低能电子束照射接地绝缘薄膜的负带电过程

为揭示低能电子束照射接地绝缘薄膜的负带电过程及其机理,建立了同时考虑电子散射与电子输运的计算模型,综合Monte Carlo方法和有限差分法进行了数值模拟,获得了内部空间电荷、泄漏电流和表面电位随电子束照射的演化规律.结果表明,入射电子因迁移、扩散效应会超越通常的散射区域产生负空间电荷分布,并经过一定的渡越时间后到达接地基板,形成泄漏电流,负带电暂态过程则随着泄漏电流的增加而趋于平衡.在平衡状态下,泄漏电流随电子束能量和电流而增大;薄膜净负电荷量和表面电位随膜厚而增加、随电子迁移率的增大而降低,随着电子束 关键词： 绝缘薄膜 电子束照射 带电效应 数值模拟     

高能电子照射绝缘样品的泄漏电流特性

建立了考虑电子散射、输运、俘获和自洽场的数值计算模型, 研究了高能电子束照射下绝缘厚样品的泄漏电流特性, 并采用一个实验平台测量了泄漏电流. 结果表明: 在电子束持续照射下, 电子总产额会下降; 由于电子在样品内部的输运, 样品近表面呈现微弱的正带电, 在样品内部呈现较强的负带电; 样品内部电子会向下输运形成电子束感生电流, 长时间照射下会形成泄漏电流; 随着照射, 泄漏电流逐渐增大并趋于稳定值; 泄漏电流随样品厚度的增大而减小, 随电子束能量、电子束电流的增大而增大. 关键词： 绝缘样品 泄漏电流 电子产额 数值模拟     

电介质/半导体结构样品电子束感生电流瞬态特性

电子束照射下电介质/半导体样品的电子束感生电流(electron beam induced current,EBIC)是其电子显微检测的重要手段.结合数值模拟和实验测量,研究了高能电子束辐照下SiO2/Si薄膜的瞬态EBIC特性.基于Rutherford模型和快二次电子模型研究电子的散射过程,基于电流连续性方程计算电荷的输运、俘获和复合过程,获得了电荷分布、EBIC和透射电流瞬态特性以及束能和束流对它们的影响.结果表明,由于电子散射效应,自由电子密度沿入射方向逐渐减小.由于二次电子出射,净电荷密度呈现近表面为正、内部为负的特性,空间电场在表面附近为正而在样品内部为负,导致一些电子输运到基底以及一些出射二次电子返回表面.SiO2与Si界面处俘获电子导致界面附近负电荷密度高于周围区域.随电子束照射样品内部净电荷密度逐渐降低,带电强度减弱.同时,负电荷逐渐向基底输运,EBIC和样品电流逐渐增大,电场强度逐渐减小.由于样品带电强度较弱,表面出射电流和透射电流随照射基本保持恒定.EBIC、透射电流及表面出射电流均随束流呈现近似正比例关系.对于本文SiO2/Si薄膜,透射电流随束能的升高逐渐增大并接近于束流值,EBIC在束能约15 keV时呈现极大值.     

高能电子辐照绝缘厚样品的表面电位动态特性

采用数值计算和实验测量相结合的方法, 阐明了高能电子束照射下绝缘厚样品的表面电位和电子产额动态特性. 结果表明: 由于电子在样品内部的散射和输运, 沿着深度方向, 空间电位先缓慢下降到最小值, 然后逐渐升高并趋近于零; 随着电子束照射, 样品的表面电位逐渐下降, 可至负千伏量级, 电子总产额逐渐增大至一个接近于1的稳定值; 电子束停止照射后, 长时间放置下, 表面电位将逐渐升高, 但带电并不会消除; 表面电位随电子束能量的升高近似线性下降, 随入射角的增大而升高, 而随样品厚度的增大仅略有下降.     

空间多能电子辐照聚合物充电过程的稳态特性

空间同步轨道上多能电子辐照聚合物的充电过程及其稳态特性是研究和抑制通信卫星静电放电的基础.在同步电子散射-输运微观模型的基础上,采用具有10—400 keV积分能谱分布的多能电子辐照聚酰亚胺样品,进行了多能电子辐照聚酰亚胺充电过程的数值模拟,获得了空间电荷密度、空间电位、空间电场分布和聚合物样品参数条件下的表面电位和最大场强.结果表明,多能电子与样品发生散射作用并沉积在样品内形成具有高密度的电荷区域分布,同时在迁移和扩散的作用下输运至样品底部形成样品电流;充电达到稳态、电子迁移率较小时(小于10-10cm2·V-1·s-1),表面电位绝对值和充电强度随电子迁移率的降低明显加强,捕获密度较大时(大于1014cm-3),表面电位绝对值和充电强度随捕获密度的增大明显加强;聚合物样品厚度对表面电位和充电强度的影响大于电子迁移率、捕获密度和相对介电常数的影响.研究结果对于揭示空间多能电子辐照聚合物的充电现象及微观机理、提高航天器故障机理研究水平具有重要科学意义和价值.     

