The effect of bombardment with neutralized neon ions on the roughness of a fused silica and beryllium surface

The effect of Ne ion beam etching on the roughness of materials for optical substrates—fused silica and beryllium—is studied. It is shown that the treatment of a fused silica surface by neutralized Ne ions with an energy of 400–800 eV makes it possible to smooth roughnessed in the range of higher spatial frequencies of 3–63 μm^–1 at an incidence angle of 0°–30°. For beryllium, the possibility of smoothing the surface roughness at an ion energy of 400 eV is found.     

Investigation of the binary model of scattering of 1 keV to 25 eV Ar+ ions from a Cu surface 1

The validity of the binary collision approximation for describing the scattering of low energy Ar ions from a polycrystalline Cu surface was investigated. The Ar ions were incident upon the target surface at an angle of 45° (with respect of the plane of the surface). The range of primary ion energy studied was 1000–25 eV. An ultra-high vacuum magnetic sector mass spectrometer was used to analyze those secondary ions emitted from the specimen surface at an angle of 90° with respect to the primary ion beam. The scattered ions were identified and their energies measured. No significant deviation from the prediction of the binary collision model was found throughout the range of energy studied.     

Effect of the electron beam and ion flux parameters on the rate of plasma nitriding of an austenitic stainless steel

The method of nitriding of metals in an electron beam plasma is used to change the current density and energy of nitrogen ions by varying the electron beam parameters (5–20 A, 60–500 eV). An electron beam is generated by an electron source based on a self-heated hollow cathode discharge. Stainless steel 12Kh18N10T is saturated by nitrogen at 500°C for 1 h. The microhardness is measured on transverse polished sections to obtain the dependences of the nitrided layer thickness on the ion current density (1.6–6.2 mA/cm²), the ion energy (100–300 eV), and the nitrogen-argon mixture pressure (1–10 Pa). The layer thickness decreases by 4–5 μm when the ion energy increases by 100 V and increases from 19 to 33 μm when the ion current density increases. The pressure dependence of the layer thickness has a maximum. These results are in conflict with the conclusions of the theory of the limitation of the layer thickness by ion sputtering, and the effective diffusion coefficient significantly exceeds the well-known reported data.     

Inelastic effect in low energy ion-surface collisions: He+Au,Ag

Energy distributions of He⁺ ions scattered by Au and Ag surfaces are measured by an ISS system with high energy resolution, at a scattering angle of 90° and at incident ion energies ranging from 277 to 977 eV. It is found that the observed peak energies deviate toward the low energy side by several electron-volts with respect to the calculated elastic single collision energies. Both the deviation Q' and the inelastic loss energy Q are plotted as a function of incident ion energy for the Au surface.     

Accommodation coefficients for low-energy ions on metal surfaces

The interaction of low-energy ions (E = 3 to 100 eV) with the surface of a solid cannot be treated in terms of gas dynamics. The scattering of particles at an energy of E _o > 20 eV may be explained in terms of binary collisions with the atoms of the target. The validity of the single collision model with free surface atoms for medium energies from 10 to 100 eV and even down to 1 eV was confirmed on the basis of both experimental and computational data. This paper describes experimental studies of the secondary ion emission from the (100) and (110) faces of a Mo single crystal and both experimental and theoretical studies of alkaline ion accommodation coefficient on polycrystalline Mo within the energy range E = 3 to 50 eV with a varying direction of the primary ion beam from normal to the glancing angle of incidence (ρ = 0 to 75°). On the basis of the retarding potential method using a spherical condenser whose central electrode was the target, we measured the energy distribution of secondary ions. Calculations have been performed for the energy of scattered ions and the high energy portion of accommodation coefficient on the basis of single and double binary collisions using the Born-Mayer potential and taking into consideration the influence of adsorption forces at the surface of the target.     

