Intermixing behavior in InGaAs/InGaAsP multiple quantum wells with dielectric and InGaAs capping layers

The influence of the InGaAs capping layer on the intermixing behavior of dielectric-capped In_0.53Ga_0.47 As/In_0.81Ga_0.19As_0.37P_0.63 multiple quantum wells (MQWs) was investigated by measuring the change in the photoluminescence spectra after rapid thermal annealing. The magnitude of the energy shift in the transition energy from the first electronic sub-band to the first heavy- and light-hole sub-bands of the MQWs is large when SiO₂ and InGaAs hybrid capping layers are employed, but it is rather small when Si₃N₄ and InGaAs hybrid capping layers are employed. This result indicates that the InGaAs capping layer holds promise for applications involved in the fabrication of integrated photonic devices, but only when it is incorporated with the SiO₂ capping layer. The reason why the InGaAs capping layer behaves differently under the SiO₂ and Si₃N₄ capping layers is also discussed. Received: 4 December 1999 / Accepted: 26 September 2000 / Published online: 10 January 2001     

Enhancement of laser ablation yield by two color excitation

This work studied the implementation of multi-wavelength laser diodes on a single substrate through the position-dependent bandgap modification of the In_0.2Ga_0.8As/ GaAs multiple quantum wells (MQWs) by impurity-free vacancy disordering (IFVD). The position-dependent bandgap modification is achieved by performing the IFVD with SiO_x capping layers with different stoichiometries. The lasing wavelength difference of about 31 nm was obtained between the ridge-waveguide laser diodes fabricated with the MQWs that had undergone the same thermal treatments using the SiO_x film provided with SiH₄ flow rates of 20 and 300 sccm. The device performance was not appreciably degraded in the laser diodes fabricated with the MQWs that had undergone the IFVD process . PACS 68.65.Fg; 78.55.-m; 42.55.Px     

Improvement of photoluminescence and electroluminescence characteristics of MBE-grown In0.53Ga0.47As/In0.53(Ga0.6Al0.4)0.47As quantum well laser structure with InGaAlAs digital alloys by thermal annealing

We investigated the effect of rapid thermal annealing (RTA) on the photoluminescence (PL) and electroluminescence of the In_0.53Ga_0.47As/In_0.53(Ga_0.6Al_0.4)_0.47As multiple quantum well (MQW) laser structure with InGaAlAs barrier layers provided by the digital-alloy technique. The SiO₂- (Si₃N₄-) capped samples followed by the RTA exhibited a significant improvement of PL intensity without any appreciable shifts in PL peak energy for settings of up to 750 °C (800 °C) for 45 s. This improvement is attributed to the annealing of nonradiative defects in InAlAs layers of digital-alloy InGaAlAs and partially those near the heterointerfaces of the digital-alloy layers. The InGaAs/InGaAlAs MQW laser diodes fabricated on the samples annealed at 850 °C show a hugely improved lasing performance. Received: 2 September 2002 / Accepted: 3 September 2002 / Published online: 17 December 2002 RID="*" ID="*"Corresponding author. Fax: +82-62/970-2204, E-mail: ytlee@kjist.ac.kr     

Influence of the cap layer thickness on photoluminescence properties in strained InGaAs/GaAs single quantum wells

The influence of the GaAs cap layer thickness on the luminescence properties in strained In_0.20Ga_0.80As/GaAs single quantum well (SQW) structures has been investigated using temperature-dependent photoluminescence (PL) spectroscopy. The luminescence peak is shifted to lower energy as the GaAs cap layer thickness decreases, which demonstrates the effect of the GaAs cap layer thickness on the strain of InGaAs/GaAs single quantum wells (SQW). We find the PL quenching mechanism is the thermal activation of electron hole pairs from the wells into the GaAs cap layer for the samples with thicker GaAs cap layer, while in sample with thinner GaAs cap layer exciton trapping on misfit dislocations is dominated.     

The emission wavelength tuning of InAs/InP quantum dots with thin GaAs, InGaAs, InP capping layers by MOCVD

InAs quantum dots (QDs) were grown on InP substrates by metalorganic chemical vapor deposition. The width and height of the dots were 50 and 5.8 nm, respectively on the average and an areal density of 3.0×10¹⁰ cm⁻² was observed by atomic force microscopy before the capping process. The influences of GaAs, In_0.53Ga_0.47As, and InP capping layers (5–10 ML thickness) on the InAs/InP QDs were studied. Insertion of a thin GaAs capping layer on the QDs led to a blue shift of up to 146 meV of the photoluminescence (PL) peak and an InGaAs capping layer on the QDs led to a red shift of 64 meV relative to the case when a conventional InP capping layer was used. We were able to tune the emission wavelength of the InAs QDs from 1.43 to 1.89 μm by using the GaAs and InGaAs capping layers. In addition, the full-width at half-maximum of the PL peak decreased from 79 to 26 meV by inserting a 7.5 ML GaAs layer. It is believed that this technique is useful in tailoring the optical properties of the InAs QDs at mid-infrared regime.     

