Structure and phase composition of a chromium-silicon system modified by high-current electron beams

The results of studies of the structure-phase state of a chromium-coated silicon substrate system’s subsurface layer treated with low-energy high-current electron beams, 50–200 μs in duration and with an energy density of 15 J/cm², are reported. The data of raster electron microscopy and X-ray structural and spectral microanalysis revealed the formation of a chromium-doped silicon layer with a thickness of 2–38 μm, chromium-enriched silicon dendrites, chromium disilicide CrSi₂, and an amorphous eutectic layer (the characteristic cross-section size of the chromium-enriched phase extrusions is ∼50 nm). The structure-phase transformations are discussed taking into account the peculiarities of the distribution of temperature, diffusion and convective mass-transfer in the modified layer.     

Optical properties of silicon-silicide nanoheterostructures grown by consecutive plasma-epitaxy synthesis

Consecutive plasma-epitaxial synthesis on silicon wafers is used for the first time to fabricate monolithic nanoheterostructures with embedded nanocrystals (NC) of chromium disilicide (Si–NC CrSi₂–Si). It is found that, initially, nanoislands form on the surface and within a coating layer of silicon, followed by the formation of small (10–15 nm) nanocrystals of semiconducting chromium disilicide (CrSi₂) at a high occupation density ((2–3)⋅10¹¹ cm^–2). During formation of silicon-silicide-silicon heterostructures, CrSi₂ nanocrystallites “float up” into the near surface area of the covering silicon layer.     

Properties and structural state of the surface layer in a zirconium alloy modified by a pulsed electron beam and saturated by hydrogen

A pulsed action of an electron beam on a Zr-1% Nb zirconium alloy is studied. Alloy samples are irradiated by three 50-μs pulses at an energy density of 15–25 J/cm², a power of (3–6) × 10⁴ W/cm², a current density of 10–50 A/cm², and an electron energy of 18 keV. This method of processing is found to modify the surface layer of the alloy without changing the structure-phase state of its volume. This surface modification increases the hydrogen saturation resistance of the alloy.     

Pulsed electron-beam melting of a copper — steel 316 system: Evolution of the chemical composition,microstructure, and properties

The surface topography, chemical composition, microstructure, nanohardness, and tribological characteristics of a Cu (film, 512 nm)-stainless steel 316 (substrate) system subjected to pulsed melting by a low-energy (20–30 keV), high-current electron beam (2–3 μs, 2–10 J/cm²) were investigated. The film was deposited by sputtering a Cu target in the plasma of a microwave discharge in argon. To prevent local exfoliation of the film due to cratering, the substrate was multiply pre-irradiated with 8–10 J/cm². On single irradiation, the bulk of the film survived, and a diffusion layer containing the film and substrate components was formed at the interface. The thickness of this layer was 120–170 nm irrespective of the energy density. The diffusion layer consisted of subgrains of γ-Fe solid solution and nanosized particles of copper. In the surface layer of thickness 0.5–1 μm, which included the copper film quenched from melt and the diffusion layer, the nanohardness and the wear resistance nonmonotonicly varied with energy density, reaching, respectively, a maximum and a minimum in the range 4.3–6.3 J/cm². As the number of pulsed melting cycles was increased to five in the same energy density range, there occurred mixing of the film-substrate system and a surface layer of thickness ∼2 μm was formed which contained ∼20 at. % copper. Displacement of the excess copper during crystallization resulted in the formation of two-phase nanocrystal interlayers separating the γ-phase grains. __________ Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 12, pp. 6–13, December, 2005.     

