Tailoring the surface chemistry of carbon fiber and E‐glass composites for improved adhesion

The main challenges in the manufacture of composite materials are low surface energy and the presence of silicon‐containing contaminants, both of which greatly reduce surface adhesive strength. In this study, carbon fiber (CF) and E‐glass epoxy resin composites were surface treated with the Accelerated Thermo‐molecular adhesion Process (ATmaP). ATmaP is a multiaction surface treatment process where tailored nitrogen and oxygen functionalities are generated on the surface of the sample through the vaporization and atomization of n‐methylpyrrolidone solution, injected via specially designed flame‐treatment equipment. The treated surfaces of the polymer composites were analyzed using XPS, time of flight secondary ion mass spectrometry (ToF‐SIMS), contact angle (CA) analysis and direct adhesion measurements. ATmaP treatment increased the surface concentration of polar functional groups while reducing surface contamination, resulting in increased adhesion strength. XPS and ToF‐SIMS showed a significant decrease in silicon‐containing species on the surface after ATmaP treatment. E‐glass composite showed higher adhesion strength than CF composite, correlating with higher surface energy, higher concentrations of nitrogen and C?O functional groups (from XPS) and higher concentrations of oxygen and nitrogen‐containing functional groups (particularly C₂H₃O⁺ and C₂H₅NO⁺ molecular ions, from ToF‐SIMS). Copyright © 2010 John Wiley & Sons, Ltd.     

Photodegradation of poly(ether sulphone) Part 1. A time‐of‐flight secondary ion mass spectrometry study

An extensive study of the surface chemical changes to poly(ether sulphone) (PES) ultrafiltration membranes is made for the first time by the use of time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) after photoirradiation at 254 nm with irradiances varying from 10 to 300 mJ cm^?2 in a nitrogen atmosphere. Complementary information is provided by analysis with x‐ray photoelectron spectroscopy (XPS) and attenuated total reflectance Fourier transform infrared spectroscopy (ATR‐FTIR). The versatility, superior specificity and sensitivity of using ToF‐SIMS to investigate degradation phenomena are highlighted. The combined results demonstrate that photoirradiation causes a number of chemical changes to the surface: incorporation of oxygen; degradation of the benzene rings and formation of oxidized carbon species; depletion of carbon; reduction of ? SO₂? to some extent; formation of ? OH, C?O and ? SO₃H groups; and probable formation of ? C₆H₄? O? C₆H₅ end‐groups. In addition, no ? OSO₃H groups are formed and no formation of SO₂ is detected. Also, it is shown that chain scission dominates below an irradiation dose of ～200 mJ cm^?2 (at 254 nm in a nitrogen atmosphere). At higher doses, cross‐linking becomes dominant. Copyright © 2004 John Wiley & Sons, Ltd.     

ToF‐SIMS depth profiling of a complex polymeric coating employing a C60 sputter source

A complex poly(vinylidene difluoride) (PVdF)/poly(methyl methacrylate) (PMMA)‐based coil coating formulation has been investigated using time‐of‐flight SIMS (ToF‐SIMS). Employing a Bi₃⁺ analysis source and a Buckminsterfullerene (C₆₀) sputter source, depth profiles were obtained through the polymeric materials in the outer few nanometres of the PVdF topcoat. These investigations demonstrate that the PVdF coating's air/coating interface is composed principally of the flow agent included in the formulation. Elemental depth profiles obtained in the negative ion mode demonstrate variations in the carbon, oxygen and fluorine concentrations within the coating with respect to depth. All three elemental depth profiles suggest that the PVdF coating bulk possesses a constant material composition. The oxygen depth profile reveals the presence of a very thin oxygen‐rich sub‐surface layer in the PVdF coating, observed within the first second of the sputter/etch profile. Retrospectively, extracted mass spectra (from the elemental depth profile raw data set) of the PVdF coating sub‐surface and bulk layers indicates this oxygen‐rich sub‐surface layer results from segregation of the acrylic co‐polymers in the formulation towards the PVdF coating air/coating interface. Molecular depth profiles obtained in both the positive and negative secondary ion modes provide supporting evidence to that of the elemental depth profiles. The molecular depth profiles confirm the presence of a sub‐surface layer rich in the acrylic co‐polymers indicating segregation of the co‐polymers towards the PVdF topcoats air‐coating surface. The molecular depth profiles also confirm that the PVdF component of the topcoat is distributed throughout the coating but is present at a lower concentration at the air‐coating interface and in the sub‐surface regions of the coating, than in the coating bulk. Copyright © 2007 John Wiley & Sons, Ltd.     

