III–V on silicon: Observation of gallium phosphide anti-phase disorder by low-energy electron microscopy

The formation of anti-phase disorder is a major obstacle in the heteroepitaxy of III–V semiconductors on silicon. For an investigation of the anti-phase domain (APD) structure of GaP/Si(100) samples on mesoscopic length scales, we applied dark-field imaging in a low-energy electron microscope (LEEM) to thin GaP films grown on Si(100) substrates by metal organic vapor phase epitaxy (MOVPE). A contamination-free transfer of the samples from the MOVPE ambient to the ultra-high vacuum chamber of the microscope ensured that the atomically well-ordered, P-rich (2 × 2)/c(4 × 2) reconstruction of the surface was preserved. Mutually perpendicular oriented domains of the characteristic GaP(100) reconstruction identify the APDs in the GaP film at the surface and enabled us to achieve high contrast LEEM images. Striped patterns of APDs reflect the regular terrasse structure of the two-domain Si(100)(2 × 1) substrate far away from defects. APDs in the proximity of the defects have larger lateral extensions and are arranged in target pattern-like structures around the defects. In contrast to transmission electron microscopy, which was also applied in a specific dark-field mode for comparison, the characterization of anti-phase disorder by LEEM is non-destructive, does not require elaborate sample preparation, and addresses extended length scales.     

Growth of Sr2CrReO6 epitaxial thin films by pulsed laser deposition

We report the growth, structural, magnetic, and electrical transport properties of epitaxial Sr₂CrReO₆ thin films. We have succeeded in depositing films with a high crystallinity and a relatively large cationic order in a narrow window of growth parameters. The epitaxy relationship is Sr₂CrReO₆ (SCRO) (0 0 1) [1 0 0]∥SrTiO₃ (STO) (0 0 1) [1 1 0] as determined by high-resolution X-ray diffraction and scanning transmission electron microscopy (STEM). Typical values of saturation magnetization of M_S (300 K)=1 μ_B/f.u. and ρ (300 K)=2.8 mΩ cm have been obtained in good agreement with previous published results in sputtered epitaxial thin films. We estimate that the antisite defects concentration in our thin films is of the order of 14%, and the measured Curie temperature is T_C=481(2) K. We believe these materials be of interest as electrodes in spintronic devices.     

The effect of copper concentration on structural,optical and dielectric properties of CuxZn1 − xS thin films

Cu_xZn_1 ? xS (x = 0, 0.25, 0.50, 0.75, 1) thin films were deposited on glass substrates using Successive Ionic Layer Adsorption and Reaction (SILAR) method at room temperature and ambient pressure. The copper concentration (x) effect on the structural, morphological and optical properties of Cu_xZn_1 ? xS thin films was investigated. The X-ray diffraction (XRD) and scanning electron microscopy (SEM) studies showed that all the films exhibit polycrystalline nature and are covered well with glass substrates. The crystalline and surface properties of the films improved with increasing copper concentration. The energy bandgap values were changed from 2.07 to 3.67 eV depending on the copper concentration. The refractive index (n), optical static and high frequency dielectric constants (ε_o, ε_∞) values were calculated by using the energy bandgap values as a function of the copper concentration.     

Real-space study of the growth of magnesium on ruthenium

The growth of magnesium on ruthenium has been studied by low-energy electron microscopy (LEEM) and scanning tunneling microscopy (STM). In LEEM, a layer-by-layer growth is observed except in the first monolayer, where the completion of the first layer in inferred by a clear peak in electron reflectivity. Desorption from the films is readily observable at 400 K. Real-space STM and low-energy electron diffraction confirm that sub-monolayer coverage presents a moiré pattern with a 12 Å periodicity, which evolves with further Mg deposition by compressing the Mg layer to a 22 Å periodicity. Layer-by-layer growth is followed in LEEM up to 10 ML. On films several ML thick a substantial density of stacking faults are observed by dark-field imaging on large terraces of the substrate, while screw dislocations appear in the stepped areas. The latter are suggested to result from the mismatch in heights of the Mg and Ru steps. Quantum size effect oscillations in the reflected LEEM intensity are observed as a function of thickness, indicating an abrupt Mg/Ru interface.     

