The adsorption of carbon monoxide on TiO2(110) supported palladium

Palladium overlayers deposited on TiO₂(110) by metal vapour deposition have been investigated using LEED, XPS and FT-RAIRS of adsorbed CO. Low coverages of palladium (<3 ML) deposited at 300 K adsorb CO exclusively in a bridged configuration with a band (B₁ at 1990 cm⁻¹) characteristic of CO adsorption on Pd(110) and Pd(100) surfaces. When annealed to 500 K, XPS and LEED indicate the nucleation of Pd particles on which CO adsorbs predominantly as a strongly bound linear species which we associate with edge sites on the Pd particles (L* band at 2085 cm⁻¹). Both bridged and linear CO bands are exhibited as increases in reflectivity at the resonant frequency, indicating the retention of small particle size during the annealing process. Palladium overlayers of intermediate coverages (10–20 ML) deposited at 300 K undergo some nucleation during growth, and adsorbed CO exhibits both absorption and transmission bands in the B₁ (1990 cm⁻¹) and B₂ (1940 cm⁻¹) regions. The latter is associated with the formation of Pd(111) facets. Highly dispersed Pd particles are produced on annealing at 500 K. This is evidenced by the dominance of transmission bands for adsorbed CO and a significant concentration of edge sites, which accommodate the strongly bound linear species at 300 K. Adsorption of CO at low temperature also allows the identification of the constituent faces of Pd and the conversion of Pd(110)/(100) facets to Pd(111) facets during the annealing process. High coverages of palladium (100 ML) produce only absorption bands in FT-RAIRS of adsorbed CO associated with the Pd facets, but annealing these surfaces also shows a conversion to Pd(111) facets. LEED indicates that at coverages above 10 ML, the palladium particles exhibit (111) facets parallel to the substrate and aligned with the TiO₂(110) unit cell, and that this ordering in the particles is enhanced by annealing.     

Interactions of HCOOH with stoichiometric and defective TiO2(110) surfaces

Interactions of HCOOH with stoichiometric (nearly defect-free) and defective TiO₂(110) surfaces have been studied experimentally using X-ray photoelectron spectroscopy (XPS), ultraviolet photoemission spectroscopy (UPS), and theoretically using electronic structure calculations. The HCOOH saturation coverages were 0.58 ML, 0.77 ML, and 0.92 ML (1 ML ≈ 5.2 × 10¹⁴ cm⁻²) for nearly defect-free surfaces, for electron-beam exposed surfaces, and for Ar⁺ ion bombarded surfaces, respectively. The excess formic acid adsorption quantitatively corresponds to the number of newly exposed sites created by electron-beam exposure. Electronic structure calculations show a strong adsorptive interaction for formate on cation sites on both stoichiometric and defective TiO₂ surfaces, consistent with the experimental observations. In spite of adsorption at defect sites, little or no defect healing (defect healing means a reduction in defect signal observed by the photoemission measurements) was observed for either electron-beam exposed or Ar⁺ bombarded surfaces by HCOOH exposure up to 10⁴L at room temperature. However, some healing will occur if extra energy provided by electrons is introduced to breakdown formate species. In contrast to water adsorption, electronic structure calculations on defective TiO₂ have found that formate is located in an asymmetric position with respect to the Ti³⁺ sites with a potential additional interaction with the Ti⁴⁺ site.     

Characterization and chemical behavior of submonolayer coverages of titania on a Pt foil

The interaction between submonolayer titania coverages and Pt foil has been studied by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD) and high-resolution electron energy loss spectroscopy (HREELS). The submonolayer titania can be fully oxidized to TiO₂ at 923 K under 10⁻⁸ Torr O₂, and partially oxidized to TiO_x at lower oxidation temperatures. The oxidized surface can be reduced by annealing to 1000 K or higher, or by heating in H₂ at 823 K, or by interacting with surface carbon formed from acetone decomposition. Under certain conditions (e.g., hydrogen reduction at 923 K), the surface titania can be fully reduced to metallic Ti which diffuses into bulk Pt readily. The reduced metallic Ti can resurface when the surface is oxidized at 923 K. Both XPS and HREELS data indicate the existence of subsurface oxygen, which plays an important role for the diffusion of Ti into and out of the Pt foil. Although no special interfacial active sites were revealed by HREELS studies of adsorbed acetone and CO, some TPD and XPS data suggest the presence of sites active for acetone decomposition.     