空间电子辐照聚合物的充电特性和微观机理

空间电子辐照聚合物的充电特性和微观机理是研究和防护航天器聚合物充放电特性的基础.采用蒙特卡罗方法模拟空间电子的散射过程,快二次电子模型模拟二次电子的产生,有限差分法求解电荷连续性方程、电流密度方程和泊松方程的电荷输运过程,俘获过程基于Poole-Frenkel效应来实现.基于电子散射/输运同步模型基础,结合法国国家航空航天科研局(ONERA)的地球同步轨道电子能谱分布理论公式和欧空局(SIRENE)机构的地面实验方法,建立了基于地球同步轨道电子能谱分布的空间多能电子的散射模型.通过空间电子辐照聚合物充电过程的数值模拟,获得了空间电荷密度、电位、电场和空间电位分布.阐明了空间电子辐照聚合物的充电特性和样品微观参数与表面电位的关联性.表面电位特性与实验结果相吻合,单能电子的电位强度高于多能电子的电位.充电达到稳态时,电子迁移率较小时(小于10~(–11)cm~2·V~(–1)·s~(–1)),空间电位绝对值随电子迁移率的降低明显加强;复合率较大时(大于10~(–14)cm~3·s~(–1)),空间电位绝对值随复合率的增大而增大.研究结果对于揭示空间电子辐照聚合物的充电特性和微观机理、提高航天器充放电故障机理研究水平具有重要科学意义和价值.     

电子辐照聚合物带电特性多参数共同作用的数值模拟

电子辐照聚合物样品的带电特性是扫描电子显微镜成像、电子束探针微分析以及空间器件辐照效应等领域的一个重要研究课题. 通过建立基于蒙特卡罗方法的电子散射和时域有限差分法的电子输运的数值模型, 并采用高效的多线程并行计算, 模拟了电子非透射辐照聚合物样品的带电特性, 得到了带电稳态下的样品底部泄漏电流密度、表面负电位以及样品总电荷密度等带电特征量受入射电子能量、入射电流密度、样品材料的电子迁移率、样品厚度等相关参数共同作用的影响. 结果表明, 一个参数的变化使表面负电位增强时, 其他参数对负电位的影响将增强. 样品的带电稳态特征量在同一个电流平衡的模式下受参数影响的变化是单调的. 当电流平衡模式发生变化时, 如在入射电子能量较低的条件下, 样品内部的总电荷量会随着样品厚度的增大而先增加后减小, 出现局部极大值. 样品底部的泄漏电流密度随着入射电流密度的增大而近线性成比例地增大. 研究结果对于揭示电子辐照聚合物的带电规律及微观机理、预测不同条件下的样品带电状态具有重要科学意义.     

纳米TiO_2∶Zn薄膜电极紫外光电特性研究

采用sol-gel法制备了Zn2 掺杂的锐钛矿相纳米TiO2薄膜电极.通过光电流作用谱和电流-电位(I-U)曲线研究了掺杂不同浓度Zn2 的TiO2薄膜电极的光电特性.由光电流作用谱可知,Zn2 的掺杂可显著影响薄膜电极的光电流大小,且掺杂的最佳浓度与薄膜晶粒尺度有关.在320nm单色光照射下,掺杂浓度(摩尔浓度)为0.1%的薄膜电极光电流最大,与未掺杂的本征薄膜电极相比增幅达40%.I-U曲线表明,光照下,随电极电位由正到负逐渐降低,不同掺杂浓度的TiO2薄膜电极中均出现了阳极电流向阴极电流转换的现象,且Zn2 掺杂浓度可影响电极阳极电流的初始电位.另外,无光照的暗态下,各薄膜在负电位区域观察到了相似的随电位降低而迅速增大的阴极暗电流.     

拓扑石墨烯电极分子器件输运特性

利用密度泛函理论结合非平衡格林函数方法,研究了不同拓扑能带结构的石墨烯电极分子器件输运特性.结果表明器件导通电压与电极禁带宽度正相关,同时器件在输运过程中表现出负微分电阻特性,峰谷电流比可达2697.分析认为器件导通源自于偏压升高过程中两电极能带匹配.器件负微分电阻特性源自于偏压升高过程中两电极能带交错.散射态分析表明,能带匹配后散射态分布较为离域,有利于电子通过器件.能带交错后散射态局域于电极处,表明电子输运受到抑制.     