Structural and optical properties of Mn-doped ZnO nanocrystalline thin films with the different dopant concentrations

The transparent nanocrystalline thin films of undoped zinc oxide and Mn-doped (Zn_1−xMn_xO) have been deposited on glass substrates via the sol–gel technique using zinc acetate dehydrate and manganese chloride as precursor. The as-deposited films with the different manganese compositions in the range of 2.5–20 at% were pre-heated at 100 °C for 1 h and 200 °C for 2 h, respectively, and then crystallized in air at 560 °C for 2 h. The structural properties and morphologies of the undoped and doped ZnO thin films have been investigated. X-ray diffraction (XRD) spectra, scanning electron microscopy (SEM), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS) were used to examine the morphology and microstructure of the thin films. Optical properties of the thin films were determined by photoluminescence (PL) and UV/Vis spectroscopy. The analyzed results indicates that the obtained films are of good crystal quality and have smooth surfaces, which have a pure hexagonal wurtzite ZnO structure without any Mn related phases. Room temperature photoluminescence is observed for the ZnO and Mn-doped ZnO thin films.     

Influence of heat treatment on field emission characteristics of boron nitride thin films

Boron nitride (BN) nanometer thin films are synthesized on Si (1 0 0) substrates by RF reactive magnetron sputtering. Then the film surfaces are treated in the case of the base pressure below 5 × 10⁻⁴ Pa and the temperature of 800 and 1000 °C, respectively. And the films are studied by Fourier transform infrared spectra (FTIR), atomic force microscopic (AFM) and field emission characteristics at different annealing temperature. The results show that the surface heat treatment makes no apparent influence on the surface morphology of the BN films. The transformations of the sample emission characteristics have to do with the surface negative electron affinity (NEA) of the films possibly. The threshold electric fields are lower for BN samples without heat-treating than the treated films, which possibly ascribed to the surface negative electron affinity effect. A threshold field of 8 V/μm and the emission current of 80 μA are obtained. The surface NEA is still presence at the heat treatment temperature of 800 °C and disappeared at temperature of 1000 °C.     

Exploring the role of samarium in the modification of rhodium catalysts through surface science approach

In this paper we review the preparation and reaction properties of ordered SmRh surface alloys and SmO_x/Rh(1 0 0) model catalyst which have been systematically investigated by low energy electron diffraction (LEED), Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), high-resolution electron energy loss spectroscopy (HREELS) and temperature desorption spectroscopy (TDS). The growth of Sm on Rh(1 0 0) at room temperature follows the Stranski-Krastanov mode. Thermal treatment of the Sm films on Rh(1 0 0) leads to the formation of ordered SmRh surface alloys. An “inverse” SmO_x/Rh(1 0 0) model catalyst is produced under controlled oxidation of the SmRh surface alloy. CO adsorption on the SmRh alloy and SmO_x/Rh(1 0 0) surfaces gives rise to five TDS characteristic features originating from different adsorption sites. Both the site blocking of SmO_x and the electron transfer between SmO_x and Rh substrate significantly affect the CO adsorption. Acetate decomposition on both Rh(1 0 0) and the SmO_x/Rh(1 0 0) surfaces are found to undergo two competitive pathways that yields either (i) CO(a) and O(a) or (ii) CO₂(g) and H₂(g) at high temperature. The reactive desorption of acetic acid on SmO_x/Rh(1 0 0) is dramatically different from that on Rh(1 0 0). A rapid decomposition of acetic acid to produce CO(g) and CO₂(g) can be observed only on SmO_x/Rh(1 0 0), where CO(g) becomes the predominant product at 225 K, indicating a strong promotional effect of SmO_x in the selective decomposition of acetate. Finally, we briefly describe the future outlook of research on rare earth oxide/metal model catalysts.     

Stress and morphological development of CdS and ZnS thin films during the SILAR growth on (1 0 0)GaAs

Cadmium sulfide and zinc sulfide films were grown on (1 0 0)GaAs substrate by successive ionic layer adsorption and reaction (SILAR) technique from aqueous precursor solutions at room temperature and normal pressure. The stress development of the thin films was characterized by laser interferometry as a function of the thickness of the films. The morphology and roughness of the films were monitored by atomic force microscopy. Additionally the crystallinity and crystallite size were analyzed by X-ray diffraction and composition by electron spectroscopy for chemical analysis. The CdS thin films had significantly higher stress level and also better crystallinity compared with ZnS thin films. Both films were polycrystalline and cubic, but the CdS thin films followed the substrate (1 0 0) orientation, whereas the ZnS films were (1 1 1) orientated. The roughness vs. film thickness curves of both films followed each other in shape, but the CdS films consisted of smaller particles.     