The scattering of hydrogen from a cesiated tungsten surface

The reflection of protons from a partially cesiated tungsten surface is studied in the energy domain between 100 and 2000 eV and in the angular domain between 75° and 85° with respect to the surface normal. The study is performed by measuring the angular and energy distribution of the scattered negative ions. The reflection can take place along two paths. One path is reflection from the cesium surface layer, the other one is reflection from the tungsten substrate. A dependence of the final charge state on the path is observed. It is inferred that this phenomenon is due to incomplete neutralization of the protons scattered from the cesium layer. The energy loss of the reflected ions cannot be accounted for by using only the binary collision model. Also the electronic stopping of the atoms by the metal electrons is shown to be an important energy loss mechanism. Total conversion measurements of H⁺ to H^- combined with the measurements of the negatively charged fraction of the scattered particles, as reported in the proceeding paper, yield the particle reflection coefficient as a function of the angle of incidence. These reflection coefficients show that for angles of incidence less than 75° already more than 50% of the particles do not reflect from the surface. Total conversion efficiency measurements with H^- ions as primary ions show that the influence of the initial charge state on the total conversion is very small.     

几种微构件材料的表面能及纳观黏附行为研究

对微机电系统（MEMS）中几种常用构件材料的表面能及其主要影响因素进行了探讨,并与材料表面的纳观黏附性能进行了分析比较.用Owens二液法计算出硅基材料的表面能在60—75 mJ/m²之间,它们之间总表面能的差异主要归结为表面能极性分量的差异,表面粗糙度的存在使表观表面能有所偏高.施加自组装分子膜后的表面能大为降低,粗糙度的存在可以使其表面能进一步减小.纳观黏附力和表面能之间有一定的对应关系.另外,在研究中发现表面粗糙度对纳观黏附行为的影响较小. 关键词： MEMS 表面能 纳观黏附 粗糙度     

Study of the angular and energy distributions of Na+ and K+ ions which have passed through thin copper films

The angular and energy distributions of alkaline Na⁺ and K⁺ ions which have passed through thin Cu films in different crystal states are studied. The ion energy E₀ is varied from 10 to 40 keV, and the incidence angle. ranges from 0° to 60°. The angular aperture of the detector is ～0.5°, which allows the form of the angular distribution of ions which have passed through the solid thin films as a function of the energy, the angle of primary-ion beam incidence, and the layer thickness to be studied in detail. It is shown that, in the range E₀ = 10.40 keV, the energy loss ΔE of those ions that have passed increases linearly as the energy of incident ions increases. The energy loss increases with increasing ion mass in the case of singly charged ions. The surface amorphization of single- and polycrystalline films leads to an increase (by 150–200 eV) in the energy loss caused by the diffuse propagation of ions and to loss-peak broadening. It is probable that surface amorphization is accompanied by an increase in the number of atoms experiencing multiple collisions with atoms of the film, which leads to an increase in the average energy loss by ions that have passed through films.     

Dynamics of femtosecond laser-produced plasma ions

We investigated the ion laser-produced plasma plume generated during ultrafast laser ablation of copper and silicon targets in high vacuum. The ablation plasma was induced by ≈50 fs, 800 nm Ti:Sa laser pulses irradiating the target surface at an angle of 45°. An ion probe was used to investigate the time-of-flight profiles of the emitted ions in a laser fluence range from the ablation threshold up to ≈10 J/cm². The angular distribution of the ion flux and average velocity of the produced ions were studied by moving the ion probe on a circle around the ablation spot. The angular distribution of the ion flux is well described by an adiabatic and isentropic model of expansion of a plume produced by laser ablation of solid targets. The angular distribution of the ion flux narrows as the laser pulse fluence increases. Moreover, the ion average velocity reaches values of several tens of km/s, evidencing the presence of ions with kinetic energy of several hundred eV. Finally, the ion flux energy is confined in a narrow angular region around the target normal.     

Room-temperature deposition of transparent conductive Al-doped ZnO thin films using low energy ion bombardment

Al-doped zinc oxide (AZO) films are prepared on quartz substrates by dual-ion-beam sputtering deposition at room temperature (∼25°C). An assisting argon ion beam (ion energy E _i =0–300 eV) directly bombards the substrate surface to modify the properties of AZO films. The effects of assisted-ion beam energy on the characteristics of AZO films were investigated in terms of X-ray diffraction, atomic force microscopy, Raman spectra, Hall measurement and optical transmittance. With increasing assisting-ion beam bombardment, AZO films have a strong improved crystalline quality and increased radiation damage such as oxygen vacancies and zinc interstitials. The lowest resistivity of 4.9×10⁻³Ω cm and highest transmittance of above 85% in the visible region were obtained under the assisting-ion beam energy 200 eV. It was found that the bandgap of AZO films increased from 3.37 to 3.59 eV when the assisting-ion beam energy increased from 0 to 300 eV.     

