Influences of the interfacial state between Co and a Si substrate on the magnetic properties of Co/Si(1 1 1) films

Morphology and magnetic properties of Co/Si(1 1 1) interfaces have been investigated using scanning tunneling microscope and surface magneto-optic Kerr effect techniques. As deposited at room temperature for Co/Si(1 1 1), defects have been observed with shapes of dark patches and bright islands on the surface with different Co coverage. The defect formation causes a rough interface. For subsequently deposited Co layers, the interfacial state between Co and the Si substrate results in the appearance of both the longitudinal and polar Kerr loops. After annealing treatments, interdiffusion of Co atoms and Si(1 1 1) substrate occurs as revealed by Auger electron spectroscopy. Scanning tunneling microscope images show the formation of Si clusters with average diameter of 10 nm at high temperatures. The disappearance of ferromagnetism of the films occurs due to the structural and compositional changes.     

Epitaxial growth of Co(0 0 0 1)hcp/Fe(1 1 0)bcc magnetic bi-layer films on SrTiO3(1 1 1) substrates

Co(0 0 0 1)_hcp/Fe(1 1 0)_bcc epitaxial magnetic bi-layer films were successfully prepared on SrTiO₃(1 1 1) substrates. The crystallographic properties of Co/Fe epitaxial magnetic bi-layer films were investigated. Fe(1 1 0)_bcc soft magnetic layer grew epitaxially on SrTiO₃(1 1 1) substrate with two type variants, Nishiyama–Wasserman and Kurdjumov–Sachs relationships. An hcp-Co single-crystal layer is obtained on Ru(0 0 0 1)_hcp interlayer, while hcp-Co layer formed on Au(1 1 1)_fcc or Ag(1 1 1)_fcc interlayer is strained and may involve fcc-Co phase. It has been shown possible to prepare Co/Fe epitaxial magnetic bi-layer films which can be usable for patterned media application.     

Structure and magnetic properties of magnetron-sputtered [(Fe/Pt/Fe)/Au]n multilayer films

Using dc magnetron sputtering, Fe/Pt/Au multilayer films were prepared, and the effects of Au layer thickness and annealing temperature on structure and magnetic properties of the Fe/Pt/Au multilayer films were investigated. The as-deposited Fe/Pt/Au multilayer films have good periodic structure with composition modulation along the growth direction. The stress stored in the as-deposited films promoted the ordering of the films annealed at 400 °C. When the films were annealed at 500 °C, the thicker Au layer could restrain the order-disorder transformation region volume and lead to the decrease of the ordered volume fraction with Au layer thickness increasing.     

Structural and magnetic properties of evaporated Fe thin films on Si(1 1 1), Si(1 0 0) and glass substrates

We present experimental results on the structural and magnetic properties of series of Fe thin films evaporated onto Si(1 1 1), Si(1 0 0) and glass substrates. The Fe thickness, t, ranges from 6 to110 nm. X-ray diffraction (XRD) and atomic force microscopy (AFM) have been used to study the structure and surface morphology of these films. The magnetic properties were investigated by means of the Brillouin light scattering (BLS) and magnetic force microscopy (MFM) techniques. The Fe films grow with (1 1 0) texture; as t increases, this (1 1 0) texture becomes weaker for Fe/Si, while for Fe/glass, the texture changes from (1 1 0) to (2 1 1). Grains are larger in Fe/Si than in Fe/glass. The effective magnetization, 4πM_eff, inferred from BLS was found to be lower than the 4πM_S bulk value. Stress induced anisotropy might be in part responsible for this difference. MFM images reveal stripe domain structure for the 110 nm thick Fe/Si(1 0 0) only.     

Surface morphology and luminescence characterization of β-FeSi2 thin films prepared by pulsed laser deposition

β-FeSi₂ thin films were prepared on Si (1 1 1) substrates by pulsed laser deposition (PLD) with a sintering FeSi₂ target and an electrolytic Fe target. The thin films without micron-size droplets were prepared using the electrolytic Fe target; however, the surface without droplets was remarkably rougher using the Fe target than using the FeSi₂ target. After deposition at 600 °C and then annealing at 900 °C for 20 h, XRD indicated that the thin film prepared using the Fe target had a poly-axis-orientation, but that prepared using the FeSi₂ target had a one-axis-orientation. The PL spectra of the thin films prepared using the FeSi₂ and Fe targets at a growth temperature of 600 °C and subsequently annealed at 900 °C for 20 h had A-, B- and C-bands. Moreover, it was found that the main peak at 0.808 eV (A-band) in the PL spectrum of the thin films prepared using the FeSi₂ target was the intrinsic luminescence of β-FeSi₂ from the dependence of PL peak energy on temperature and excitation power density.     

