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1.
First-principles calculation on the basis of the density functional theory (DFT) and generalized gradient approximation have been applied to study the adsorption of H2 on the stoichiometric O-terminated Cu2O (1 1 1), Cu2O (1 1 1)-CuCUS and Cu-terminated Cu2O (1 1 1) surfaces. The optimal adsorption position and orientation of H2 on the stoichiometric O-terminated Cu2O (1 1 1) surface and Cu-terminated Cu2O (1 1 1) surface were determined and electronic structural changes upon adsorption were investigated by calculating the Local Density of States (LDOS) of the CuCUS 3d and CuCUS 4s of stoichiometric O-terminated Cu2O (1 1 1) surface. These results showed that H2 molecule adsorption on CuCUS site parallel to stoichiometric O-terminated Cu2O (1 1 1) surface and H2 molecule adsorption on Cu2 site parallel to Cu-terminated Cu2O (1 1 1) surface were the most favored, respectively. The presence of surface copper vacancy has a little influence on the structures when H2 molecule adsorbs on CuCSA, OCUS and OCSA atoms and the H2 molecule is only very weakly bound to the Cu2O (1 1 1)-CuCUS surface. From the analysis of stoichiometric O-terminated Cu2O (1 1 1) Local Density of States, it is observed that CuCUS 3d orbital has moved to a lower energy and the sharp band of CuCUS 4s is delocalized when compared to that before H2 molecule adsorption, and overlapped substantially with bands due to adsorbed H2 molecule. The Mulliken charges of H2 adsorption on CuCUS site showed that H2 molecule obtained electron from CuCUS which was consistent with the calculated electronic structural changes upon H2 adsorption.  相似文献   

2.
Interactions of atomic and molecular hydrogen with perfect and deficient Cu2O(1 1 1) surfaces have been investigated by density functional theory. Different kinds of possible modes of H and H2 adsorbed on the Cu2O(1 1 1) surface and possible dissociation pathways were examined. The calculated results indicate that OSUF, CuCUS and Ovacancy sites are the adsorption active centers for H adsorbed on the Cu2O(1 1 1) surface, and for H2 adsorption over perfect surface, CuCUS site is the most advantageous position with the side-on type of H2. For H2 adsorption over deficient surface, two adsorption models of H2, H2 adsorbing perpendicularly over Ovacancy site and H2 lying flatly over singly-coordinate Cu-Cu short bridge, are typical of non-energy-barrier dissociative adsorption leading to one atomic H completely inserted into the crystal lattice and the other bounded to CuCUS atom, suggesting that the dissociative adsorption of H2 is the main dissociation pathway of H2 on the Cu2O(1 1 1) surface. Our calculation result is consistent with that of the experimental observation. Therefore, Cu2O(1 1 1) surface with oxygen vacancy exhibits a strong chemical reactivity towards the dissociation of H2.  相似文献   

3.
DFT calculations have been performed to investigate the effect of dielectric responses of the solvent environment on the CO adsorption over CuCl(1 1 1) surface by using COSMO (conductor-like solvent model) model in Dmol3. Different dielectric constants, including vacuum, liquid paraffin, methylene chloride, methanol and water solution, are considered. The effects of solvent model on the structural parameters, adsorption energies and vibrational frequency of CO adsorption over CuCl(1 1 1) surface have been investigated. The calculation results suggest that solvent effects can improve the stability of CO adsorption and reduce the intensity of C-O bond, which might mean that solvent is in favor of C-O bond activation and improve the reaction activity of oxidative carbonylation in a slurry reactor.  相似文献   

4.
J.M.R. Muir  H. Idriss 《Surface science》2009,603(19):2986-2990
The reaction of formamide over the (0 1 1) faceted TiO2(0 0 1) surface has been studied by Temperature Programmed Desorption (TPD) and X-ray Photoelectron Spectroscopy (XPS). Two main reactions were observed: dehydration to HCN and H2O and decomposition to NH3 and CO. The dehydration reaction was found to be three to four times larger than the decomposition at all coverages. Each of these reactions is found to occur in two temperature domains which are dependent upon surface coverage. The low temperature pathway (at about 400 K) is largely insensitive to surface coverage while the high temperature pathway (at about 500 K) shifts to lower temperatures with increasing surface coverage. These two temperature pathways may indicate two adsorption modes of formamide: molecular (via an η1(O) mode of adsorption) and dissociative (via an η2(O,N) mode of adsorption). C1s and N1s XPS scans indicated the presence of multiple species after formamide absorption at 300 K. These occurred at ca. 288.5 eV (-CONH-) and 285 eV (sp3/sp2 C) for the C1s and 400 eV-(NH2), 398 eV (-NH) and 396 eV (N) for the N1s and result from further reaction of formamide with the surface.  相似文献   