Efficiency improvement of quantum well solar cell with the AuGeNi metallization and Si3N4 ARC design

This study demonstrates the power conversion efficiency enhancement on In_0.19Ga_0.81As/GaAs quantum well solar cells (QWSC). The solar cell structure was grown on n-type (100)-oriented GaAs substrate by using solid-source molecular beam epitaxy technique and divided into square pieces. In order to understand whether the eight quantum wells were grown or not, scanning electron microscopy (SEM), and secondary ion mass spectrometry characterizations were done at room temperature. After that, the Si₃N₄ antireflection layers were coated onto both two square pieces of In_0.19Ga_0.81As/GaAs QWSC structure and p-GaAs substrate at different temperatures by the radio frequency magnetron sputtering system. The optical properties of the Si₃N₄ coated and uncoated p-GaAs samples have been evaluated by means of ultraviolet-visible spectrometry measurements at room temperature. According to ultraviolet-visible spectrometry results, the best Si₃N₄ antireflection coated one was obtained at 100 °C substrate temperature. Thus, the In_0.19Ga_0.81As/GaAs QWSC structure with and without Si₃N₄ layer, which was coated at 100 °C substrate temperature, was selected for other measurements and processes. Moreover, the In_0.19Ga_0.81As/GaAs QWSC samples with and without Si₃N₄ antireflection coating were separately fabricated with different metallization materials for obtaining the solar cell electrical output parameters. AuGe and AuGeNi metallization materials were used for the fabrication processes. After fabrication, the electrical output parameters were extracted from the current-voltage measurements at room temperature both in dark and under AM1.5 – 1 Sun illumination. The proposed design which includes the AuGeNi metallization and Si₃N₄ antireflection layer enhanced the power conversion efficiency by 44.40%.     

Gas sensor based on nanosize In<Subscript>2</Subscript>O<Subscript>3</Subscript>:Ga<Subscript>2</Subscript>O<Subscript>3</Subscript> film

Nanosize films of In₂O₃:Ga₂O₃ (96:4 weight %) have been deposited on a glassceramic substrate by the method of rf magnetron sputtering. The surfaces of fabricated films were studied with use of a scanning electron microscope; sizes of grains were determined and the thicknesses of films were measured. In order to prepare a gas-sensitive structure, a thin catalytic palladium layer and ohmic comb contacts were deposited on the In₂O₃:Ga₂O₃ film surface by the method of ion-plasma sputtering. The sensitivity of sensors based on the glassceramic/In₂O₃:Ga₂O₃ (96:4 weight %)/Pd structure to different concentrations of propane and butane gas mixture, as well as to methane was investigated at temperatures of working substance from 250 to 300°C.     

低温InGaAs/InAlAs多量子阱的分子束外延生长与表征

采用气源分子束外延(GSMBE)生长了低温InGaAs材料,研究了生长温度及As压对InGaAs材料性质的影响,得到优化的生长条件为:生长温度为300 ℃、As压为77.3 kPa。通过Be掺杂,并采用In0.52Al0.48As/In0.53Ga0.47As多量子阱结构,将材料的方块电阻提高到1.632106 /Sq,载流子数密度降低至1.0581014 cm-3。X射线衍射结果表明:InGaAs多量子阱材料具有较高的晶体质量。这种Be掺杂InGaAs多量子阱材料缺陷密度大且电阻率高,是制作太赫兹光电导天线较理想的基质材料。收稿日期:; 修订日期:     

InAs/GaAs表面量子点的压电调制反射光谱研究

运用压电调制反射光谱(PzR)方法测量了在以GaAs(311)B为衬底的In_0.35Ga_0.65As模板上生长的InAs表面量子点结构的反射谱.在77K温度下，观察到了来自样品各个组成结构(包括表面量子点本身、被覆盖层覆盖的量子点、In_0.35Ga_0.65As模板以及GaAs衬底等)的调制信号.来自表面量子点本身的调制信号是多个清晰的调制峰.用一阶和三阶微分洛伦兹线形对PzR谱中对应结构的实验数据进行了拟合，精确确定了与样品的各个组成结构相对应的调制峰的能量位置.对不同样品PzR谱的差异进行了定性的说明. 关键词： 压电调制光谱 InAs/GaAs 表面量子点 洛伦兹线形拟合     

