Oxidation kinetics of thin titanium films grown on tungsten

Growth of thin Ti films on (100)W and the kinetics of their oxidation are studied using thermal-desorption spectroscopy and Auger electron spectroscopy. Titanium films grow nearly layer by layer on the (100)W face at room temperature. The activation energy for desorption of Ti atoms decreases from 5.2 eV for coverage θ=0.1 to 4.9 eV in a multilayer film. Oxidation of a thin (θ=6) titanium film starts with dissolution of oxygen atoms in its bulk to the limiting concentration for a given temperature, after which the film oxidizes to TiO, with the TiO₂ oxide starting to grow when exposure of the film to oxygen is prolonged. The thermal desorption of oxides follows zero-order kinetics and is characterized by desorption activation energies of 5.1 (TiO) and 5.9 eV (TiO₂).     

Adsorption of hydrogen and deuterium on potassium-promoted Pd(100) surfaces

The adsorption of H₂ and D₂ has been studied on clean and K-promoted Pd(100) surfaces using thermal desorption, work function changes, ultraviolet photoelectron and Auger spectroscopy. The potassium adlayer significantly lowers the sticking coefficient (from 0.6 to 0.06 at θ_k = 0.2), and the uptake of hydrogen, but increases the desorption energy for H₂ desorption. Calculation showed that each potassium adatom blocks approximately 4–5 adsorption sites for H₂ adsorption. Atomization of hydrogen led to an increase of hydrogen uptake. The adsorption of potassium on the H-covered surface caused a significant decrease in the amount of hydrogen adsorbed on the surface (as indicated by less desorbing hydrogen below 500 K) and promoted the dissolution of H atoms into the bulk of Pd. The dissolved hydrogen was released only above 600–650 K. In the interpetation of the results the extended charge transfer from K-dosed Pd to the adsorbed H atoms and the direct interaction between adsorbed H and K adatoms are taken into account.     

First-principles study of hydrogen adsorption on titanium-decorated single-layer and bilayer graphenes

The adsorption of hydrogen molecules on titanium-decorated （Ti-decorated） single-layer and bilayer graphenes is studied using density functional theory （DFT） with the relativistic effect. Both the local density approximation （LDA） and the generalized gradient approximation （GGA） are used for obtaining the region of the adsorption energy of H2 molecules on Ti-decorated graphene. We find that a graphene layer with titanium （Ti） atoms adsorbed on both sides can store hydrogen up to 9.51 wt% with average adsorption energy in a range from -0.170 eV to 0.518 eV. Based on the adsorption energy criterion, we find that chemisorption is predominant for H2 molecules when the concentration of H2 molecules absorbed is low while physisorption is predominant when the concentration is high. The computation results for the bilayer graphene decorated with Ti atoms show that the lower carbon layer makes no contribution to hydrogen adsorption.     

Electron-stimulated desorption of potassium and cesium atoms from oxidized molybdenum surfaces

The electron-stimulated desorption (ESD) yields and energy distributions for potassium (K) and cesium (Cs) atoms have been measured from K and Cs layers adsorbed at 300 K on oxidized molybdenum surfaces with various degrees of oxidation. The measurements were carried out using a time-of-flight method and surface ionization detector. The ESD appearance threshold for K and Cs atoms is independent of the molybdenum oxidation state and is close to the oxygen 2s level ionization energy of 25 eV. Additional thresholds for both K and Cs atoms are observed at about 40 and 70 eV in ESD from layers adsorbed on an oxygen monolayer-covered molybdenum surface; they are associated with resonance processes involving Mo 4p and 4s excitations. The ESD energy distributions for K and Cs atoms consist of single peaks. The most probable kinetic energy of atoms decreases in going from cesium to potassium and with increasing adsorbed metal concentration; it lies in the energy range around 0.35 eV. The K and Cs atom ESD energy distributions from adlayers on an oxygen monolayer-covered molybdenum surface are extended toward very low kinetic energies. The data can be interpreted by means of the Auger stimulated desorption model, in which neutralization of adsorbed alkali-metal ions occurs after filling of holes created by incident electrons in the O 2s, Mo 4s or Mo 4p levels.     