Onset of surface segregation controlled by the segment length of the low‐energy component of polymers

Films of a series of polymers with variable CF₂ segments were studied by angle‐dependent X‐ray photoelectron spectroscopy (ADXPS) and time‐of‐flight secondary ion mass spectroscopy (ToF‐SIMS). The effects of the length of the CF₂ segment on the surface composition of the polymers were investigated. ADXPS results indicated that the CF₂ segment segregated on the surface of the polymers after thermal annealing at temperatures above their bulk glass transition temperatures when the number of CF₂ units was increased to 8. Because of the higher surface sensitivity, ToF‐SIMS results showed more CF₂ segments at the topmost surface than shown by ADXPS. Copyright © 2006 John Wiley & Sons, Ltd.     

Photodegradation of poly(ether sulphone) Part 2. Wavelength and atmosphere dependence

The photodegradation of poly(ether sulphone) (PES) was investigated systematically by time‐of‐flight SIMS (ToF‐SIMS) and x‐ray photoelectron spectroscopy (XPS). The effect of varying the irradiation dose, wavelength and the atmosphere was studied along with mechanistic photooxidation studies using ¹⁸O₂. Photoinduced ? SO₃H group formation was observed at 199, 260 and 315 nm for an oxygen‐containing atmosphere only. Photoinduced ? OH group formation is observed at all investigated wavelengths and atmospheres. Photoinduced cross‐linking was an important process in a vacuum. The oxygen reacts quickly with the PES surface during photoirradiation and chain scission was found to be the dominant process, and oxygen incorporation was found to be non‐specific but pronounced for ? SO₃H group formation. It was found that for conditions where processes are affected by photoirradiation the extent is observed to follow the UV absorption and showed little dependence on the wavelength. The wavelength only affects the extent of the process in question, which is ascribed to a fast equilibrium of the absorbed energy. The photoinduced processes are very sensitive towards the presence of the smallest amounts of oxygen in the atmosphere. Copyright © 2004 John Wiley & Sons, Ltd.     

Quantitative analysis of styrene‐pentafluorostyrene random copolymers by ToF‐SIMS and XPS

Poly(styrene) (PS), poly(2,3,4,5,6‐pentafluorostyrene) (5FPS) and their random copolymers were prepared by bulk radical polymerization. The spin‐cast polymer films of these polymers were analyzed using X‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS). The surface and bulk compositions of these copolymers were found to be same, implying that surface segregation did not occur. The detailed analysis of ToF‐SIMS spectra indicated that the ion fragmentation mechanism is similar for both PS and 5FPS. ToF‐SIMS quantitative analysis using absolute peak intensity showed that the SIMS intensities of positive styrene fragments, particularly C₇H₇⁺, in the copolymers are higher than the intensities expected from a linear combination of PS and 5FPS, while the SIMS intensities of positive pentafluorostyrene fragments are smaller than expected. These results indicated the presence of matrix effects in ion formation process. However, the quantitative approach using relative peak intensity showed that ion intensity ratios are linearly proportional to the copolymer mole ratio when the characteristic ions of PS and 5FPS are selected. This suggests that quantitative analysis is still possible in this copolymer system. Copyright © 2005 John Wiley & Sons, Ltd.     