Emission and elastic strain in InAs dot-in-a well InGaAs/GaAs structures

The paper presents the photoluminescence (PL) study of InAs quantum dots (QDs) embedded in the asymmetric GaAs/In_xGa_1?xAs/In_0.15Ga_0.85As/GaAs quantum wells (QWs) with the different compositions of capping In_xGa_1?xAs layers. The composition of the buffer In_0.15Ga_0.85As layer was the same in all studied QD structures, but the In content (parameter x) in the capping In_xGa_1?xAs layers varied within the range 0.10–0.25. The In concentration (x) increase in the In_xGa_1?xAs capping layers is accompanied by the variation non-monotonously of InAs QD emission: PL intensity and peak positions. To understand the reasons of PL variation, the PL temperature dependences and X ray diffraction (XRD) have been investigated. It was revealed that the level of elastic deformation (elastic strain) and the Ga/In interdiffusion at the In_xGa_1?xAs/InAs QD interface are characterized by the non-monotonous dependences versus parameter x. The physical reasons for the non-monotonous variation of the elastic strains and PL parameters in studied QD structures have been discussed.     

Exciton line broadening in strained InGaAs/GaAs single quantum wells

We report the first observation of well-resolved exciton peaks in the room-temperature absorption spectrum of the strained In_0.20Ga_0.80As/GaAs Single Quantum-Well (SQW) structure. The best fit of the exciton resonances gives the conduction-band offset ratioQ _c=0.70±0.05. The strength of the exciton-phonon coupling is determined from linewidth analysis and is found to be much larger than that of strained InGaAs/GaAs MQW structures.     

不同组分InxGa1-xAs(0≤x≤0.3)覆盖层对自组织InAs量子点的影响

研究了不同In组分的In_xGa_1-xAs(0≤x≤0.3)覆盖层对自组织InAs量子点的结构及发光特性的影响.透射电子显微镜和原子力显微镜表明,InAs量子点在InGaAs做盖层时所受应力较GaAs盖层时有所减小,并且x＝0.3时,InGaAs在InAs量子点上继续成岛.随x值的增大,量子点的光荧光峰红移,但随温度的变化发光峰峰位变化不明显.理论分析表明InAs量子点所受应力及其均匀性的变化分别是导致上述现象的主要原因. 关键词： 量子点 盖层 应力 红移     

Polarization effects in quantum-well In<Subscript>28</Subscript>Ga<Subscript>72</Subscript>As/GaAs heterolasers

The effect of externally introduced variable strains on the polarization properties of quantum-well In₂₈Ga₇₂As/GaAs laser radiation at room temperature is studied experimentally and theoretically. An analysis of the polarization effects at various values of the excess of the working current over the threshold is performed. Data on the energy for the splitting of the levels of light and heavy holes in the quantum well of the structure under consideration are obtained. It is experimentally proven that the effectiveness of the action of a variable strain on the polarization twist substantially increases with increasing quantum well width.     

Quantum point contacts on InGaAs/InP heterostructures

For the first time we have observed quantized conductance in a split gate quantum point contact prepared in a strained In_0.77Ga_0.23As/InP two-dimensional electron gas (2DEG). Although quantization effects in gated two-dimensional semiconductor structures are theoretically well known and proven in various experiments on AlGaAs/GaAs and also on In_0.04Ga_0.96As/GaAs, no quantum point contact has been presented in the InGaAs/InP material with an indium fraction as high as 77% so far. The major problem is the comparatively low Schottky barrier of the InGaAs (φ_B≈ 0.2 eV) making leakage-free gate structures difficult to obtain. Nevertheless this heterostructure—especially with the highest possible indium content—has remarkable properties concerning quantum interference devices and semiconductor/superconductor hybrid devices because of its large phase coherence length and the small depletion zone, respectively. In order to produce leakage-free split gate point contacts the samples were covered with an insulating SiO₂layer prior to metal deposition. The gate geometry was defined by electron-beam lithography. In this paper we present first measurements of a point contact on an In_0.77Ga_0.23As/InP 2DEG clearly showing quantized conductance.     

Absorption spectra of some radiation-doped A<Subscript>3</Subscript>B<Subscript>5</Subscript> compounds

Temperature dependences of the absorption coefficient in A₃B₅ crystals before and after irradiation by electrons with an energy of 6 MeV and a dose of Ф = 2 × 10¹⁷ electron/cm² are studied. A low-lying E_v + 0.4 eV center of a nonimpurity origin is found in both undoped GaAs crystals and those doped with various impurities (Te, Zn, Sn, Ga_1–xIn_xAs, InP, and InP〈Fe〉).     

