Molecular Precursors for the Phase‐Change Material Germanium‐Antimony‐Telluride,Ge2Sb2Te5 (GST)

This review provides an overview of the precursor chemistry that has been developed around the phase‐change material germanium‐antimony‐telluride, Ge₂Sb₂Te₅ (GST). Thin films of GST can be deposited by employing either chemical vapor deposition (CVD) or atomic layer deposition (ALD) techniques. In both cases, the success of the layer deposition crucially depends on the proper choice of suitable molecular precursors. Previously reported processes mainly relied on simple alkoxides, alkyls, amides and halides of germanium, antimony, and tellurium. More sophisticated precursor design provided a number of promising new aziridinides and guanidinates.     

Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide

New precursor chemistries for the atomic layer deposition (ALD) of aluminium oxide are reported as potential alternatives to the pyrophoric trimethylaluminium (TMA) which is to date a widely used Al precursor. Combining the high reactivity of aluminium alkyls employing the 3-(dimethylamino)propyl (DMP) ligand with thermally stable amide ligands yielded three new heteroleptic, non-pyrophoric compounds [Al(NMe₂)₂(DMP)] ( 2 ), [Al(NEt₂)₂(DMP)] ( 3 , BDEADA) and [Al(NiPr₂)₂(DMP)] ( 4 ), which combine the properties of both ligand systems. The compounds were synthesized and thoroughly chemically characterized, showing the intramolecular stabilization of the DMP ligand as well as only reactive Al−C and Al−N bonds, which are the key factors for the thermal stability accompanied by a sufficient reactivity, both being crucial for ALD precursors. Upon rational variation of the amide alkyl chains, tunable and high evaporation rates accompanied by thermal stability were found, as revealed by thermal evaluation. In addition, a new and promising plasma enhanced (PE)ALD process using BDEADA and oxygen plasma in a wide temperature range from 60 to 220 °C is reported and compared to that of a modified variation of the TMA, namely [AlMe₂(DMP)] (DMAD). The resulting Al₂O₃ layers are of high density, smooth, uniform, and of high purity. The applicability of the Al₂O₃ films as effective gas barrier layers (GBLs) was successfully demonstrated, considering that coating on polyethylene terephthalate (PET) substrates yielded very good oxygen transmission rates (OTR) with an improvement factor of 86 for a 15 nm film by using DMAD and a factor of 25 for a film thickness of just 5 nm by using BDEDA compared to bare PET substrates. All these film attributes are of the same quality as those obtained for the industrial precursor TMA, rendering the new precursors safe and potential alternatives to TMA.     

Ab initio study of aluminum chemical vapor deposition from dimethylaluminum hydride: a gas phase reaction mechanism

The effect of preheating of dimethylaluminum hydride (DMAH) as a gas on the epitaxial growth in aluminum chemical vapor deposition (Al-CVD) is studied theoretically. The chemical changes of DMAH in the gas phase such as unimolecular decomposition reactions, bimolecular reactions and polymerizations are treated using ab initio molecular orbital method (MP2/6-31G**) and density functional theory (B3P86/LanL2DZ). The gas phase equilibrium composed of the previous reaction products under the usual experimental conditions for Al-CVD is also investigated in detail as the initial stage of the CVD process. From the energetics point of view, unimolecular decomposition reactions and bimolecular reactions hardly occur, however, polymerizations of DMAH take place readily at the low temperatures found in Al-CVD. A large amount of DMAH-dimer and a small amount of DMAH-monomer and trimer coexist in the equilibrium state.     