Structural and phase transformations in Ni3Fe during high-dose ion implantation

The results are given for experimental studies of the structural-phase state formed in the surface and nearsurface layers of a disordered polycrystalline Ni₃Fe alloy during high-dose ion implantation. The studies used Auger electron spectroscopy, transmission electron microscopy, x-ray structural analysis, and microhardness measurements. The ion implantation was done using the “Raduga” vacuum arc source with a multicomponent cathode of composition Zr (89.5 wt. %)+C+N+O with an acceleration voltage of 50 kV. The implanted ion dose was varied in the range (6.0·10¹⁶–6.0·10¹⁷) ions/cm². It was established that in the surface layer which is alloyed during ion implantation there is amorphization with simulataneous formation of finely dispersed ZrO₂ particles whose dimensions increase with increasing implanted ion dose; this is accompanied by an increased internal mechanical stress. Beyond the ion-implanted layer a sublayer about 10 μm thick with a high dislocation density is formed (the “long-range action” effect). The results of microhardness measurements correlate with the data from structural studies. Institute of the Physics of Strength and Materials Science, Siberian Section, Russian Academy of Science; Tomsk State University—Architectural-Construction University; and Scientific Research Institute for Nuclear Physics at Tomsk Polytechnic University. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 11, pp. 15–24, November, 1998.     

Synthesis of LaB6 micro/nano structures using picosecond (Nd:YAG) laser and its field emission investigations

Micro/nano structures have been obtained by laser surface treatment on sintered LaB₆ pellets employing a picosecond pulsed Nd:YAG laser at a pressure of ∼1×10⁻³ mbar. The X-ray diffraction pattern of the laser treated pellet shows a set of well defined diffraction peaks, indexed to the cubic phase of LaB₆ only. The scanning electron microscope studies reveal formation of micro and nano structures upon laser treatment and the resultant surface morphology is found to be strongly influenced by the laser fluence. Field electron emission studies made on the LaB₆ pellet, treated with optimized laser fluence, have been performed in a planar diode configuration under ultra high vacuum conditions. The threshold field required to draw an emission current density of ∼10 μA/cm² has been found to be ∼2.3 V/μm and a current density of ∼530 μA/cm² has been drawn at an applied field of 5.2 V/μm. The Fowler-Nordheim plot is found to be linear in accordance with the quantum mechanical tunneling phenomenon, confirming the metallic nature of the emitter. The emission current at the pre-set value ∼10 μA shows very good stability over a period of more than 3 hours. The present results emphasize the effectiveness of a picosecond laser treatment towards fabrication of a nano metric LaB₆ emitter for high current density applications.     

Observation of slowly decreasing molecular oscillations in ultrathin liquid films using X-ray reflectivity

We studied ~0.5 μm and 30–80 ? thick films of a normal dielectric liquid, tetrakis(2-ethylhexoxy)silane (TEHOS), at temperature range 228–286 K, deposited onto silicon (111) substrate with native oxide using X-ray reflectivity. TEHOS is spherical with size ~10 ?, non-polar, non-reactive, and non-entangling; TEHOS has been reported to show interfacial layering at room temperature and surface layering at 0.23 T_c (T_c≈ 950 K). For films m thick, the reflectivity data did not change significantly as a function of temperature; for films 30–80 ? thick, the reflectivity data did change. The data could be fitted with an electron density model composed of a minimum necessary number of Gaussians and a uniform density layer with error-function broadened interfaces. When the film thickness is 60–80 ? below 246 K, we found that the interface and the surface layering coexist but do not overlap. When the film thickness is 30–40 ? below 277 K, they overlap and the electron density profile shows slowly decreasing molecular oscillations at the air-liquid interface.     

Electron microscopy investigation of AlMg6 aluminum alloy surface defects caused by microorganisms extracted in space stations

The surfaces of AMg6 (aluminum-magnesium) alloy samples that have passed accelerated biocorrosion tests have been investigated in a Quanta-3D scanning electron microscope. The alloy samples have been treated with the Ulocladium botrytis Preuss fungus, which is an active destructive fungus and was previously extracted on surfaces of the International Space Station. Biocorrosion pits 2–10 μm in diameter, cavities the depths of which can reach 70–250 μm depth, and spots of modified color are found to be the most typical defects. The surfaces of large cavities consist of faceted cubic particles that are formed when the acid products of fungus metabolism interact with the alloy surface. The particles have an average size of 30 μm, which is close to the size of alloy grains. The microstructure of a biocorrosion layer has been investigated in a Quanta-3D microscope with the use of a focused Ga⁺ ion beam. The samples of 12-μm-wide transverse slices are obtained near large cavities and investigated in a Tecnai G₂₃0ST transmission electron microscope. The X-ray microanalysis of the defective layer has revealed the high concentration of oxygen in this layer. Obtained images indicate that the corrosion cavity surface has a complex porous structure.     