First-principle study on the electronic structure and magnetic properties in Fe/MgO/Fe magnetic tunnel junction with Mg insertion layer

The effect of a Mg insertion layer between the Fe electrode and the MgO barrier layer on the electronic structure and magnetic properties of Fe/MgO/Fe magnetic tunnel junction has been studied by first-principle method. Two models of (a) Fe(1 0 0)/MgO(1 0 0)/Fe(1 0 0) and (b) Fe(1 0 0)/Mg/MgO(1 0 0)/Mg/Fe(1 0 0) were established. Our calculation results show that the Mg insertion layer has enhanced both the spin polarization and the magnetic moment of its adjacent Fe layer. The results have been discussed in terms of the variation in the DOS features and charge transfer with the Mg insertion layer.     

The interaction of Fe on MgO(1 0 0) surfaces

The atomic interaction and magnetic properties of ultrathin Fe films grown on cleaved and polished MgO(1 0 0) surfaces were studied by conversion electron Mössbauer spectroscopy (CEMS). ⁵⁷Fe layers were deposited as probe atoms in different layer positions in 10 ML thick Fe films. Fe layers of different thicknesses were formed on polished and cleaved substrate surfaces at RT deposition. The analysis of the spectra showed no Fe-O^2- interaction in MgO/Fe interface. FeO phase formation was excluded. The Mössbauer spectrum of 5 ML ⁵⁷Fe sample showed enhanced internal magnetic field at 80 K. No interdiffusion of ⁵⁷Fe and ⁵⁶Fe atoms was observed between the layers at room temperature.     

Ultrathin Fe films on single crystal and virtual Ge(0 0 1) substrates: Towards the control of magnetic properties

Ultrathin Fe films have been epitaxially grown at room temperature on standard single crystal Ge(0 0 1) substrates and virtual Ge/Si(0 0 1) substrates. Their magnetic and electronic properties have been investigated in situ by spin polarized inverse photoemission and magneto-optical Kerr effect. In both cases, the onset of ferromagnetism appears definitively at 3 ML, and the overall behavior is very similar in the case of standard and virtual substrates, so that the latter can be employed for growing high quality Fe/Ge/Si interfaces. All the films investigated display uniaxial anisotropy, which is explained in terms of the surface morphology induced by the preparation conditions.     

Microstructure, magnetic and optical properties of sputtered polycrystalline ZnO films with Fe addition

Microstructure, magnetic and optical properties of polycrystalline Fe-doped ZnO films fabricated by cosputtering with different Fe atomic fractions (x_Fe) have been examined systematically. Fe addition could affect the growth of ZnO grains and surface morphology of the films. As x_Fe is larger than 7.0%, ZnFe₂O₄ grains appear in the films. All the films are ferromagnetic. The ferromagnetism comes from the ferromagnetic interaction activated by defects between the Fe ions that replace Zn ions. The average moment per Fe ion reaches a maximum value of 1.61 μ_B at x_Fe = 4.8%. With further increase in x_Fe, the average moment per Fe ion decreases because the antiferromagnetic energy is lower than the ferromagnetic one due to the reduced distance between the adjacent Fe ions. The optical band gap value decreases from 3.245 to 3.010 eV as x_Fe increases from 0% to 10%. Photoluminescence spectra analyses indicate that many defects that affect the optical and magnetic properties exist in the films.     

Structural, electrical and piezoelectric properties of LiNbO3 thin films for surface acoustic wave resonators applications

In this work, 0.30 μm thick LiNbO₃ layers have been deposited by sputtering on nanocrystalline diamond/Si and platinised Si substrates. The films were then analyzed in terms of their structural and optical properties. Crystalline orientations along the (0 1 2), (1 0 4) and (1 1 0) axes have been detected after thermal treatment at 500 °C in air. The films were near-stoichiometric and did not reveal strong losses or diffusion in lithium during deposition or after thermal annealing. Pronounced decrease of the roughness on top of the LiNbO₃ layer and at the interface between LiNbO₃ and diamond was also observed after annealing, compared to the bare nanocrystalline diamond on Si substrate. Furthermore, ellipsometry analysis showed a better density and a reduced thickness of the surface layer after post-deposition annealing. The dielectric constant and losses have been measured to 50 and less than 3.5%, respectively, for metal/insulator/metal structures with 0.30 μm thick LiNbO₃ layer. The piezoelectric coefficient d₃₃ was found to be 7.1 pm/V. Finally, we succeeded in switching local domain under various positive and negative voltages.     