Growth evolution of Bi2Sr2CaCu2O8+δ thin films deposited by infrared (1064 nm) pulsed laser deposition

Bi₂Sr₂CaCu₂O_8+δ (Bi-2212) thin films were grown on MgO (1 0 0) using 1064 nm infrared pulsed laser deposition with post heat treatment. The material arrives at the substrate surface with characteristic spheroidal morphology. Smooth, homogeneous and highly c-axis oriented films were obtained after heat treatment. Using infrared laser as excitation, the stoichiometry of the target is preserved on the film. However, the films were apparently under-doped.     

Enhanced superconducting properties in epitaxial FeSe thin films with self-assembled Fe3O4 nanoparticles

In this paper we report epitaxial tetragonal iron selenide thin films grown on single crystal SrTiO₃ (STO) (0 0 1) and MgO (0 0 1) substrates by a pulsed laser deposition (PLD) technique. Deposition temperature and annealing process are found to be critical for achieving the tetragonal phase and the optimum superconducting properties of the films. The critical transition temperature of the thin films ranges from 2 K to 11.5 K depending on the deposition temperature and annealing condition. The samples with higher critical transition temperatures show better film crystallinity along with self-assembled Fe₃O₄ nanoparticles (～15 nm in average particle size) in the films according to both X-ray diffraction (XRD) and transmission electron microscopy (TEM) analysis. Besides the better crystallinity achieved in the films, the formation of Fe₃O₄ nanoparticles could assist the formation of the tetragonal FeSe phase and thus lead to the enhanced superconducting properties.     

Chemical solution processing and properties of Sr2FeMoO6 thin films

Crack-free and oriented Sr₂FeMoO₆ (SFMO) thin film with double perovskite structure has been fabricated by the chemical solution deposition (CSD) method. A homogeneous and stable SFMO precursor solution was successfully prepared by controlling the reaction of starting metal-organic compounds in a mixture solvent of 1-propanol and 2-methoxyethanol. SFMO thin films with c-axis preferred orientation could successfully be synthesized on MgO (0 0 1) and SrTiO₃ (0 0 1) substrates by optimizing the several processing conditions. SFMO thin film prepared on SrTiO₃ (0 0 1) showed a magnetoresistance effect at a low magnetic field.     

Thin films of molecule-based charge transfer complex cobalt tetracyanoethylene: In situ X-ray photoemission study

Thin films of molecule-based charge transfer magnet, cobalt tetracyanoethylene [Co(TCNE)_x, x ~ 2] consisting of the transition metal Co, and an organic molecule viz. tetracyanoethylene (TCNE) have been deposited by using physical vapor deposition method under ultra-high vacuum conditions at room temperature. X-ray photoelectron spectroscopy (XPS) technique has been used extensively to investigate the electronic properties of the Co(TCNE)_x thin films. The XPS measurements show that the prepared Co(TCNE)_x films are clean, and oxygen free. The stoichiometries of the films, based on atomic sensitive factors, are obtained, and yields a ~ 1:2 ratio between metal Co and TCNE for all films. Interestingly, the positive shift of binding energy position for Co(2p), and negative shifts for C(1s) and N(1s) peaks suggest a charge-transfer from Co to TCNE, and cobalt is assigned to its Co(II) valence state. In the valence band investigation, the highest occupied molecular orbital (HOMO) of Co(TCNE)_x is found to be at ~ 2.4 eV with respect to the Fermi level, and it is derived either from the TCNE^? singly occupied molecular orbital (SOMO) or Co(3d) states. The peaks located at ~ 6.8 eV and ~ 8.8 eV are due to TCNE derived electronic states. The obtained core level and valence band results of Co(TCNE)_x, films are compared with those of V(TCNE)_x thin film magnet: a well known system of M(TCNE)_x type of organic magnet, and important points regarding their electronic properties have been brought out.     