Effect of the electron beam and ion flux parameters on the rate of plasma nitriding of an austenitic stainless steel

The method of nitriding of metals in an electron beam plasma is used to change the current density and energy of nitrogen ions by varying the electron beam parameters (5–20 A, 60–500 eV). An electron beam is generated by an electron source based on a self-heated hollow cathode discharge. Stainless steel 12Kh18N10T is saturated by nitrogen at 500°C for 1 h. The microhardness is measured on transverse polished sections to obtain the dependences of the nitrided layer thickness on the ion current density (1.6–6.2 mA/cm²), the ion energy (100–300 eV), and the nitrogen-argon mixture pressure (1–10 Pa). The layer thickness decreases by 4–5 μm when the ion energy increases by 100 V and increases from 19 to 33 μm when the ion current density increases. The pressure dependence of the layer thickness has a maximum. These results are in conflict with the conclusions of the theory of the limitation of the layer thickness by ion sputtering, and the effective diffusion coefficient significantly exceeds the well-known reported data.     

Formation of two-dimensional current sheets under high initial pressure conditions

The possibilities of current-sheet formation in two-dimensional magnetic fields with a null line as well as the characteristic features of the plasma dynamics under high initial pressure conditions (helium, P ₀≈300 mtorr) are investigated for the first time. It is shown that current-sheet formation and efficient compression of the plasma into a sheet require that the magnetic field gradient be sufficiently large. A brightly emitting compact region with electron density N _e∼9×10¹⁶ cm⁻³, an order of magnitude higher than the gas atom density, was observed to form at the center of the layer. Zh. éksp. Teor. Fiz. 114, 1202–1214 (October 1998)     

Paramagnetic properties of single-crystal silicon implanted with iron-group transition metals

Samples of single-crystal silicon implanted with iron-group ions are investigated by electron paramagnetic resonance (EPR). The change in relative permittivity μ_r of the silicon layer modified by implanted nickel ions is found. The accumulation kinetics of paramagnetic centers of amorphous regions of silicon implanted with Co, Ni, and Fe are shown to be different. Magnetic hysteresis for both the wide EPR line due to implanted impurities and the EPR line due to dangling chemical silicon bonds is found. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 75, No. 2, pp. 197–201, March–April, 2008.     

Surface relief and structure of electroexplosive composite surface layers of the molybdenum-copper system

The surface topography and structure of copper layers exposed to multiphase plasma jets of products of electrical explosion of molybdenum and copper foils are studied using profilometry and scanning electron and light microscopy. Such treatment allows deposition of either layered coatings or alloyed composite layers. It is found that the surface layer roughness parameter is R _a = 3.2−4.0 μm. The thickness of some copper and molybdenum layers of coatings is 15–20 μm. Electroexplosive alloying produces layers 25 μm thick. Sizes of copper inclusions in the molybdenum matrix near the surface of such layers vary from 30 nm to 1–2 μm.     