Cu/N表面沉积共掺杂TiO_2光催化剂作用机理的理论研究

本文采用基于周期性密度泛函理论研究了Cu/N表面沉积共掺杂对锐钛矿相TiO2(001)面的修饰作用.计算了Cu在不同位置掺杂TiO2(101)面和(001)面的形成能,并在此基础上计算N不同位置掺杂TiO2(001)面及Cu/TiO2(001)面的形成能,通过形成能的比较获得了表面共掺杂的最优化结构.在此基础上计算了最稳定结构的能带结构及态密度,并与S单掺杂TiO2(001)面最稳定结构进行了对比.通过对结果的分析发现:Cu/N在(001)表面的沉积共掺杂有效降低了TiO2的禁带宽度,并在表面形成CuO2相,更利于提高其光催化活性.     

Creation of variable concentrations of defects on TiO2(110) using low-density electron beams

Low density (˜μA/cm²) 0.48 and 1.0 keV electron beams have been used to create surface defects on a TiO₂(110) surface. These electron-beam induced defects were examined primarily by X-ray photoelectron spectroscopy (XPS) with supporting ultraviolet photoemission spectroscopy (UPS). Glancing and normal emission XPS spectra of nearly defect-free surfaces revealed that Ti atoms on the surface were similar to the bulk Ti, while some surface oxygen atoms were different from the bulk oxygen. XPS of Ti 2p_3/2 was used to quantify the defect concentration and to examine the defect electronic structure. Based on our calculation of defect concentrations and the comparison of our results with results and models from the literature, we conclude that oxygen vacancies induced by electron beams in the current study are mostly from the bridging oxygen sites, in agreement with the previous work. A range of defect concentrations with similar electronic structure, mainly composed of Ti³⁺, have been induced by low-density electron beams. Beam energy and exposure were the experimental variables. The rates of defect formation at low beam exposure were beam-energy dependent, with a faster growth rate at 0.48 keV than at 1.0 keV. These defects were similar to those by thermal annealing in vacuum, but a higher concentration of defects could be obtained with longer beam exposure. However, the e-beam induced defects were different from those produced by Ar⁺ ion bombardment since both this and previous studies have found defects produced by Ar⁺ ion bombardment to be complex, with a variety of different local environments where oxygen and titanium surface atoms coexist.     

X-ray and electron beam modification of thiophene overlayers on TiO2(100)1 × 1 and 1 × 3

The effects of electron and X-ray beams on thiophene overlayers on TiO₂(100) 1 × 1 and 1 × 3 surfaces have been investigated using AES, UPS and XPS. Mg K X-rays were found to polymerise a thiophene multilayer condensed at 120 K. The evidence points to a substrate-secondary-electron mediated process. A 3 keV electron beam also modifies a condensed thiophene overlayer, probably by polymerisation.     

Experimental and theoretical study of the electronic properties of CoSi2 and NiSi2

Electronic structure of Co and Ni silicides were studied by means of the spectral properties of XPS high-resolution measurements together with theoretical calculations using crystal orbital overlap population (COOP) analysis. Calculations were carried out for CoSi₂ and NiSi₂ microstructures. Analysis from calculations shows that hybridization is stronger in Co disilicide than in Ni disilicide. Close to the Fermi level, we noticed that for the Co disilicide there is a small distribution (bonding and antibonding) to the total COOP, while the contribution from the Ni disilicide is null. XPS analysis of sample under study gives evidence about the covalent bonding when the chemical shifts for the Co 2p_3/2, Ni 2p_3/2 and Si 2p transitions are analyzed in the depth-profile mode.     

