Recombination dynamics of free and bound excitons in bulk GaN

We report new data on the transient photoluminescence behaviour of free and donor bound excitons in high quality bulk GaN material grown by HVPE. With 266 nm photoexcitation the no-phonon free exciton has a short decay time, about 100 ps at 2 K, assigned to nonradiative surface recombination. The LO replicas of the free exciton have a much longer decay at 2 K, about 1.4 ns, believed to be a lower bound for the bulk radiative lifetimes of the free excitons at 2 K. The donor bound exciton no-phonon lines exhibit a rather short (about 300 ps) nonexponential decay at 2 K, which appears to be dominated by a scattering process. The corresponding LO replicas and the two-electron transitions have a much longer decay. From the latter, the lower bound of the radiative lifetime of the O- and Si-bound excitons are 1800 ps and 1100 ps, respectively.     

Ultrafast photoconductors from low-temperature MOCVD-grown GaAs and InGaAs epitaxial layers

GaAs and InGaAs epitaxial layers were grown by Metal-Organic Chemical Vapor Deposition at Low substrate Temperatures (LT-MOCVD). The layers, grown at temperatures below 430° C were semi-insulating. Transmission electron microscopy images reveal uniformly distributed 3–10nm size clusters which consist, most probably, of zinc. Photodetectors fabricated from those layers feature nonlinear photocurrent versus optical power dependence. The nonlinearities are explained in terms of electric field redistribution. The nonlinear photoconductive correlation measurements show that excess carrier lifetimes are in the range of 20–50 ps.Deceased     

Photoexcited carrier dynamics in aligned InAs/GaAs quantum dots grown on strain-relaxed InGaAs layers

Carrier dynamics in aligned InAs/GaAs quantum dots (QDs) grown on cross-hatched patterns induced by metastable In_xGa_1−xAs layers have been studied by time-resolved photoluminescence. The low-temperature carrier lifetimes were found to be of the order of 100–200 ps and determined by carrier trapping and nonradiative recombination. Comparisons with control “nonaligned” InAs QDs show remarkable differences in dependence of peak PL intensities on excitation power, and in PL decay times dependences on both temperature and excitation intensities. Possible origin of traps, which determine the carrier lifetimes, is discussed.     

Characterization of InGaAs and InGaAsN semiconductor saturable absorber mirrors for high-power mode-locked thin-disk lasers

We report a comparative study of carrier dynamics in semiconductor saturable absorber mirrors (SESAMs) containing InGaAs quantum wells and InGaAsN quantum wells (QWs). The static and dynamic reflectivity spectra were measured with a Fourier-transform-infrared-spectrometer and a pump-probe setup, respectively. The influence of rapid thermal annealing (RTA) on carrier dynamics was studied. Due to the reduction of defect states by RTA we observed an increase of the static reflectivity and an increase of the electron–hole recombination time.     

Picosecond timescale carrier dynamics of InAs quantum dots: The role of a continuum background

We have investigated the ultrafast carrier dynamics in Molecular Beam Epitaxy (MBE)-grown InAs/InGaAs/GaAs quantum dots emitting at 1.3 μm by means of time resolved photoluminescence upconversion measurements with a time resolution of about 200 fs. The detection energies scan the spectral region from the energy of the quantum dot excitonic transition up to the barrier layer absorption edge. We found, under high excitation intensity, that the intrinsic electronic states are populated mainly by carriers directly captured from the barrier.     

不同盖层对InAs/GaAs量子点结构和光学性质的影响

利用金属有机化合物气相沉积设备生长了不同盖层结构的InAs/GaAs量子点,采用原子力显微镜和光致发光光谱仪对量子点的结构和光学性质进行了研究.量子点层之间的盖层由一个低温层和一个高温层组成.对不同材料结构的低温盖层的对比研究表明,In组分渐变的InGaAs低温盖层有利于改善量子点均匀性、减少结合岛数目、提高光致发光强度;当组分渐变InGaAs低温盖层厚度由6.8 nm增加到12 nm,发光波长从1256.0 nm红移到1314.4 nm.另外,还对不同材料结构的高温盖层进行了对比分析,发现高温盖层采用In组分渐变的InGaAs材料有利于光致发光谱强度的提高. 关键词： 半导体量子点 盖层 组分渐变     

Pseudomorphic InGaAs quantum-wire FETs with negative differential resistance

Pseudomorphic trench-type InGaAs/InAlAs quantum-wire field-effect transistors (QWR-FET) are realized by selective molecular beam epitaxy. The pseudomorphic QWR-FET has a negative differential resistance (NDR) effect with a low source–drain voltage (0.3 V). The NDR spectra are clearly observed in the 50–220 K temperature range. The operating current of the pseudomorphic QWR-FET is twice that of a lattice-matched QWR-FET, and this is thought to be due to the higher electron mobility.     