Effects of Ar‐ and Ar/O2‐plasma‐treated amorphous and crystalline polymer surfaces revealed by ToF‐SIMS and principal component analysis

The effects of argon (Ar) and a mixture of Ar and oxgyen(Ar/O₂) plasmas on amorphous and semi‐crystalline poly(bisphenol A hexane ether) thin films were investigated by time‐of‐flight secondary ion mass spectroscopy (ToF‐SIMS) and principal component analysis (PCA). PCA results of the ToF‐SIMS spectra indicate that an Ar/O₂ plasma produced less physical sputtering and had a higher chemical reactivity than did an Ar plasma, regardless of whether an amorphous or a crystalline surface was involved. However, the chemical differences between the Ar‐ and Ar/O₂‐plasma‐treated semi‐crystalline films were much smaller. The observed results can be explained by the higher resistance of the polymer crystalline regions to physical sputtering and chemical etching. Copyright © 2013 John Wiley & Sons, Ltd.     

ToF‐SIMS studies of the oxidation of Fe by D2O vapour: comparison with XPS

The oxidation of iron (Fe) by water (D₂O) vapour at low pressures and room temperature was investigated using time‐of‐flight (ToF) SIMS. The results supported those found previously using XPS and the QUASES^? program in that a duplex oxide structure was found containing a thin outer surface hydroxide (Fe(OD)₂) layer over an inner oxide (FeO) layer. The extraordinary depth resolution of the ToF‐SIMS profiles assisted in identifying the two phases; this resolution was achieved by compensation for surface roughness. A substantial concentration of deuterium was found in the subsurface oxide layer. This observation confirmed previous assessments that the formation of FeO was from the reaction of Fe(OD)₂ with outward‐diffusing Fe, leaving deuterium as a reaction product. Copyright © 2005 John Wiley & Sons, Ltd.     

Interaction of O2, CO and CO2 with Co films

Metastable impact electron spectroscopy (MIES), ultraviolet photoelectron spectroscopy (UPS(HeI)) and x‐ray photoelectron spectroscopy (XPS) were applied to study the interaction of O₂, CO and CO₂ with Co films at room temperature. The films were produced on Si(100) surfaces under the in situ control of MIES, UPS and scanning tunnelling microscopy (STM). For O₂, dissociative adsorption takes place initially and then incorporation of oxygen starts at exposures of ～5 L. Comparison of the MIES and UPS spectra with those published for CoO shows that near‐stoichiometric CoO films can be obtained by co‐deposition of Co and O₂. The CO is adsorbed molecularly up to a maximum coverage of ～0.6 monolayer, with the C‐end pointing towards the surface. The CO₂ adsorption is dissociative, resulting in the formation of Co–CO bonds at the surface. The resulting oxygen atoms are mostly incorporated into the Co layer. For all studied molecules the interaction with Co is similar to that with Ni. Copyright © 2005 John Wiley & Sons, Ltd.     

Multi‐instrument characterization of the surfaces and materials in microfabricated,carbon nanotube‐templated thin layer chromatography plates. An analogy to ‘The Blind Men and the Elephant’

We apply a suite of analytical tools to characterize materials created in the production of microfabricated thin layer chromatography plates. Techniques used include X‐ray photoelectron spectroscopy (XPS), valence band spectroscopy, time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) in both positive and negative ion modes, Rutherford backscattering spectroscopy (RBS), and helium ion microscopy. Materials characterized include: the Si(100) substrate with native oxide: Si/SiO₂, alumina (35 nm) deposited as a diffusion barrier on the Si/SiO₂: Si/SiO₂/Al₂O₃, iron (6 nm) thermally evaporated on the Al₂O₃: Si/SiO₂/Al₂O₃/Fe, the iron film annealed in H₂ to make Fe catalyst nanoparticles: Si/SiO₂/Al₂O₃/Fe(NP), and carbon nanotubes (CNTs) grown from the Fe nanoparticles: Si/SiO₂/Al₂O₃/Fe(NP)/CNT. The Fe films and nanoparticles appear in an oxidized state. Some of the analyses of the CNTs/CNT forests appear to be unique: (i) the CNT forest appears to exhibit an interesting ‘channeling’ phenomenon by RBS, (ii) we observe an odd–even effect in the SIMS spectra of C_n^‐ species for n = 1 – 6, with the n ≥ 6 ions showing a steady decrease in intensity, and (iii) valence band characterization of CNTs using X‐radiation is reported. Initial analysis of the CNT forest by XPS shows that it is 100 at.% carbon. After one year, only ca. 0.25 at.% oxygen is observed. The information obtained from the combination of the different analytical tools provides a more complete understanding of our materials than a single technique, which is analogous to the story of ‘The Blind Men and the Elephant’. The raw XPS and ToF‐SIMS spectra from this study will be submitted to Surface Science Spectra for archiving. Copyright © 2013 John Wiley & Sons, Ltd.     

