旋光纤喇曼放大器中ASE噪音模型及仿真计算

通过分析旋光纤喇曼放大器中信号光、抽运光的非线性薛定谔波动方程及放大自发辐射噪音特性,提出一种能同时在旋光纤喇曼放大器中产生预计波形放大自发辐射噪音,又方便计算的方法.根据放大自发辐射噪音时域特性,建立并在波动方程中加入放大自发辐射非高斯噪音模型.在考虑旋光纤双折射的非线性效应同时,通过分步傅里叶法对波动方程求解,计算了旋光纤喇曼放大器中的放大自发辐射噪音,并与实验结果吻合.     

旋光纤喇曼放大器中ASE噪音模型及仿真计算

通过分析旋光纤喇曼放大器中信号光、抽运光的非线性薛定谔波动方程及放大自发辐射噪音特性,提出一种能同时在旋光纤喇曼放大器中产生预计波形放大自发辐射噪音,又方便计算的方法.根据放大自发辐射噪音时域特性,建立并在波动方程中加入放大自发辐射非高斯噪音模型.在考虑旋光纤双折射的非线性效应同时,通过分步傅里叶法对波动方程求解,计算了旋光纤喇曼放大器中的放大自发辐射噪音,并与实验结果吻合.     

神光装置放大自发辐射输出特性测量

讨论了大型激光装置放大自发辐射输出的一般特性，给出了神光装置放大自发辐射特性的测量结果。     

激光器泵浦的波导染料放大器的研究

本文对波导染料自发辐射放大器进行了理论和实验研究。利用矩形波导模型求出波导模式、放大自发辐射阈值、放大自发辐射的近场及远场光强分布。实验获得放大自发辐射的远场光斑图样与理论计算比较基本一致,并对放大自发辐射输出特性进行研究。     

脉冲储能型重复频率Yb:YAG片状激光放大器ASE效应研究

探讨了脉冲储能型重复频率片状Yb:YAG激光放大器抽运过程中的自发辐射放大（ASE）效应和能量提取过程.在Yb³⁺离子抽运动力学的基础上,建立了抽运过程中的自发辐射放大模型,计算了Yb:YAG晶体中三维含时储能密度分布和全片可提取能量.讨论了不同介质尺寸、掺杂浓度及厚度、介质温度参数下,自发辐射放大对储能的影响.给出了较为优化的设计,将有助于基于Yb激光材料的大能量二极管抽运的固体激光器设计. 关键词： 脉冲储能 Yb:YAG激光放大器 自发辐射放大（ASE）     

准分子激光器放大自发辐射特性的研究

本文考虑了XeCl激光振荡器中放大自发辐射对阈值条件和输出特性的影响,建立了激光和放大自发辐射归一化光通量的耦合输运方程,求得激光和放大自发辐射光通量分析和输出功率的解析表达式。结果表明:(1)放大自发辐射的存在增加了激光的阈值增益;(2)随着腔的Q值的提高,放大自发辐射的输出减弱;(3)适当地选取腔镜的反射率,即可有效地抑制放大自发辐射,从XeCl准分子激光器空间相干性的测量证实了上述结果。     

天光一号预放大器中的放大自发辐射效应

 在三维放大自发辐射（ASE）的模拟计算中，计入了侧壁反射效应以及KrF自发辐射的谱线形状（高斯型、洛伦兹型及平顶型）的影响，并对空间网点的影响进行了考察。经过综合分析，给出了ASE对预放大器放大特性影响的上、下限范围。当计入平顶型频谱分布，壁反射系数为 0 .2时，与不计入ASE的情形对比，天光一号预放大器的提取效率下降为35%。     

KrF准分子激光器中的ASE效应

论述了具有小纵横比（长／宽）介质的ＫｒＦ准分子激光放大器和振荡器中放大的自发辐射（ＡＳＥ）。导出了以激光负载为主的含放大的自发辐射的普适计算公式。编制了仅含纵向ＡＳＥ流变化的计算程序。分析并给出了在适度饱和增益下放大器的功率增益与抽运效率的最佳关系曲线以及相应的各参量选择值。可为ＫｒＦ激光放大器的设计及改善其光束质量提供理论参考。     

