三个新的稳定硅表面及其家族领地

为了对稳定硅表面进行广泛的搜索,利用低能电子衍射(LEED)研究了13个散布在极射投影三角内各处的高指数硅表面:Si(10　4　13),(6　2　7),(8　4　11),(4　1　10),(2　1　5),(5　1　10),(5　2　10),(5　1　5),(5　1　6),(4　0　5),(12　4　19),(12　3　14)和(12　3　16).结果发现这些清洁的硅表面都不稳定,因为在被充分退火后,它们会彻底小面化成为分属一个或几个稳定表面的小面.提出了一套行之有效的方法,使小面化表面的复杂LEED图得以可靠地标定,进而确定了全部出现的稳定表面的指数.除已知的Si(15　3　23)外,还发现三个新的稳定表面,即Si(20　4　23),(3　1　4)和(3　1　7).同时也粗略地确定了它们的家族领地为了对稳定硅表面进行广泛的搜索,利用低能电子衍射(LEED)研究了13个散布在极射投影三角内各处的高指数硅表面:Si(10　4　13),(6　2　7),(8　4　11),(4　1　10),(2　1　5),(5　1　10),(5　2　10),(5　1　5),(5　1　6),(4　0　5),(12　4　19),(12　3　14)和(12　3　16).结果发现这些清洁的硅表面都不稳定,因为在被充分退火后,它们会彻底小面化成为分属一个或几个稳定表面的小面.提出了一套行之有效的方法,使小面化表面的复杂LEED图得以可靠地标定,进而确定了全部出现的稳定表面的指数.除已知的Si(15　3　23)外,还发现三个新的稳定表面,即Si(20　4　23),(3　1　4)和(3　1　7).同时也粗略地确定了它们的家族领地 关键词： 高指数表面 硅 铟 小面化     

ATLEED研究6H-SiC(0001)(3~(0.5)×3~(0.5))R30°重构表面

低能电子衍射 (LEED)对 6H SiC(0 0 0 1) (3× 3)R30°表面的研究结果表明 ,该表面有 1/3单层的Si原子吸附在T4 空位上与第一个SiC复合层中的三个Si原子键接 ,它们之间的垂直距离为 0 171nm .通过对该表面 10个非等价垂直入射衍射束的自动张量低能电子衍射 (ATLEED)计算 ,得到“最佳结构”由于表面SiC复合层堆积顺序不同而产生的三种表面终止状态 (surfacetermination)的混合比例为S1∶S2∶S3 =15∶15∶70 ,理论计算与实验I V曲线比较得到可靠性因子RVHT=0 .16 5 ,RP=0 .142 ,表明表面生长符合能量最小化的台阶生长机制     

稳定In/Si表面的LEED研究

利用LEED图形拟合的方法对大量不同取向In/Si表面的稳定性和小面化进行了研究，新发现了In覆盖度在1/2单层原子以下的三个稳定表面：Si(214)-In，Si(317)-In和Si(436)-In，以及In覆盖度在1单层原子左右的两个稳定表面Si(101)-In和Si(313)-In.此外还确定了In覆盖度在1单层原子左右的6个稳定In/Si表面的家族领地以及In覆盖度在1/2单层原子以下的4个稳定In/Si表面的家族领地.特别值得注意的是 Si(103)-In的家族领地相当大，甚至比最稳定的Si(1 关键词： 硅表面 铟 稳定表面 家族领地     

ATLEED研究6H-SiC(0001)-(3×3)R30°重构表面

低能电子衍射(LEED)对6H-SiC(0001)-(3×3)R30°表面的研究结果表明,该表面有1/3单层的Si原子吸附在T4空位上与第一个SiC复合层中的三个Si原子键接,它们之间的垂直距离为0.171nm.通过对该表面10个非等价垂直入射衍射束的自动张量低能电子衍射(ATLEED)计算,得到“最佳结构”由于表面SiC复合层堆积顺序不同而产生的三种表面终止状态(surface termination)的混合比例为S1∶S2∶S3=15∶15∶70,理论计算与实验I-V曲线比较得到可靠性因子RVHT=0.165,RP=0.142,表明表面生长符合能量最小化的台阶生长机制.     