Europium adsorption on a tungsten surface with various degrees of oxidation

The kinetics of europium adsorption on a W(100) face with various degrees of oxidation were studied by thermal desorption and Auger electron spectroscopy. The spectrum of Eu atoms desorbed thermally from the W(100) face consists of three successively filling desorption phases whose desorption activation energy decreases from 3 to 2.1 eV with an increase in the surface coverage. The thermodesorption spectrum of Eu atoms from the W(100) face coated with a monatomic oxygen film contains five successively forming desorption phases, with the desorption activation energy increasing to 4 eV for the high-temperature phase. The oxidized W is reduced by europium, and the desorption of the W oxides is replaced by that of EuO. After a monolayer film has formed, the Eu film adsorbed on tungsten starts to grow in the form of three-dimensional crystallites. As the degree of W oxidation increases, the Eu film becomes less nonuniform, until a solid Eu film starts to grow on bulk W oxides and completely screens the tungsten Auger signal.     

MgH2(110)表面Pd单原子催化氢脱附反应的第一性原理研究

本文采用第一性原理密度泛函理论计算研究了MgH₂(110)表面吸附单原子Pd后的氢脱附反应. 计算发现,在吸附一个Pd单原子后,MgH₂(110)表面氢脱附反应的能垒可以从1.802 eV显著地降低到1.154 eV,表明Pd单原子对于氢脱附具有很强的催化效应. 并且,Pd单原子催化还可以将氢脱附的温度从573 K显著地降低到了367 K,从而使MgH₂(110)表面的氢脱附反应更加容易和快速地发生. 此外,通过MgH₂(110)表面氢溢出机制的反向过程来讨论了氢脱附反应的微观过程. 该研究表明Pd/MgH₂薄膜在未来的实验中可作为良好的储氢材料.     

Theoretical study of the migration of the hydrogen atom adsorbed on aluminum nanowire

We study the behavior of a hydrogen atom adsorbed on aluminum nanowire based on density functional theory. In this study, we focus on the electronic structure, potential energy surface (PES), and quantum mechanical effects on hydrogen and deuterium atoms. The activation energy of the diffusion of a hydrogen atom to the axis direction is derived as 0.19 eV from PES calculations. The probability density, which is calculated by including quantum effects, is localized on an aluminum top site in both cases of hydrogen and deuterium atoms of the ground state. In addition, some excited states are distributed between aluminum atoms on the surface of the nanowire. The energy difference between the ground state and these excited states are below 0.1 eV, which is much smaller than the activation energy of PES calculations. Thus using these excited states, hydrogen and deuterium atoms may move to the axial direction easily. We also discuss the electronic structure of the nanowire surface using quantum energy density defined by one of the authors.     

Li掺杂对MgH2(001)表面H2分子扩散释放影响的第一性原理研究

本文利用基于密度泛函理论的第一性原理分别研究了MgH₂(001)表面H原子扩散形成H₂分子释放出去的可能路径及金属Li原子掺杂对其影响. 研究结果表明: 干净MgH₂(001)表面第一层释放H原子形成H₂分子有两种可能路径, 其释放能垒分别为2.29和2.50 eV; 当将Li原子替代Mg原子时, 两种H原子扩散释放路径的能垒分别降到了0.31和0.22 eV, 由此表明Li原子掺杂使MgH₂(001)表面H原子扩散形成H₂释放更加容易.     