基于自发辐射相干控制的电磁感应透明诱导无反转光放大效应

建立微波驱动基态精细结构跃迁的Λ型三能级系统,研究基于自发辐射相干控制的电磁感应透明诱导无反转光放大效应.微波场作用于基态精细结构能级之间,产生3个透明窗口,利用适当角度的自发辐射相干效应与电磁感应透明耦合,实现透明向光放大的转化.结果表明,透明转化为光放大时,激发态与基态能级之间以及两个基态能级之间均不出现粒子数反转,但在产生光放大的过程中必须经历两个基态能级出现粒子数反转的状态.调节微波场的频率失谐量可以改变基态能级上的粒子数分布,有利于无反转光放大的产生.     

掺钛蓝宝石激光放大器中放大自发辐射效应研究

 给出了描述掺钛蓝宝石激光放大器的速率方程组，通过对放大介质内反转粒子数密度和放大自发辐射的时间和空间特性的数值计算与分析，提出可通过控制泵浦光脉冲和信号光之间的时间延迟来有效地抑制放大自发辐射对放大器增益的影响。     

Influence of multi-photon ionization of Xe on a XeF discharge induced by KrF laser irradiation

Excimer laser preionization induced by an external laser was investigated for XeF excimer laser discharge induced by a KrF laser, paying attention to the ionized species in the gas. Enhancement of amplified spontaneous emission (ASE) was observed for XeF gas discharge preionized by a KrF laser with and without its irradiation. In contrast, no ASE enhancement was observed for KrF gas discharge with KrF laser preionization. ASE enhancement was larger for the longer wavelength, which was close to the two-photon resonance of the Xe atom, when tunable KrF laser irradiation was used. These results indicate that multi-photon ionization of Xe atoms supplied the initial electrons to the laser-induced preionization.     

10 ps High Power Laser System at 248 nm

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10 ps High Power Laser System at 248 nm

A simple 10 ps KrF laser system consisting of quenched dye laser oscillator pumped by a XeCl laser, a distributed feedback dye laser (DFDL), a three-stage dye amplifier and a two-stage KrF amplifier are described. The output of the laser system is 140 mJ with 10 ps pulse width by using polarization-multiplexing amplification. A focused output laser intensity of about 4×1015 W/cm2 is obtained. The saturation fluence for KrF laser is obtained with this laser.     

Generation of femtosecond vacuum-ultraviolet pulses

High power femtosecond pulses in the Vacuum Ultra Violet (VUV) have been generated through the nonlinear interaction of femtosecond KrF pulses with xenon and argon gas. Under near resonant two photon excitation of xenon by a femtosecond KrF laser, parametric four wave mixing processes lead to VUV pulses at 147 and 108 nm with pulse energies in the 10 µJ range. Tuning is demonstrated by mixing the KrF pulse with a 500 fs dye laser pulse at 497 nm, resulting in 165 nm emission. In argon, a three photon resonance leads to third harmonic generation at 83 nm and micro joule level pulses near 127 nm generated by a six wave mixing process. Since the spectra of the VUV pulses show an ionization-induced blue shift with increasing KrF laser intensity, the VUV pulses can be shown to have temporal duration less than the pulse width (450 fs) of the KrF laser. Blue shifting of the third harmonic of the KrF laser in argon is dominated by a reduction in the neutral gas density rather than by an increase in the electron density.     

KrF激光动力学过程的模拟研究

本文配合KrF激光器的设计,对其动力学过程作了零维模拟计算,并与国内外实验结果进行了比较。通过模拟研究,对KrF激光器本征效率的提高、激光器对入射束流的要求以及对激光腔体的设计等都提出了很好的建议与简单实用的计算模式。     

Theoretical application of z-dependent gain coefficient to describe amplified spontaneous emission

Based on the geometrical modeling of the unified gain coefficient and the reported amplified spontaneous emission (ASE) output energy measurement ε(ASE) versus amplifying excitation length, l(AMP) in a KrF laser oscillator, we managed, as an example, to explain the ASE output energy behavior both numerically and analytically. In this approach, introducing the ASE gain-coefficient profile for the KrF laser, g(0,KrF)(ASE), was not avoidable. It was found that while the g(0,KrF)(ASE) profile follows the introduced gain-modeling formulation, it is, however, slightly lower than the KrF laser gain profile, g(0,KrF)(exp), deduced from the measurements reported by different researchers. The present approach, up to the present time, is able to explain all of the existing ambiguities on understanding the ASE behavior.     