Rapid surface roughness measurements of silicone thin films with different thicknesses

A rapid optical measurement system for rapid surface roughness measurement of polycrystalline silicon (poly-Si) thin films was developed in this study. Two kinds of thickness of poly-Si thin films were used to study rapid surface roughness measurements. Six different incident angles were employed for measuring the surface roughness of poly-Si thin films. The results reveal that the incident angle of 20° was found to be a good candidate for measuring the surface roughness of poly-Si thin films. Surface roughness (y) of poly-Si thin films can be determined rapidly from the average value of reflected peak power density (x) measured by the optical system developed using the trend equation of y = ?0.1876x + 1.4067. The maximum measurement error rate of the optical measurement system developed was less than 8.61%. The savings in measurement time of the surface roughness of poly-Si thin films was up to 83%.     

Photoluminescence studies of ZnO thin films on R-plane sapphire substrates grown by sol–gel method

Zinc oxide (ZnO) thin films on R-plane sapphire substrates were grown by the sol–gel spin-coating method. The optical properties of the ZnO thin films were investigated using photoluminescence. In the UV range, the asymmetric near-band-edge emission was observed at 300 K, which consisted of two emissions at 3.338 and 3.279 eV. Eight peaks at 3.418, 3.402, 3.360, 3.288, 3.216, 3.145, 3.074, and 3.004 eV, which respectively correspond to the free exciton (FX), bound exciton, transverse optical (TO) phonon replica of FX recombination, and first-order longitudinal optical phonon replica of FX and the TO (1LO+TO), 2LO+TO, 3LO+TO, 4LO+TO, and 5LO+TO, were obtained at 12 K. From the temperature-dependent PL, it was found that the emission peaks at 3.338 and 3.279 eV corresponded to the FX and TO, respectively. The activation energy of the FX and TO emission peaks was found to be about 39.3 and 28.9 meV, respectively. The values of the fitting parameters of Varshni's empirical equation were α=4×10^?3 eV/K and β=4.9×10³ K, and the S factor of the ZnO thin films was 0.658. With increasing temperature, the exciton radiative lifetime of the FX and TO emissions increased. The temperature-dependent variation of the exciton radiative lifetime for the TO emission was slightly higher than that for the FX emission.     

Optical properties of Cr/Fe(t)/MgO (0 0 1) thin films

In this work we report on the optical properties of single-crystalline iron thin films. For this, Cr-capped Fe films with thickness, t, in the range 30–300 Å were prepared on MgO (0 0 1) by DC magnetron sputtering, and then studied by optical absorption technique within the range from 1.0 to 3.6 eV. All measurements were carried out at room temperature using a fiber optics spectrophotometer. The intensity of the transmitted light decreases with increasing film thickness. The optical constants of the films are deduced from a model that considers the transmission of light by two absorbing films on an absorbing substrate. The absorption coefficient of the Fe films is also calculated from the transmission data. The absorption spectra show the following characteristics: (i) two large absorption peaks centered at about 1.20 and 2.65 eV; and (ii) a sharp step near 1.40 eV. These structures are associated with conventional interband transitions of the iron film.     

Microstructure and characterization of Al-doped ZnO films prepared by RF power sputtering on Al and ZnO targets

Al-doped zinc oxide (AZO) transparent conductive films were prepared on a glass substrate using a magnetron sputtering system with a pure zinc oxide (ZnO) target and a pure Al target sputtered using radio frequency (RF) power. The RF power was set at 100 W for the ZnO target and varied from 20 to 150 W for the Al target. The morphology of the thin films was examined by field-emission scanning electron microscope (FE-SEM), and their composition was analyzed by the equipped energy-dispersive X-ray spectroscopy (EDS). The cross section of the films determined through FE-SEM indicated that their thickness was around 650 nm. EDS analysis revealed that the Al-dopant concentration of the AZO films increased in the following order: 0.85 at.% (20 W) < 1.60 at.% (40 W) < 3.52 at.% (100 W) < 4.34 at.% (150 W). Analysis of the films using X-ray diffractometer (XRD) indicated that all films had a wurtzite structure with a texture of (0 0 2). High-resolution transmission electron microscopy (HRTEM) revealed a number of defects in the films, such as stacking faults and dislocations. Ultraviolet photoelectron spectroscopy (UPS) was used to estimate the optical energy gap (E_g) for the AZO thin films. The energy gap increases from 3.39 to 3.58 eV as the RF power applied to the Al target increase. The electrical resistivity of the films decreased from 3.43 × 10^?2 Ω cm to 3.29 × 10^?3 Ω cm as the RF power increased from 20 to 150 W when a four-point probe was used to investigate. Atomic force microscope (AFM) revealed that the surface roughness of the films increased with increasing RF power. The average optical transmittance of the films was determined by UV–visible spectrometer. The films are suitable for use as transparent conductive oxide films in the optoelectronic industry. A decrease in the electrical resistivity of the film with increasing Al-dopant concentration was ascribed to an increase in the carrier concentration and density of stacking faults in the films.     

