Luminescence investigations of the GaP-based dilute nitride Ga(NAsP) material system

Multi-quantum well heterostructures (MQWHs) of the novel Ga(NAsP)/GaP material system have been grown, pseudomorphically strained to GaP-substrate. The crystalline perfection is verified by transmission electron microscopy (TEM). For As-concentrations in excess of about 70%, a direct band structure and adequate luminescence efficiency for laser device application is observed. Temperature-dependent photoluminescence (PL) investigations show the influence of carrier localisation and non-radiative recombination processes typical for dilute nitride materials. With rising N content in the active material, the emission wavelength shifts towards longer wavelength, leading to Ga(NAs)/GaP MQW structures with photon energies below the indirect band gap of silicon (Si). At the same time the luminescence intensity drops due to an increase in non-radiative carrier traps and/or structural degradation.     

Coexistence of type-I and type-II band alignment in Ga(Sb,P)/GaP heterostructures with pseudomorphic self-assembled quantum dots

Band alignment of heterostructures with pseudomorphic GaSb_{1 ? x} P _x /GaP self-assembled quantum dots (SAQDs) lying on a wetting layer was studied. Coexistence of type-I and type-II band alignment was found within the same heterostructure. Wetting layer has band alignment of type-I with the lowest electronic state belonging to the X _XY valley of GaSb_{1 ? x} P _x conduction band, in contrast to SAQDs, which have band alignment of type-II, independently of the ternary alloy composition x. It is shown that type-I-type-II transition is a result of GaP matrix deformation around the SAQD.     

GS-MBE生长的GaP/Si的XPS研究

利用X射线光电子能谱(XPS)深度剖析方法对气体源分子束外延(GS-MBE)生长的GaP/Si异质结构进行了详细的分析.其结果表明:(1)外延层内Ga、P光电子峰与GaP相相符,且组份分布均匀,为正化学比GaP.(2)在不同富PH₃流量条件下生长的样品,其表面富P量稍有不同,而GaP外延层内的测试结果相同.界面也未见有P的富集.(3)XPS剖析至GaP/Si界面附近,随外延层界面向衬底过渡,Si2p光电子峰向高结合能方向移动,且其结合能高于原衬底p型Si,接近于n型Si.但Ga、P光电子峰未发现有明显能移.(4)在XPS检测限内,外延层内和界面都未见有C、O等沾污.这一研究表明:无污染的本底超高真空、相对过剩的富₃生长环境、成功的Si衬底清洗方法等措施保证了GS-MBE生长出正化学比GaP/Si外延异质结构.     

Optoelectronic properties of Ni–GaP diodes with a modified surface

We report the promising results for Ni–GaP Schottky diode structures manufactured on the substrates with chemically-etched nano-scale surface formations that are responsible for a clearly marked luminescence band located at the energy exceeding the band gap of the bulk GaP. The other peculiarity produced by surface patterning concerns a remarkable redshift of material's optical absorption edge. At the room temperature, the height of potential barrier for Ni–GaP structure is 1.8 eV, with the monochromatic sensitivity peaking at 0.35 A/W. The comparative study of diode performance under different light sources exhibited the pronounced linear photocurrent-illumination dependence for about five orders of illumination magnitude, evidencing good optical and electrical quality of Ni–GaP diodes with surface-modified semiconductor substrate.     

Non-linear photo-induced desorption of GaP

Laser-induced desorption of P from GaP at various photon energies near the absorption edge has been measured. The desorption yield is found to start increasing above a certain threshold laser fluence, of which the dependence on the photon energy exhibits a sharp dip near the indirect band gap besides a gradually decreasing component from the indirect band gap to the direct band gap energy. The sharp dip is ascribed to desorption induced by dense excitation of the surface states.     

Camel's back structure of the conduction band in GaP

A simple k · p theory based on Si and the ionic X gap is applied to the conduction band of GaP. It is found that recent evidence may indicate a location of the absolute minima away from the zone boundary. In the directions parallel to 〈100〉, the band structure is highly nonparabolic for carrier energies in the range 1–50 meV.     

Temperature-dependent photoluminescence spectra of GaN epitaxial layer grown on Si(111) substrate

In this paper, the temperature-dependent photoluminescence(PL) properties of Ga N grown on Si(111) substrate are studied. The main emission peaks of Ga N films grown on Si(111) are investigated and compared with those grown on sapphire substrates. The positions of free and bound exciton luminescence peaks, i.e., FX A and D0 X peaks, of Ga N films grown on Si(111) substrates undergo red shifts compared with those grown on sapphire. This is attributed to the fact that the Ga N films grown on sapphire are under the action of compressive stress, while those grown on Si(111) substrate are subjected to tensile stress. Furthermore, the positions of these peaks may be additionally shifted due to different stress conditions in the real sample growth. The emission peaks due to stacking faults are found in Ga N films grown on Si(111) and an S-shaped temperature dependence of PL spectra can be observed, owing to the influence of the quantum well(QW) emission by the localized states near the conduction band gap edge and the temperature-dependent distribution of the photo-generated carriers.     