5.
Density functional theory has been employed to investigate the adsorption and the dissociation of an N2O at different sites on perfect and defective Cu2O(1 1 1) surfaces. The calculations are performed on periodic systems using slab model. The Lewis acid site, CuCUS, and Lewis base site, OSUF are considered for adsorption. Adsorption energies and the energies of the dissociation reaction N2O → N2 + O(s) at different sites are calculated. The calculations show that adsorption of N2O is more favorable on CuCUS adsorption site energetically. CuCUS site exhibits a very high activity. The CuCUS-N2O reaction is exothermic with a reaction energy of 77.45 kJ mol−1 and an activation energy of 88.82 kJ mol−1, whereas the OSUF-N2O reaction is endothermic with a reaction energy of 205.21 kJ mol−1 and an activation energy of 256.19 kJ mol−1. The calculations for defective surface indicate that O vacancy cannot obviously improve the catalytic activity of Cu2O.  相似文献   

6.
S. Funk 《Applied Surface Science》2007,253(17):7108-7114
We attempt to correlate qualitatively the surface structure with the chemical activity for a metal surface, Cr(1 1 0), and one of its surface oxides, Cr2O3(0 0 0 1)/Cr(1 1 0). The kinetics and dynamics of CO2 adsorption have been studied by low energy electron diffraction (LEED), Aug er electron spectroscopy (AES), and thermal desorption spectroscopy (TDS), as well as adsorption probability measurements conducted for impact energies of Ei = 0.1-1.1 eV and adsorption temperatures of Ts = 92-135 K. The Cr(1 1 0) surface is characterized by a square shaped LEED pattern, contamination free Cr AES, and a single dominant TDS peak (binding energy Ed = 33.3 kJ/mol, first order pre-exponential 1 × 1013 s−1). The oxide exhibits a hexagonal shaped LEED pattern, Cr AES with an additional O-line, and two TDS peaks (Ed = 39.5 and 30.5 kJ/mol). The initial adsorption probability, S0, is independent of Ts for both systems and decreases exponentially from 0.69 to 0.22 for Cr(1 1 0) with increasing Ei, with S0 smaller by ∼0.15 for the surface oxide. The coverage dependence of the adsorption probability, S(Θ), at low Ei is approx. independent of coverage (Kisliuk-shape) and increases initially at large Ei with coverage (adsorbate-assisted adsorption). CO2 physisorbs on both systems and the adsorption is non-activated and precursor mediated. Monte Carlo simulations (MCS) have been used to parameterize the beam scattering data. The coverage dependence of Ed has been obtained by means of a Redhead analysis of the TDS curves.  相似文献   

7.
K. Ozawa  Y. Oba 《Surface science》2009,603(13):2163-1659
Low-energy electron diffraction, X-ray photoelectron spectroscopy and synchrotron-radiation-excited angle-resolved photoelectron spectroscopy have been used to characterize Cu-oxide overlayers on the Zn-terminated ZnO(0 0 0 1) surface. Deposition of Cu on the ZnO(0 0 0 1)-Zn surface results in the formation of Cu clusters with (1 1 1) top terraces. Oxidation of these clusters by annealing at 650 K in O2 atmosphere (1.3 × 10−4 Pa) leads to an ordered Cu2O overlayer with (1 1 1) orientation. Good crystallinity of the Cu2O(1 1 1) overlayer is proved by energy dispersion of one of Cu2O valence bands. The Cu2O(1 1 1) film exhibits a strong p-type semiconducting nature with the valence band maximum (VBM) of 0.1 eV below the Fermi level. The VBM of ZnO at the Cu2O(1 1 1)/ZnO(0 0 0 1)-Zn interface is estimated to be 2.4 eV, yielding the valence-band offset of 2.3 eV.  相似文献   