The influence of intrinsic and surface states on the emission properties of colloidal nanocrystals

Time Resolved Photoluminescence (TRPL) measurements on the picosecond time scale (temporal resolution of 17 ps) on colloidal CdSe and CdSe/ZnS Quantum Dots (QDs) were performed, to elucidate the role of intrinsic and surface states on the emission process. Transient PL spectra reveal three emission peaks with different lifetimes (60 ps, 460 ps and 9–10 ns, from the bluest to the reddest peak). The energy separations among the states, together with their characteristic decay times, allow us to attribute the two higher energy peaks to ±1^U and ±1^L bright states of the fine structure picture of spherical CdSe QDs, and the third one to surface states emission, respectively. We show that the contribution of surface emission to the PL results to be different for the two samples studied (67% in the CdSe QDs and 32% in CdSe/ZnS QDs), confirming the decisive role of the ZnS shell in the improvement of the surface passivation.     

Investigation of Mn incorporation in fifteen-period InGaAs/GaAs quantum well system

A ferromagnetic ordering with a Curie temperature of 50 K of fifteen layer of InGaMnAs/GaAs multi quantum wells (MQWs) structure grown on high resistivity (100) p-type GaAs substrates by molecular beam epitaxy (MBE) was found. It is likely that the ferromagnetic exchange coupling of sample with Curie temperature of 50 K is hole-mediated resulting in Mn substituting In or Ga sites. Temperature and excitation power dependent PL emission spectra of InGaMnAs MQWs sample grown at temperature of 170 °C show that an activation energy of Mn ion on the first quantum confinement level in InGaAs quantum well is 36 meV and impurity Mn is partly ionized. It is found that the activation energy of 36 meV of Mn ion in the QW is lower than the activation energy of 110 meV for a substitutional Mn impurity in GaAs. These measurements provide strong evidence that an impurity band existing in the bandgap due to substitutional Mn ions and it is the location of the Fermi level within the impurity band that determines Curie temperature.     

Passivation of GaAs surface by atomic-layer-deposited titanium nitride

The suitability of titanium nitride (TiN) for GaAs surface passivation and protection is investigated. A 2-6-nm thick TiN passivation layer is deposited by atomic layer deposition (ALD) at 275 ° C on top of InGaAs/GaAs near surface quantum well (NSQW) structures to study the surface passivation. X-ray reflectivity measurements are used to determine the physical properties of the passivation layer. TiN passivation does not affect the surface morphology of the samples, but increases significantly the photoluminescence intensity and carrier lifetime of the NSQWs, and also provides long-term protection of the sample surface. This study shows that ALD TiN coating is a promising low-temperature method for ex situ GaAs surface passivation.     

Structure and properties of epitaxial GaAs and InGaAs films grown by low-temperature molecular-beam epitaxy

We study epitaxial GaAs and InGaAs films produced by molecular-beam epitaxy in the temperature range 150–480°C and with various arsenic partial pressures. We determine the structural and electrophysical characteristics of the film (the excess arsenic, the crystal lattice parameter, and the carrier concentration and mobility) as a function of the growth conditions. The influence of annealing on the cluster-structure formation in low-temperature MBE films, and on their properties, is also studied. In low-temperature GaAs we find a characteristic microwave absorption signal indicating the presence of a superconducting phase. We discuss the possible nature of this phase with regard to clusters of gallium or an In-Ga alloy. Siberian V. D. Kuznetsova Physicotechnical Institute, Tomsk State University. Tomsk State University. Semiconductor Physics Institute, Siberian Division, Russian Academy of Sciences. A. F. Ioffe Physicotechnical Institute. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika No. 9, pp. 37–45, September, 1998.     