Repair of defects created by Ar+ sputtering on graphite surface by annealing as confirmed using ToF‐SIMS and XPS

Defects were created on the surface of highly oriented pyrolytic graphite (HOPG) by sputtering with an Ar⁺ ion beam, then characterized using X‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) at 500°C. In the XPS C1s spectrum of the sputtered HOPG, a sp³ carbon peak appeared at 285.3 eV, representing surface defects. In addition, 2 sets of peaks, the C_x⁻ and C_xH⁻ ion series (where x = 1, 2, 3...), were identified in the ToF‐SIMS negative ion spectrum. In the positive ion spectrum, a series of C_xH₂^+• ions indicating defects was observed. Annealing of the sputtered samples under Ar was conducted at different temperatures. The XPS and ToF‐SIMS spectra of the sputtered HOPG after 800°C annealing were observed to be similar to the spectra of the fresh HOPG. The sp³ carbon peak had disappeared from the C1s spectrum, and the normalized intensities of the C_xH⁻ and C_xH₂^+• ions had decreased. These results indicate that defects created by sputtering on the surface of HOPG can be repaired by high‐temperature annealing.     

Hydroxylation of the silica in microfabricated thin layer chromatography plates as probed by time‐of‐flight secondary ion mass spectrometry and diffuse reflectance infrared Fourier transform spectroscopy

Microfabricated silica thin layer chromatography (TLC) plates have previously been prepared on patterned carbon nanotube forests. The high temperatures used in their fabrication reduce the number of hydroxyl groups on their surfaces. Fortunately, silica can be rehydroxylated. In diffuse reflectance infrared Fourier transform spectroscopy (DRIFT), a silanol peak below 3740 cm^?1 indicates a well‐hydroxylated silica surface that is fit for chromatography. Hydroxylations of our materials with HF are so effective that it is not possible to discern the position of this peak. In contrast, this signal is discernable when the plates are treated with NH₄OH. To find a more convenient method for studying the surfaces of TLC plates, time‐of‐flight secondary ion mass spectroscopy (ToF‐SIMS) was considered. ToF‐SIMS is advantageous because multiple microfabricated TLC plates must be scraped to obtain enough silica for one DRIFT analysis, while static SIMS can be performed on very small regions (500 × 500 µm² or less) of individual plates. Ratios of the SiOH⁺ and Si⁺ ToF‐SIMS signals for microfabricated TLC plates correlated well with ~3740 cm^?1 silanol peaks from DRIFT. Thus, SIMS allows direct analysis of all of our treated and untreated plates, including those hydroxylated with HF. The best hydroxylation condition for HF, which was better than any studied for NH₄OH, was around 150 ppm at room temperature. The best hydroxylation condition for NH₄OH was 50 °C for 72 h. ToF‐SIMS versus DRIFT results of commercial TLC plates were also obtained and evaluated. Copyright © 2014 John Wiley & Sons, Ltd.     

A Doping Technique that Suppresses Undesirable H2 Evolution Derived from Overall Water Splitting in the Highly Selective Photocatalytic Conversion of CO2 in and by Water

Photocatalytic conversion of CO₂ to reduction products, such as CO, HCOOH, HCHO, CH₃OH, and CH₄, is one of the most attractive propositions for producing green energy by artificial photosynthesis. Herein, we found that Ga₂O₃ photocatalysts exhibit high conversion of CO₂. Doping of Zn species into Ga₂O₃ suppresses the H₂ evolution derived from overall water splitting and, consequently, Zn‐doped, Ag‐modified Ga₂O₃ exhibits higher selectivity toward CO evolution than bare, Ag‐modified Ga₂O₃. We observed stoichiometric amounts of evolved O₂ together with CO. Mass spectrometry clarified that the carbon source of the evolved CO is not the residual carbon species on the photocatalyst surface, but the CO₂ introduced in the gas phase. Doping of the photocatalyst with Zn is expected to ease the adsorption of CO₂ on the catalyst surface.     