Electrical properties of p-type GaP schottky barrier under stress

The effect of stress on a Schottky barrier height at a metal-semiconductor interface is investigated for metal-p-type GaP contacts. The diodes are fabricated by evaporating metals (Ag, Au) on polar (111)Ga and (1̄1̄1̄)P surfaces. Stress is applied to the diodes by bending the crystal wafers attached to the cantilever. The variation of the barrier height with stress is determined from the measurements of the current-voltage characteristics under stress. The barrier height decreases under compressive stress parallel to the interface and increases under tensile stress. The change in barrier height on the (111)Ga surface is greater than that on the (1̄1̄1̄)P surface. These experimental results are discussed from the point of both the piezoelectricity and the change in band gap caused by stress.     

Specific features of the effect of annealing on the transmission spectra of GaP:N light-emitting diodes

The effect of annealing in a hydrogen atmosphere on the transmission spectra of GaP:N light-emitting diodes at temperatures of 550, 570, and 590 °C has been investigated. Temperature-induced rearrangement of defects has been observed. The band gap of the material studied is determined. The dependence of the transmission and difference transmission spectra on the annealing temperature and the effect of annealing on the electroluminescence spectra are shown.     

Energy levels in doped SiGe quantum well studied by admittance spectroscopy

SiGe/Si quantum wells (QWs) with different Boron doping concentrations were grown by molecular beam epitaxy (MBE) on p-type Si(1 0 0) substrate. The activation energies of the heavily holes in ground states of QWs, which correspond to the energy differences between the heavy hole ground states and Si valence band, were measured by admittance spectroscopy. It is found that the activation energy in a heavily doped QW increases with doping concentration, which can be understood by the band alignment changes due to the doping in the QWs. Also, it is found that the activation energy in a QW with a doping concentration of 2 × 10²⁰ cm⁻³ becomes larger after annealing at a temperature of 685 °C, which is attributed to more Boron atoms activation in the QW by annealing.     

分子束外延生长Si/GaP(111)异质结的界面特性

本文研究了分子束外延(MBE)生长的n-N型Si/GaP(111)异质结的界面特性。采用C-V法测量Si/GaP(111)异质结的表观载流子浓度分布n(x),从中导出了异质界面的导带失配值和界面电荷密度。实验结果表明,n-N型Si/GaP(111)是一种弱整流结构。导带失配△E_c=0.10eV,界面电荷密度σ_i=8.8×10¹⁰cm^-2。通过表现载流子浓度n(x)的理论计算曲线与实验曲线符合较好,说明了实验结果的可靠性 关键词：     

Electronic structure and optical gain of InAsPN/GaP(N) quantum dots

The electronic structure and optical gain of InAsPN/GaP(N) quantum dots (QDs) are investigated in the framework of the effective-mass envelope function theory. The strain distribution is calculated using the valence force field (VFF) method. With GaP barrier, for smaller InAsPN QDs, the minimum transition energy may occur at a lower phosphorous (P) composition, but for larger QDs, the transition energy increases as P composition increases due to the increased bandgap of alloy QDs. When the nitrogen (N) composition increases, the transition energy decreases due to the stronger repulsion between the conduction band (CB) and the N resonant band, and the transition matrix element (TME) is more affected by the transition energy rather than N–CB mixing. To obtain laser materials with a lattice constant comparable to Si, we incorporated 2% of N into the GaP barrier. With this GaP_0.98N_0.02 barrier, the conduction band offset is reduced, so the quantum confinement is lower, resulting in a smaller transition energy and longer wavelength. At the same time, the TME is reduced and the optical gain is less than those without N in the barrier at a low carrier density, but the peak gain increases faster when the carrier density increases. Finally it can surpass and reach a greater saturation optical gain than those without N in the barrier. This shows that incorporating N into GaP barriers is an effective way to achieve desirable wavelength and optical gain.     

Effective barriers induced by confined carriers in space charge spectroscopy of Si/Ge quantum wells

Results are presented concerning the characterization of p-Si/Si_1-xGe_x/Si quantum wells (QW) by space charge spectroscopy. Analysis of potential barriers at the QW enables us to determine the valence band offset from such measurements. Admittance spectroscopy data of QWs with 30 nm undoped spacers, acceptor concentration N_A of about 10¹⁷cm^-3 in the cap and buffer layers, x=0.25 and a QW thickness in the range from 1 to 5 nm are in fair agreement with the proposed theoretical model. A decrease of the effective potential barriers due to hole tunneling via shallow acceptor states in the barrier is experimentally confirmed for 5 nm QW structures without spacers.     