Features of the structure and properties of β-FeSi<Subscript>2</Subscript> nanofilms and a β-FeSi<Subscript>2</Subscript>/Si interface

The electronic, geometric, and magnetic structure of nanofilms of the β phase of iron disilicide FeSi₂ with the (001), (100), and (010) surfaces have been simulated through density functional calculations. A substantial reconstruction of the (001) surface terminated with silicon atoms has been observed, which was accompanied by an increase in the surface symmetry and appearance of “squares” of silicon atoms. Analysis of the electron density of states (DOS) and spin DOS projected on the contributions of layers of atoms (LSDOS) indicates that all plates have metallic properties. The main contribution near the Fermi level comes from the surface iron layers and it decreases rapidly with an increase in the distance from the surface of the plate. Analysis of the calculated effective magnetic moments of atoms shows that the surface layers in the plates have a significant magnetic moment, in particular, iron layers on the (001) surface (1.89 μ_B/atom). The moments of atoms decrease rapidly with an increase in their distance from the surface. The electron and geometric regions of a (001)Si/FeSi₂ interface have been studied. Analysis of the LSDOS shows that the surface conducting state mainly determined by the contribution from the near-surface silicide layers is implemented in this region. The possibility of the formation of the perfect and sharp Si/FeSi₂ interface has been demonstrated.     

Formation of silicon carbide and diamond nanoparticles in the surface layer of a silicon target during short-pulse carbon ion implantation

Synthesis of silicon carbide and diamond nanoparticles is studied during short-pulse implantation of carbon ions and protons into a silicon target. The experiments are carried out using a TEMP source of pulsed powerful ion beams based on a magnetically insulated diode with radial magnetic field B _r . The beam parameters are as follows: the ion energy is 300 keV, the pulse duration is 80 ns, the beam consists of carbon ions and protons, and the ion current density is 30 A/cm². Single-crystal silicon wafers serve as a target. SiC nanoparticles and nanodiamonds form in the surface layer of silicon subjected to more than 100 pulses. The average coherent domain sizes in the SiC particles and nanodiamonds are 12–16 and 8–9 nm, respectively.     

Characterization and applications of as-grown β-Fe<Subscript>2</Subscript>O<Subscript>3</Subscript> nanoparticles prepared by hydrothermal method

The production of low-dimensional nanoparticles (NPs) with appropriate surface modification has attracted increasing attention in biological, biochemical, and environmental applications including chemical sensing, photocatalytic degradation, separation, and purification of toxic molecules from the matrices. In this study, iron oxide NPs have been prepared by hydrothermal method using ferric chloride and urea in aqueous medium under alkaline condition (pH 9 ~ 10). As-grown low-dimensional NPs have been characterized by UV–vis spectroscopy, FT-IR, X-ray diffraction, Field emission scanning electron microscopy, Raman spectroscopy, High-resolution Transmission electron microscopy, and Electron Diffraction System. The uniformity of the NPs size was measured by the scanning electron microscopy, while the single phase of the nanocrystalline β-Fe₂O₃ was characterized using powder X-ray diffraction technique. As-grown NPs were extensively applied for the photocatalytic degradation of acridine orange (AO) and electrochemical sensing of ammonia in liquid phase. Almost 50% photo-catalytic degradation with AO was observed in the presence of UV sources (250 W) with NPs. β-Fe₂O₃ NP-coated gold electrodes (GE, surface area 0.0216 cm²) have enhanced ammonia-sensing performances in their electrical response (I–V characterization) for detecting ammonia in liquid phase. The performances of chemical sensor were investigated, and the results exhibited that the sensitivity, stability, and reproducibility of the sensor improved significantly using β-Fe₂O₃ NPs on GE surface. The sensitivity was approximately 0.5305 ± 0.02 μAcm⁻²mM⁻¹, with a detection limit of 21.8 ± 0.1 μM, based on a signal/noise ratio of 3 with short response time.     

N+BF<Subscript>2</Subscript> and N+C+BF<Subscript>2</Subscript> high-dose co-implantation in silicon

Nitrogen and boron BF₂, and nitrogen, carbon, and boron BF₂ high-dose (6×10¹⁶–3×10¹⁷ cm^-2) co-implantation were performed at energies of about 21–77 keV. Subsequent high-temperature annealing processes (600, 850, and 1200 °C) lead to the formation of three and two surface layers respectively. The outer layer mainly consists of polycrystalline silicon and some amorphous material and Si₃N₄ inclusions. The inner layer is highly defective crystalline silicon, with some inclusions of Si₃N₄ too. In the N+B-implanted sample the intermediate layer is amorphous. Co-implantation of boron with nitrogen and with nitrogen and carbon prevents the excessive diffusivity of B and leads to a lattice-parameter reduction of 0.7–1.0%. Received: 10 January 2002 / Accepted: 30 May 2002 / Published online: 4 November 2002 RID="*" ID="*"Corresponding author. Fax: +34-91/3974895; E-mail: Lucia.Barbadillo@uam.es     