Electron-stimulated desorption of rare-earth metal atoms

The yield of europium and samarium atoms in electron-stimulated desorption from layers of rare-earth metals (REMs) adsorbed on the surface of oxidized tungsten has been measured as a function of the incident electron energy, surface coverage by REMs, degree of tungsten oxidation, and substrate temperature. The measurements were performed using the time-of-flight method with a surface-ionization-based detector within the substrate temperature interval 140–600 K. The yield studied as a function of electron energy has a resonance character. Overlapping resonance peaks of Sm atoms are observed at electron energies of 34 and 46 eV, and those of Eu atoms, at 36 and 41 eV. These energies correlate well with the REM 5p and 5s core-level excitation energies. The REM yield is a complex function of the REM coverage and substrate temperature. The peaks due to REM atoms are seen at low REM coverages only, and their intensity usually passes through a maximum with increasing coverage and substrate temperature. The concentration dependence of the REM atom yield is affected by the deposition of slow Ba⁺ ions, but only if they are deposited after the REM adsorption. At higher REM coverages, additional peaks are observed at electron energies of 42, 54, and 84 eV, which originate from excitation of the 5p and 5s tungsten levels and result from desorption of SmO and EuO molecules. The temperature dependence of the intensity of these peaks is explained to be due to the order-disorder phase transition. The desorption of REM atoms is the result of their reversed motion through the adsorbed REM layer, and the SmO and EuO molecules desorb due to the formation of an antibonding state between the REM oxide molecules and the tungsten ions.     

Cu(100) (2×22)R45°-O的表面结构与电子态的密度泛函研究

用第一性原理的总能计算研究了Cu(100))面的表面结构、弛豫以及氧原子的(2×22)吸附状 态.计算给出了Cu(100) (2×22)R45°-O吸附表面的结构参数，并得到了上述结构下氧吸附 的Cu(100)表面氧原子和各层Cu原子的电子态密度.计算得到的吸附表面功函数为4.58 eV ，与清洁Cu(100)表面功函数(～4.53 eV)几乎相同.吸附氧原子与最外层铜原子之间的垂直 距离约为0.02 nm，其能带结构体现出一定的金属性，同时由于Cu-O的杂化作用在费米能以 下约6.4 eV附近出现了局域的表面态.可以认为，在Cu(100) (2×22)R45°的氧吸附表面结 构下，吸附氧原子和衬底之间的结合主要来源于表面最外层铜原子与氧原子的相互作用. 关键词： Cu(100)(2×22)R45°-O表面 缺列再构 表面电子态     

The influence of grain boundary on the conductivity of donor doped SrTiO3

The electrical conductivity of polycrystalline Sr(Ti_0.999Nb_0.001)O₃ was investigated. The conductivity was smaller by 1–2 order than that of the single crystal. The conductivity increased with temperature with the activation energy of 0.61 eV. The distribution of grain boundary nature of the polycrystalline sample was determined by Orientation Imaging Microscope (OIM) analysis. The ratio of coincident lattice boundaries was determined to be approximately 20%. The impedance of bicrystals across the grain boundary with different grain boundary type was measured. The grain boundary impedance was found to consist of two RC parallel components in series. The activation energies of them were 0.56–0.71 eV and 1.73–1.97 eV, respectively. These two processes were assigned to the grain boundary or annealed surface layer and the Schottky barrier between the bulk and the surface or the grain boundary layer. A possible conduction mechanism of polycrystalline material was considered that of the three dimensional network of the grain boundary layer.     

Model of β-CO on Mo(100): Dissociative adsorption

Secondary ion production during ion bombardment is analyzed experimentally. Secondary ions consist of bulk ions and surface ions. The former originates in the bulk material and the latter in the adsorbed layer. The most probable kinetic energy of bulk ions is higher by several tens of eV than that of surface ions, In order to perform quantitative bulk analysis the surface ions should be removed from the mass spectrum by making use of the difference between these kinetic energies. Secondary ion measurements indicate that the recoil implantation of an adsorbed element occurs to a significant extent under low ion current density bombardment.     

Mechanism of H2 desorption from monohydride Si(100)2 × 1H

Most recent experimental work on H₂ desorption from the monohydride Si(100) surface seems to point to a pairwise desorption mechanism involving the concerted desorption of two hydrogen atoms on different Si atoms of a single dimer. Using ab initio SCF and CI theory and a cluster model of the surface, the present work finds that the lowest energy pathway is symmetric rather than asymmetric. The desorption energy barrier is calculated to be 3.7 eV. Compared with an experimental value of 2.6 eV, the large barrier suggests that this direct desorption mechanism is not applicable. A multi-step desorption mechanism which involves a delocalized process in the formation of dihydride SiH₂ and a localized desorption of H₂ is proposed and is shown to explain the experimental observations.     