Investigation of block depth distribution in PS‐b‐PMMA block copolymer using ultra‐low‐energy cesium sputtering in ToF‐SIMS

Directed self‐assembly of block copolymers (BCPs) is a promising candidate for next generation nanolithography. In order to validate a given pattern, the lateral and in‐depth distributions of the blocks should be well characterized; for the latter, time‐of‐flight (ToF) SIMS is a particularly well‐adapted technique. Here, we use an ION‐TOF ToF‐SIMS V in negative mode to provide qualitative information on the in‐depth organization of polystyrene‐b‐polymethylmethacrylate (PS‐b‐PMMA) BCP thin films. Using low‐energy Cs⁺ sputtering and Bi₃⁺ as the analysis ions, PS and PMMA homopolymer films are first analyzed in order to identify the characteristic secondary ions for each block. PS‐b‐PMMA BCPs are then characterized showing that self‐assembled nanodomains are clearly observed after annealing. We also demonstrate that the ToF‐SIMS technique is able to distinguish between the different morphologies of BCP investigated in this work (lamellae, spheres or cylinders). ToF‐SIMS characterization on BCP is in good agreement with XPS analysis performed on the same samples. Copyright © 2013 John Wiley & Sons, Ltd.     

An Atomic‐Scale View of CO and H2 Oxidation on a Pt/Fe3O4 Model Catalyst

Metal–support interactions are frequently invoked to explain the enhanced catalytic activity of metal nanoparticles dispersed over reducible metal oxide supports, yet the atomic‐scale mechanisms are rarely known. In this report, scanning tunneling microscopy was used to study a Pt_1‐6/Fe₃O₄ model catalyst exposed to CO, H₂, O₂, and mixtures thereof at 550 K. CO extracts lattice oxygen atoms at the cluster perimeter to form CO₂, creating large holes in the metal oxide surface. H₂ and O₂ dissociate on the metal clusters and spill over onto the support. The former creates surface hydroxy groups, which react with the support, ultimately leading to the desorption of water, while oxygen atoms react with Fe from the bulk to create new Fe₃O₄(001) islands. The presence of the Pt is crucial because it catalyzes reactions that already occur on the bare iron oxide surface, but only at higher temperatures.     

ToF‐SIMS study of 1‐dodecanethiol adsorption on Au,Ag, Cu and Pt surfaces

Time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) has been used to perform a chemical analysis of long‐chain thiol (CH₃(CH₂)₁₁SH)‐treated gold, silver, copper and platinum surfaces. All the mass peaks from positive and negative ion spectra within the range m/z = 0–2000 u are studied. ToF‐SIMS data revealed that on gold, silver and copper substrates 1‐dodecanethiol form dense standing‐up phases, but on platinum being a catalytically active substrate, we were able to identify also surface‐aligned parallel lying molecules in addition to a standing thiolate layer. Our study shows that when ToF‐SIMS spectra are analyzed, not only the existence of oligomers but also metal + hydrocarbon fragments give information about the order of SAM. Copyright © 2008 John Wiley & Sons, Ltd.     

Ultrashallow depth profiling using SIMS and ion scattering spectroscopy

The accuracy of ultrashallow depth profiling was studied by secondary ion mass spectrometry (SIMS) and high‐resolution Rutherford backscattering spectroscopy (HRBS) to obtain reliable depth profiles of ultrathin gate dielectrics and ultrashallow dopant profiles, and to provide important information for the modeling and process control of advanced complimentary metal‐oxide semiconductor (CMOS) design. An ultrathin Si₃N₄/SiO₂ stacked layer (2.5 nm) and ultrashallow arsenic implantation distributions (3 keV, 1 × 10¹⁵ cm^?2) were used to explore the accuracy of near‐surface depth profiles measured by low‐energy O₂⁺ and Cs⁺ bombardment (0.25 and 0.5 keV) at oblique incidence. The SIMS depth profiles were compared with those by HRBS. Comparison between HRBS and SIMS nitrogen profiles in the stacked layer suggested that SIMS depth profiling with O₂⁺ at low energy (0.25 keV) and an impact angle of 78° provides accurate profiles. For the As⁺‐implanted Si, the HRBS depth profiles clearly showed redistribution in the near‐surface region. In contrast, those by the conventional SIMS measurement using Cs⁺ primary ions at oblique incidence were distorted at depths less than 5 nm. The distortion resulted from a long transient caused by the native oxide. To reduce the transient behavior and to obtain more accurate depth profiles in the near‐surface region, the use of O₂⁺ primary ions was found to be effective, and 0.25 keV O₂⁺ at normal incidence provided a more reliable result than Cs⁺ in the near‐surface region. Copyright © 2007 John Wiley & Sons, Ltd.     