Adsorption and reactions of CH2I2 on Ru(001) surface

The adsorption and dissociation of CH₂I₂ were studied at 110 K with the aim of generating CH₂ species on the Ru(001) surface. The methods used included X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), temperature programmed desorption (TPD), Auger electron spectroscopy (AES) and work function measurements. Adsorption of CH₂I₂ is characterized by a work function decrease (0.96 eV at monolayer), indicating that adsorbed CH₂I₂ has a positive outward dipole moment. Three adsorption states were distinguished: a multilayer (T_p=200 K), a weakly bonded state (T_p=220 K) and an irreversibly adsorbed state. A new feature is the formation of CH₃I, which desorbs with T_p=160 K. The adsorption of CH₂I₂ at 110 K is dissociative at submonolayer, but molecular at higher coverages. Dissociation of the monolayer to CH₂ and I proceeded at 198–230 K, as indicated by a shift in the I(3d_5/2) binding energy from 620.6 eV to 619.9 eV. A fraction of adsorbed CH₂ is self-hydrogenated into CH₄ (T_p=220 K), and another one is coupled to di-σ-bonded ethylene, which — instead of desorption — is converted to ethylidyne at 220–300 K. Illumination of the adsorbed CH₂I₂ initiated the dissociation of CH₂I₂ monolayer even at 110 K, and affected the reaction pathways of CH₂.     

Adsorption of oxygen on Au(111) by exposure to ozone

Atomic oxygen coverages of up to 1.2 ML may be cleanly adsorbed on the Au(111) surface by exposure to O₃ at 300 K. We have studied the adsorbed oxygen layer by AES, XPS, HREELS, LEED, work function measurements and TPD. A plot of the O(519 eV)/Au(239 eV) AES ratio versus coverage is nearly linear, but a small change in slope occurs at Θ_O=0.9 ML. LEED observations show no ordered superlattice for the oxygen overlayer for any coverage studied. One-dimensional ordering of the adlayer occurs at low coverages, and disordering of the substrate occurs at higher coverages. Adsorption of 1.0 ML of oxygen on Au(111) increases the work function by +0.80 eV, indicating electron transfer from the Au substrate into an oxygen adlayer. The O(1s) peak in XPS has a binding energy of 530.1 eV, showing only a small (0.3 eV) shift to a higher binding energy with increasing oxygen coverage. No shift was detected for the Au 4f_7/2 peak due to adsorption. All oxygen is removed by thermal desorption of O₂ to leave a clean Au(111) surface after heating to 600 K. TPD spectra initially show an O₂ desorption peak at 520 K at low Θ_O, and the peak shifts to higher temperatures for increasing oxygen coverages up to Θ_O=0.22 ML. Above this coverage, the peak shifts very slightly to higher temperatures, resulting in a peak at 550 K at Θ_O=1.2 ML. Analysis of the TPD data indicates that the desorption of O₂ from Au(111) can be described by first-order kinetics with an activation energy for O₂ desorption of 30 kcal mol⁻¹ near saturation coverage. We estimate a value for the Au–O bond dissociation energy D(Au–O) to be 56 kcal mol⁻¹.     

Structures of sulfur on TiO2(1 1 0) determined by scanning tunneling microscopy, X-ray photoelectron spectroscopy and low-energy electron diffraction

The temperature dependent adsorption of sulfur on TiO₂(1 1 0) has been studied with X-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), and low-energy electron diffraction (LEED). Sulfur adsorbs dissociatively at room temperature and binds to fivefold coordinated Ti atoms. Upon heating to 120°C, 80% of the sulfur desorbs and the S 2p peak position changes from 164.3±0.1 to 162.5±0.1 eV. This peak shift corresponds to a change of the adsorption site to the position of the bridging oxygen atoms of TiO₂(1 1 0). Further heating causes little change in S coverage and XPS binding energies, up to a temperature of 430°C where most of the S desorbs and the S 2p peak shifts back to higher binding energy. Sulfur adsorption at 150°C, 200°C, and 300°C leads to a rich variety of structures and adsorption sites as observed with LEED and STM. At low coverages, sulfur occupies the position of the bridging oxygen atoms. At 200°C these S atoms arrange in a (3×1) superstructure. For adsorption between 300°C and 400°C a (3×3) and (4×1) LEED pattern is observed for intermediate and saturation coverage, respectively. Adsorption at elevated temperature reduces the substrate as indicated by a strong Ti³⁺ shoulder in the XPS Ti 2p_3/2 peak, with up to 15.6% of the total peak area for the (4×1) structure. STM of different coverages adsorbed at 400°C indicates structural features consisting of two single S atoms placed next to each other along the [0 0 1] direction at the position of the in-plane oxygen atoms. The (3×3) and the (4×1) structure are formed by different arrangements of these S pairs.     

