Fe-Ni-S软磁薄膜的电沉积

酸性镀液中以硼酸为缓冲剂、柠檬酸三钠为配合剂,在紫铜箔上电沉积得到非晶Fe-Ni-S合金薄膜。 采用扫描电子显微镜和能谱分析技术(EDS)研究了镀液组成和沉积条件对镀层表面形貌和组成的影响。 结果表明,在镀液中加入2 g/L C7H5O3NS（糖精）和0.4 g/L 1,4-丁炔二醇可获得表面平整无裂缝和较小内应力的合金镀层;电流密度和镀液pH值对镀层组成影响较小,但施镀温度对镀层组成影响较大。 获得了理想的镀液组成和沉积条件,所得Fe73Ni9.5S17.5薄膜的X射线衍射表明其为非晶结构,在室温下具有较高的饱和磁化强度(Ms约为876.25 kA/m)和较低的矫顽力(Hc约为4.96 kA/m),具有良好的软磁性能。 循环伏安曲线和阴极极化曲线均表明,镀液中CS(NH2)2会促进Fe-Ni-S共沉积。     

Cu含量对Ni-Cu-P化学镀层组织结构和性能影响

利用化学镀法制备出Ni-Cu-P合金镀层,研究了镀液中CuSO4·5H2O含量对合金镀层沉积速率和成分的影响. 通过XRD和SEM表征了不同CuSO4·5H2O质量浓度下Ni-Cu-P合金镀层的组织结构和表面形貌,运用极化曲线评价了合金镀层在质量分数为3.5%NaCl溶液中的耐蚀性能. 结果表明,随着镀液中CuSO4·5H2O质量浓度的增加,镀层沉积速率和P含量不断下降,Ni-P镀层中P的质量分数为14.98%. 当镀液中CuSO4·5H2O质量浓度为1.0 g/L时,P的质量分数为4.21%;镀层中Cu的含量随着镀液中CuSO4·5H2O含量的增加而增加. 当添加量为1.0 g/L时,镀层中Cu的质量分数达19.04%;镀层的结晶度随着Cu含量的上升不断增大,Cu的加入使镀层的表面形貌更加光滑;镀层的耐蚀性能随着镀液中CuSO4·5H2O含量的增加先上升后下降,当镀液中CuSO4·5H2O质量浓度为0.4 g/L时,Ni-Cu-P镀层表现出最优的耐蚀性能.     

主盐浓度和工艺条件对Sn-Ag-Cu合金镀层组成和形貌的影响

在弱酸性镀液中电沉积得到无铅Sn-Ag-Cu可焊性合金镀层。采用X射线荧光光谱仪(XRF)和扫描电子显微镜(SEM)研究了镀液中主盐浓度和电镀工艺条件对镀层的组成和形貌的影响。研究表明,Sn-Ag-Cu合金的电沉积是正则共沉积。镀液中Sn²⁺和Ag⁺浓度改变对镀层晶粒大小影响较大,Cu²⁺浓度的改变对镀层的平整度影响较大。电流密度增加、pH值下降、温度降低,都能使镀层结晶细致。     

不同分子量PEG的铜电镀液对电化学沉积铜行为的研究

研究了在酸性镀铜溶液中添加不同分子量的PEG对直径为50微米、深径比为1的镀层盲孔填充效果的影响.结果表明,随着PEG分子量的增加,电镀铜溶液的微孔填充力明显提高.电流密度为2 A/dm2,添加剂PEG分子量(u)超过6000时,镀液可以完全填充盲孔,镀层不出现任何空洞和缝隙.这是由于添加剂PEG能明显加强电镀铜镀液阴极极化,抑制了电镀铜的沉积.同时,PEG于镀液中的扩散系数还随其分子量的增加而降低,从而增加了SPS在微孔底部的吸附力,加速了电镀铜在微孔底部的沉积.进一步,增大PEG分子量,沉积铜膜的表面粗糙度、铜膜结晶度和电阻率均有所降低.     

化学沉积镍-铁-磷合金和它的伏安行为(英文)

在以次亚磷酸钠为还原剂 ,硼酸为缓冲剂和柠檬酸钠为络合剂的碱性介质中 ,研究了镍_铁_磷合金化学沉积条件 (pH值 ,温度及 [Fe2 + ]/([Ni2 + ]+[Fe2 + ])物质的量比 )对沉积速率和镀层组成的影响 ;并由此建立镀液稳定的最佳沉积工艺 .实验表明 ,镀液中硫酸亚铁对沉积镍_铁_磷合金有阻碍作用 (降低了化学沉积速率 ) ,造成镀层中铁含量不高 (小于 2 0 % ) ,使用循环伏安技术研究了镍_铁_磷合金的电沉积机理 .结果发现铁对次亚磷酸钠的氧化不起催化作用 ,提高镀液温度和pH值有增加沉积速率之效     

镍钴磷包覆的碳纳米管与成分关联的磁性能

用化学镀方法在碳纳米管表面沉积了具有不同镍／钴成分配比的镍钴磷合金层．讨论了Co^2＋与Ni^2＋的浓度比、镀液温度、pH值对沉积速率的影响．并利用场发射扫描电镜、透射电镜、X射线衍射仪、能谱仪和磁性测疑仪对镍钴磷包覆碳纳米管进行了系统的结构和性能表征．结果表明：当镀液中Co^2＋与Ni^2＋的浓度比为1,pH值为9时沉积速率最大;镀液温度的升高会使沉积速率增大．磁性测试结果显示碳纳米管表面镀覆Ni—Co—P镀层后,其磁性能对镀层中的Ni、Co相对含量有强烈的依赖性．当Co^2＋：Ni^2＋=2：1时,饱和磁化强度最大．矫顽力分别在Co^2＋：Ni^2＋=1：2和Co^2＋：Ni^＋2＋=4：1时有2个峰值;而磁导率分别在Co^2＋：Ni^2＋=1：4和Co^2＋：Ni^2＋=4：1时有2个峰值．     