Reduction of Carbon Oxides by an Acyclic Silylene: Reductive Coupling of CO

Reactions of a boryl‐substituted acyclic silylene with carbon dioxide and monoxide are reported. The former proceeds through oxygen atom abstraction, generating CO (with rearrangement of the putative silanone product through silyl‐group transfer). The latter is characterized by reductive coupling of CO to give an ethynediolate fragment, which undergoes formal insertion into the Si?B bond. The net conversion of carbon dioxide with two equivalents of silylene offers a route for the three‐electron reduction of CO₂ to [C₂O₂]^2?.     

ToF‐SIMS characterization of glyoxal surface oxidation products by hydrogen peroxide: A comparison between dry and liquid samples

As one of the simplest volatile organic compounds, glyoxal and its oxidation products were considered to be important precursors to aqueous secondary organic aerosol formation. Herein, we analyzed products from glyoxal oxidation by hydrogen peroxide in dry and liquid samples using time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS). ToF‐SIMS spectra and spectral principal component analysis (PCA) were used to investigate surface oxidation products. Dry samples were prepared on clean silicon wafers. Liquid samples consisting of glyoxal and hydrogen peroxide (H₂O₂) were introduced to a vacuum compatible microfluidic reactor prior to UV illumination or dark aging followed by in situ liquid SIMS analysis. A number of reaction products were observed in both dry and liquid samples; different oligomers and carboxylic acids could be formed depending on reaction conditions. In addition, hydrolyzed products were observed in the liquid samples, but not in the dry samples. Although dry samples reveal some products of the aqueous process, they are not fully representative as results from those of the aqueous samples. Our findings suggest that the ability to characterize the liquid surface reaction products provides more realistic information of the reaction products associated with aqueous secondary organic aerosol formation in the atmosphere. Meanwhile, the high mass resolution spectra from the dry sample SIMS measurement are helpful to identify oxidation products in the liquid samples.     

The Mechanistic Study of Methane Reforming with Carbon Dioxide on Ni/α-Al2O3

The reactions of oxidized and reduced 6 wt % NiO/-Al₂O₃ with H₂, CH₄, CO₂, O₂, and their mixtures are studied in flow and pulse regimes using a setup equipped with a differential scanning calorimeter DSC-111 and a system for chromatographic analysis. It is shown that treatment with hydrogen at 700° results in the partial reduction of NiO to Ni. Methane practically does not react with oxidized Ni/-Al₂O₃ but it does react actively with the reduced catalyst to form H₂ and surface carbon. The latter is capable of reacting with lattice oxygen of Ni/-Al₂O₃ (slowly) and with adsorbed oxygen (rapidly). Carbon dioxide also reacts with surface carbon to form CO (rapidly) and with metallic Ni to yield CO and NiO (slowly). Thus, the main route of methane reforming with carbon dioxide on Ni/-Al₂O₃ is the dissociative adsorption of CH₄ to form surface carbon and H₂ and the reaction of this carbon with CO₂ resulting in the formation of CO by the reverse Boudouard reaction. Side routes are the interaction of the products of methane chemisorption with catalyst oxygen and the dissociative adsorption of CO₂ on metallic nickel. A competitive reaction of surface carbon with adsorbed oxygen results in a decrease in the CO₂ conversion in methane reforming with carbon dioxide. Therefore, the presence of gaseous oxygen in the reacting mixture decelerates methane reforming (catalyst poisoning by oxygen).