Cracking study of pentakis(dimethylamino)tantalum vapors by Knudsen cell mass spectrometry

Organometallic molecules are commonly used as gaseous precursors in Atomic Layer Deposition/Chemical Vapor Deposition (ALD/CVD) processes. However, the use of these molecules, which are generally thermally unstable at temperatures close to the deposition temperature, requires an understanding of their gas‐phase chemical behavior. The thermal cracking of the gaseous precursor, pentakis(dimethylamino) tantalum (PDMAT), generally adopted in the ALD/CVD TaN deposition processes, has been studied in the temperature range from 343 to 723K using a specific reactor coupled with a high‐temperature mass spectrometer. This reactor – built as tandem Knudsen cells – consists of two superimposed cells. The first stage reactor – an evaporation cell – provides an input saturated vapor flow operating from room temperature to 333K. The second stage cell, named the cracking cell, operated from 333 to 723K in the present study. Experiments showed the appearance of many gaseous species when the cracking temperature increased and, in particular, dimethylamine, corresponding to the saturated organic branches of PDMAT. Decomposition products of the HNC₂H₆ branch were observed at relatively high temperature, namely above 633K. This gas‐phase study – as for the preceding saturated one – shows the presence of oxygen‐containing molecules in PDMAT cracked vapor. Thus, it explains the systematic presence of oxygen contamination in the deposited TaN films observed in ALD/CVD industrial processes. Copyright © 2010 John Wiley & Sons, Ltd.     

Synthesis and characterization of zinc bis(O‐isopropylxanthate) as a single‐source chemical vapor deposition precursor for ZnS

The utilization of single‐source molecular precursors in chemical vapor deposition (CVD) experiments requires a deep knowledge of their chemico‐physical properties, with particular regard to thermal stability and fragmentation pattern. This study describes the synthesis and characterization of zinc bis(O‐isopropylxanthate), Zn(O‐ⁱPrXan)₂, [O‐ⁱPrXan = (CH₃)₂CHOCS₂], a single‐source precursor for the CVD of zinc(II) sulfide thin films and nanorods. Several analytical methods yielding complementary information (extended X‐ray absorption fine structure, Raman, FT‐IR, UV–Vis optical absorption, ¹H and ¹³C NMR, thermogravimetric analysis, differential scanning calorimetry as well as mass spectrometry techniques, i.e. electrospray and electron ionization, mass‐analyzed ion kinetic energy) are adopted for a comprehensive investigation of purity, structure, thermal behavior and decomposition pathways of the molecule. The most significant results are discussed critically and the properties useful for CVD applications are highlighted. Copyright © 2005 John Wiley & Sons, Ltd.     

Synthesis and characterization of a novel soluble reactive ladder‐like polysilsesquioxane with side‐chain 2‐(4‐chloromethyl phenyl) ethyl groups

A new kind of soluble structure‐ordered ladder‐like polysilsesquioxane with reactive side‐chain 2‐(4‐chloromethyl phenyl) ethyl groups ( L ) was first synthesized by stepwise coupling polymerization. The monomer, 2‐(4‐chloromethyl phenyl) ethyltrichlorosilane ( M ), was synthesized successfully by hydrosilylation reaction with dicyclopentadienylplatinum(II) chloride (Cp₂PtCl₂) ­catalyst. Monomer and polymer structures were characterized by FT‐IR, ¹H‐NMR, ¹³C‐NMR, ²⁹Si‐NMR, differential scanning calorimetry (DSC), thermogravimetric analysis (TGA), vapor pressure osmometry (VPO) and X‐ray diffraction (XRD). This novel reactive ladder‐like polymer has promise potential applications as initiator for atom transfer radical polymerization, and as precursor for a variety of advanced functional polymers. Copyright © 2001 John Wiley & Sons, Ltd.     

Solid–Vapor Reaction Growth of Transition‐Metal Dichalcogenide Monolayers

Two‐dimensional (2D) layered semiconducting transition‐metal dichalcogenides (TMDCs) are promising candidates for next‐generation ultrathin, flexible, and transparent electronics. Chemical vapor deposition (CVD) is a promising method for their controllable, scalable synthesis but the growth mechanism is poorly understood. Herein, we present systematic studies to understand the CVD growth mechanism of monolayer MoSe₂, showing reaction pathways for growth from solid and vapor precursors. Examination of metastable nanoparticles deposited on the substrate during growth shows intermediate growth stages and conversion of non‐stoichiometric nanoparticles into stoichiometric 2D MoSe₂ monolayers. The growth steps involve the evaporation and reduction of MoO₃ solid precursors to sub‐oxides and stepwise reactions with Se vapor to finally form MoSe₂. The experimental results and proposed model were corroborated by ab initio Car–Parrinello molecular dynamics studies.     

