滴调控实现高质量QDs薄膜是发展量子点电致发光显示的关键。研究工作表明,通过溶剂实施的墨水调控被证明是改变沉积薄膜形貌的有效手段。然而,优化出可消除咖啡环或拱状形貌的墨水流变参数往往需要大量耗时的实验,墨水配制筛选效率低。本研究基于薄膜形貌分析结合机器学习方法,试图将溶剂流变参数与喷墨打印QDs薄膜形貌直接联系起来,并以红光QDs为溶质,以烷烃或直链酯类为溶剂,研究发现通常使用的一元溶剂和二元溶剂体系中,所使用溶剂的沸点比表面张力或粘度参数对薄膜沉积形貌的影响更加显著,在二元溶剂中薄膜形貌与沸点较高的溶剂组分密切相关。为得到厚度均匀的平整薄膜,建议一元溶剂墨水体系的溶剂或二元溶剂墨水体系中较高沸点的溶剂的沸点范围为250～265℃。     

Au电极厚度对MgZnO紫外探测器性能的影响

利用分子束外延设备(MBE)制备了MgZnO薄膜.X射线衍射谱、紫外-可见透射光谱和X射线能谱表明薄膜具有单一六角相结构,吸收边为340 nm,Zn/Mg组分比为62:38.采用掩膜方法使用离子溅射设备,在MgZnO薄膜上制备了Au电极,并实现了Au-MgZnO-Au结构的紫外探测器.通过改变溅射时间,得到具有不同Au电极厚度的MgZnO紫外探测器.研究结果表明:随着Au电极厚度的增加,导电性先缓慢增加,再迅速增加,最后缓慢增加并趋于饱和;而Au电极的透光率则随厚度的增加呈线性下降.此外,随着Au电极厚度的增加,器件光响应度先逐渐增大,在Au电极厚度为28 nm时达到峰值,之后逐渐减小.     

基于裂纹模板法的金属网格透明导电薄膜制备及性能改进

基于裂纹模板法制备了一种高屏蔽性能的金属网格透明导电薄膜.采用现有裂纹模板法制备得到的金属网格透明导电薄膜,其金属网格厚度较薄,屏蔽性能有待改进.本文在研究了裂纹材料的旋涂转速对龟裂图案的影响关系分布曲线中,增加了缝隙深度因子,选取了合适的裂纹材料和旋涂方案,制备得到理想的随机图案分布的裂纹模板.通过磁控溅射法在裂纹模板缝隙内外沉积厚度为1μm的金属层,引入了超声波清洗结合有机溶剂的方法,高效去除裂纹胶模板后,得到了金属网格透明导电薄膜样品.实测的金属网格透明导电薄膜样品透光率超过85%,同时方阻值保持在2.8Ω/左右,具有良好的透光和电磁屏蔽性能.通过制备加厚金属网格透明导电薄膜改进了屏蔽性能,为后续基于裂纹模板法制备高屏蔽性能金属网格透明导电薄膜提供了参考.     

基于透射率曲线确定聚合物太阳能电池功能层的光学常数和厚度

本文介绍了一种确定聚合物太阳能电池功能层光学常数和厚度的方法. 该方法借助于特定的色散模型拟合透射率测试曲线以获得功能层光学常数和厚度值. 文中比较了Forouhi-Bloomer和Lorentz-Oscillator模型在体异质结薄膜的透射率拟合计算中的适用性, 计算了poly(3-hexylthiophene)(P3HT)/[6,6]-phenylC₆₁-butyric acid methyl ester (PCBM)和 poly[2-methoxy-5-5(2'-ethyl-hexyloxy)-1,4-phenylenevinylene](MEH-PPV)/PCBM体异质结薄膜的光学常数和厚度. 拟合得到的曲线与实验曲线符合良好, 厚度计算的结果与台阶仪测量结果保持一致, 误差小于4%. 进一步分析得到的热退火和加入高沸点溶剂添加剂后P3HT/PCBM薄膜的光学常数和光学禁带值与相应器件伏安特性相符. 该方法适用于所有体异质结的功能层, 可用于聚合物太阳能电池的膜系优化和在线检测.     

高均匀性柔性纳米银线透明导电薄膜的制备及其性能研究

对真空抽滤法进行了改进,制备出高均匀性且只存在极少量纳米银微粒的纳米银线透明导电薄膜.将纳米银线在同一片衬底上依次进行真空抽滤和压制并重复多次,然后对制备的透明导电薄膜的表面形貌以及透光率和方阻的分布进行了讨论.结果表明通过三次压制制备出的导电薄膜的透光率约为82.7%,平均方阻为7.47Ω/sq.     