Structural evolution of nanocrystalline/amorphous Fe/Ni75B25 multilayers: temperature dependence of electrical resistivity

X-ray specular-reflectivity measurements have been carried out on nanocrystalline/amorphous Fe/Ni₇₅B₂₅ multilayer films which were sputter-deposited on Si substrates, to investigate the evolution of interface roughness and the correlation between structure and transport properties. A significant interface roughness correlation with increasing Fe/NiB layer repetition was observed. The investigated films indicated a temperature dependent high electrical resistivity—10⁴ μΩ-cm at 10 K and 10³ μΩ-cm at 300 K—with a semiconductor-metal transition like behavior. Selected area electron diffraction revealed the presence of crystalline bcc Fe phase and NiB in amorphous state. The structural and transport properties of the multilayers are discussed.     

Field dependence of spin and orbital moments of Fe in L10 FePt magnetic thin films

The field dependence of spin and orbital magnetic moments of Fe in L1₀ FePt magnetic thin films was investigated using X-ray magnetic circular dichroism (XMCD). The spin and orbital moments were calculated using the sum rules; it was found that the spin and orbital moment of Fe in L1₀ FePt films are ∼2.5 and 0.2 μ_B, respectively. The relative XMCD asymmetry at Fe L₃ peak on the dependence of applied field suggested that the majority magnetic moment of L1₀ FePt films resulted from Fe.     

Synchrotron radiation and polarized neutron study of the enhancement of orbital magnetic moment of Fe in the epitaxial NiFe/Ru multilayer

Epitaxial Ni₈₀Fe₂₀(5 nm)/Ru(x nm)/Ni₈₀Fe₂₀(5 nm) trilayers with thickness x = 0.5-3.0 were prepared on Al₂O₃ substrate. The structure, magnetic properties and magnetic depth profiles of the epitaxial Ni₈₀Fe₂₀(1 1 1)/Ru(0 0 0 1) multilayers were studied by X-ray diffraction, X-ray magnetic circular dichroism and polarized neutron reflectivity. A strongly enhanced orbital moment of Fe in the permalloy layer was observed at the Ru thickness of the first anti-ferromagnetic coupling, which might be due to an interference between two interfaces. At this Ru thickness, the neutron reflectivity data show a 0.8 nm layer at the interface with the magnetic moment perpendicular to the surface plane, which might be due to the enhanced spin-orbital coupling at interface.     

Control of crystallographic orientation in L10 FePt films by using Cr and CrW underlayers

The microstructure and magnetic properties of FePt films grown on Cr and CrW underlayers were investigated. The FePt films that deposited on Cr underlayer show (2 0 0) orientation and low coercivity because of the diffusion between FePt and Cr underlayer. The misfit between FePt magnetic layer and underlayer increases by small addition of W element in Cr underlayer or using a thin Mo intermediate layer, which is favorable for the formation of (0 0 1) orientation and the transformation of FePt from fcc to fct phase. A good FePt (0 0 1) texture was obtained in the films with Cr₈₅W₁₅ underlayer with substrate temperature of 400 °C. The FePt films deposited on Mo/Cr underlayer exhibit larger coercivity than that of the films grown on Pt/Cr₈₅W₁₅ because 5 nm Mo intermediate layer depressed the diffusion of Cr into magnetic layer.     

Mössbauer spectroscopy and magnetic properties in thin films of FexNi100−x electroplated on silicon (1 0 0)

Fe_xNi_100−x thin films were produced by galvanostatic electrodeposition on Si (1 0 0), nominal thickness 2800 nm, and x ranging 7-20. The crystalline structure of the sample was determined by X-ray diffraction (XRD). The magnetic properties were investigated by vibration sample magnetometry (VSM) and room temperature ⁵⁷Fe Mössbauer spectroscopy. Conversion Electron Mössbauer spectroscopy (CEMS) in both film surfaces for the thick self-supported films showed that the magnetic moment direction is in the plane and conventional transmission (MS) that the directions are out of the plane films. The results were interpreted assuming a three-layer model where the external layer has in-plane magnetization and the internal one, out of plane magnetization.     

Magnetic depth profiling of Fe/Au multilayer using neutron reflectometry

We present unpolarized and polarized neutron reflectometry data on Fe/Au multilayer sample for characterizing the layer structure and magnetic moment density profile. Fe/Au multilayer shows strong spin-dependent scattering at interfaces, making it a prospective GMR material. Fe/Au multilayer with bilayer thickness of 130 Å was grown on Si substrate by RF magnetron sputtering technique. Unpolarized neutron reflectivity measurement yields nuclear scattering length density profile. The magnetic scattering length density profile has been obtained from polarized neutron reflectivity measurements.     