8.
The adsorption and dissociation of O2 on the perfect and oxygen-deficient Cu2O(1 1 1) surface have been systematically studied using periodic density functional calculations. Different kinds of possible modes of atomic O and molecular O2 adsorbed on the Cu2O(1 1 1) surface are identified: atomic O is found to prefer threefold 3Cu site on the perfect surface and Ovacancy site on the deficient surface, respectively. CuCUS is the most advantageous site with molecularly adsorbed O2 lying flatly over singly coordinate CuCUS-CuCSA bridge on the perfect surface. O2 adsorbed dissociatively on the deficient surface, which is the main dissociation pathway of O2, and a small quantity of molecularly adsorbed O2 has been obtained. Further, possible dissociation pathways of molecularly adsorbed O2 on the Cu2O(1 1 1) surface are explored, the reaction energies and relevant barriers show that a small quantity of molecularly adsorbed O2 dissociation into two O atoms on the deficient surface is favorable both thermodynamically and kinetically in comparison with the dissociation of O2 on the perfect surface. The calculated results suggest that the presence of oxygen vacancy exhibits a strong chemical reactivity towards the dissociation of O2 and can obviously improve the catalytic activity of Cu2O, which is in agreement with the experimental observation.  相似文献   

9.
V2O3(0 0 0 1) films have been grown epitaxially on Au(1 1 1) and W(1 1 0). Under typical UHV conditions these films are terminated by a layer of vanadyl groups as has been shown previously [A.-C. Dupuis, M. Abu Haija, B. Richter, H. Kuhlenbeck, H.-J. Freund, V2O3(0 0 0 1) on Au(1 1 1) and W(1 1 0): growth, termination and electronic structure, Surf. Sci. 539 (2003) 99]. Electron irradiation may remove the oxygen atoms of this layer. H2O adsorption on the vanadyl terminated surface and on the reduced surface has been studied with thermal desorption spectroscopy (TDS), vibrational spectroscopy (IRAS) and electron spectroscopy (XPS) using light from the BESSY II electron storage ring in Berlin. It is shown that water molecules interact only weakly with the vanadyl terminated surface: water is adsorbed molecularly and desorbs below room temperature. On the reduced surface water partially dissociates and forms a layer of hydroxyl groups which may be detected on the surface up to T ∼ 600 K. Below ∼330 K also co-adsorbed molecular water is detected. The water dissociation products desorb as molecular water which means that they recombine before desorption. No sign of surface re-oxidation could be detected after desorption, indicating that the dissociation products desorb completely.  相似文献   

10.
The adsorption properties of CO on experimentally verified stepped Pt3Sn(1 0 2) surface were investigated using quantum mechanical calculations. The two possible terminations of Pt3Sn(1 0 2) were generated and on these terminations all types of possible adsorption sites were determined. The adsorption energies and geometries of the CO molecule for all those sites were calculated. The most favorable sites for adsorption were determined as the short bridge site on the terrace of pure-Pt row of the mixed-atom-ending termination, atop site at the step-edge of the pure row of pure-Pt-ending termination and atop site at the step-edge of the pure-Pt row of the mixed-atom-ending termination. The results were compared with those for similar sites on the flat Pt3Sn(1 1 0) surface considering the fact that Pt3Sn(1 0 2) has terraces with (1 1 0) orientation. The LDOS analysis of bare sites clearly shows that there are significant differences between the electronic properties of Pt atoms at stepped Pt3Sn(1 0 2) surface and the electronic properties of Pt atoms at flat (1 1 0) surface, which leads to changes in the CO bonding energies of these Pt atoms. Adsorption on Pt3Sn(1 0 2) surface is in general stronger compared to that on Pt3Sn(1 1 0) surface. The difference in adsorption strength of similar sites on these two surface terminations is a result of stepped structure of Pt3Sn(1 0 2). The local density of states (LDOS) of the adsorbent Pt and C of adsorbed CO was utilized. The LDOS of the surface metal atoms with CO-adsorbed atop and of their bare state were compared to see the effect of CO chemisorption on the electron density distribution of the corresponding Pt atom. The downward shift in energy peak in the LDOS curves as well as changes in the electron densities of the corresponding energy levels indicate the orbital mixing between CO molecular orbitals and metal d-states. The present study showed that the adsorption strength of the sites has a direct relation with their LDOS profiles.  相似文献   

11.
The decomposition of methanol on clean and oxygen-precovered CuCl(1 1 1) surface have been studied with the method of density functional theory-generalized gradient approximation (DFT-GGA) and the periodic slab models. The effects of different methanol coverages up to one monolayer are investigated. The activation of the O-H bond of methanol to form the methoxide intermediate, the activation of the C-H bond to form the hydroxymethyl intermediate and the activation of the C-O bond to form methyl are examined. These intermediates can subsequently react to form methoxide, hydroxymethyl, methyl, formaldehyde, formyl, and finally CO on the surface. The chemisorption energies of CH3OH, CH3O, H2COH, CH3, H2CO, HCO, OH and CO at their most favorable adsorption sites are predicted to be −57.9, −235.3, −172.9, −170.5, −67.8, −192.4, −309.5 and −105.7 kJ/mol, respectively. We also confirm that the O-H bond-breaking paths have lower energy barrier, compared to the C-O and C-H bond-breaking paths. However, these reactions need a lower energy barrier when precovered oxygen atoms participate in these reactions.  相似文献   

