四激光束干涉光刻制造纳米级孔阵的理论分析

为提供一个在大范围内曝光出深亚微米甚至纳米级周期性密集图形的廉价的方法,研究了四激光束干涉光刻的原理,分析了干涉曝光的结果,并进行了计算机模拟.用现有的光源,如442 nm、365 nm、248 nm、193 nm激光,曝光得到的图形的临界尺寸容易做到180～70 nm.具有实际上无限制的焦深和容易实现的大视场.适合硅基CCDs、平场显示器的场发射电极阵列等光电子器件中大范围内超亚微米级的周期性孔阵或点阵结构图形的制作.     

衍射极限尺度下的亚波长电磁学

作为波的本性之一,衍射是现代物理学的重要研究内容.衍射导致自由空间中波的能量不能被无限小地聚集,从而为成像、光刻、光存储、光波导等技术设定了一个原理性的障碍——衍射极限.对于电磁波和光波而言,尽管通过提高介质的折射率可以压缩衍射效应,但由于自然界中材料的折射率有限,该方法存在很大限制.近年来,随着表面等离子体光学的兴起,表面等离子体在超越传统衍射极限方面的能力和应用前景受到了学术界的关注.本文从亚波长电磁学的角度出发,介绍衍射极限研究的历史,综述了突破衍射极限的理论方法.首先,利用金属介质表面等离子体激元的短波长特性,可将等效波长压缩一个数量级以上,在纳米尺度实现光波的聚焦或定向传输;更进一步,通过人为设计超构材料和超构表面,利用结构化金属和介质中的局域谐振、耦合等特殊电磁响应,可实现亚波长局域相位调制、超宽带色散调控、近完美吸收、光子自旋轨道耦合等,从而突破传统理论的诸多局限,为下一代电磁学和光学功能器件奠定重要基础.     

基于多层膜结构的亚波长光栅研究

利用表面等离子体共振效应理论及金属-介质复合膜的特殊纳米光学效应对平面多层膜超分辨光刻技术进行了研究. 在曝光光源为365 nm的情况下,实现周期230 nm,线宽100 nm的超分辨光刻成像. 讨论了均匀金属-介质多层膜的结构参数选择,并通过数值仿真得到有效的光强度和对比度, 然后用等离子体纳米光刻进行试验验证,通过最优化选择,最终得到了亚波长结构多层膜的大区域范围超分辨成像.     

耦合场线宽和强度对双简并四能级系统的吸收和衍射效率的影响

采用密度矩阵方程,分别在引入耦合场线宽和强度、探测场频率变化以及耦合场频率与探测场频率之比变化的条件下,数值计算了双简并四能级原子系统中介质对探测场的吸收(增益)和相位光栅衍射效率的影响。结果表明:耦合场线宽的增大削弱了简并四能级原子相干;不考虑耦合场线宽(R=0)时的增益和衍射效率比考虑耦合场线宽(R≠0)时的大,在耦合光频率与探测光频率之比为ΩcΩp≈400时衍射效率最大可达到35%。     

超分辨近场结构的研究进展及其应用

超分辨近场结构(super-resolution near-field structure,super-RENS)由于突破了传统远场光学衍射极限的限制,在纳米光储存、微纳米加工、基于局域表面等离子体增强的生物传感器方面展现出良好的应用前景,因此吸引了众多研究者的目光.文章简要介绍了超分辨近场结构的发展历程、相应的工作机理、最新研究动态及其在超高密度光存储、近场光刻中的应用状况,并对未来的工作重点做出展望.     

菲涅尔衍射光刻

通过合理选取等间距采样点的数目,利用快速傅里叶变换算法解释了有限通光光阑产生的“内密外疏”菲涅尔衍射条纹.基于菲涅尔衍射,在静态曝光、动态扫描条件下分别实现了约190 nm最小特征尺寸图形制备,以及约350 nm线宽线条直写.菲涅尔衍射光刻无需复杂的光学透镜组合,无需任何微纳衍射光学元件,且具有较大的聚焦容差.该方法有望成为一种新型的,低成本、高灵活度的亚波长图形制备手段.     

高数值孔径光学光刻成像中的体效应

为有效控制成像线宽,研究了高数值孔径光学光刻中的体效应并提出一种光刻胶膜层优化方法,利用成像中的摇摆效应平衡体效应对成像线宽的影响.首先根据系统数值孔径和照明相干因子确定成像光入射角分布,相对所有入射光求出光刻胶底面单位体积吸收的能量平均值.然后用最小二乘法拟合得到能量平均值随光刻胶厚度变化的解析式并求能量平均值的导数.最后通过优化光刻胶膜层,使能量平均值的导数绝对值最小.按优化结果设计光刻胶膜层,利用商业光刻软件Prolith9.0得到成像线宽随光刻胶厚度的变化.结果表明,该方法能在30～40nm的光刻胶厚度范围,有效地减小由体效应引起的成像线宽的变化.     

