Asymmetric surface modification of poly(ethylene terephthalate) film by CF4 plasma immersion

Poly(ethylene terephthalate) (PET) films were treated with CF₄ plasma immersion. The samples were processed at different RF powers and treatment time. The surface modification of PET films was evaluated by water contact angle (CA), X-ray photoelectron spectroscopy (XPS) and atomic force microscope (AFM). Decrease in contact angle of both sides of PET films was observed under mild treatment conditions. However, as raising treatment power and/or time, the change in contact angle between the two sides of PET films was different. The relatively hydrophobic and hydrophilic surfaces were being in situ formed on the two sides of PET films, respectively. And the extreme values of water contact angle reached 108.63 and 7.56°, respectively. XPS analyses revealed that there was a substantial incorporation of fluorine and/or oxygen atoms in both side surfaces. The relative chemical composition of the C (ls) spectra's showed the incorporation of non-polar fluorine-based functionalities (i.e. CFCF_n, CF₂ or CF₃ groups) and polar oxygen-based functionalities (i.e. COOH or OH groups) in the surfaces. Correlation between the plasma parameters and the surface modification of PET films is also discussed.     

Preparation of visible-light responsive PF-codoped TiO2 nanotubes

Fabrication of PF-codoped TiO₂ nanotubes was carried out using a one-step electrochemical anodization process by tailoring the composition of the electrolyte with the aim of PF-codoping to extend the optical absorption of TiO₂ to the visible-light region. The as-prepared PF-codoped TiO₂ nanotubes were characterized by SEM, XPS, and UV-vis diffuse reflectance absorption spectra (DRS). The results showed that the tube diameter of the nanotubes was approximately 100 nm and the tube length was approximately 510 nm. The phosphorus and fluorine were successfully doped into TiO₂ nanotubes, as evidenced by XPS. Moreover, the PF-codoped samples displayed remarkably strong visible-light response.     

Pre-treatments applied to oxidized aluminum surfaces to modify the interfacial bonding with bis-1,2-(triethoxysilyl)ethane (BTSE): Part I. High-purity Al with native oxide

A remote microwave-generated H₂ plasma and heating to 250 °C were separately used to modify high-purity oxidized aluminum surfaces and to assess whether these treatments can help enhance adhesion with bis-1,2-(triethoxysilyl)ethane (BTSE) coatings. Different initial oxide surfaces were considered, corresponding to the native oxide and to surfaces formed by the Forest Products Laboratory (FPL) treatment applied for either 15 or 60 min. BTSE is applied from solution at pH 4, and competing processes of etching, protonation (to form OH groups) and coupling (to form AlOSi interfacial bonds) occur at the solid-liquid interface. Scanning electron microscopy (SEM) was used to determine how the topographies of the modified Al surfaces changed with the different pre-treatments and with exposure to a buffer solution of pH 4. Secondary-ion mass spectrometry (SIMS) was used to determine the direct amount of AlOSi interfacial bonds by measuring the ratio of peak intensities 71-70 amu, while X-ray photoelectron spectroscopy (XPS) was used to determine the overall strength of the silane coating adhesion by measuring the Si 2p signals before and after application of an ultrasonic rinse to the coated sample. Measured Al 2p and O 1s spectra helped assess how the different pre-treatments modified the various Al oxidized surfaces prior to BTSE coating. Pre-treated samples that showed increased AlOSi bonding after BTSE coating corresponded to surfaces, which did not show evidence of significant etching after exposure to a pH 4 environment. This suggests that such surfaces are more receptive to the coupling reaction during exposure to the BTSE coating solution. These surfaces include all H₂ plasma-treated samples, the heated native oxide and the sample that only received the 15 min FPL treatment. In contrast, other surfaces that show evidence of etching in pH 4 environments are samples that received lower amounts of AlOSi interfacial bonding. Overall, heating improved the BTSE adhesive bonding for the native Al oxide, while H₂ plasma treatment improved the BTSE bonding for surfaces that had initially been FPL-treated for 15 and 60 min.     