Features of Ion-Beam Polishing of the Surface of Sapphire

The effect of an argon ion beam on the surface of sapphire is studied at different technological parameters: the ion energy, and the angle α between the sapphire surface and the ion-beam axis. The roughness of the sapphire surface is analyzed before and after ion polishing. The optimum ion-beam parameters are determined, at which the surface roughness after polishing decreases to 0.8 nm. At angles α = 20°–30°, the relief of the sapphire surface is found to become wavy. The study of the impact of the ion energy on the roughness of the sapphire surface in the 400–1200-eV range reveals that an increase in the energy of the ion beam to 1200 eV is accompanied with a decrease by 8.8 times in the roughness which falls below the level of 3 nm.     

Electron stimulated desorption of oxygen from nickel

Electron Stimulated Desorption (ESD) of O⁺ ions from oxygen-covered Ni(100) has been investigated at 390 K and 500 eV primary energy. The ion energy distribution is found to peak at 7.5 eV and to extend to 11 eV, over our whole exposure range (0–1000 L). The 7.5 eV peak height as a function of exposure shows that desorption takes place both in the chemisorption and the oxidation region. Emission of O⁺ occurs preferentially along the surface normal, with a base width of ≈ 60°. No azimuthal structure is observed. Additional electron energy dependent measurements clearly show a threshold near the oxygen 2s level.     

Measurements of X-ray absorption spectra by the prism spectroscopy method

X-ray absorption spectra of a number of samples were measured in the range 5–30 keV by the prism spectrophotometry method. The spectral decomposition was performed using an optically polished diamond prism with an opening angle of 90°. The absorption spectra of liquid bromonaphthalene are presented as an example. An energy resolution of 100–130 eV was achieved in the energy range of ～10 keV, providing the unambiguous identification of elements by jumps in the K photoabsorption.     

Energieverlustmessungen an Silber mit hoher Energieauflösung

In energy loss experiments on Ag-films with monochromatic fast electrons the separation of surface and volume loss is demonstrated. The surface loss is found at 3.63 0.02 eV with a half-width of ≈250 mV. The volume loss at 3.78±0.02 eV has a halfwidth of 75±15 mV. The energy loss spectrum is compared with that computed from optical data by means of the dielectric theory and shows good agreement. Also the dependance of the surface loss from the scattering angle and the angle of incidence is in agreement with calculated values. The shift of the volume loss with temperature of ?2.5·10^?4 eV/degree agrees with values obtained from experiments on plasma radiation.     

Optical and structural characterization of ultrananocrystalline diamond/hydrogenated amorphous carbon composite films deposited via coaxial arc plasma

Ultrananocrystalline diamond/hydrogenated amorphous carbon composite films were deposited in the ambient of hydrogen by coaxial arc plasma deposition. The film compositions and chemical bonding structures were investigated by X-ray diffraction, X-ray photoemission and hydrogen forward scattering spectroscopies. The sp³/(sp²+sp³) ratio and hydrogen content in the film were estimated to be 64% and 35?at.%, respectively. The optical parameters and the optical dispersion profile were determined by using a variable angle spectroscopic ellipsometer at 55°, 65° and 75° angle of incidence in the photon energy range of 0.9–5?eV. Combinations of multiple Gaussian, and Tauc-Lorentz or Cody-Lorentz dispersion functions are used to reproduce the experimental data. Results of ellipsometry showed a refractive index of approximately 2.05 (at 2eV) and optical band gap of 1.63?eV. The imaginary part of dielectric function exhibited a peak at 3.8?eV, which has assigned to π-π* electron transitions. Furthermore, Electron spin resonance measurements implied the existence of dangling bonds, which might have a partial contribution to the optical absorption properties of the deposited films. A correlation between optical parameters and structural profile of the deposited films is discussed.     