表面等离激元体干涉制备纳米光子晶体的模拟分析

利用表面等离激元短波长和近场增强效应的特性,用多束P偏振态相干光激发表面等离激元(SPPs),并优化干涉光刻的曝光参数,可获得高分辨率、高对比度周期性纳米结构.阐述了多束SPPs干涉法制备纳米光子晶体的原理,并得到了干涉场强度分布随光束增加的关系.随着干涉SPPs数目的增加,干涉场会复杂变化,对此进行了计算机模拟.模拟了三束SPPs和六束SPPs干涉的强度分布,并分析了调制技术干涉曝光结果,该方法适合光电子器件中大范围亚波长的周期性孔阵或点阵结构的制作以及纳米量级光子晶体的的制作,并可以有效降低制作成本.     

超衍射极限相干反斯托克斯拉曼散射显微成像技术及其探测极限分析

理论上提出一种突破衍射极限限制的相干反斯托克斯拉曼散射显微成像方法, 并对其探测极限进行分析.通过引入环形附加探测光与艾里斑周边的声子作用, 实现点扩展函数的改造, 提高相干反斯托克斯拉曼散射显微成像系统的横向空间分辨率. 随着分辨率的提高, 信号强度也随之降低, 尤其当应用于生物学、医学研究时, 样品分子数密度通常很低, 这将导致信号探测更加困难. 因此分析系统的探测极限, 确定超分辨体积元内的最小可探测分子数是展开超衍射极限相干反斯 托克斯拉曼散射显微成像实验研究的重要前提. 当泵浦光、斯托克斯光、探测光光强均达到极大值, 分辨率约40 nm三维空间内, 超衍射极限相干反斯托克斯拉曼散射显微成像系统的散粒噪声信噪比由曝 光时间与样品分子数密度决定. 曝光时间若取20 ms, 探测极限约为10³, 样品分子数目只有大于探测极限, 才能保证信号可以从噪声背景中提取出来. 关键词： 突破衍射极限 相干反斯托克斯拉曼散射 非线性光学 探测极限     

用同步辐射光刻直接在有机玻璃板上制备高深宽比亚微米光栅

为了将平面金属膜紧密耦合到纳米光栅形成的表面等离子体共振传感器,以提高灵敏度,以及利用亚微米光栅调整共振反射波长,需要制备亚微米结构光栅。介绍了一种基于X光光刻的亚微米结构光栅的制造技术。该结构光栅是利用日本立命馆大学的同步辐射光源进行同步辐射光光刻,在有机玻璃(PMMA)板上直接得到亚微米光栅。用此纳米加工技术获得的光栅线宽为250 nm,周期为500 nm,深宽比为8的PMMA亚微米结构光栅。还优化了曝光近接间隔、曝光剂量和显影时间等同步辐射光刻参数。     

Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth

We propose a new direct writing nanolithography approach using a plasmonic focusing device and a nano silver mirror with dual-wavelength illumination for high exposure depth. Arrays of pyramid aperture are used to focus the incident light beams into 80 nm light spots. The pyramid combined with a thin silver film coated on the substrate constructs a surface plasmon polaritons (SPP) coupling cavity, which amplifies the intensity of the light field in it by SPP effect and resonance. The transmission depth of the standing wave formed by forward and reflected light could reach hundreds of nanometers. Two lasers with different wavelengths are used as illumination sources to homogenize the light field through complementation between the two standing waves. Simulation results show by using 355 nm and 441 nm wavelengths, a space of 44 nm at the bottom of the photoresist could be obtained after exposure and development. The feature size of resist patterns could be further scaled down, depending on the optimization of parameters of photoresist exposure and development, illumination wavelengths, etc.     

Focusing of light beyond the diffraction limit of half the wavelength

The diffraction limit sets the smallest achievable linewidth at half the wavelength. With a subwavelength plasmonic lens allowing one to reduce the diffraction via an asymmetry and to generate and squeeze the wave functions, an incident light is focused by the aperture to a single line with its width smaller than the limited value in the intermediate zone. The focused fields are capable of propagating in free space. This light focusing process, besides being of academic interest, is expected to open up a wide range of application possibilities.     

表面等离子体无掩膜干涉光刻系统的数值分析

表面等离子体激元具有近场增强效应,可以代替光子作为曝光源形成纳米级特征尺寸的图像.本文数值分析了棱镜辅助表面等离子体干涉系统的参量空间,并给出了计算原理和方法.结果表明,适当地选择高折射率棱镜、低银层厚度、入射波长和光刻胶折射率,可以获得高曝光度、高对比度的干涉图像.入射波长为431 nm时,选择40 nm厚的银层,曝光深度可达200 nm,条纹周期为110 nm.数值分析结果为实验的安排提供了理论支持.     