O在预覆盖K的Ag(110)表面的共吸附及其性质

本文用X射线光电子能谱(XPS),紫外光电子能谱(UPS),电子能量损失谱(EELS)和低能电子衍射(LEED)研究了O与预覆盖K的Ag(110)表面相互作用及其性质。在低覆盖度K下,发现有两种O的吸附态,经鉴别为溶解到表面下的O^2-和表面上吸附的O^x-增加K的覆盖度,出现分子状态的吸附物O₂^δ-,它与表面下存在的K相联系。XPS和UPS均清楚地显示出对应于三种不同吸附态的光电子发射峰。Ag(110)表面预覆盖K后的粘滞系数大大增加。K和O的共吸附引起它们彼此向Ag(110)表面下的溶解。LEED实验结果表明,清洁Ag(110)表面覆盖单层K原子后衍射图形从(1×1)变到(1×2),再吸附O后表面吸附层结构变为(2×1)。另外,结合UPS和EELS测量初步考察了O/K/Ag(110)共吸附系统的电子结构。本文还提出了一个共吸附模型来解释这些现象。 关键词：     

低能电子衍射

一、引 言 1926—1927年,Davisson 和 Germer[1]通过电子束在Ni,Pt单晶表面的衍射现象证明了电子的波动性,这也就是低能电子衍射(LEED)的初期工作.六十年代初期,超真真空技术实用化了.Germer在长期脱离LEED工作后又返回该领域,发展了后加速显示型LEED,加上Bell实验室的一系列研究工作,使LEED研究进入新的发展时期.七十年代以来,由于LEED与俄歇电子能谱分析(AES)结合和多散射理论的进展,LEED已成为主要的表面结构研究工具. 近年来,LEED沿着两条平行的路线发展.一些人继续研究清洁和吸附表面的有序结构,它们随温度和覆盖度的变…     

科苑快讯

20项 2 0世纪最伟大的工程技术成就美国《今日物理》杂志载文报道 ,美国国家工程院评出2 0项 2 0世纪最伟大的工程技术成就 ,这些工程成就有不少植根于物理学。它们是 :1.电气化 2 .汽车3.飞机 4 .给排水系统 5 .电子学 6.无线电和电视 7.农业机械化 8.计算机 9.电话 10 .空调和冰箱 11.洲际高速公路 12 .宇宙飞船 13.互联网 14 .显像技术15 .家用设备 16.健康技术 17.石油和石化技术 18.纤维光学 19.核技术 2 0 .高性能材料(武汉大学物理科学与技术学院　李道学　供稿 )美《科学》评出 2 0 0 1年十大科学成就据《科技日报》报道 ,美国《科…     

甘氨酸在Cu(001)表面的吸附结构

结合低能电子衍射(LEED)及其消失斑点规律和扫描隧道显微镜(STM)手段确定了室温下甘氨酸在Cu(001)表面能形成c(2×4)和两种(2×4)吸附结构((2×4)₁和(2×4)₂),并推断出在两种(2×4)结构单胞中两甘氨酸分子的羧基相对于衬底的吸附取向一致,而它们的氨基则不同.实验中还观察到c(2×4)与(2×4)₂结构能相互转变成窄条相互穿插共存,这说明几种吸附结构能量相近. 关键词：     

光电子衍射

六十年代末,由于超高真空条件的获得,使低能电子衍射仪(LEED)逐渐发展成为实用的表面结构分析手段[1].在理论上,几种LEED的动力学理论也相继出现[2-4].利用LEED实验与理论计算的比较,可以决定长程有序表面结构,但对无序表面结构测定,LEED则无能为力. 七十年代中期开始,人们着手寻找一种新的表面结构分析方法,这种方法以LEED为基础,又弥补了它的不足.LEED的入射电子源是非相干源,如果用单色光激发表面层内原子,使之发射光电子,则这种光电子是相干电子源.光电子在固体中的衍射过程与LEED一样,分析光电子的衍射谱而获得表面原子结…     