Field electron emission from amorphous carbon thin films grown by RF magnetron sputtering

Using a RF magnetron sputtering, amorphous carbon (a-C) and N-doped a-C (a-C:N) thin films were fabricated as field electron emitter. These thin films were deposited on Si(0 0 1) substrate at several temperatures. The field emission property was improved for a-C thin films grown at higher substrate temperatures. Furthermore, a-C:N film exhibits field emission property better than that of undoped a-C film. These results are explained in terms of the change in surface morphology and structural properties of a-C film.     

Effective demagnetizing factors in ferromagnetic resonance equations

A simple method of deriving effective demagnetizing factors (N_x^e,N_y^e) for the use of Kittel's ferromagnetic resonance formula is reported. The effective demagnetizing factors are expressed by an anisotropy energy (G) and a static field direction (θ,φ). By this derivation method, the resonance equations of thin films having a uniaxial or a four-fold anisotropy are obtained when a static field is rotated in the film plane. Six arrangements are calculated: (1) perpendicular anisotropy, (2) in-plane anisotropy, (3) cubic-crystal (0 0 1) face, (4) cubic-crystal (0 1 1) face, (5) cubic-crystal (1 1 1) face, and (6) oblique anisotropy films.     

Influence of substrate temperature on physical properties of sprayed Zn0.85Mn0.15O films

Zn_1−xMn_xO thin films have been synthesized by chemical spray pyrolysis at different substrate temperatures in the range, 250–450 °C for a manganese composition, x = 15%, on corning 7059 glass substrates. The as-grown layers were characterized to evaluate their chemical and physical behaviour with substrate temperature. The change of dopant level in ZnO films with substrate temperature was analysed using X-ray photoelectron spectroscope measurements. The X-ray diffraction studies revealed that all the films were strongly oriented along the (0 0 2) orientation that correspond to the hexagonal wurtzite structure. The crystalline quality of the layers increased with the increase of substrate temperature up to 400 °C and decreased thereafter. The crystallite size of the films varied in the range, 14–24 nm. The surface morphological studies were carried out using atomic force microscope and the layers showed a lower surface roughness of 4.1 nm. The optical band gap of the films was ∼3.35 eV and the electrical resistivity was found to be high, ∼10⁴ Ω cm. The films deposited at higher temperatures (>350 °C) showed ferromagnetic behaviour at 10 K.     

Characterization of CdS1−xSex thin films by chemical bath deposition technique

The cadmium sulfo selenide CdS_1?xSe_x thin films were chemical bath deposited in aqueous media onto coated glass substrates. As-deposited CdS_1?xSe_x thin films were annealed at 350 °C in air for 30 min. The structural, morphological, compositional and optical properties of deposited CdS_1?xSe_x thin films were studied using X-ray diffractometer (XRD), scanning electron microscopy (SEM), Energy dispersive analysis by X-ray (EDAX), and UV-Vis-NIR spectrophotometer respectively. X-ray diffraction patterns of CdS_1?xSe_x thin films reveal the polycrystalline nature and hexagonal structure. The microstructural parameters such as crystallite size (D), micro strain (?), and dislocation density were calculated and found to depend on compositions. The surface morphology and grain size are found to be influenced with the annealing temperature. The presence of Cd, S and Se of the CdS_1?xSe_x thin films and the composition of CdS_1?xSe_x thin film are estimated by EDAX analysis. The optical transmittance and absorption spectra were recorded in the range 400–2500 nm. The band gap of the CdS_1?xSe_x thin films is found to decrease from 2.5 eV to 1.75 eV.