Laser reflectometry in situ monitoring of InGaAs grown by atmospheric pressure metalorganic vapour phase epitaxy

InGaAs layers on undoped GaAs (0 0 1) substrates were grown by atmospheric pressure metalorganic vapour phase epitaxy (AP-MOVPE). In order to obtain films with different indium composition (x_In), the growth temperature as a growth parameter, was varied from 420 to 680 °C. Furthermore, high-resolution X-ray diffraction (HRXRD) measurements were used to quantify the change of x_In. Crystal quality has been also studied as a function of growth conditions. On the other hand, laser reflectometry (LR) at 632.8 nm wavelength, was employed to in situ monitor epitaxy. Reflectivity-time signal was enabled to evaluate structural and optical properties of samples. We have fitted experimental data to determine optical constants and growth rate of InGaAs at 632.8 nm. In addition, the fitting provided InGaAs thickness as a function of growth time. Based on ex situ characterization by scanning electronic microscopy (SEM) and HRXRD, we propose a practical method, relating the contrast of first reflectivity maximum with the X-ray diffraction peak angular difference between the substrate and epitaxial layer, to determine in situ the In solid composition in InGaAs alloys.     

Far-infrared dielectric functions and phonon spectra of alloys determined by spectroscopic ellipsometry

We have used spectroscopic ellipsometry to determine the complex dielectric function of a series of ternary Be_xZn_1−xTe thin films grown by molecular beam epitaxy. The II–VI semiconductor alloys were grown on InP substrates that had an InGaAs buffer layer. After the growth, X-ray diffraction experiments were performed in order to determine the alloy concentration. A standard inversion technique was used to obtain the dielectric functions from the measured ellipsometric spectra, obtained between 2000 nm (5000 cm⁻¹) and 40,000 nm (250 cm⁻¹). By modelling the dielectric function as a collection of oscillators, representing longitudinal and transverse optical phonons of the Be_xZn_1−xTe lattice, we were able to recover the phonon spectra for this alloy system. It is argued that the additional phonon modes that are obtained from ellipsometry are best understood from the recently-proposed percolation model.     

Growth mode and effect of carrier gas on In0.53Ga0.47As/InP surface morphology grown with trimethylarsine and arsine

Different growth mode have been observed for InGaAs/InP grown with trimethylarsine and arsine by Metalorganic Vapor Phase Epitaxy (MOVPE) when changing the carrier gas. The surface has been investigated by Atomic Force Microscope (AFM) for epilayers grown at 600°C under pure hydrogen or a mixture of hydrogen and nitrogen as carrier gas. The step/terrace surface morphology was observed for InP/InP and InGaAs/InP (001) using 0.2° off substrates. InP epilayers grown under nitrogen flow show step-bunched terraces as large as 170 nm. The effect of the group V source for InGaAs/InP has been studied. It is shown that the step edge characteristic of step flow growth appears for lattice-matched InGaAs/InP grown with arsine. When using TMAs and hydrogen as a carrier gas, the growth mode and surface roughness depends greatly on V/III ratio and growth temperature. Under nitrogen flow with the combination of TMI+TMG+TMAs, pit-like defects (5–8 nm deep) are visible at high surface concentration (10⁹–10¹⁰/cm²). When increasing V/III ratio, 3D growth occurs simultaneously with pit-like defects, recovering the whole surface of the sample. Various surface morphology characteristics of InGaAs epilayers assessed by AFM characterisation will be presented and discussed.     

Transient differential reflectivity of ferromagnetic and paramagnetic phases in the bilayered manganite La1.24Sr1.76Mn2O7

Photoinduced effects in a single crystal of bilayered manganites, La_2−2xSr_1+2xMn₂O₇ (x=0.38), were investigated in a wide range of temperatures by pump-probe measurement at a photon energy of 1.6 eV. In a ferromagnetic metallic state, significant enhancement of positive rise in differential reflectivity with a slow relaxing time of 100 ps was observed just below T_C=127 K, indicating that the reflectivity change with the slow relaxation time constant is induced by laser heating. We have also observed an unconventional fast relaxing component that has a time constant of the order of 10 ps. This fast relaxing component, whose absolute value has an asymmetric peak at T_C, is presumably due to short-range correlation of Jahn-Teller distortion.     