Influence of thermal treatment of low dielectric constant SiOC(H) films using MTES/O2 deposited by PECVD

Low dielectric constant SiOC(H) films are deposited on p-type Si(100) substrates by plasma enhanced chemical vapor deposition (PECVD) using methyltriethoxysilane (MTES, C₇H₁₈O₃Si) and oxygen gas as precursors. The SiOC(H) films are deposited at room temperature, 100, 200, 300 and 400 °C and then annealed at 100, 200, 300 and 400 °C temperatures for 30 min in vacuum. The influence of deposition temperature and annealing on SiOC(H) films are investigated. Film thickness and refractive index are measured by field emission scanning electron microscopy and ellipsometry, respectively. Chemical bonding characteristics of as-deposited and annealed films are investigated by Fourier transform infrared (FTIR) spectroscopy in the absorbance mode. As more carbon atoms are incorporated into the SiOC(H) films, both film density and refractive index are decreased due to nano pore structure of the film. In the SiOC(H) film, CH₃ group as an end group is introduced into OSiO network, thereby reducing the density to decrease the dielectric constant thereof. The dielectric constant of SiOC(H) film is evaluated by C-V measurements using metal-insulator-semiconductor (MIS), Al/SiOC(H)/p-Si structure and it is found to be as low as 2.2 for annealed samples deposited at 400 °C.     

Effect of oxidation on the optical and surface properties of AlGaN

The chemical properties of Al_xGa_1−xN surfaces exposed to air for different time periods are investigated by atomic force microscopy (AFM), photoluminescence (PL) measurement and X-ray photoelectron spectroscopy (XPS). PL and AFM results show that Al_xGa_1−xN samples exhibit different surface characteristics for different air-exposure times and Al contents. The XPS spectra of the Al 2p and Ga 2p core levels indicate that the peaks shifted slightly, from an AlN to an AlO bond and from a GaN to a GaO bond. All of these results show that the epilayer surface contains a large amount of Ga and Al oxides.     

XPS analysis of down stream plasma treated wool: Influence of the nature of the gas on the surface modification of wool

A microwave plasma treatment in a down stream configuration was used to modify the natural hydrophobocity of untreated wool fibers. This property is a consequence of the presence of a Fatty acid monolayer (F-layer) on the outermost part of the fiber surface. The wool fibers treated with plasma were analyzed by means of X-ray photoelectron spectroscopy (XPS) without previous exposure to the air. Experiments have been carried out with air, water vapor, oxygen and nitrogen as plasma gas. The “in situ” analysis of the treated samples has permitted to differentiate between the plasma effects and those other linked to the exposure of the fibers to the air after their treatment. The results have evidenced the effects induced by the different active species generated by plasma from the different components of the air. In general, the intensity of CC peaks decreases and that of the CO, CO and OCO increases when using a gas containing oxygen species. Simultaneously, the intensity of the SS groups decreases and that of the sulphonate (SO₃⁻) increases. Other changes are also detected in the intensity of the N 1s level. The extent and characteristics of the oxidation and functionalisation of the hydrocarbon chains of the F-layer depend on the nature of gas. Thus, whereas treatments with plasmas of air and water vapor strongly affect the hydrocarbon chains of the F-layer, oxygen is less effective in the oxidation process. It has been also noted that the active species formed in the nitrogen plasma do not induce any significant change in the surface composition of the wool fibers.     

Low temperature catalytic performance of nanosized TiNiO for oxidative dehydrogenation of propane to propene

Nanosized TiNiO catalysts prepared by a modified sol-gel method have been investigated in the oxidative dehydrogenation of propane (ODP) to propene. At 300 °C the yield to propene of 12.1% was obtained on 9.1 wt.% TiNiO catalyst with the selectivity of 43%. The continued variety of lattice parameter and variation of chemical value of nickel and titanium ion on the surface indicates that there are strong interactions of TiO₂ and NiO. The decreased low temperature oxygen desorption and the weaker reducibility seems to be responsible for the decreased activity and enhanced selectivity of propane oxidative dehydrogenation over TiNiO catalysts.     

Structural study of thin films prepared from tungstate glass matrix by Raman and X-ray absorption spectroscopy

Thin films were prepared using glass precursors obtained in the ternary system NaPO₃BaF₂WO₃ and the binary system NaPO₃WO₃ with high concentrations of WO₃ (above 40% molar). Vitreous samples have been used as a target to prepare thin films. Such films were deposited using the electron beam evaporation method onto soda-lime glass substrates. Several structural characterizations were performed by Raman spectroscopy and X-ray Absorption Near Edge Spectroscopy (XANES) at the tungsten L_I and L_III absorption edges. XANES investigations showed that tungsten atoms are only sixfold coordinated (octahedral WO₆) and that these films are free of tungstate tetrahedral units (WO₄). In addition, Raman spectroscopy allowed identifying a break in the linear phosphate chains as the amount of WO₃ increases and the formation of POW bonds in the films network indicating the intermediary behavior of WO₆ octahedra in the film network. Based on XANES data, we suggested a new attribution of several Raman absorption bands which allowed identifying the presence of WO⁻ and WO terminal bonds and a progressive apparition of WOW bridging bonds for the most WO₃ concentrated samples (above 40% molar) attributed to the formation of WO₆ clusters.     