Microstructure, microhardness, composition, and corrosive properties of stainless steel 304 I. Laser surface alloying with silicon by beam-oscillating method.

Laser surface alloying (LSA) with silicon was conducted on austenitic stainless steel 304. Silicon slurry composed of silicon particle of 5 μm in average diameter was made and a uniform layer was supplied on the substrate stainless steel. The surface was melted with beam-oscillated carbon dioxide laser and then LSA layers of 0.4–1.2 mm in thickness were obtained. When an impinged energy density was adjusted to be equal to or lower than 100 W mm⁻², LSA layers retained rapidly solidified microstructure with dispersed cracks. In these samples, Fe₃Si was detected and the concentration of Si in LSA layer was estimated to be 10.5 wt.% maximum. When the energy density was equal to or greater than 147 W mm⁻², cellular grained structure with no crack was formed. No iron silicate was observed and alpha iron content in LSA layers increased. Si concentration within LSA layers was estimated to be 5 to 9 wt.% on average. Crack-free as-deposited samples exhibited no distinct corrosion resistance. The segregation of Si was confirmed along the grain boundaries and inside the grains. The microstructure of these samples changed with solution-annealing and the corrosion resistance was fairly improved with the time period of solution-annealing. Received: 2 September 1999 / Accepted: 6 September 1999 / Published online: 1 March 2000     

Sheath and electron density dynamics in the normal and self-pulsing regime of a micro hollow cathode discharge in argon gas

A microplasma is generated in the microhole (400 μm diameter) of a molybdenum-alumina-molybdenum sandwich (MHCD type) at medium pressure (30–200 Torr) in pure argon. Imaging and emission spectroscopy have been used to study the sheath and electron density dynamics during the stationary normal regime and the self-pulsing regime. Firstly, the evolution of the microdischarge structure is studied by recording the emission intensity of the Ar (5p[3/2]₁–4s[3/2]₁)_{1}) line at 427.217 nm, and Ar⁺ (4p′ ²P_3/2–4s′ ²D_5/2)_{5/2}) line at 427.752 nm. The maximum of the Ar⁺ line is located in the vicinity of the sheath-plasma edge. In both regimes, the experimental observations are consistent with the position of the sheath edge calculated with an ionizing sheath model. Secondly, the electron density is recorded by monitoring the Stark broadening of the H_b_\beta-line. In the self-pulsing regime at 150 Torr, the electron density reaches its maximum value of 4 × 10¹⁵ cm^-3, a few tens of ns later than the discharge current maximum. The electron density then decays with a characteristic decay time of about 2 μs, while the discharge current vanishes twice faster. The electron density in the steady-state regime is two orders of magnitude lower, at about 6–8 × 10¹³ cm^-3.     

Hot electron plasmas trapped in helical magnetic surfaces

Experimental studies on nonneutral (pure electron) plasmas of finite temperature, trapped in helical closed magnetic surfaces have been conducted. The helical electron plasmas are produced with thermal electrons launched from the outside of the last closed flux surface (LCFS). About 150 μs after the electron injection, the plasmas reach equilibrium state. Around the LCFS, a steep gradient of plasma space potential φ _s is formed. The corresponding radial electric field is about 2.5 kV/m. On the other hand, around the magnetic axis of helical magnetic surfaces, φ _s is almost constant, indicating that there are little electrons there. The volume-averaged electron density is on the order of 10¹³ m^–3, smaller than the Brillouin density limit. The confinement time seems to be limited by a disruptive instability, and is so far about 1.5 ms.