Relationship between electronic and crystal structure in Cu–Ni–Co–Mn–O spinels: Part B: Binding energy anomaly in Cu photoemission spectrum

In very rare circumstances, X-ray photoemission spectra of copper in spinel oxides exhibit a “negative binding energy shift”. The origin of such an anomalous XPS chemical shift was investigated. A metastable Ni_0.48Co_0.24Cu_0.6+xMn_1.68−xO₄ (0 < x < 0.6) spinel was fabricated at 600 °C using a low-temperature solution technique. The binding energy of the 2p_3/2 level of copper (930.8 eV) is found 1.9 eV lower than that of Cu⁰ (932.7 eV). XPS and EXAFS studies revealed that the post-thermal annealing between 600 and 800 °C undergoes an irreversible cubic-to-tetragonal phase transformation through oxidation–reduction reaction Cu¹⁺ + Mn⁴⁺  Cu²⁺ + Mn³⁺, and only tetrahedral Cu¹⁺ species in the cubic spinel shows this anomalous chemical shift. The negative shift of the core levels was correlated to an equal shift of the Cu 3d valence band levels. XPS valence bands from the samples annealed at different temperatures were compared to DOS calculations. The DOS computations were performed with FEFF-8.1 code using experimental crystal parameters established by the EXAFS analysis. It was found that the tetrahedral Cu¹⁺ in the 600 °C annealed sample exhibits localization of the 3d orbitals showing behavior characteristic to zinc. The completely filled and isolated 3d electron shell appears as a false valence band edge in the XPS spectrum. The position of the Cu 3d, and other core levels, is established by oxygen pinning the Cu valence band levels and by the fixed value of the p–d gap characteristic to the tetrahedral copper environment in this spinel.     

Interface effects for metal oxide thin films deposited on another metal oxide I. SnO deposited on SiO2

The growing mode of SnO overlayers deposited on SiO₂ has been studied by ISS and XPS. This study has shown that SnO spreads on the surface of SiO₂. The oxidation state of tin under different experimental conditions of preparation has been characterized by XPS and ELS and a procedure has been found to produce pure SnO. For comparison, SnO has been evaporated on highly oriented pyrolytic graphite (HOPG). In this case, independent of the deposited amount of SnO, XPS and ELS did not show any significant difference in the photoemission and loss features of this material as a function of coverage (i.e. there are no size effects). On the contrary, at low coverages of SnO deposited on SiO₂ XPS showed a shift of 1 eV in the BE of the Sn 3d_5/2 peak another of 1.7 eV in the values of the Auger parameter with respect to the values found for the bulk material. These shifts, very common on deposited metal particles, have been previously reported by us for TiO₂/SiO₂, and are tentatively attributed to t of the interaction of small deposits of SnO with the surface of SiO₂. The characterization by ELS and valence band photoemission of SnO completes the set of results reported in this paper.     

Covalent binding of cyclohexene, 1,3-cyclohexadiene and 1,4-cyclohexadiene on Si(1 1 1)-7 × 7