A Density Functional Theory (DFT) Quantum‐Chemical Approach to the Real Structure of Poly(methylaluminoxane)

DFT quantum chemical calculations have been performed in order to optimize the geometric and electronic cage structure of poly(methylaluminoxane) (MAO) with oligomerization degree n = 9–15, and to find such structures that fit most closely the existing experimental data on the MAO composition and structure. The following peculiarities of the MAO structure were found: i) In “classic” MAO (n = 9, 12, 15; Al : CH₃ : O = 1 : 1 : 1), which has a triple‐layer cage structure, the inner layer contains highly reactive Al‐O bonds. ii) The reaction between “classic MAO” and trimethylaluminium (TMA) proceeds by the concerted mechanism, with the insertion of Al‐CH₃ groups into these Al‐O bonds producing “true” MAO (Al : CH₃ : O = 1 : 1.5 : 0.75). The calculated geometric and electronic structures of “true” MAO with n = 6, 9, 12 are presented. iii) “True” MAO and “classic” MAO exist in equilibrium. The driving force for the formation of “true” MAO is the decrease in enthalpy, and of “classic” MAO the increase in entropy, in the equilibrium reaction between “classic” MAO and TMA.     

Nanostructured ZrO2 and Zr‐C‐N Coatings from Chemical Vapor Deposition of Metal‐Organic Precursors

Nanocrystalline zirconium carbonitride (Zr‐C‐N) and zirconium oxide (ZrO₂) films were deposited by chemical vapor deposition (CVD) of zirconium‐tetrakis‐diethylamide (Zr(NEt₂)₄) and ‐tert‐butyloxide (Zr(OBu^t)₄), respectively. The films were deposited on iron substrates and characterized by scanning electron microscopy (SEM), X‐ray diffraction (XRD) and X‐ray photoelectron spectroscopy (XPS). The Zr‐C‐N films show blue, golden brown or bronze colours, with colour stability depending upon the precursor composition (pure metal amide or mixed with Et₂NH). The deposition temperature showed no pronounced effect on the granular morphology of the Zr‐C‐N films. The XRD data of the films correspond to the formation of carbonitride phase whereas the XPS analyses revealed a strong surface oxidation and incorporation of oxygen in the film. The films deposited using a mixture of Zr(NEt₂)₄ and Et₂NH showed higher N content, better adhesion and scratch resistance when compared to films obtained from the CVD of pure Zr(NEt₂)₄. Subject to the precursor composition and deposition temperature (550‐750 °C), the microhardness values of Zr‐C‐N films were found to be in the range 2.11‐5.65 GPa. For ZrO₂ films, morphology and phase composition strongly depend on the deposition temperature. The CVD deposits obtained at 350 °C show tetragonal ZrO₂ to be the only crystalline phase. Upon increasing the deposition temperature to 450 °C, a mixture of tetragonal and monoclinic modifications was formed with morphology made up of interwoven elongated grains. At higher temperatures (550 and 650 °C), pure monoclinic phase was obtained with facetted grains and developed texture.     

Bimodal Polyethylenes Obtained with a Dual‐Site Metallocene Catalyst System. Effect of Trimethylaluminium Addition

Bimodal polyethylenes were obtained with the dual site Cp*₂ZrCl₂( 1 )/Et(IndH4)₂ZrCl₂( 2 ) metallocene catalyst system with a mixture of methylaluminoxane (MAO) and trimethylaluminium (TMA) as the cocatalyst. Polymer properties can be controlled by the amount of TMA added, monomer pressure, polymerization temperature and the addition of hexene or hydrogen. TMA is suggested to be partly coordinated to the active sites, thereby enhancing termination ( 1 ), increasing comonomer incorporation ( 2 ), but also partially blocking coordination and chain transfer to hydrogen. For the ansa catalyst, hydrogen probably relieves dormant (β‐agostic) sites.     