用赝势微扰法计算某些半导体的能带结构(用于GaAs,GaP和Ga[As1-xPx]合金)

用赝势微扰法计算了GaAs,GaP和Ga[As_1-xP_x]合金的能带。赝势选择的原则是使计算所得直接能隙和间接能隙与实验值相符合。计算结果表明,不但能带次序准确,而且与室温下的实验值符合得很好。基于由GaAs到GaP晶格常数和赝势是线性变化的假设,计算了GaP含量为20％,50％和80％时Ga[As_1-xP_x]合金的能带。当GaP含量为41％时,直接能隙和间接能隙相等,这一数值刚好是Spitzer和Fenner的实验值的平均值。此时,由于很好满足光激射器p-n结所要求的条件,因此可望在光激射器中得到应用,它们的能带也就有一定的参考价值。     

Effect of Quantum Well Width Reduction for GaInNAs/GaAs Lasers

We investigated the function of the quantum well (QW) width for laser characteristics especially for reduction of the well width. We pointed out that such reduction has almost no influence on the optical gain or the carrier overflow for a large conduction band offset system, such as GaInNAs QWs. A thin QW is advantageous for suppression of the carrier overflow to the higher quantized energy levels which results in good temperature and gain characteristics. Thin GaInNAs QWs is a good candidate for an active layer structure of the lasers utilized in the next optical communication systems.     

A trend in the energy distributions of Ga dangling-orbital surface states on GaP,GaAs and GaSb (110)

Relaxed (110) surfaces of GaP, GaAs, and GaSb are studied by cluster calculations. Strongly localized surface states near the band gap are presented. It is shown that Ga dangling-orbital surface states can occur within the band gap as a result of a strong decrease in the anti-bonding character of surface Ga orbitals. A trend in the bond length on going from GaSb to GaP explains experimental data. Surface states associated with the group-V atoms are also described.     

二维MoSi2N4WSe2异质结的第一性原理研究

实验上新合成的MoSi2N4（MSN）由于其独特的七原子层结构和电子特性引起了人们的广泛关注。本文搭建了一种由二维MSN与二维WSe2（WS）垂直堆垛而成的二维MSN/WS异质结,其表现出直接间隙半导体和I型能带排列的特性,具有1.46 eV的带隙。在异质结界面处存在一个由电荷耗尽层MSN指向电荷积累层WS微弱的内建电场。最后,通过施加双轴应变对二维MSN/WS异质结进行调控。发现在正双轴应变的作用下,MSN/WS异质结保持了原来直接带隙半导体和I型能带排列特性;在负双轴应变作用下,MSN/WS异质结由原来的直接带隙半导体转变为间接带隙半导体,当施加的负双轴应变达到-6%与-8%时,I型能带排列转变为Ⅱ型能带排列。     

Some optical properties of (ZnS)−(GaP) alloys and their interpretation

Optical measurements on the single crystals of the pseudobinary (ZnS)?(GaP) alloy were carried out. The band gap energy decreased more rapidly with increase in GaP concentration than that reported previously. The analysis of the absorption spectra for the crystals of up to 70 mole % GaP indicated a direct transition characteristic, and that the band gap becomes nearly equal to that of pure GaP at about 30 mole % GaP. The photoluminescence spectra observed at liquid nitrogen temperature could first be resolved into three kinds of emission band with Gaussian distribution. The peak energy of these bands were found to be independent of the band gap variation. Thus the observed peak energy shift with alloy composition was attributed to the variation of the emission intensity of each band. The band gap shrinkage and the origin of the photoluminescence spectra on the basis of a molecular orbital method were discussed.     

用光电子能谱研究 Si/GaP(Ⅲ)异质界面的价带不连续性

介绍在改装的ADES-400型光电子能谱仪上,用Si电子束蒸发的方法生长Si/GaP(Ⅲ)界面的过程,并用光电子能谱原位地分析测量不同条件下生长的Si/GaP(Ⅲ)异质界面的形成状况和价带不连续值△E_v。讨论了△E_v与界面状况和原子能级变化的相互关系,确定了生长有序的突变Si/GaP(Ⅲ)异质界面的条件,得到此时界面的价带不连续值为0.80eV。它与理论计算值基本一致。 关键词：     

Theoretical analysis of semi/non-polar In GaN/GaN light-emitting diodes grown on silicon substrates

A theoretical study of polar and semi/non-polar In Ga N/Ga N light-emitting diodes(LEDs) with different internal surface polarization charges, which can be grown on Si substrates, is conducted by using APSYS software. In comparison with polar structure LEDs, the semi-polar structure exhibits a higher concentration of electrons and holes and radiative recombination rate, and its reduced built-in polarization field weakens the extent of band bending which causes the shift of peak emission wavelength. So the efficiency droop of semi-polar In Ga N/Ga N LEDs declines obviously and the optical power is significantly improved. In comparison with non-polar structure LEDs, although the concentration of holes and electrons as well as the radiative recombination rate of the semi-polar structure are better in the last two quantum wells(QWs) approaching the p-Ga N side, the uniformity of distribution of carriers and radiative recombination rate for the nonpolar structure is better. So the theoretical analysis indicates that the removal of the internal polarization field in the MQWs active regions for non-polar structure LEDs contributes to the uniform distribution of electrons and holes, and decreases the electron leakage. Thus it enhances the radiative recombination rate, and further improves the IQEs and optical powers, and shows the best photoelectric properties among these three structures.