Theoretical and experimental study of KrF fluorescence in amultimicrosecond longitudinal discharge

Multimicrosecond KrF (B→X) fluorescence characteristics were measured using KrF laser mixtures pumped by a low-pressure longitudinal stable discharge to make clear the mechanism of the premature termination of the KrF laser. Using the experimental setup with a seven-stage pulse-forming network (PFN), a KrF fluorescence pulse with a pulse duration of 2.0 μs was obtained at a total pressure of 75 torr, whose gas mixture was F₂/Kr/He=0.1/7.5/92.4(%). The pulse width (FWHM) of KrF fluorescence was decreased from 1400 ns to 500 ns with increasing F₂ concentration from 0.1 to 1.5%. The theoretical analysis made it clear that this termination mechanism was strongly due to the KrF fluorescence kinetics     

Dual-beam ablation of fused silica by multiwavelength excitation process using KrF excimer and F2 lasers

A new technique of dual-beam laser ablation of fused silica by multiwavelength excitation process using a 248-nm KrF excimer laser (ablation beam) coupled with a 157-nm F₂ laser (excitation beam) in dry nitrogen atmosphere is reported. The dual-beam laser ablation greatly reduced debris deposition and, thus, significantly improved the ablation quality compared with single-beam ablation of the KrF laser. High-quality ablation can be achieved at the delay times of KrF excimer laser irradiation shorter than 10 ns due to a large excited-state absorption. The ablation rate can reach up to 80 nm/pulse at the fluence of 4.0 J/cm² for the 248-nm laser and 60 mJ/cm² for the F₂ laser. The ablation threshold and effective absorption coefficient of KrF excimer laser are estimated to be 1.4 J/cm² and 1.2᎒⁵ cm^-1, respectively.     

Development of XUV lasers at the RAL Central Laser Facility

Recent progress in the development of XUV lasers by research teams using high-power and ultrashort-pulse Nd: glass and KrF laser facilities at the Rutherford Appleton Laboratory is reviewed. Injector-amplifier operation and prepulse enhanced output of the Ge XXIII collisional laser driven by a kilojoule glass laser, enhanced gain in CVI recombination with picosecond CPA drive pulses from a glass laser, and optical field ionization and XUV harmonic generation with a KrF CPA laser are described.     

Influence of laser fluence and irradiation timing of F2 laser on ablation properties of fused silica in F2-KrF excimer laser multi-wavelength excitation process

A collinear irradiation system of F₂ and KrF excimer lasers for high-quality and high-efficiency ablation of hard materials by the F₂ and KrF excimer lasers’ multi-wavelength excitation process has been developed. This system achieves well-defined micropatterning of fused silica with little thermal influence and little debris deposition. In addition, the dependence of ablation rate on various conditions such as laser fluence, irradiation timing of each laser beam, and pulse number is examined to investigate the role of the F₂ laser in this process. The multi-wavelength excitation effect is strongly affected by the irradiation timing, and an extremely high ablation rate of over 30 nm/pulse is obtained between -10 ns and 10 ns of the delay time of F₂ laser irradiation. The KrF excimer laser ablation threshold decreases and its effective absorption coefficient increases with increasing F₂ laser fluence. Moreover, the ablation rate shows a linear increase with the logarithm of KrF excimer laser fluence when the F₂ laser is simultaneously irradiated, while single KrF excimer laser ablation shows a nonlinear increase. The ablation mechanism is discussed based on these results. Received: 16 July 2001 / Accepted: 27 July 2001 / Published online: 2 October 2001