12.
Density functional theory (DFT) combined with conductor-like solvent model (COSMO) have been performed to study the solvent effects of H2 adsorption on Cu(h k l) surface. The result shows H2 can not be parallel adsorbed on Cu(h k l) surface in gas phase and only vertical adsorbed. At this moment, the binding energies are small and H2 orientation with respect to Cu(h k l) surfaces is not a determining parameter. In liquid paraffin, when H2 adsorbs vertically on Cu(h k l) surface, solvent effects not only influences the adsorptive stability, but also improves the ability of H2 activation; When H2 vertical adsorption on Cu(h k l) surface at 1/4 and 1/2 coverage, H-H bond is broken by solvent effects. However, no stable structures at 3/4 and 1 ML coverage are found, indicating that it is impossible to get H2 parallel adsorption on Cu(h k l) surfaces at 3/4 and 1 ML coverages due to the repulsion between adsorbed H2 molecules.  相似文献   

13.
The formation mechanism of CH3O by the adsorption and decomposition of CH3OH on clean and oxygen-precovered Cu2O(1 1 1) surface has been investigated with density functional theory method together with the periodic slab models. Two possible formation pathways of CH3O by CH3OH decomposition on oxygen-precovered (Opre) Cu2O(1 1 1) surface were proposed and discussed. One is the O-H bond-cleavage of CH3OH with H migration to Opre to form CH3O; the other is the C-O bond-scission of CH3OH with CH3 migration to Opre leading to CH3Opre. The calculated results show that the O-H bond-breaking path has the lowest activation barrier 26.8 kJ mol−1, the presence of oxygen-precovered on Cu2O(1 1 1) surface exhibits a high surface reactivity toward the formation of CH3O by the O-H bond-cleavage of CH3OH, and reduce the activation barrier of O-H bond-cleavage. The C-O bond-breaking path was inhibited by dynamics, suggesting that the O atom of CH3O is not from the oxygen-precovered, but comes from the O of CH3OH. Meanwhile, the calculated results give a clear illustration about the formation mechanism of CH3O in the presence of oxygen and the role of oxygen at the microscopic level.  相似文献   

14.
Adsorption of carbon monoxide on Pd(3 1 1) and (2 1 1) stepped surfaces has been investigated by the extended London-Eyring-Polyani-Sato (LEPS) method constructed using a 5-parameter Morse potential. The calculated results show that there exist common characteristics of CO adsorption on the two surfaces. At low coverage, CO occupies threefold hollow site of the (1 1 1) terrace and is tilted with respect to the surface normal. Among the threefold hollow sites on the (1 1 1) terrace, the nearer the site is to the step, the greater is the influence of the step. The twofold bridge site on the (1 0 0) step is also a stable adsorption site at high coverage. Because of the different lengths of the (1 1 1) terraces, the (3 1 1) and (2 1 1) stepped surfaces have different characteristics. A number of new sites are exposed on the boundary regions, including the fourfold hollow site (H4) of the (3 1 1) surface and the fivefold hollow site (H5) of the (2 1 1) surface. At high coverage, CO resides in the H5 site of the (2 1 1) surface, but the H4 site of the (3 1 1) surface is not a stable adsorption site. This study further shows that the on-top site on the (1 0 0) step of Pd(3 1 1) is a stable adsorption site, but the same type of site on Pd(2 1 1) is not.  相似文献   

15.
Adsorption probability measurements (molecular beam scattering) have been conducted to examine the adsorption dynamics (i.e. the gas-surface energy transfer processes) of CO2 adsorption on the Zn-on-Cu(1 1 0) bimetallic system. The results indicate surface alloy formation, which is in agreement with prior studies. Depositing Zn at 300 K on Cu(1 1 0), above the condensation temperature of CO2, leads to a “blocking” of CO2 adsorption sites by Zn which is incorporated in the Cu(1 1 0) surface. This apparent site blocking effect indicates a lowering of the CO2 binding energy on the alloyed surface as compared with the clean Cu(1 1 0) support. The Zn coverage has been calibrated by Auger electron spectroscopy and thermal desorption spectroscopy.  相似文献   