喷墨打印量子点墨水调控EI北大核心CSCD

设计了环己基苯与十八烯的双溶剂量子点墨水体系,研究了具有CdSe@ZnS/ZnS核/壳结构的绿光量子点(QDs)成膜规律及其发光特性。设计的高沸点、低表面张力的十八烯和低沸点、高表面张力的环己基苯所组成的双溶剂墨水体系增强了马兰戈尼流,减弱了量子点在像素坑边缘的沉积,实现了在像素坑中制备表面平整的量子点薄膜。研制的分辨率为240 PPI的倒置结构顶发射绿光量子点阵列发光器件启亮电压2.7 V,最高亮度132 510 cd/m^(2),最大外量子效率14.0%,为采用喷墨打印工艺制备高性能量子点电致发光点阵器件提供了借鉴。     

喷墨打印量子点墨水调控

设计了环己基苯与十八烯的双溶剂量子点墨水体系,研究了具有CdSe@ZnS/ZnS核/壳结构的绿光量子点(QDs)成膜规律及其发光特性。设计的高沸点、低表面张力的十八烯和低沸点、高表面张力的环己基苯所组成的双溶剂墨水体系增强了马兰戈尼流,减弱了量子点在像素坑边缘的沉积,实现了在像素坑中制备表面平整的量子点薄膜。研制的分辨率为240 PPI的倒置结构顶发射绿光量子点阵列发光器件启亮电压2.7 V,最高亮度132 510 cd/m~2,最大外量子效率14.0%,为采用喷墨打印工艺制备高性能量子点电致发光点阵器件提供了借鉴。     

喷墨打印量子点薄膜的形貌控制

基于微流体理论,对采用聚合物量子点墨水打印薄膜的干燥过程进行了研究,并通过优化溶剂配比、聚合物含量及干燥温度克服"咖啡环"现象,改善薄膜形貌.研究结果表明:墨水中添加高沸点溶剂有助于延缓外向流动;调节聚合物含量可改变墨水的物理性质,有利于在诱发内向流动的同时阻碍外向流动,二者均可明显改善"咖啡环"形貌,另外聚合物的流平作用可提高薄膜的平整度;调节干燥温度可优化液滴与基板的接触线钉扎,从而进一步改善"咖啡环"形貌.最终,在量子点浓度为12mg/mL,墨水中氯苯/环己基苯体积比为8∶2,聚丙烯酸酯质量百分比为11wt%,干燥温度为25℃时制备了直径约为169μm,高度约为65nm的均匀量子点薄膜及量子点点阵,为QLED器件的制备及Micro-LED面板的全彩化提供了技术支持.     

高厚度n型β-Ga2O3薄膜的MOCVD制备

高厚度的Ga2 O3薄膜能够提高器件的击穿电压,这种高厚度Ga2 O3薄膜往往是通过HVPE法制备的.然而HVPE法存在着成本高、设备少等缺点.本文通过金属有机化学气相沉积(MOCVD)工艺,以SiH4为n型掺杂源,在Ga2 O3衬底上生长了高厚度的n型β-Ga2 O3薄膜,并且研究了SiH4流量对β-Ga2 O3性质...     

全湿法制备聚合物电致发光器件

利用全溶液方法制备了聚合物电致发光器件并研究了器件的性能。器件的所有膜层,包括发光层和上电极层均采用溶液湿法获得,完全摒弃了真空蒸镀工艺。利用二次溶剂掺杂获得的PEDOT∶PSS聚合物薄膜的电导率达到608.7 S/cm。在240 nm的厚度时,聚合物电极膜层的面电阻约为68 Ω/□; 当膜层厚度为1 μm时,薄膜的面电阻可低于16 Ω/□。采用溶液滴涂方法制备的高电导PEDOT∶PSS聚合物薄膜作为上电极替代通常所用的铝电极,所制备的聚合物发光器件的开启电压约为4 V。     

Effect of thickness on the stability of transparent conducting impurity‐doped ZnO thin films in a high humidity environment

The resistivity of transparent conducting Al‐ and Ga‐doped ZnO (AZO and GZO) thin films prepared with a thickness in the range from 20 to 200 nm on glass substrates at a temperature below 200 °C was found to increase with exposure time when tested in a high humidity environment (air at 90% relative humidity and 60 °C). The resistivity stability (resistivity increase) was considerably affected by the thin film thickness. In particular, thin films with a thickness below about 50 nm were very unstable. The increase in resistivity is interpreted as carrier transport being dominated by grain boundary scattering resulting from the trapping of free electrons due to oxygen adsorption on the grain boundary surface. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Dependence of the surface roughness of MAPLE-deposited films on the solvent parameters

Matrix-assisted pulsed laser evaporation (MAPLE) was used to deposit layers of poly(9,9-dioctylfluorene) (PFO) to study the relation between the solvent properties (laser light absorption, boiling temperature and solubility parameters) and the morphology of the deposited films. To this end, the polymer was diluted (0.5 wt%) in tetrahydrofuran—THF, toluene and toluene/hexane mixtures. The thickness of the films was equal to 70±20 nm. The morphology and uniformity of the films was investigated by Atomic Force Microscopy and by the photoluminescence emission properties of the polymer films, respectively. It is shown that, although the solubility parameters of the solvents are important in controlling the film roughness and morphology, the optical absorption properties and boiling temperature play a very important role, too. In fact, for matrices characterized by the same total solubility parameter, lower roughness values are obtained for films prepared using solvents with lower penetration depth of the laser radiation and higher boiling temperatures.     