Highly active and easily accessible catalysts for vinyl polymerization of norbornene obtained by oxidative addition of salicylaldimine ligands to bis(1,5‐cyclooctadiene)nickel(0) and methylaluminoxane

Highly active, cheap, and easy to synthesize catalytic systems, obtained in situ by the oxidative addition of salicylaldimine ligands to bis(1,5‐cyclooctadiene)nickel(0) and activated by methylaluminoxane (MAO), are now reported for the vinyl polymerization of norbornene. Their activity resulted mainly influenced by the nature of the substituents present both on the phenolate moiety and on the N‐aryl ring as well as the content of free trimethylaluminum (TMA) present in the commercial MAO. In particular, the maximum activity, up to about 78,000 kg polynorbornene/mol Ni × h, was ascertained when 3,5‐dinitro‐N‐(2,6‐diisopropylphenyl)salicylaldimine ligand was adopted in conjunction with Ni(cod)₂ and TMA‐depleted MAO. This remarkable performance, to the best of our knowledge, the highest never reported working in toluene instead of chlorinated aromatics, was reached adopting this more sustainable reaction medium. The influence of the main reaction parameters such as reaction time, temperature, monomer/Ni, and Al/Ni molar ratios on the catalytic performances and polymer characteristics was studied as well. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012     

Molecular layer deposition of aluminum alkoxide polymer films using trimethylaluminum and glycidol

Molecular layer deposition (MLD) of aluminum alkoxide polymer films was examined using trimethlyaluminum (TMA) and glycidol (GLY) as the reactants. Glycidol is a high vapor pressure heterobifunctional reactant with both hydroxyl and epoxy chemical functionalites. These two different functionalities help avoid "double reactions" that are common with homobifuctional reactants. A variety of techniques, including in situ Fourier transform infrared (FTIR) spectroscopy and quartz crystal microbalance (QCM) measurements, were employed to study the film growth. FTIR measurements at 100 and 125 °C observed the selective reaction of the GLY hydroxyl group with the AlCH(3) surface species during GLY exposure. Epoxy ring-opening and methyl transfer from TMA to the surface epoxy species were then monitored during TMA exposure. This epoxy ring-opening reaction is dependent on strong Lewis acid-base interactions between aluminum and oxygen. The QCM experiments observed linear growth with self-limiting surface reactions at 100-175 °C under certain growth conditions. With a sufficient purge time of 20 s after TMA and GLY exposures at 125 °C, the mass gain per cycle (MGPC) was 19.8 ng/cm(2)-cycle. The individual mass gains after the TMA and GLY exposures were also consistent with a TMA/GLY stoichiometry of 4:3 in the MLD film. This TMA/GLY stoichiometry suggests the presence of Al(2)O(2) dimeric core species. The MLD films resulting from these TMA and GLY exposures also evolved with annealing temperature to form thinner conformal porous films with increased density. Non-self-limiting growth was a problem at shorter purge times and lower temperatures. With shorter purge times of 10 s at 125 °C, the MPGC increased dramatically to 134 ng/cm(2)-cycle. The individual mass gains after the TMA and GLY exposures in the CVD regime were consistent with a TMA/GLY stoichiometry of 1:1. The MGPC decreased progressively versus purge time. This behavior was attributed to the removal of reactants that could lead to CVD and the instability of the surface species after the reactant exposures. These results reveal that the TMA and GLY reaction displays much complexity and must be carefully controlled to be a useful MLD process.     

