半导体玻璃微通道板的研制

介绍了半导体玻璃微通道板的主要性能，并与传统铅硅酸盐玻璃的相关性能进行了比较。阐述了半导体玻璃的研制工艺，研究了利用半导体玻璃材料制备微通道板的工艺途径，开发了靠玻璃本身体电导性质而无需氢还原工艺的微通道板，即半导体玻璃微通道板。研制出孔径为20μm、外径为12mm的半导体玻璃微通道板，实验利用紫外光电法测试了微通道板的增益、闪烁噪声和成像性能。结果表明新型微通道板具有明显的电子增益和低的闪烁噪声，并且通道表面稳定；利用磷硅酸盐玻璃材料可以实现体导电微通道板的制备。     

电子清刷对微通道板增益及输出信噪比的影响

电子清刷是微通道板生产流程中常用的除气方法,会引起微通道板其他性能参量的变化.为研究电子清刷对微通道板输出信噪比及增益的影响,根据信噪比及增益的定义讨论了微通道板性能参量的测试方法,研制了微通道板参量测试系统.应用微通道板参量测试系统对微通道板进行了电子清刷处理,测试清刷过程中不同阶段微通道板的信噪比及增益变化.实验表明:微通道板增益随清刷时间增加而降低,同时增益稳定性提高;电子清刷过程中微通道板的输出信号及噪音的变化率与微通道板增益的变化率基本相同,输出信噪比基本不变.增益变化是影响清刷过程中信号及噪音变化的主要因素,并且电子清刷对微通道板输出信噪比影响较小.     

含负折射率介质的一维光子晶体构成的相干热辐射源的辐射特性及控制

电子清刷是微通道板生产流程中常用的除气方法,会引起微通道板其他性能参量的变化.为研究电子清刷对微通道板输出信噪比及增益的影响,根据信噪比及增益的定义讨论了微通道板性能参量的测试方法,研制了微通道板参量测试系统.应用微通道板参量测试系统对微通道板进行了电子清刷处理,测试清刷过程中不同阶段微通道板的信噪比及增益变化.实验表明:微通道板增益随清刷时间增加而降低,同时增益稳定性提高;电子清刷过程中微通道板的输出信号及噪音的变化率与微通道板增益的变化率基本相同,输出信噪比基本不变.增益变化是影响清刷过程中信号及噪音变化的主要因素,并且电子清刷对微通道板输出信噪比影响较小.     

一种测试微通道板增益均匀性的新方法

本文介绍一种测试微通道板增益均匀性的新方法,从测试原理到测试方法均给予较为详细的说明,并与目前国内采用的测量方法进行了比较。一、引言微通道板的增益均匀性,是指通道板在线性工作时增益空间分布的均匀情况。其均匀性主要与微通道板的工艺结构有关,也与材料、工作状态及清洗所造成的通道表面状态有关。它包含的主要内容为:(1)复丝与复丝之间的增益偏差;(2)复丝边界相     

硅微通道板电子倍增器的研制

阐述了新一代硅微通道板的主要性能。采用定向离子深度刻蚀技术在2和4硅片上刻蚀了四组不同直径的硅微通道板微孔阵列,分别采用PECVD技术和液体化学沉积两种方法制作了硅微通道板的连续打拿极,从而探索了研制新一代硅微通道板的途径。利用紫外光电法测试了硅微通道板的增益和增益均匀性。实验结果表明,如果进一步改进制备工艺,硅微通道板可以实现较传统微通道板更高的增益和更好的增益均匀性。     

微通道板防离子反馈膜新工艺

微通道板防离子反馈膜在三代象管中起到延长寿命的作用.本文叙述了微通道板防离子反馈膜的传统工艺和传统工艺对微通道板电性能的影响,提出了一种制备微通道板防离子反馈膜的新工艺.结果表明,新工艺没有给微通道板通道内表面带来碳污染,不影响微通道板电性能.     