Interaction of NO with a Ni (111) surface

The interaction of NO with a Ni (111) surface was studied by means of LEED, AES, UPS and flash desorption spectroscopy. NO adsorbs with a high sticking probability and may form two ordered structures (c4 × 2 and hexagonal) from (undissociated) NO_ad. The mean adsorption energy is about 25 $\text{kcal}\text{mole}$. Dissociation of adsorbed NO starts already at ?120°C, but the activation energy for this process increases with increasing coverage (and even by the presence of preadsorbed oxygen) up to the value for the activation energy of NO desorption. The recombination of adsorbed nitrogen atoms and desorption of N₂ occurs around 600 °C with an activation energy of about 52 $\text{kcal}\text{mole}$. A chemisorbed oxygen layer converts upon further increase of the oxygen concentration into epitaxial NiO. A mixed layer consisting of N_ad + O_ad (after thermal decomposition of NO) exhibits a complex LEED pattern and can be stripped of adsorbed oxygen by reduction with H₂. This yields an N_ad overlayer exhibiting a 6 × 2 LEED pattern. A series of new maxima at ≈ ?2, ?8.8 and ?14.6 eV is observed in the UV photoelectron spectra from adsorbed NO which are identified with surface states derived from molecular orbitals of free NO. N_ad as well as O_ad causes a peak at ?5.6 eV which is derived from the 2p electrons of the adsorbate. The photoelectron spectrum from NiO agrees closely with a recent theoretical evaluation.     

Properties of ultrathin layers of palladium on a tungsten {110} surface

The growth mode, structure, thermal stability and work function of Pd films up to several monolayers in thickness on a W{110} surface are studied. At room temperature, layer-by-layer growth occurs, at least up to 4 layers. Layers in excess of the first monolayer are metastable and agglomerate at substrate temperatures above 700 K. Pd-W and Pd-Pd interactions within the first layer are investigated with thermal desorption techniques. The binding energy for single Pd atoms to the substrate is 3.6 eV/atom, the energy per lateral bond between nearest Pd atoms is about 0.05–0.12 eV/bond dependent upon range of interaction. These data are based on a phase transition occurring during the desorption of the first layer. The desorption of Pd in excess of the first monolayer is similar to the sublimation of bulk Pd.     

High temperature coadsorption study of zirconium and oxygen on the W(100) crystal face

The coadsorption of zirconium and oxygen on W(100) has been studied by Auger electron spectroscopy, low energy electron diffraction, mass spectroscopy, ion sputtering, and work function measurement techniques. Adsorption of zirconium onto W(100) followed by heating in an oxygen partial pressure produces rapid diffusion of a ZrO complex into the bulk and the formation of a tungsten oxide layer. Heating in vacuum causes desorption of the tungsten oxide and segregation of the ZrO complex to the surface. The activation energy for the ZrO bulk-to-surface diffusion is 30 ± 2 kcal/mole. Upon heating in vacuum at 2000 K the composite surface exhibits predominantly a (1 × 1) LEED structure with a room temperature field emission retarding potential work function of 2.67 ± 0.05 eV. The Richardson work function for this unusually thermally stable surface is 2.56 ± 0.05 eV with a pre-exponential of 6 ± 2. The effects of carbon and nitrogen contamination on this low work function ZrOW composite surface are discussed and a structural model for the surface is presented.     

Temperature and concentration effects in electron-stimulated desorption of sodium atoms from sodium layers adsorbed on tungsten coated with a gold film

The yield and energy distributions of sodium atoms upon electron-stimulated desorption from sodium layers adsorbed on tungsten coated with a gold film are investigated for the first time as functions of the thickness of the gold film, the concentration of deposited sodium, and the surface temperature. It is found that the energy distributions exhibit two peaks, namely, a narrow peak with a maximum at about 0.15 eV, whose intensity continuously increases with increasing temperature, and a broad peak with a maximum at about 0.35 eV, whose intensity either decreases or remains constant with increasing temperature. It is shown that both peaks arise as a result of the same excitation, which gives rise to different channels of electron-stimulated desorption of sodium atoms. Possible mechanisms of electron-stimulated desorption and the kinetics of destruction of the surface coating are discussed.     