Pressure and trimethylaluminum effects on ethene/1‐hexene copolymerization with methylaluminoxane‐activated (1,2,4‐Me3Cp)2ZrCl2: Trimethylaluminum suppression of standard termination reactions after 1‐hexene insertion

Ethene homopolymerizations and copolymerizations with 1‐hexene were catalyzed by methylaluminoxane‐activated (1,2,4‐Me₃Cp)₂ZrCl₂. Investigations of the effects of various pressures on the homopolymerizations and copolymerizations and of the effects of different concentrations of trimethylaluminum (TMA) on the copolymerizations were performed. The characteristics of the ethene/1‐hexene copolymers agreed with expectations for changes in the ethene concentration: the incorporation of 1‐hexene decreased, whereas the melting point and crystallinity increased, with increasing pressure. The main termination mechanism of the homopolymerizations was β‐hydrogen transfer to the monomer. Termination mechanisms resulting in vinylidene unsaturations dominated in the copolymerizations. Standard termination mechanisms producing vinyl and trans‐vinylene unsaturations occurred in parallel and were not influenced by the ethene or TMA concentration. In addition, some chain transfer to TMA, producing saturated end groups after hydrolysis, occurred. Copolymerizations with different additions of TMA, with the other polymerization conditions kept constant, showed that the catalytic productivity [tons of polyethylene/(mol of Zr h)], the 1‐hexene incorporation, and the molecular weight (from gel permeation chromatography) were independent of the TMA concentration. Surprisingly, the vinylidene content decreased almost linearly with increasing TMA concentration. TMA might have coordinated to the catalytic site after 1‐hexene insertion and rotation to the β‐agostic state and, therefore, suppressed the standard termination reactions after 1‐hexene insertion. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 2584–2597, 2005     

The monomer−dimer equilibria of liquid aliminum alkyls : III. Trimethylaluminum: the monomer−dimer equilibria of liquid and gaseous trimethylaluminum and triethylaluminum

There has been a dichotomy of opinion concerning the values for the heats of dissociation of trimethylaluminum (TMA) and triethylaluminum (TEA) in the liquid phase. It is believd that the result reported herein will enable these differences to be resolved. In the present study, the heat of dissociation (ΔH^o_d of liquid TMA is evaluated as 19.4₀±0.3₀-kcal · (mole of dimer)⁻¹ from the previously determined ΔH⁰_d of liquid TEA and new heat of mixing data for TMA−TEA. Essentially the same result is derived from the established ΔH⁰_d of gaseous TMA by application of a thermodynamic relationship between heats of dissociation and heats of vaporization (the “Dissociation−Vaporization Rule”). It is concluded that the experimental ΔH⁰_d values for liquid TEA (16.9₃ kcal · (mole of dimer)⁻¹) and gaseous TMA (20.4₀ are thermodynamically consistent. The ΔS⁰_dof liquid TMA is evaluated as 29.3±0.3 cal · K⁻¹ · (mole of dimer)⁻¹. The ΔH⁰_d valuesfor liquid adn gaseous TMA are shown to be thermodynamically consistent with vapor pressure data. Boiling points derived for pure TMA monomer and pure dimer are 8.1±2.1 and 131.95±0.02°C, respectively. Degrees of dissociation of TMA in the pure liquid state and at various mole fractions in aliphatic hydrocarbon solution are tabulated over a wide temperature range. The results indicate that the extent of dissociation of liquid TMA is 0.0047% at 20, 0.053% at 70, and 0.32% at 120°C.     