第一性原理研究O2和H2O在ZnO (101 ̅0)表面上的吸附行为

运用基于密度泛函理论(DFT)的第一性原理方法研究了O2和H2O单分子在ZnO (101 ̅0)表面上的吸附行为。吸附位点主要考虑了表面的Zn顶位和Zn桥位，同时也考虑了其它可能的吸附行为。对于O2在ZnO (101 ̅0)表面上的吸附设计了9个模型，H2O在ZnO (101 ̅0)表面上的吸附设计了12个模型。通过形成能计算发现，O2在表面上的吸附为正值，H2O的吸附为负值。O2和H2O单分子在表面上发生分子吸附，未见解离形态。对于O2吸附最稳定的结构是O2分子与表面相邻的Zn原子形成了Znslab1-Oads1-Oads2-Znslab2桥连键。其它较为稳定的结构是Oads1原子迁移到下一个表面重复晶胞的O原子位置附近，在表面上形成了Znslab1-Oads1键，同时Oads2原子扩散至表面沟渠上方。对于H2O吸附，不论以何种方式吸附结构都比较稳定。其中最稳定的构型是Oads迁移到下一个表面重复晶胞的O原子位置附近，形成了Znslab1-Oads键以及Oslab3-H氢键。另外较稳定的构型是Oads迁移到ZnO (101 ̅0)表面台阶上方，形成了Znslab1-Oads键以及Oslab1-H氢键。     

稀氢氟酸中硅表面氢终端的原位拉曼光谱研究

本文用共焦显微拉曼系统原位观察了Ｓｉ（１００）表面氢终端原子在稀氢氟酸中的变化过程。研究表明：在硅片浸入氢氟酸溶液的初期,表面主要被硅和三个氢原子的结合体（Ｓｉ Ｈ３）以及硅和两个氢原子的结合体（Ｓｉ Ｈ２）所覆盖。随着腐蚀过程的延长,Ｓｉ Ｈ３越来越少,Ｓｉ Ｈ２的信号不断增强,并且,硅和单个氢原子的结合体（Ｓｉ Ｈ）的信号也开始出现。最终,硅表面主要被Ｓｉ Ｈ２所覆盖,有少量Ｓｉ Ｈ３和Ｓｉ Ｈ键。本文还表明,拉曼光谱用来原位观察半导体材料表面终端原子键在溶液中的变化是很有用的工具     

Conciliating surface superhydrophobicities and mechanical strength of porous silicon films

Hydrophobic surfaces on Mechanical stable macroporous silicon films were prepared by electrochemical etching with subsequent octadecyltrichlorosilane (OTS) modification. The surface morphologies were controlled by current densities and the mechanical properties were adjusted by their corresponding porosities. Contrast with the smooth macroporous silicon films with lower porosities (34.1%) and microporous silicon with higher porosities (97%), the macroporous film with a rough three-dimension (3D) surface and a moderate pore to cross-section area ratio (37.8%, PSi2′) exhibited both good mechanical strength (Yong’ modulus, shear modulus and collapse strength are 64.2, 24.1 and 0.32 GPa, respectively) and surface superhydrophobicity (water contact angle is 158.4 ± 2° and sliding angle is 2.7 ± 1°). This result revealed that the surface hydrophobicities (or the surface roughness) and mechanical strength of porous films could be conciliated by pore to cross-section area ratios control and 3D structures construction. Thus, the superhydrophobic surfaces on mechanical stable porous films could be obtained by 3D structures fabrication on porous film with proper pore to cross-section area ratios.     

An AFM study of the processing of hydrogen passivated silicon(1 1 1) of a low miscut angle

We present atomic force microscopy (AFM) measurements from a passivated silicon crystal miscut by 0.1° and show the etching regime to be significantly different from surfaces with a larger miscut angle. A simple kinetic model is developed to explain the results and is used to derive the optimal etching conditions for nominally flat Si(1 1 1)–(1×1)H. We show that small changes in miscut angle can alter the kinetic steady state and promote the formation of deep etch pits, even on the least stable, miscut surface. Collisions of steps with these pits result in arrays of stable, self-aligned ‘etch hillocks' over micron dimensions. Following preparation, we use AFM to observe the initial growth of native oxide on the Si(1 1 1)–(1×1)H surface, and demonstrate that AFM is a sensitive probe to surface oxidation in the sub-monolayer regime.     