Features of the energy distribution of secondary particles upon the ion bombardment of graphite

The secondary emission of carbon atoms from the (0001) plane of graphite nanocrystallites bombarded with argon ions with energies of 1 and 10 keV and the incidence angle α = 45° is investigated. The unusual oscillating energy distributions of secondary C⁺ ions with main maxima E _max in the range of 40–60 eV and peaks corresponding to the energies E ₁ ≈ 20, 30, 70, 80, and 100 eV have been revealed. The C⁺ ion yield decreases, the energy spectrum increases, and the maximum E _max shifts to larger energies E ₁ with increasing emission angle (with respect to the normal to the surface). The secondary-ion emission from the (0001) face of graphite is numerically simulated with allowance for the charge exchange of secondary ions to obtain a qualitative explanation of the observed results.     

Ion source with electron ionization for a portable mass spectrometer

An ion source with electron ionization is considered. The charged-particle flow at the exit from this source has a cross section of ∼0.1 × 0.1 mm, an angle spread of 2° × 2°, a relative energy spread of <0.5%, and an energy range of 0.5–3.0 keV. This ion source is intended for systems where an ion beam is focused in two mutually perpendicular directions. The ion source design makes it possible to ionize a sample locally (in a volume of ∼10 mm³), where the concentration of the particles under study exceeds the concentration averaged over the volume of the vacuum chamber of the mass spectrometer by two to three orders of magnitude. The ion-optical properties of the source are numerically simulated, and the optimum parameters of the source are chosen. Examples of the application of the ion source are given for the mass-spectrometric determination of metal salts in aqueous solutions and of gases and volatile compounds in samples in various phase states.     

Electron and positron work functions of Cr(100)

We report measurements of the electron and positron work functions of submonolayer contaminated single crystal surfaces of Cr(100) in ultra high vacuum. The positron work function ø₊ is obtained by measuring the spectrum of slow positrons reemitted by the Cr(100) surface when it is bombarded with keV energy positrons. The electron work function ø_- is measured relative to Al(100) by comparing the target biases at which the slowest emitted positrons are recollected by the target. We obtain ø₊ = ?1.76(10) eV and ø_- = 4.46(6) eV for our Cr(100) surface using the value ø_- = 4.41(3) eV for Al(100) reported by Grepstad, Gartland and Slagsvold. The ø₊ value is in agreement with the ?2.2 eV calculated by Nieminen and Hodges. The positronium work function for Cr implied by these results is ?4.10(10) eV; the positronium negative ion (Ps^-) work function for this surface is calculated to be + 0.37(7) eV. A search for Ps^- showed that at a 90% confidence level less than one in 10³ thermalized positrons reaching the Cr surface are emitted as Ps^-. The slow positron emission spectrum was observed not to change over the 70–300 K range in contrast to recent theoretical predictions.     

宽束冷阴极离子源分时中和技术的研究

离子束辅助镀膜沉积过程中,绝缘薄膜表面的电荷积累效应严重影响了薄膜质量。通过对宽束冷阴极离子源引出栅部分的改进,采用分时引出电子和离子方法,使正负电荷中和,以消除薄膜表面的放电现象,并对引出电子束的束流密度、能量、发射角等参数进行了测试。实验结果表明：在引出电压为600V时,电子的平均能量为100eV左右;引出电子束的发射角可以达到±40°,在±15°范围内的束流密度波动小于±5%。引出电子的束流密度较同参数下的离子束流密度小,通过调节脉冲电源的占空比,可达到很好的中和效果。     

Multiple scattering features in neon ion scattering spectra (ISS) from polycrystalline materials

A systematic investigation of multiple scattering from polycrystalline materials in ion scattering spectrometry was carried out using Ne⁺ at a scattering angle of 90° over the energy range of 100 to 2500 eV. It was found that the intensity of multi scattering shoulders increased with ion beam energy. The intensity at a given energy could be predicted on the basis of interatomic distances of the target. The larger the interatomic distance, the more intense the multi scattering shoulder. The separation of the double scattering shoulder from the binary peak decreased linearly with increasing mass, and the maximum of the shoulder to higher energies from the binary peak could be calculated by the relationship $\text{ΔE}\text{E}{}_0\text{= 0.166 ?(0.00064)M}$, where M is the mass of the target atom.