Thermochemistry of the initial steps of methylaluminoxane formation. Aluminoxanes and cycloaluminoxanes by methane elimination from dimethylaluminum hydroxide and its dimeric aggregates

Results are presented of ab initio studies at levels MP2(full)/6-31G* and MP2(full)/6-311G** of the hydrolysis of trimethylaluminum (TMA, 1) to dimethylaluminumhydroxide (DMAH, 2) and of the intramolecular 1,2-elimination of CH(4) from 2 itself to form methylaluminumoxide 3, from its dimeric aggregate 4 to form hydroxytrimethyldialuminoxane 5 and dimethylcyclodialuminoxane 6, and from its TMA aggregate 7 to form 8 and/or 9, the cyclic and open isomers of tetramethyldialuminoxane, respectively. Each methane elimination creates one new Lewis acid site, and dimethylether is used as a model oxygen-donor molecule to assess the most important effects of product stabilization by Lewis donor coordination. It is found that the irreversible formation of aggregate 4 (ΔG(298) = -29.2 kcal/mol) is about three times more exergonic than the reversible formation of aggregate 7 (ΔG(298) = -9.9 kcal/mol), that the reaction free enthalpies for the formations of 5 (ΔG(298) = -9.0 kcal/mol) and 6 (ΔG(298) = -18.8 kcal/mol) both are predicted to be quite clearly exergonic, and that there is a significant thermodynamic preference (ΔG(298) = -7.2 kcal/mol) for the formation of 6 over ring-opening of 5 to hydroxytrimethyldialuminoxane 10. The mechanism for oligomerization is discussed based on the bonding properties of dimeric aggregates and involves the homologation of HO-free aluminoxane with DMAH (i.e., 9 to 13), and any initially formed hydroxydialuminoxane 10 is easily capped to trialuminoxane 13. Our studies are consistent with and provide support for Sinn's proposal for the formation of oligoaluminoxanes, and in addition, the results point to the crucial role played by the kinetic stability of 5 and the possibility to form cyclodialuminoxane 6. Dialuminoxanes 9 and 10 are reversed-polarity heterocumulenes, and intramolecular O→Al dative bonding competes successfully with Al complexation by Lewis donors. Intramolecular O→Al dative bonding is impeded in cyclodialuminoxane 6, and the dicoordinate oxygen in 6 is a strong Lewis donor. Ethylene polymerization catalysts contain highly oxophilic transition metals, and our studies suggest that these transition metal catalysts should discriminate strongly in favor of cycloaluminoxane-O donors even if these are present only in small concentrations in the methylaluminoxane (MAO) cocatalyst.     

Screening the Thermodynamics of Trimethylaluminum‐Hydrolysis Products and Their Co‐Catalytic Performance in Olefin‐Polymerization Catalysis

Herein, we introduce an approach for the computational screening of stoichiometric reactions between trimethylaluminum (TMA) and water. The thermodynamic products of these reactions are methylaluminoxanes (MAOs) with different compositions, which have the general formula (AlOMe)_n(AlMe₃)_m, in which n describes the degree of oligomerization and m is the number of associated TMA molecules. These reaction products were thoroughly explored up to n=4, thus demonstrating the thermodynamically preferable association of up to four AlMe₃ molecules, that is, TMA molecules in their monomeric form. The relative Lewis acidities of the Al sites in these MAOs were systematically explored and we found that the associated TMA molecules were a key ingredient for co‐catalytic activity in olefin‐polymerization catalysis. This conclusion was supported by computational studies on catalyst activation, which revealed an exergonic insertion of ethene into the metallocene/MAO complex.     

Possible effects on the polyethene chain structure of trimethylaluminum coordination to zirconocene catalysts