The adsorption reactions and binding configurations of cyclohexene, 1,3-cyclohexadiene and 1,4-cyclohexadiene on Si(1 1 1)-7 × 7 were studied using high-resolution electron energy loss spectroscopy (HREELS), ultraviolet photoelectron spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and DFT calculation. The covalent attachments of these unsaturated hydrocarbons to Si(1 1 1)-7 × 7 through the formation of Si–C linkages are clearly demonstrated by the observation of the Si–C stretching mode at 450–500 cm⁻¹ in their HREELS spectra. For chemisorbed cyclohexene, the involvement of π_C=C in binding is further supported by the absence of C=C stretching modes and the disappearance of the π_C=C photoemission. The chemisorption of both 1,3-cyclohexadiene and 1,4-cyclohexadiene leads to the formation of cyclohexene-like intermediates through di-σ bonding. The existence of one π_C=C bond in their chemisorbed states is confirmed by the observation of the C=C and (sp²)C---H stretching modes and the UPS and XPS results. DFT calculations show that [4 + 2]-like cycloaddition is thermodynamically preferred for 1,3-cyclohexadiene on Si(1 1 1)-7 × 7, but a [2 + 2]-like reaction mechanism is proposed for the covalent attachment of cyclohexene and 1,4-cyclohexadiene.     

I掺杂金红石TiO$lt;sub$gt;2$lt;/sub$gt;(110)面的第一性原理研究

利用基于密度泛函理论的第一性原理研究了I掺杂金红石TiO₂（110）表面的形成能和电子结构,分析了不同掺杂位置的结构对TiO₂光催化性能的影响. 计算表明,氧化环境下I最容易替代掺杂表面五配位的Ti,而还原环境下最容易替代掺杂表面的桥位氧. I替位Ti或I替位O都能降低禁带宽度,可能使TiO₂吸收带出现红移现象或产生在可见光区的吸收,其中I替位桥位氧的禁带宽度最小. 吸收光谱表明,I掺杂不仅能提高TiO₂可见光响应,同时可增加紫外光的吸收能量,提高其可见光及紫外光下的光催化性能. 关键词： 第一性原理 I掺杂 2(110)')" href="#">金红石相TiO₂(110) 光催化     

The surface structure of the metallic sodium tungsten bronze Na0.667WO3(001)

Scanning tunnelling microscopy has been used to identify a number of surface reconstructions on the (001) surface of the cubic metallic sodium tungsten bronze, Na_0.667WO₃. Which is dominant has been found to depend critically on sample preparation. As well as a reconstruction that bears a striking similarity to that of the parent material, tungsten trioxide, regions of (2×1) periodicity are observed that can only be explained in terms of an Na_yO surface layer. In the current work, we relate the effect of sample preparation on the surface electronic structure of Na_0.667WO₃(001) with that on the atomic structure by comparing photoemission spectra with STM images. Particular interest is focused on band gap defect states in photoemission spectra which, in contrast to similar states in spectra from WO₃, do not appear to correlate with the appearance of localised defects or highly reduced terraces in STM images. The existence of peroxide-like oxygen dimers at the (2×2) reconstructed surface, on the other hand, is characterised by the appearance of identifiable states in the valence band spectrum.     

Magnli相亚氧化钛Ti8O15的电子结构和光学性能的第一性原理研究

采用基于密度泛函理论的平面波超软赝势法研究了Magneli相亚氧化钛Ti8O15的电子结构和光学性能.计算出的能带结构显示Ti₈O₁₅相比锐钛型TiO₂禁带宽度大幅度降低.态密度分析表明,其原因在于Ti₈O₁₅的O原子的2p轨道以及Ti原子的3p,3d轨道相对于TiO₂的相应轨道向左产生了偏移,同时由于O原子的缺失使得Ti原子的3d,3p轨道多余电子在Fermi能级附近聚集形成新的电子能级.态密度分析结果还显示,相对于TiO₂,Ti₈O₁₅Fermi能级附近电子格局发生了如下变化:O原子的2p轨道电子贡献减少,Ti原子的3d轨道的电子对Fermi能级贡献增大.光吸收计算图谱表明,TiO₂仅在紫外光区有较高的光吸收能力,而Ti₈O₁₅由于禁带宽度变窄引起光吸收范围红移到可见光区,从而在紫外光区和可见光区都有较高的光吸收能力,计算结果与实验得到的紫外-可见漫反射吸收光谱结果一致.     