微通道板及其主要特征性能

简要描述了微通道板的工作原理，介绍了微通道板的主要特征性能及其工作参数，包括厚度、开口面积比、增益及增益均匀性、动态范围、噪声、工作寿命和空间分辨率等，阐述了这些特征性能和参数彼此间的相互关联和相互制约的特殊关系。在此基础上，对影响和制约微通道板名个特征性能和参数的特殊关系及因素作了详细分析。这项工作对进一步认识和协调处理微通道板的各种特征性能和参数有着非常积极的作用。     

酸蚀对微通道板电性能的影响

采用扫描电镜（SEM）、卢瑟福背散射谱（RBS）、原子力显微镜（AFM）、能量色散谱仪（EDS）、照度计、微通道板测试台等分析表征手段,从微通道板皮料玻璃表面的成分、形貌和结构上,研究了酸蚀时间对微通道板电子增益、体电阻、噪声电流和电子图像等电性能的影响。研究结果表明：酸蚀时间显著影响微通道板的电性能,经酸蚀120min后微通道板的电子增益和图像亮度达到最高值;随着酸蚀时间的增加,噪声电流相应增加,而体电阻降至一定值后保持相对的稳定。     

微通道板表面发雾的AES分析

应用俄歇电子能谱对微通道板表面发雾区域进行分析。分析结果表明,发雾区碳含量比正常区高三倍。由此可推测出,发雾是由碳污染引起的,而这种碳污染很可能是残留于微通道板上的某些有机物在烧氢时碳化所致。     

微通道板输入信号利用率提高研究

分析了微通道板输入信号损失的原因,提出了在微通道板输入端镀制绝缘层,从而提高微通道板输入信号利用率的方法,并进行了试验.试验结果表明:在微通道板输入端镀制一层15nm的绝缘层,可以提高微通道板输入信号的利用率,从而提高微通道板的增益.绝缘层的二次电子发射系数越高,微通道板输入信号的利用率越高,增益提高的比例越大.对SiO2膜层而言,可以提高12%左右;对Al2O3膜层而言,可以提高35%左右.在微通道板增益提高的同时,像增强器的分辨力和调制传递函数会降低,并且绝缘层的二次电子发射系数越高,分辨力和调制传递函数降低的比例越大.但微通道板分辨力和调制传递函数降低的比例远低于增益提高的比例.本文提出的提高微通道板输入信号利用率的方法具有一定的实用性,可以推广使用.     

Influence of the initial state of adatoms on the ratio of atoms and ions in a sputtered particle flow

The role of the initial state of adatoms in the formation of the charge composition of a sputtered particle flow is investigated. Calculations are carried out for alkali metal atoms adsorbed on a tungsten surface and subjected to mutual dipole-dipole repulsion. It is shown that the escape probability (yield) of positive ions diminishes as the surface density of adatoms increases, an effect that is enhanced when the initial state ofthe adatoms is taken into account. Zh. Tekh. Fiz. 69, 116–120 (May 1999)     

三代管MCP离子阻挡膜研究

三代管中GaAs光电阴极的表面Cs-O层经不住正离子的轰击,但在MCP的通道内,由于二次电子倍增,在MCP通道的输出端,电子密度较大,所以MCP通道内的残余气体分子就会被电离,正离子在电场的作用下向阴极方向运动,最终轰击阴极的表面Cs-O层,使阴极的灵敏度衰退.所以在MCP的输入端制作一层Al₂O₃离子阻挡膜对延长阴极的寿命是至关重要的作用.本文介绍了MCP离子阻挡膜的离子阻挡和电子透射原理,离子阻挡膜厚度的确定以及离子阻挡膜的制作工艺.     

Graphene traps for cesium atoms

A significant increase in the surface concentration of cesium atoms intercalated under graphene islands on rhodium has been revealed when annealing the adsorbed layer in a ultrahigh vacuum. Heating leads to a decrease in the area of graphene islands due to the solution of carbon atoms in the metal bulk. At the same time, the edge carbon atoms in the islands, which are coupled with the surface by chemisorptive forces, prevent the leakage of the alkali metal from under the islands. This leads to the significant compression of cesium and to an increase in its surface concentration under the islands by a factor of almost 10. The desorption of cesium is observed only after the complete thermal destruction of graphene islands.     

微通道板电子透射膜工艺的AES研究

用冷基底溅射方法和静电贴膜方法分别在微通道板表面制备了电子透射膜,采用俄歇电子能谱(AES)研究了两种工艺制备的微通道板电子透射膜的薄膜成分,微通道板电子透射膜工艺失败微通道板通道表面的成分和通道内壁的成分随深度的变化. 结果表明,冷基底溅射方法制膜工艺的失败对MCP造成了严重的碳污染,污染的MCP不可回收;静电贴膜方法制膜工艺的失败对MCP通道表面没有明显影响,MCP可回收利用.     