Influence of double A1N buffer layers on the qualities of GaN films prepared by metal-organic chemical vapour deposition

<正>In this paper we report that the GaN thin film is grown by metal-organic chemical vapour deposition on a sapphire (0001) substrate with double AlN buffer layers.The buffer layer consists of a low-temperature(LT) AlN layer and a high-temperature(HT) AlN layer that are grown at 600℃and 1000℃,respectively.It is observed that the thickness of the LT-AlN layer drastically influences the quality of GaN thin film,and that the optimized 4.25-min-LT-AlN layer minimizes the dislocation density of GaN thin film.The reason for the improved properties is discussed in this paper.     

Amplification of kW peak power femtosecond pulses in single quantum well InGaAs tapered amplifiers

The amplification of ps and fs pulses with peak powers of up to 4.5 kW has been investigated in a single quantum well InGaAs tapered amplifier. The pulses with durations of 100 fs or 2 ps were generated by a modelocked titanium-sapphire laser. The amplified pulses indicate strong gain saturation and carrier generation due to photon absorption in the laser active region which causes a temporal broadening of the amplified pulses as well as modifications of the optical spectrum. The gain recovery time was measured by a pump-probe experiment. The experimental results are analyzed with respect to the sub-ps gain dynamics which is described by a relaxation time approximation.     

In-plane photovoltage measurements on MBE grown InN

Temperature dependent measurements of the in-plane photovoltage (IPV) arising from Fermi level fluctuations constitute a powerful tool for determining surface and bulk states and trap activation energies in nominally undoped semiconductors. In this work we report the first IPV measurements on high quality InN grown using the MBE technique. The temperature dependent IPV results coupled with Hall mobility and carrier density measurements provide ample evidence for the existence of a high density of states within the range 54 to 68 meV below the conduction band. Temperature dependent PL measurements indicate a band gap of 0.77 eV where a very weak temperature dependence is observed between 77 and 300 K. These results are shown to be in accord with the IPV measurements.     

Time- and frequency-domain measurements of carrier lifetimes in GaN epilayers

Results on time-resolved study of GaN photoluminescence (PL) in a power density range from 0.5 mW/cm² under CW excitation by ultraviolet light emitting diode (UV LED) to 1 GW/cm² under pulsed excitation by YAG:Nd laser in the temperature range from 8 to 300 K are presented. Measurements of PL response in the frequency domain by using amplitude-modulated emission of a UV LED as well as time-resolved PL measurements using a streak camera and light-induced transient grating technique have been used in the study. Yellow luminescence (YL) intensity increases with increasing temperature up to 120 K and faster components in YL decay switch to slower components with increasing temperature under UV LED excitation. At low carrier densities, the trapping decreases the carrier lifetime below 250 ps, while the carrier lifetime in the same GaN sample under excitation ensuring saturation of the traps equals 2 ns.     

Growth and characterisation of GaN with reduced dislocation density

Two GaN MOVPE growth methods to reduce the threading dislocation (TD) density have been explored. The combined effects of (1) in situ SiN_x masking of the sapphire substrate and (2) starting the epitaxial growth at low V-to-III ratio on the GaN film quality were studied by atomic force microscopy, transmission electron microscopy and high-resolution X-ray diffraction. It was found that the annealing condition of the low-temperature nucleation layer after in situ SiN_x masking is critical in order to decrease the density of nucleation sites and hence increase the average grain size to about 5 μm. However, the coalescence of large grains with vertical side facets results in the formation of dense bundles of TDs at the grain boundaries combined with large numbers of basal-plane dislocation loops throughout the film. The formation of these dislocations can be prevented by starting the epilayer growth at low V-to-III ratio, resulting in the formation of grains with inclined side facets. The interaction of the TDs with the inclined side facets causes the dislocations to bend 90 as the grains grow in size and coalesce. GaN films with dislocation densities as low as 1×10⁸ cm⁻², giving full-width at half-maximum values of 180 and 220 arcsec for respectively (002) and (302) omega scans, were achieved by the combination of in situ masking and low V–III ratio epilayer growth. Hall carrier mobility values in excess of 900 cm² V ⁻¹ s⁻¹ were deduced for Si-doped layers.