Modification of H-terminated Ge surface in hydrochloric acid

Various amounts of H-termination on a Ge surface were prepared by dipping a Ge wafer in differentially diluted hydrofluoric acid solutions for different periods of time. Formation of GeH_x in hydrofluoric acid and its disappearance in hydrochloric acid (HCl) were directly measured by using multiple internal reflection Fourier transform infrared spectroscopy (MIR FT-IR). Peak intensity of GeH_x vibration mode was increased with diluted hydrofluoric acid (DHF) treatment time and the concentration of HF solution. Therefore, it is suggested that microroughness of a Ge surface changes depending on the concentration of HF. Peak intensity of GeH_x vibration mode was reduced when the GeH_x surface was treated in HCl solution. With an increase in HCl treatment time, peak intensity of GeH_x vibration mode was reduced. Ge surfaces treated in a more diluted HF solution were barely modified, because it was thought to have fewer kink sites, dihydrides and trihydrides.     

Modification of wetting properties of CR39 by plasma source ion implantation

Plasma source ion implantation (PSII), a hybrid implantation technique between ion beams and immersion plasmas has been used to modify CR39 surfaces for improved wettability providing both advancing (θ_a) and receding (θ_r) contact angles below 5°. The modifications brought to the polymer surface structure have been characterized by X-ray photoelectron spectroscopy (XPS) and its combination with chemical derivatization (CD-XPS). Oxygen desorption has been observed in spite of the very hydrophilic surfaces. C_1s XPS peak has been displaced toward greater energies, while the opposite has been found for O_1s, both involving new components and strong modifications after ion implantation treatment. Strong evidences about the formation of new chemical functions, like OOH, COOH and CC, have been found and have provided an explanation for the increased wettability.     

X-ray photoelectron spectroscopy study of cubic boron nitride single crystals grown under high pressure and high temperature

The defects, impurities and their bonding states of unintentionally doped cubic boron nitride (cBN) single crystals were investigated by X-ray photoelectron spectroscopy (XPS). The results indicate that nitrogen vacancy (V_N) is the main native defect of the cBN crystals since the atomic ratio of B:N is always larger than 1 before Ar ion sputtering. After sputter cleaning, around 6 at% carbon, which probably comes from the growth chamber, remains in the samples as the main impurity. Carbon can substitute nitrogen lattice site and form the bonding states of CBN or CB, which can be verified by the XPS spectra of C1s, B1s and N1s. The C impurity (acceptor) and N vacancy (donor) can compose the donor-acceptor complex to affect the electrical and optical properties of cBN crystals.     

Effect of CCC bond bending vibration on the photodissociation of cyclobutane

The effect of CCC bond bending on the photodissociation of cyclobutane to form two ethylene molecules was investigated by performing semiclassical electron-radiation-ion dynamics simulations and also by examining the potential energy surfaces of the electronic ground state and lowest excited states. These potential energy surfaces, calculated at the CASSCF/MRPT2 level with 6-31G* basis sets along a reaction path determined by the semiclassical dynamics simulations, show well-defined energy minima and maxima in the intermediate state region. It is found that in addition to rotation of the molecule around the central CC bond, CCC bond bending plays an important role in determining the features of the potential energy surfaces for the intermediate species.     

Improvement of photoluminescence properties of porous silicon by silica passivation

Porous silicon (PS) was passivated by silica film using a sol-gel method; the photoluminescence (PL) properties were significantly improved; namely, PL intensity and stability increased and PL peak shifted to shorter wavelength. Scanning electron microscope (SEM) and Fourier transformed infrared spectroscope (FTIR) results indicated that silica passivation produced a compact film on the PS surface and modified the surface state of PS. The number of stable surface bonds (HSiO₃, HSiSiO₂ and H₂SiO₂) increased due to the oxidation of SiH back-bonds during the gelation process, and thus the PL intensity and stability were improved. Moreover, the blue-shift of PL peak was determined due to the increase in the ratio of SiO/SiH.     