Effect of composition on phase formation,microstructure and magnetic properties of Nd–Fe–B thin films

Nd–Fe–B hard magnetic thin films were deposited on a combined Cr/Ta buffer layer on heated MgO(1 0 0) substrates by pulsed laser deposition. The effect of composition on phase formation, morphology and magnetic properties was investigated. For a quantification of phase formation, hysteresis measurements along the hard axis are used. Optimum phase formation is obtained at a Nd/Fe ratio around 0.3. For this Nd content an excellent magnetic texture and a coercivity up to 1 T can be obtained; however, remanence is reduced and the films have a granular microstructure with high roughness. Also a certain B surplus is of benefit. However, with a too-high B or Nd surplus phase formation is more difficult.     

Laser synthesis of semiconductor nanostructures with narrow band gap

Semiconductor nanostructures with narrow band gap were synthesized by means of laser chemical vapor deposition (LCVD) of elements from iron carbonyl vapors [Fe(CO)₅] under the action of Ar⁺ laser radiation (λ_L = 488 nm) on the Si substrate surface. The temperature dependence of the specific conductivity of these nanostructures in the form of thin films demonstrated typical semiconductor tendency and gave the possibility to calculate the band gap for intrinsic conductivity (E_g) and the band gap assigned for impurities (E_i), which were depended upon film thickness and applied electrical field. Analysis of deposited films with scanning electron microscopy (SEM) and atomic force microscopy (AFM) demonstrated their cluster structure with average size not more than 100 nm. Semiconductor properties of deposited nanostructures were stipulated with iron oxides in different oxidized phases according to X-ray photoelectron spectroscopy (XPS) analysis.These deposited nanostructures were irradiated with Q-switched YAG laser (λ_L = 1064 nm) at power density about 6 × 10⁷ W/cm². This irradiation resulted in the crystallization process of deposited films on the Si substrate surface. The crystallization process resulted in the synthesis of iron carbide-silicide (FeSi_2−xC_x) layer with semiconductor properties too. The width of the band gap E_g of the synthesized layer of iron carbide-silicide was less than for deposited films based on iron oxides Fe₂O_3−x (0 ≤ x ≤ 1).     

Structural and magnetic properties of RF sputtered FePt/Fe multilayers

Series of [FePt(4min)/Fe(t_Fe)]₁₀ multilayers have been prepared by RF magnetron sputtering and post-annealing in order to optimize their magnetic properties by structural designs. The structure, surface morphology, composition and magnetic properties of the deposited films have been characterized by X-ray diffractometer (XRD), Rutherford backscattering (RBS), scanning electron microscope (SEM), energy dispersive X-ray spectroscope (EDX) and vibrating sample magnetometer (VSM). It is found that after annealing at temperatures above 500 °C, FePt phase undergoes a phase transition from disordered FCC to ordered FCT structure, and becomes a hard magnetic phase. X-ray diffraction studies on the series of [FePt/Fe]_n multilayer with varying Fe layer thickness annealed at 500 and 600 °C show that lattice constants change with Fe layer thickness and annealing temperature. Both lattice constants a and c are smaller than those of standard ones, and lattice constant a decreases as Fe layer deposition time increases. Only a slight increase in grain size was observed as Fe layer decreased in samples annealed at 500 °C. However, the increase in grain size is large in samples annealed at 600 °C. The coercivities of [FePt/Fe]_n multilayers decrease with Fe layer deposition time, and the energy product (BH)_max reaches a maximum in the samples with Fe layer deposition time of 3 min. Comparison of magnetic properties with structure showed an almost linear relationship between the lattice constant a and the coercivities of the FePt phase.     

Epitaxial growth of bcc Fe films on Al(1 0 0) surfaces using Ti as an interface stabilizer

An approach is described to promote epitaxial growth of thin metal films on single-crystal metal substrates by stabilizing the interface with an extremely thin metallic interlayer. A single atomic layer of a metal is deposited at the interface, Ti on Al(1 0 0) in this case, prior to the growth of the metal film of interest to produce an epitaxial interface in a system that is otherwise characterized by interdiffusion and disorder. The stabilized interface reduces interdiffusion and serves as a template for ordered film growth. Using Rutherford backscattering and channeling techniques along with low-energy electron diffraction and low-energy He⁺ scattering, it is demonstrated that an atomically thin layer of Ti metal deposited at the Fe-Al interface, a system well known for considerable intermixing at room temperature, reduces interdiffusion and promotes the epitaxial growth of Fe films on the Al(1 0 0) surface. The decrease in ion scattering yield for Al atoms, Fe-Fe shadowing and long-range order of the surface suggest that the epitaxial growth of Fe is greatly improved when the Ti interlayer is introduced prior to Fe deposition. Off-normal ion channeling experiments provide clear evidence for the bcc structure of Fe on the Ti/Al(1 0 0) template with the measured average (1 0 0) interplanar distance of 1.44 Å in the Fe overlayer.