Spontaneous one-dimensional lateral alignment of multistacked InGaAs quantum dots on GaAs (n 1 1)B substrates

In_0.45Ga_0.55As/GaAs multistacking quantum dot (QD) structures were fabricated on a GaAs (n 1 1)B (n=2–4) substrate by metalorganic vapor-phase epitaxy. QDs spontaneously aligned in the [0 1 1] direction were observed on stacked QDs, whereas QDs were randomly distributed in the initial In_0.45Ga_0.55As layer growth. The formation mechanism of this self-alignment was studied by changing the number of In_0.45Ga_0.55As/GaAs multilayers and crystallographic arrangement. Photoluminescence spectra showing clear polarization dependence indicate carrier coupling in the QD arrays. This growth technique results in spontaneously aligned InGaAs QDs without any preprocessing technique prior to growth.     

N+BF<Subscript>2</Subscript> and N+C+BF<Subscript>2</Subscript> high-dose co-implantation in silicon

Nitrogen and boron BF₂, and nitrogen, carbon, and boron BF₂ high-dose (6×10¹⁶–3×10¹⁷ cm^-2) co-implantation were performed at energies of about 21–77 keV. Subsequent high-temperature annealing processes (600, 850, and 1200 °C) lead to the formation of three and two surface layers respectively. The outer layer mainly consists of polycrystalline silicon and some amorphous material and Si₃N₄ inclusions. The inner layer is highly defective crystalline silicon, with some inclusions of Si₃N₄ too. In the N+B-implanted sample the intermediate layer is amorphous. Co-implantation of boron with nitrogen and with nitrogen and carbon prevents the excessive diffusivity of B and leads to a lattice-parameter reduction of 0.7–1.0%. Received: 10 January 2002 / Accepted: 30 May 2002 / Published online: 4 November 2002 RID="*" ID="*"Corresponding author. Fax: +34-91/3974895; E-mail: Lucia.Barbadillo@uam.es     

Theoretical study on electronic and optical properties of Zn-doped In<Subscript>0.25</Subscript>Ga<Subscript>0.75</Subscript>As photocathodes

First-principles calculations for intrinsic and Zn-doped In_0.25Ga_0.75As are performed based on density functional theory to study the influence of Zn doping on electronic and optical properties. The band structure, density of state, Mulliken population, dielectric function, complex refractive index, absorption coefficient and reflectivity of In_0.25Ga_0.75As are calculated. Results show that the Fermi levels of two Zn-doped models enter into the valence bands and Zn atom is more easily to replace In atom than Ga atom. The lattice constant of In_0.2344Ga_0.75Zn_0.0156As reduced after optimization, while that of In_0.25Ga_0.7344Zn_0.0156As increased to the contrary. The Mulliken bond population shows that the doping Zn atoms can enlarge the strength of In–As and Ga–As polar covalent bonds. Furthermore, the calculated absorption coefficient and reflectivity are used to characterize the performance of photoemission, indicates that the photoresponses of Zn-doped models are better than that of the intrinsic.     

Growth of InGaAs-capped InAs quantum dots characterized by Atomic Force Microscope and Scanning Electron Microscope

Atomic force microscopy (AFM) is typically used to measure the quantum dot shape and density formed by lattice mismatched epitaxial growth such as InAs on GaAs. However, AFM images are distorted when two dots are situated in juxtaposition with a distance less than the AFM tip width. Scanning electron Microscope (SEM) is much better in distinguishing the dot density but not the dot height. Through these measurements of the growth of In_xGa_1-xAs cap layer on InAs quantum dots, it was observed that the InGaAs layer neither covered the InAs quantum dots and wetting layer uniformly nor 100% phase separates into InAs and GaAs grown on InAs quantum dots and wetting layer, respectively.     

Influence of different precursor surface layers on Cu(In<Subscript>1-x</Subscript>Ga<Subscript>x</Subscript>)Se<Subscript>2</Subscript> thin film solar cells

The properties of Cu(In_1-xGa_x)Se₂ (CIGS) thin films obtained by selenization of the precursors with different surface layers have been studied, and photovoltaic devices based on the absorbers were measured and analyzed. The devices constructed by the absorbers obtained by selenization of the precursors with CuGa-rich surface layers are improved, compared with those with In-rich surface layers. Through XRD, SEM, SIMS, illuminated J–V, QE and Raman spectra measurements, it was found that the increased Ga contents within the surface region of films and the graded Ga distribution can be realized in the selenized thin films fabricated by the precursors with the CuGa-rich surface layer. Consequently, the performances of the photovoltaic devices based on these thin films are further improved. PACS 61.72.Ss; 87.64.Jt; 68.60.Bs; 81.15.Cd; 84.60.Jt