On the mechanism of carbon nanotube formation in electrochemical processes

Quantum-chemical methods are used to analyze the mechanism of carbon nanotube formation in the electrochemical bath, where tiny fragments of graphene planes are in the environment of atoms and ions of alkali metals and halogens. In the optimal configuration, alkali metal atoms move toward the edge of a graphene fragment, whereas halogen atoms remain at the sites of their initial attachment. When the graphene fragments “burdened” by alkali metal and halogen atoms interact with each other, the overall graphene configuration twists in a natural way into a nanotube-like open-end structure.     

CO adsorption on alkali-metal covered Ni(100)

The effect of preadsorbed alkali metal atoms Na, K and Cs on CO adsorption on Ni(100) has been studied using Auger spectroscopy and thermal desorption. It was found that the presence of alkali metals causes an appearance of several more tightly bound states in the CO thermal desorption spectra. The observed difference in carbon and oxygen Auger peak line shape on a bare and alkali modified Ni(100) is indicative that the presence of alkali adatoms induces CO decomposition on the Ni(100) surface. The fraction of dissociated CO increases with the amount of alkali adatoms present. At the same overlayer coverage the dissociation probability increases in the sequence Na, K, Cs. A comparison of the strength of the promoting effect on CO dissociation with the changes in the surface electron density in the presence of alkali adatoms has shown that at low overlayer coverages the electronic factor plays a major role in explaining the action of the surface modificators.     

Light Absorption of GaN Nanowire Array Cathode with Alkali Metal Nanoparticle Modified on the Surface

Since the adsorption of alkali metals is necessary for the negative electron affinity (NEA) of the photocathode, light absorption models of GaN nanowire (NW) arrays with alkali metal (Li, Na, K, and Cs) nanoparticles (NPs) modified on the NW surface based on the finite difference time domain (FDTD) method are constructed. The absorption spectra of hemispherical, spherical alkali metal NPs adsorbed on the outer surface of the NW, and spherical alkali metal embedded on the inner surface and center of the NW are studied. When the ratio of NW diameter to period (D/P) is greater than 0.5, the adsorption of alkali metal NPs cannot improve the absorption of GaN NW arrays. Alkali metal decoration can cause the absorption gain of NW arrays and optical loss of NPs, so the diameter and spacing of alkali metal NPs need to be balanced. When Li NPs are embedded in NW, plasmons can enhance the generation of electron-hole pairs, making GaN NWA obtain higher optical absorption and quantum efficiency. Therefore, the method of Li and Cs NPs embedded in GaN NW can provide a reference for the process NEA design, which will contribute to the development of the ultraviolet photocathode with high absorption characteristics.     

Graphene growth during benzene pyrolysis on an iridium crystal

The dependence of graphene formation mechanisms during pyrolysis of carbon-containing molecules on iridium on the crystal structure and surface curvature has been studied using field desorption and field electron microscopy. The structure and shape of grown carbon formations, diffusion, desorption, and intercalation of alkali metal atoms have been investigated.     

Secondary ion emission processes of sputtered alkali ions from alkali/Si(100) and Si(111)

The secondary alkali ion yield vs. the work function change (Δφ) of Na, K and Cs/Si(100) and Si(111) was measured to discuss the details of secondary ion emission processes. In the case of alkali/metal systems, the secondary ion emission is explained by the electron tunneling model. In this model, the ionization of the ejected atom occurs as a result of electron resonant tunneling through the potential barrier separating an atom and a metal, and the secondary ion yield depends on exponentially the work function change of metal surface. For alkali/Si(100) systems, the secondary ion emission processes are explained in terms of the electron tunneling model since the secondary alkali ion yield vs. the work function change (Δφ) follows the exponential manner. However, it is not easy to apply the simple electron tunneling model to our experimental results for alkali/Si(111) systems. There is the essential difference in surface structures between Si(100) and Si(111). Therefore, it is suggested that the local electronic environment around the adsorbates might be taken into consideration for alkali/Si(111) systems.