额定压强下O_2/Ar比对ZnO:Al薄膜导电性能的影响

采用射频磁控溅射法在石英玻璃基片上制备出ZnO:Al薄膜,并对薄膜在不同O2/Ar比状态下的沉积厚度、结晶性能和导电性能之间的关系进行了探讨。测试结果表明:在0.2Pa的额定压强下,Ar流量越大,薄膜的厚度越大,XRD峰越强,薄膜的电阻率(ρ)值越低。在纯氩气状态下溅射时,制得的薄膜具有最大的厚度值,约为2.06μm,并具有最强的XRD峰,ρ同时也达到最小值,阻值为2.66×10-4Ω.cm。研究表明:结晶性能的提高对薄膜ρ的降低起到了关键作用,而厚度的增加也会使电阻率下降。     

直流磁控溅射厚度对Cu(Inx,Ga1-x)Se2背接触Mo薄膜性能的影响

采用直流磁控溅射工艺, 在一定条件下通过控制溅射时间, 在钠钙玻璃上制备了不同厚度的用于Cu(In_x, Ga_1-x)Se₂薄膜太阳电池背接触材料的Mo薄膜, 并利用X射线衍射 (XRD)、场发射扫描电子显微镜 (SEM)、四探针测试仪、台阶仪研究了厚度对溅射时间、薄膜微结构、电学性能及力学性能的交互影响. Mo薄膜的厚度与溅射时间呈线性递增关系; 随厚度的增大, Mo薄膜 (110) 和 (211) 面峰强均逐渐增大, 择优生长从(110)方向逐渐向 (211)方向转变, 方块电阻值只随 (110) 方向上的生长而急剧减小直到一特定值约2 Ω/⇑, 电导率随薄膜的 (110) 择优取向程度的降低而线性减小直到一特定值约0.96×10^-4 Ω·cm; Mo薄膜内部是一种多孔的长形簇状颗粒和颗粒间隙交织的结构, 并处于拉应力态, 其内部应变随薄膜厚度的增大而减小. 关键词： Mo薄膜 CIGS背接触 厚度 微结构     

Size-dependent electrical conduction of thin nickel films

The electrical resistivity of thin nickel films, thermally evaporated on freshly cleaved mica and smooth glass at 160 °C is studied. The measurements were taken in situ before and after annealing at 420 °C.The values of resistivity of thinner films are reduced by few orders of magnitude after annealing. A sharp reduction in the resistivity is noticed for films prepared on mica compared with those prepared on glass under the same conditions. The resistivity of films with thickness less than 200 Å on glass is irreversible with reduction, while on mica it is reversible. A tunnelling mechanism in the absence of Fuchs theory is adapted to explain the abrupt increase in resistivity of the island-films. The data recorded for thicker films was fitted to Fuchs theory withp=0.The authors would like to acknowledge Prof. Dr. K. R.Wassif for his kind cooperation and interest.     

透光导电ITO膜的制备及其光电特性的研究

采用溶胶-凝胶方法制备ITO膜,并从制备工艺上研究了各种因素对ITO膜光电特性的影响.最后制出的ITO膜厚度约为50nm,在可见光区平均透射比达97%,最高达99.55%,电阻率在2.0Ω·cm左右,最低达到0.31Ω·cm.     

Electrical conductivity of PbTe thin films

PbTe thin films were prepared by vacuum technique with different thicknesses ranging from 550 to 3000 Å. The electrical resistivity as a function of the film thickness and mobility was measured. The dependence of log (resistivity) and log (current) was studied as a function of the universal temperature. The activation energies were estimated before and after the break. The transition of conductivity from n-type to p-type is attributable to the increase in the number of migrating lead vacancies. An increase of the applied voltages on the thin films caused the shift of breaking temperature to higher temperatures. This shift is attributed to the creation of Pb vacancies which retard the break.     

Structural,optical and electrical properties of tin oxide thin films by electrostatic spray deposition

Tin oxide (SnO₂) thin films were deposited by electrostatic spray deposition (ESD). The structural, optical and electrical properties of the films for different solvents were studied. The morphology of the deposited thin films was investigated by scanning electron microscopy. The optical transmission spectra of the films showed 66–75% transmittance in the visible region of spectrum. The electrical resistivity of thin films deposited using the different solvents ranged 1.08 × 10^?3–1.34 × 10^?3 Ω-cm. Overall, EG and PG were good solvents for depositing SnO₂ thin films by the ESD technique with stable cone jet.     

The effect of Ag intermediate layer on crystalline, optical and electrical properties of nano-structured thin film

ITO thin films and ITO/Ag/ITO multilayered films were prepared on glass substrate by reactive thermal evaporation technique without intentionally heating the substrate. After deposition the films were annealed in air at three different temperatures (300°C, 420°C and 540°C). The thickness of each layer in the ITO/Ag/ITO films was kept constant at 50 nm/10 nm/40 nm. The opto-electrical and structural properties of ITO/Ag/ITO multilayered films were compared with conventional ITO single-layer films. Although both films had identical thickness, 100 nm, the ITO/Ag/ITO films showed a lower resistivity. XRD spectra showed that Ag intermediate layer had a small effect on crystalline properties of ITO/Ag/ITO films.