Ethene was polymerized with the catalytic systems L₂ZrCl₂/MAO/TMA (where L = Cp, Me₅Cp, or Me₄Cp; Cp = η⁵‐cyclopentadienyl; MAO = methylaluminoxane; and TMA = trimethylaluminum) at 60 °C, 2 bar, and Al_TMA/Zr ratios of 0–2700. The polymerization activity was reduced with the addition of TMA for L = Cp but was almost unaffected for the methyl‐substituted catalysts. Increasing the TMA concentration resulted in a lower molecular weight of the polymer, with the largest effect for L = Me₅Cp. A gel permeation chromatography analysis of the polymers revealed a high molecular weight shoulder and a nearly bimodal distribution for L = Me₅Cp at high TMA concentrations. A possible explanation of such a shoulder in terms of long‐chain branching was ruled out by dynamic viscosity measurements. The origin of this effect more likely stemmed from competition between chain transfer to aluminum and β‐hydrogen transfer reactions at two different sites, one TMA‐sensitive and one TMA‐insensitive. Polymerizations at various pressures and temperatures substantiated this assumption. A clue to the underlying mechanism came from investigations of chain transfer to TMA studied with density functional calculations. Complexation of Me₃Al to Zr was much stronger for L = Cp than for L = Me₅Cp. However, the overall chain‐transfer barrier was much higher for L = Cp. These results agreed both with the reduced activity for L = Cp and with the strongly reduced molecular weight for L = Me₅Cp observed with the addition of TMA. © 2001 John Wiley & Sons, Inc. J Polym Sci Part A: Polym Chem 39: 3566–3577, 2001     

Superclean Growth of Graphene Using a Cold‐Wall Chemical Vapor Deposition Approach

Chemical vapor deposition (CVD) has become a promising approach for the industrial production of graphene films with appealing controllability and uniformity. However, in the conventional hot‐wall CVD system, CVD‐derived graphene films suffer from surface contamination originating from the gas‐phase reaction during the high‐temperature growth. Shown here is that the cold‐wall CVD system is capable of suppressing the gas‐phase reaction, and achieves the superclean growth of graphene films in a controllable manner. The as‐received superclean graphene film, exhibiting improved optical and electrical properties, was proven to be an ideal candidate material used as transparent electrodes and substrate for epitaxial growth. This study provides a new promising choice for industrial production of high‐quality graphene films, and the finding about the engineering of the gas‐phase reaction, which is usually overlooked, will be instructive for future research on CVD growth of graphene.     

Approaches for synthesis of soluble poly(3,6‐dihydroxy‐2,7‐carbazole) with phenolic function

Poly(N‐alkyl‐3,6‐dihydroxy‐2,7‐carbazole) which should be soluble and have phenolic function was synthesized through different two routes. The former method was a direct synthesis by polymerizing a 2,7‐dibromo‐3,6‐dihydroxycarbazole monomer using Ni(cod)₂, which only gave a low molecular weight polymer. The latter method was an ether cleavage reaction of methoxy groups in a precursor polymer, poly(3,6‐dimethoxycarbazole), using BBr₃, which gave successfully the objective polymer that has a number average molecular weight of 4300 g/mol comparable to the precursor polymer. They showed large spectral changes in photoabsorption and fluorescence on addition of base. They also showed redox behavior similar to a hydroquinone/benzoquinone couple investigated by cyclic voltammetry. These new functions could be derived from the phenolic hydroxy group in the carbazole unit. © 2018 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2018 , 56, 2039–2044     

2-amino-4,6-lutidineN-oxide complexes formed from various copper(II) salts

Summary Copper(II) complexes of 2-amino-4,6-lutidineN-oxide (4,6DMAH) have been isolated as tetrafluoroborate, nitrate, chloride and bromide salts, and characterized by spectral methods (i.e., i.r., u.v.-vis. and e.s.r.). Variation of the ligand-to-copper(II) ratio yielded solids having the following empirical formulae: [Cu(4,6DMAH)₄]X₂ (X=BF₄), [Cu(4,6DMAH)₂X₂] (X=NO₃, Cl) and [Cu(4,6DMAH)X₂] (X=Br). In addition, a deprotonated ligand complex, Cu(4,6DMA)₂, was prepared using copper(II) acetate. The Sigand usually binds to the copper(II) centresvia theN-oxide oxygen and only the deprotonated ligand coordinatesvia the exocyclic nitrogen as well as the TV-oxide oxygen. The complexes involving coordinated anions and at least two ligands are monomeric while Cu(4,6DMAH)Br₂ is polymeric. The ring substituents affect either the stoichiometry or the stereochemistry of these solids when compared to less sterically demanding 2-aminopyridineN-oxides.