表面等离子体无掩膜干涉光刻系统的数值分析(英文)

表面等离子体激元具有近场增强效应,可以代替光子作为曝光源形成纳米级特征尺寸的图像.本文数值分析了棱镜辅助表面等离子体干涉系统的参量空间,并给出了计算原理和方法.结果表明,适当地选择高折射率棱镜、低银层厚度、入射波长和光刻胶折射率,可以获得高曝光度、高对比度的干涉图像.入射波长为431nm时,选择40nm厚的银层,曝光深度可达200nm,条纹周期为110nm.数值分析结果为实验的安排提供了理论支持.     

Impact of process parameters on pattern formation in the maskless plasmonic computational lithography

The extraordinary optical transmission through a sub-wavelength size metal-aperture and metamaterials has been tremendous interests for the untilization of the surface plasmon polariton (SPP). Its technology, however, is hard to apply for the optical lithography process. In this study, a maskless plasmonic lithography (MPL) is modeled and simulated for 15-nm critical dimension (CD). The near-field intensity with the plasmonic phenomena of aperture shapes is described due to aperture parameters by using a scattering matrix (S-matrix) analysis method and the finite difference time domain (FDTD) method. MPL parameters of bowtie structures are optimized and improved for the imperfection of the resist pattern. The most dominant parameter on CD is gap size of bowtie by Taguchi method.     

Beyond-limit light focusing in the intermediate zone

We experimentally verify that a new nanolens of a designed plasmonic aperture can focus visible light to a single line with its width smaller than the limit of half the wavelength in the intermediate zone. The experimental measurement indicates that while the near field plays a role to increase the spot size in the near zone, it is negligible at the beyond-limit focused region; i.e., the focused light is dominated by the radiative fields. The image taken by the optical microscope shows that the fields focused have propagated to the far zone. Besides being of academic interest, the nanolens capable in achieving a lower diffraction limit in the intermediate zone is important for application possibilities.     

Subwavelength beam manipulation via multiple-metal slits coupled by disk-shaped nanocavity

A novel plasmonic structure consisting of three nano-scaled slits coupled by nano-disk-shaped nanocavities is pro- posed to produce subwavelength focusing and beam bending at optical frequencies. The incident light passes through the metal slits in the form of surface plasmon polaritons （SPPs） ,and then scatters into radiation fields. Numerical simulations using finite-difference time-domain （FDTD） method show that the transmitted fields through the design example can gener- ate light focusing and deflection by altering the refractive index of the coupled nanocavity. The simulation results indicate that the focal spot is beyond the diffraction limit. Light impinges on the surface at an angle to the optical axis will add an extra planar phase front that interferes with the asymmetric phase front of the plasmonic lens, leading to a larger bending angle off the axial direction. The advantages of the proposed plasmonic lens are smaller device size and ease of fabrication. Such geometries offer the potential to be controlled by using nano-positior!i0g systems for applications in dynamic beam shaping and scanning on the nanoscale.     

Improvement of focusing characteristics of a spiral plasmonic lens

We designed and fabricated a spiral plasmonic lens (PL) with multi-circular grooves to increase light intensity in a farfield region via the constructive interference of the light scattered by the multi-circular grooves. To compare the beam focusing characteristics of a spiral PL with multi-circular grooves with those of a conventional spiral PL, we simulated the electric field distribution of the PLs operating at a 405 nm wavelength. We confirmed that the light intensity increased about twofold at 0.75 μm above the PL surface owing to the effect of the multi-circular grooves. Furthermore, the circular grooves negligibly affect the full width at half-maximum of the focal spot, keeping the subwavelength size (～200 nm) of incident light.     

压印光刻中紫外光诱导阻蚀胶固化控制计算

针对压印过程中两类基本的复型缺陷，从实验分析中得出其主要原因是曝光后阻蚀胶的固化程度难以控制．通过分析紫外曝光光源与阻蚀胶的光谱匹配性，得出使得阻蚀胶固化的有效波长为365nm；对光诱导紫外曝光过程中紫外光的传播分析，建立了阻蚀胶中光强分布的数学模型；用粘度来表征阻蚀胶的固化程度，建立了阻蚀胶中的粘度分布函数．分析了阻蚀胶对365nm紫外光的吸收率以及膜厚对阻蚀胶中光强分布均匀性的影响，得出复型后阻蚀胶凸起处的光强分布均匀性对吸收率及膜厚更为敏感的结论．