纳米TiO2∶Zn薄膜电极紫外光电特性研究

采用sol-gel法制备了Zn2+掺杂的锐钛矿相纳米TiO2薄膜电极.通过光电流作用谱和电流-电位（I-U）曲线研〖WTBZ〗究了掺杂不同浓度Zn2+的TiO2薄膜电极的光电特性.由光电流作用谱可知，Zn2+的掺杂可显著影响薄膜电极的光电流大小，且掺杂的最佳浓度与薄膜晶粒尺度有关.在320nm单色光照射下，掺杂浓度（摩尔浓度）为0.1％的薄膜电极光电流最大，与未掺杂的本征薄膜电极相比增幅达40％.I-U曲线表明，光照下，随电极电位由正到负逐渐降低，不同掺杂浓度的TiO2薄膜电极中均出现了阳极电流向阴极电流转换的现象，且Zn2+掺杂浓度可影响电极阳极电流的初始电位.另外，无光照的暗态下，各薄膜在负电位区域观察到了相似的随电位降低而迅速增大的阴极暗电流.     

Self-consistent charging in dielectric films under defocused electron beam irradiation

We clarify the transient and equilibrium charging characteristics of grounded dielectrics due to low-energy defocused electron beam irradiation by a three-dimensional self-consistent simulation model. The model incorporates the electron scattering, transport and trapping. Results show that some electrons can arrive at the grounded substrate due to the internal field and density gradient, forming the leakage current. The transient charging process tends to equilibrium as the surface potential decreases and the leakage electron current increases. The positive and negative space charges are distributed alternately along the beam incident direction. In the equilibrium state, the surface potential and leakage electron current decrease to stable values with increasing film thickness and the trap density, but with decreasing electron mobility. Moreover, the surface potential of the dielectric thin film exhibits a maximum negative value with variation of the beam energy; for example, under the condition of the film thicknesses 0.5 μm and 2 μm, the maximum negative values of surface potentials are -13 V and -98 V in beam energies 2 keV and 3.5 keV, respectively. However, for the thick film, the surface potential decreases with the increase in beam energy.     

The positive charging effect of dielectric films irradiated by a focused electron beam

Space charge and surface potential profiles are investigated with numerical simulation for dielectric films of SiO₂ positively charged by a focused electron beam. By combining the Monte Carlo method and the finite difference method, the simulation is preformed with a newly developed comprehensive two-dimensional model including electron scattering, charge transport and trapping. Results show that the space charge is distributed positively, like a semi-ellipsoid, within a high-density region of electrons and holes, but negatively outside the region due to electron diffusion along the radial and beam incident directions. Simultaneously, peak positions of the positive and negative space charge densities shift outwards or downwards with electron beam irradiation. The surface potential, along the radial direction, has a nearly flat-top around the center, abruptly decreases to negative values outside the high-density region and finally increases to zero gradually. Influences of electron beam and film parameters on the surface potential profile in the equilibrium state are also shown and analyzed. Furthermore, the variation of secondary electron signal of a large-scale integration sample positively charged in scanning electron microscopic observation is simulated and validated by experiment.     

Analysis of microscopic parameters of surface charging in polymer caused by defocused electron beam irradiation

The relationship between microscopic parameters and polymer charging caused by defocused electron beam irradiation is investigated using a dynamic scattering-transport model. The dynamic charging process of an irradiated polymer using a defocused 30 keV electron beam is conducted. In this study, the space charge distribution with a 30 keV non-penetrating e-beam is negative and supported by some existing experimental data. The internal potential is negative, but relatively high near the surface, and it decreases to a maximum negative value at z = 6 μm and finally tend to 0 at the bottom of film. The leakage current and the surface potential behave similarly, and the secondary electron and leakage currents follow the charging equilibrium condition. The surface potential decreases with increasing beam current density, trap concentration, capture cross section, film thickness and electron–hole recombination rate, but with decreasing electron mobility and electron energy. The total charge density increases with increasing beam current density, trap concentration, capture cross section, film thickness and electron–hole recombination rate, but with decreasing electron mobility and electron energy. This study shows a comprehensive analysis of microscopic factors of surface charging characteristics in an electron-based surface microscopy and analysis.     

Characteristics of charge and discharge of PMMA samples due to electron irradiation

In this study, using a comprehensive numerical simulation of charge and discharge processes, we investigate the formation and evolution of negative charge and discharge characteristics of a grounded PMMA film irradiated by a nonfocused electron beam. Electron scattering and transport processes in the sample are simulated with the Monte Carlo and the finite-different time-domain(FDTD) methods, respectively. The properties of charge and discharge processes are presented by the evolution of internal currents, charge quantity, surface potential, and discharge time. Internal charge accumulation in the sample may reach saturation by primary electron(PE) irradiation providing the charge duration is enough. Internal free electrons will run off to the ground in the form of leakage current due to charge diffusion and drift during the discharge process after irradiation, while trapped electrons remain. The negative surface potential determined by the charging quantity decreases to its saturation in the charge process, and then increases in the discharge process. A larger thickness of the PMMA film will result in greater charge amount and surface potential in charge saturation and in final discharge state, while the electron mobility of the material has little effects on the final discharge state. Moreover,discharge time is less for smaller thickness or larger electron mobility. The presented results can be helpful for estimating and weakening the charging of insulating samples especially under the intermittent electron beam irradiation in related surface analysis or measurement.