Interaction of amines with native aluminium oxide layers in non-aqueous environment: Application to the understanding of the formation of epoxy-amine/metal interphases

Interaction of propylamine (PA), 1,2-diaminoethane (DAE) or 3-aminomethyl-3,5,5-trimethylcyclohexylamine (isophorone diamine, IPDA) with native aluminium oxide layers in non-aqueous environment has been studied using time-resolved inductively coupled plasma optical emission spectroscopy (ICP-OES) and X-ray photoelectron spectroscopy (XPS). The formation of several surface complexes has been evidenced. Monodentate and bidentate metal-bond surface complexes (MBSC) result from interactions between the amine terminations of the molecule and aluminium cations by donation of the N lone electron pair to the metal ion (Lewis-like mechanism leading to OAl?N bonds). Monodentate and bidentate hydrogen-bond surface complexes (HBSC) are due to interaction of the amino group with surface hydroxyl groups by protonation of the amine termination (Brønsted-like mechanism leading to the formation of AlOH?N bonds) or interaction with carbonaceous contamination (C_xO_yH_z?N bonds). Diamines can also form mixed complexes with one amino group forming an O-Al?N bond and the other group forming an AlOH…N or C_xO_yH_z?N bond. AlOH?N and C_xO_yH_z…N bonds are less stable under vacuum than OAl?N bonds, leading to partial desorption of the DAE molecules in vacuum and modification of the interaction modes. Only DAE and IPDA can lead to partial dissolution of the aluminium native (hydr)oxide films. A detailed mechanism of dissolution has been proposed based on the formation of mononuclear bidentate (chelate) MBSC by ligand exchange between the terminal η¹-OH and bridged μ₂-OH surface sites and the amino terminations of the molecule. The detachment of this complex from the surface is likely to be the precursor step to the formation of the interphase in epoxy-amine/metal systems.     

Chemical reaction of sputtered Cu film with PI modified by low energy reactive atomic beam

Polyimide (PMDA-ODA) surface was irradiated by low energy reactive atomic beam with energy 160-180 eV to enhance the adhesion with metal Cu film. O₂⁺ and N₂⁺ ions were irradiated at the fluence from 5 × 10¹⁵ to 1 × 10¹⁸ cm⁻². Wetting angle 78° of distilled deionized (DI) water for bare PI was greatly reduced down to 2-4° after critical ion flounce, and the surface energy was increased from 37 to 81.2 erg/cm. From the analysis of O 1s core-level XPS spectra, such improvement seemed to result from the increment of hydrophilic carbonyl oxygen content on modified PI surface. To see more carefully correlation of the peel strength with interfacial reaction between Cu and PI, flexible copper clad laminate with Cu (9 μm)/Cu (200 nm) on modified PI substrate (25 μm) was fabricated by successive sputtering and electroplating. Firstly, peel strength was measured by using t-test and it was largely increased from 0.2 to 0.5 kgf/cm for Ar⁺ only irradiated PI to 0.72-0.8 kgf/cm for O₂⁺ or N₂O⁺ irradiated PI. Chemical reaction at the interface was reasoned by analyzing C 1s, O 1s, N 1s, and Cu 2p core-level X-ray photoelectron spectroscopy over the as-cleaved Cu-side and PI side surface through depth profiling. From the C 1s spectra of cleaved Cu-side, by the electron transfer from Cu to carbonyl oxygen, carbonyl carbon atom became less positive and as a result shifted to lower binding energy not reaching the binding energy of C₂ and C₃. The binding energy shift of the peak C₄ as small as 1.7 eV indicates that carbonyl oxygen atoms were not completely broken. From the analysis of the O 1s spectra, it was found that new peak at 530.5 eV (O₃) was occurred and the increased area of the peak O₃ was almost the same with reduced area of the peak carbonyl oxygen peak O₁. Since there was no change in the relative intensity of ether oxygen (O₂) to carbonyl oxygen (O₁), and thus O₃ was believed to result from Cu oxide formation via a local bonding of Cu with carbonyl oxygen atoms. Moreover, from X-ray induced Auger emission spectra Cu LMM which was very sensitive to chemical bonding, Cu oxide or CuOC complex formation instead of CuNO complex was clearly identified by the observation of the peak at 570 eV at higher 2 eV than that of metal Cu. In conclusion, when Cu atoms were sputtered on modified PI by low energy ion beam irradiation, it can be suggested that two Cu atoms locally reacted with carbonyl oxygen in PMDA units and formed Cu⁺O⁻C complex linkage without being broken from carbon atoms and thus the chemically bound Cu was in the form of Cu₂O.     