16.
Well ordered V2O3(0 0 0 1) films were prepared on Au(1 1 1) and W(1 1 0) substrates. These films are terminated by a layer of vanadyl groups under typical UHV conditions. Reduction by electron bombardment may remove the oxygen atoms of the vanadyl layer, leading to a surface terminated by vanadium atoms. The interaction of oxygen with the reduced V2O3(0 0 0 1) surface has been studied in the temperature range from 80 to 610 K. Thermal desorption spectroscopy (TDS), infrared reflection absorption spectroscopy (IRAS), high resolution electron energy loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS), and density functional theory (DFT) were used to study the adsorbed oxygen species. Low temperature adsorption of oxygen on reduced V2O3(0 0 0 1) occurs both dissociatively and molecularly. At 90 K a negatively charged molecular oxygen species is observed. Upon annealing the adsorbed oxygen species dissociates, re-oxidizing the reduced surface by the formation of vanadyl species. Density functional theory was employed to calculate the structure and the vibrational frequencies of the O2 species on the surface. Using both cluster and periodic models, the surface species could be identified as η2-peroxo () lying flat on surface, bonded to the surface vanadium atoms. Although the O-O vibrational normal mode involves motions almost parallel to the surface, it can be detected by infrared spectroscopy because it is connected with a change of the dipole moment perpendicular to the surface.  相似文献   

17.
The surface reaction and desorption of sulfur on Rh(1 0 0) induced by O2 and H2O are investigated with X-ray photoelectron spectroscopy (XPS) technique. The Rh(1 0 0) sample covered with atomic sulfur is prepared by means of the exposure to H2S gas, and subsequently the sample is annealed under O2 or H2O atmosphere. The XPS results show that atomic sulfur adsorbed on Rh(1 0 0) reacts with O2 and desorbs from the surface at 473 K or more. On the other hand, atomic sulfur can not be removed from Rh(1 0 0) surface by H2O at any temperature.  相似文献   

18.
We have studied the adsorption structure of acetic anhydride on a TiO2(1 1 0) surface using XPS (X-ray photoelectron spectroscopy), LEED (low energy electron diffraction) and HREELS (high resolution electron energy loss spectroscopy) to determine the origins of the unique adsorption properties of carboxylic acids on a TiO2(1 1 0) surface. The C 1s XPS data indicated that the saturation carbon amount of adsorbed acetic anhydride was 12 ± 3% larger than that of the adsorbed acetic acid. LEED showed p(2 × 1) weak spots for the acetic anhydride adsorbed surface. The HREELS spectra revealed the dissociative adsorption of acetic anhydride. Based on these findings, we concluded that the neutralization of the bridging oxygen atoms associated with the dissociative adsorption is necessary for the stable adsorption of carboxylates on the 5-fold Ti sites.  相似文献   

19.
The adsorption of NH3 molecule on the Si(1 1 1)-7 × 7 surface modelled with a cluster has been studied using density functional theory (DFT). The results indicate the existence of a precursor state for the non-dissociative chemisorption. The active site for the molecular chemisorption is the adatom; while the NH3 molecule adsorbs on the Si restatom via this preadsorbed state, the adsorption on the Si adatom is produced practically without an energy barrier. The ammonia adsorption on the adatom induces an electron transfer from the dangling bond of this atom to the dangling bond of the adjacent Si restatom, hindering this site for the adsorption of a second NH3 incoming molecule. However, this second molecule links strongly by means of two H-bonds. The dissociative chemisorption process was studied considering one and two ammonia molecules. For the dissociation of a lonely NH3 molecule an energy barrier of ∼0.3 eV was calculated, yielding NH2 on the adatom and H on the restatom. When two molecules are adsorbed, the NH3-NH3 interaction yields the weakening of a N-H bond of the ammonia molecule adsorbed closer the Si surface. As a consequence, the dissociation barrier practically disappears. Thus, the presence of a second NH3 molecule at the adatom-restatom pair of the Si(1 1 1)-7 × 7 surface makes the dissociative reaction self-assisted, the total adsorption process elapsing with a negligible activation barrier (less than 0.01 eV).  相似文献   

20.
Our measurements indicate that under temperature-programmed conditions the N2O decomposition occurs on Rh(1 0 0) between 60 and 140 K and results in the appearance of two N2 desorption peaks related to N2 molecules leaving the surface during and after N2O dissociation events, respectively. Both peaks are observed even at low initial coverages. This and other features of N2 desorption are explained by using Monte Carlo simulations taking into account attractive N2O-O lateral interactions stabilizing N2O adsorption. The results presented are compared with those obtained earlier for Rh(1 1 0).  相似文献   

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