Characterization by electrolyte electroreflectance and X-ray photoelectron spectroscopy of amorphous Ni59Nb40Pt1−xSnx alloys and their activation by HF solutions

The influence of chemical etching with HF on the nature of the surface of amorphous Ni₅₉Nb₄₀Pt_1−xSn_x alloys has been studied in situ by electrolyte electroreflectance (EER) and ex situ by X-ray photoelectron spectroscopy (XPS). The EER spectrum of the untreated alloy in 0.5 M H₂SO₄ shows a bipolar band, which disappears after the HF treatment yielding a structureless EER spectrum similar to that of Pt, but reappears after several hours in the 0.5 M H₂SO₄ electrolyte. This process of dissolution by HF of an oxide species and its reappearance after a few hours cannot be followed by XPS, since the time interval between sample withdrawal from the electrolyte and actual measurement is of a few hours as well. XPS spectra showed the presence of metallic Nb before and after the HF treatment, and that niobium pentoxide was the main species in the as-quenched alloy, but that after treatment with HF it became a minor component, the main one being NbO. The main effect of the HF treatment is to produce a platinum enrichment of the surface, as unequivocally determined by cyclic voltammetry, XPS and EER. After Ar sputtering for 9 min the XPS spectrum of the untreated alloy showed metallic Nb only, while in the HF-treated alloy the peaks of metallic Nb were swamped by those of NbO and some Nb₂O₅. We interpret this difference as being due to the formation by the HF attack of a porous Nb film which becomes oxidized in the electrolyte and/or during transfer to the spectrometer, and so thick that it is not eliminated by Ar sputtering for 9 min.     

Ce和O空位共掺杂TiO_2的电子结构与光学性质

采用基于密度泛函理论加U的计算方法,研究了Ce和O空位单(共)掺杂锐钛矿相TiO_2的电子结构和光吸收性质.计算结果表明,Ce和O空位共掺杂TiO_2的带隙中出现了杂质能级,且带隙窄化为2.67 eV,明显比纯TiO_2和Ce,O空位单掺杂TiO_2的要小,因而可提高TiO_2对可见光的响应能力,使TiO_2的光吸收范围增加.光吸收谱显示,掺杂后TiO_2的光吸收边发生了显著红移;在400.0—677.1 nm的可见光区,共掺杂体系的光吸收强度显著高于纯TiO_2和Ce单掺杂TiO_2,而略低于O空位单掺杂TiO_2.此外,Ce掺杂TiO_2中引入O空位后,TiO_2的导带边从-0.27 eV变化为-0.32 eV,这表明TiO_2的导带边的还原能力得到了加强.计算结果为Ce和O空位共掺杂TiO_2在可见光光解水方面的进一步研究提供了有力的理论依据.     

Single crystal RuO2/Ti and RuO2/TiO2 interface: LEED, Auger and XPS study

The interactions at the evolving RuO₂/titanium interface have been studied by LEED, AES and XPS. Titanium films of up to 5 monolayers were evaporated onto well ordered and ion sputtered ruthenium dioxide crystal surfaces of (110) and (100) orientation. Stabilization of the surface oxygen content under thermal treatment in UHV (up to 600°C) with increasing titanium coverage was established. After extended (up to 4 h) annealing in O₂ at 600°C an epitaxial ordering of TiO₂ on RuO₂(110) was observed. The (1 × 1) LEED patterns from the epitaxial layer exhibit a reduced background level when compared to the RuO₂ substrate itself. These findings are correlated with the XPS data and are interpreted in connection with the disappearance of the defect RuO₂ phase in the surface layer of the RuO₂. The appearance of the (1 × 2) surface reconstruction at the RuO₂(100)/Ti interface is discussed in the context of maximum cation coordination by oxygen atoms.     

Preparation and spectroscopic characterization of γ-Al2O3 thin films

The electronic structure and surface properties of γ-Al₂O₃ thin films are studied. We have prepared the films by oxydizing Al foils under controlled conditions and we characterize the γ-Al₂O₃ samples by means of XPS, UPS, and TEM and found no charging. Pronounced effects in temperature-dependent changes of the work function are observed which result from changes in band bending and electron affinities by reorganisation and migration of defects. Thereby the ability of these systems for prototype studies in catalysis and analysis of defects is demonstrated.