Adsorption structure of phenylphosphonic acid on an alumina surface

The adsorption structure of phenylphosphonic acid (PPOA) on an alumina surface was investigated as a function of exposure and temperature using infrared reflected absorption spectroscopy (IRAS) and a Kelvin probe. The alumina surface was held at room temperature during deposition. At monolayer adsorption, PO and Phenyl-P bands are observed, which indicate the creation of POAl bonds. The aromatic ring plane is positioned perpendicular to the surface, i.e. deprotonated PPOA stands vertically on the surface. At multilayer adsorption, PO and POH bands appear in the spectra. The multilayer PPOA film starts to desorb at 400 K. From 400 to 700 K, the IRAS spectra are similar to the monolayer spectrum, indicating that the multilayer structure reverses to the monolayer-like PPOA adlayer by heating. The acid molecules start to desorb at 700 K.     

Improvement and mechanism of interfacial adhesion in PBO fiber/bismaleimide composite by oxygen plasma treatment

The improved interfacial adhesion of PBO fiber-reinforced bismaleimide composite by oxygen plasma processing was investigated in this paper. After treatment, the maximum value of interlaminar shear strength was 57.5 MPa, with an increase of 28.9%. The oxygen concentration of the fiber surface increased, as did the surface roughness, resulting in improvement of the surface wettability. The cleavage and rearrangement of surface bonds created new functional groups OCO, NCO and NO, thereby activating the fiber surface. And long-time treatment increased the reaction degree of surface groups while destroyed the newly-created physical structures. The enhancement of adhesion relied primarily on the strengthening of chemical bonding and mechanical interlocking between the fiber and the matrix. The composite rupture planes indicated that the fracture failure shifted from the interface to the matrix or the fiber.     

The surface modification of nanoporous SiOx thin films with a monofunctional organosilane

The surfaces of nanostructured, porous SiO_x/Si (air-oxidized Si) and SiO_x thin films, deposited by excimer laser ablation in He and He + O₂ gas ambients, respectively, have been modified by the deposition of a monofunctional organosilane. They were characterized using photoacoustic Fourier-transform infrared (FTIR) X-ray photoelectron (XPS) spectroscopies, and field-emission scanning electron microscopy (FESEM). Photoacoustic FTIR analysis indicates that the organosilane has hydrolyzed to form a silanol, which has chemically reacted with SiO_x through its surface silanol (SiOH) group, to form siloxane (SiOSi) structures. An enhanced IR spectral signal is found, due to the expansion and contraction of both the pores of the solid and the gas within them.     

An XPS study of pulsed plasma polymerised allyl alcohol film growth on polyurethane

The growth of highly functionalised poly allyl alcohol films by pulsed plasma polymerisation of CH₂CHCH₂OH on biomedical grade polyurethane has been followed by X-ray photoelectron spectroscopy (XPS) and contact angle measurements. Film thickness is observed to increase approximately linearly with plasma modification time, suggesting a layer-by-layer growth mode of poly allyl alcohol. Water contact angle measurements reveal the change in the surface free energy of wetting decreases linearly with plasma modification up to the monolayer point after which a constant limiting value of −24 mJ m⁻² was attained. Films prepared at 20 W plasma power with a duty cycle of 10 μs:500 μs exhibit a high degree of hydroxyl (OH) retention with minimal fragmentation of the monomer observed. Increasing the plasma power up to 125 W is found to improve OH retention at the expense of ether formation generating films close to the monomer stoichiometry. Duty cycle plays an important role in controlling both film composition and thickness, with longer off times increasing OH retention, while longer on times enhance allyl alcohol film growth.     

Enhancement of Ti-containing hydrogenated carbon (TiC:H) films by high-power plasma-sputtering

Ti-containing amorphous hydrogenated carbon (TiC:H) thin films were deposited on stainless steel SS304 substrates by high-power pulsed magnetron sputtering (HPPMS) in an atmosphere of mixed Ar and C₂H₂ gases using titanium metal as the cathodic material. The multilayer structure of the deposited film had a TiTiCDLC gradient to improve adhesion and reduce residual stress. This study investigates the effects of substrate bias and target-to-substrate distance on the mechanical properties of TiC:H films. Film properties, including composition, morphology, microstructure, mechanical, and tribology, were examined by glow discharge spectroscopy (GDS), scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy, and a nanoindenter and a pin-on-disk tribometer. Experiments revealed impressive results.