Surface phonons of clean, hydrogen- and deuterium-terminated Si(0 0 1) surfaces

We present a comprehensive vibrational study of the clean and hydrogen- or deuterium-terminated silicon (0 0 1) surface. The modes related to the clean as well as to the H:Si, D:Si, and 2H:Si, 2D:Si surfaces are studied by means of high resolution electron energy loss spectroscopy (HREELS). We pay special attention to the modification of the phonon modes by the surface treatments and compare the data with reported experimental and theoretical results. The analysis of the relative phonon intensities of the clean, mono- and dihydride surfaces yields the assignment of the modes related to the dimer bonds. The isotopic shifts of vibrons related to the Si-H and Si-D bonds and to the surface phonon are discussed and applied to the characterisation of the surface excitations.     

A theoretical study of structural and electronic properties of a missing dimer defect on Si- and C-terminated SiC(0 0 1)

We present a theoretical study of the geometrical and electronic properties of the C- and Si-terminated -SiC(0 0 1) surfaces in the vicinity of the missing dimer defect. The experimental results suggest that the atomic structures of these two surfaces may be considerably modified by external stress. In our present study we have considered the possible influence of this factor on the surface geometry of both systems. We have shown that the structural differences between the C- and Si-terminated surfaces lead to their different behaviour in the presence of a missing dimer and applied stress. In the case of the C-terminated c(2×2) surface, the missing dimer defect causes the buckling of the adjacent carbon dimers lying in the line of the defect (dimer atoms adjacent to the defect have vertical positions lower by 0.18 Å). This effect becomes more pronounced in the presence of compressive stress — the stress of 8% leads to the buckling of these two dimers of around 0.5 Å. The vertical positions of silicon atoms located directly below the defect were increased by 0.2 Å. We have also found that the missing dimer influences the structure of the carbon dimers on the neighbouring lines of dimers. Contrary to the C-terminated surface, the missing dimer defect on the Si-terminated SiC(0 0 1)-p(2×1) surface remains neutral for silicon dimers located in the line of defect, i.e. the dimers do not change their geometrical properties in unstrained structure nor in the presence of a tensile stress. On the other hand, this defect modifies considerably the geometry of the dimers from the two neighbouring lines of dimers by reducing their bond lengths and vertical positions. Changes in the geometrical properties of the second neighbour dimers (with respect to the defect) in these two lines are also noticeable. Moreover, we have found that the presence of a missing dimer modifies significantly the positions of the adjacent subsurface carbon atoms.     

DLC nano-dot surfaces for tribological applications in MEMS devices

With the invention of miniaturized devices like micro-electro-mechanical systems (MEMS), tribological studies at micro/nano-scale have gained importance. These studies are directed towards understanding the interactions between surfaces at micro/nano-scales, under relative motion. In MEMS devices, the critical forces, namely adhesion and friction restrict the smooth operation of the elements that are in relative motion. These miniaturized devices are traditionally made from silicon (Si), whose tribological properties are not good. In this paper, we present a short investigation of nano- and micro-tribological properties of diamond-like carbon (DLC) nano-dot surfaces. The investigation was undertaken to evaluate the potential of these surfaces for their possible application to the miniaturized devices. The tribological evaluation of the DLC nano-dot surfaces was done in comparison with bare Si (1 0 0) surfaces and DLC coated silicon surfaces. A commercial atomic force microscope (AFM) was used to measure adhesion and friction properties of the test materials at the nano-scale, whereas a custom-built micro-tribotester was used to measure their micro-friction property. Results showed that the DLC nano-dot surfaces exhibited superior tribological properties with the lowest values of adhesion force, and friction force both at the nano- and micro-scales, when compared to the bare Si (1 0 0) surfaces and DLC coated silicon surfaces. In addition, the DLC nano-dot surfaces showed no observable wear at the micro-scale, unlike the other two test materials. The superior tribological performance of the DLC nano-dot surfaces is attributed to their hydrophobic nature and the reduced area of contact projected by them.     

Photon-stimulated desorption of methanol on Si(111)7 × 7 and Si(100)2 × 1 at the C 1s and O 1s thresholds

Photostimulated desorption experiments have been performed on deuterated methanol adsorbed on Si(111)7 × 7 and Si(100)2 × 1 at the C 1s and O 1s thresholds. D⁺ and the masses of the series CD⁺_x are produced in the photofragmentation process in both energy ranges. A comparison has been made with the photofragmentation spectra of methanol in the gas phase and two different desorption mechanisms have been hypothesized for the desorption of D⁺ and higher masses from the silicon surfaces at the C 1s threshold.