Hydrogen dissociation on oxide covered MgH2 by catalytically active vacancies

MgH₂ is an important ingredient in modern reactive hydride composites to be used as hydrogen storage materials. The surface composition and chemical state of ball-milled MgH₂ is studied during hydrogen desorption by means of X-ray photoelectron spectroscopy. Simultaneously, the desorption rate of hydrogen is monitored, which is compared to dissociative properties of the surface investigated by hydrogen-deuterium exchange experiments. It is found that MgH₂ is also oxide covered during desorption demonstrating that MgO is able to recombine atomic hydrogen. The corresponding catalytic sites are associated with low coordinated surface vacancies on the oxide. The maximum surface concentration of these vacancies is very small, which is countered by a very high turnover frequency due to a small activation energy for dissociation of hydrogen of 0.1 eV on the single vacancy. The study provides insight into the catalytic role played by the oxide additives in MgH₂, which are superior catalysts for hydrogen sorption even when compared to 3d-metals.     

Interaction of silver atoms with iridium and with a two-dimensional graphite film on iridium: Adsorption,desorption, and dissolution

The initial stages in the interaction of silver with the (111)Ir surface and with a two-dimensional graphite film (2D GF) on (111)Ir were studied by high-resolution electron Auger spectroscopy in ultrahigh vacuum. The growth mechanisms of silver films and the desorption fluxes of Ag atoms were determined, and their desorption energies estimated. It was found that the Ag desorption fluxes from a 2D GF on Ir and from a thick silver film on the pure metal are similar and considerably (an order of magnitude) smaller than the sublimation fluxes from bulk silver at the same temperatures. The activation energy for desorption from a submonolayer film varies from 3.2 eV for coverage θ=1 to 3.7 eV at θ ～ 0. It was shown that silver atoms do not penetrate into the substrate bulk throughout the temperature range covered (300–1800 K).     

Electron-stimulated cesium atom desorption from the Cs/CsAu/Au/W system

This paper reports on a continuation of the investigation of electron-stimulated Cs-atom desorption from a tungsten surface on which cesium and gold films had been adsorbed at T = 300 K. Earlier studies revealed that Cs atoms start to desorb only after more than one monolayer of gold and more than one monolayer of cesium had been deposited on the tungsten surface. In this case, a coating consisting of a gold adlayer on tungsten, a CsAu compound possessing semiconducting properties, and a cesium monolayer capping CsAu (Cs/CsAu/Au/W) is formed on the tungsten surface at 300 K. The yield of atoms from this system exhibits a resonant dependence on the incident electron energy E _e , with an appearance threshold of 57 eV and a maximum at 64 eV. In this case, Cs atoms desorb in two channels, with one of them involving Cs desorption out of the cesium monolayer, and the other, from the CsAu monolayer. The Cs yield at E _e = 64 eV has been investigated in both desorption channels, with an additional cesium coating deposited on the already formed Cs/CsAu/Au/W layered system, as well as of the effect annealing produces on the yield and energy distributions of Cs atoms. It has been demonstrated that Cs atoms evaporated at 300 K on a layered coating with a cesium monolayer atop the CsAu layer on tungsten capped with a gold adlayer, rather than reflected from the cesium monolayer or adsorbing on it, penetrate through the cesium monolayer into the bulk of CsAu even with one CsAu layer present. The desorption yield does not vary with increasing cesium concentration at 300 K, but falls off gradually at 160 K. Annealing within the temperature range 320 K ≤ T _H ≤ 400 K destroys the cesium monolayer and the one-layer CsAu coating, but the multilayer CsAu compound does not break up in this temperature range even after evaporation of the cesium monolayer. It is shown that Cs atoms escape from the multilayer CsAu compound primarily out of the top CsAu layer.