酸性溶液化学镀Ni-P-B合金及结构性能表征(英文)

联用次亚磷酸钠和硼氢化钠两种还原剂 ,从酸性镀液中沉积出不同硼含量的Ni_P_B镀层 ,并用原子力显微镜、X_射线衍射、透射电镜、动电位扫描等实验技术对其镀态结构及性能进行了表征。实验表明 ,镀液中硼氢化钠含量对沉积速度影响不大 ,但能显著影响镀层的化学组成。硼的共沉积使镍晶格点阵产生扭变 ,导致镀层晶粒增大 ,表面粗糙 ,颗粒分布不均匀 ,并使镀层由非晶态向微晶结构转变 ,且微晶成分随镀层中硼含量的增加而增多。Ni_P_B镀层的硬度随镀层中硼含量的增加而增大 ,热处理能显著提高镀层的硬度 ,且服从沉淀硬化机理。在 3.5wt%NaCl和 40wt%NaOH两种介质中 ,Ni_P_B合金的耐腐蚀能力优于Ni_P合金。镀层中硼含量越高 ,其耐腐蚀能力越强。     

化学沉积Ni–Fe–P合金的冲蚀特性研究

采用扫描电镜、能谱仪、X射线衍射等方法,研究了化学沉积Ni–Fe–P合金的组成和结构,并对其冲蚀性进行了研究。结果表明,随着镀液中硫酸亚铁浓度增大,化学沉积Ni–Fe–P镀层中的铁含量增大,磷含量下降。化学沉积Ni–Fe–P镀层的腐蚀电位比化学镀Ni–P镀层的腐蚀电位高。在3.5%(质量分数)Na Cl溶液组成的悬浮液冲击下,碳化硅颗粒粒度为124μm时,镀层质量损失出现最大值,随着悬浮液流速的增大镀层质量损失增加。     

Zn-Fe-SiO2复合镀层的制备工艺及其耐蚀性研究

在酸性硫酸盐体系中电沉积制备了Zn-Fe-SiO2复合镀层,并研究了工艺因素对镀层SiO2含量的影响.随着电流密度由4.8A/dm2增加到6A/dm2时,镀层中SiO2的含量由0.21%上升到0.47%,但是当电流密度继续增加到7.2A/dm2时,SiO2含量反而下降到了0.18%.当镀液中SiO2浓度由20g/L增加到60g/L时,镀层中SiO2含量由0.40%上升到0.51%.当镀液pH值由2增加到4时,镀层中SiO2含量由0.22%上升到1.17%.采用5%NaCl溶液浸泡试验考察了Zn镀层、Zn-Fe合金镀层与Zn-Fe-SiO2复合镀层的耐蚀性,并研究了镀层中SiO2含量对镀层耐蚀性的影响.结果表明,Zn-Fe-SiO2复合镀层无需钝化处理,其耐蚀性优于Zn镀层及Zn-Fe合金镀层,并且镀层的耐蚀性随着镀层中SiO2含量增大而提高.     

CO2-3对羟基乙叉二膦酸镀铜液的影响

研究羟基乙叉二膦酸(HEDPA)镀铜液中CO2-3含量对电沉积时阴、阳极过程及镀层的择优取向的影响. 通过分析阴、阳极的动电位极化曲线, 发现镀液中逐渐加入的CO2-3提高了阴极的极化, 使电结晶晶粒细化, 直至达到稳定; 同时促进了铜阳极的溶解. 而X射线衍射(XRD)结果表明, 铜镀层的晶面择优取向从(222)逐渐向(111)转变. 通过镀液中固体络合物的红外光谱分析表明, CO2-3的加入以第二配体的方式进入该镀液的放电络合离子结构中, 参与Cu2+的络合, 形成更稳定的络合物, 从而导致铜沉积电位负移, 镀层(111)晶面取向增强.     

Microstructure, surface and electrochemical studies of electroless Cr–P coatings tailored for the methanol oxidative fuel cell

Cr–P is a new material of great importance as a decorative coating with nickel in automobile industries. Electroless plating of Cr–P alloy has been carried out using a suitable plating bath solution and working conditions. The deposit is characterized by X-ray diffraction, transmission electron microscopy, energy-dispersive X-ray diffraction, X-ray photoelectron spectroscopy and polarization techniques. New phases appear on heat treatment of the coating. The composition (Cr/P) of the coating and the oxidation states of alloying elements vary from the surface to the bulk of the material. The coatings acted as a novel electrode material with good electrocatalytic activity (low overvoltage) and good corrosion resistance for anodic oxidation of methanol in H₂SO₄ at normal working temperature. The good corrosion resistance of the Cr–P film is accounted for by the existence of a double oxyhydroxide passive film on the surface. The electrocatalytic activity of Cr–P is very high when compared with chromium alone.     

电沉积Co-Cu颗粒膜的巨磁电阻效应

从１９８８年Ｂａｉｂｉｃｈ首先在磁性Ｆｅ／Ｃｒ多层膜中发现巨磁电阻效应（ＧＭＲ）以来 ［１］,由于ＧＭＲ本身的科研价值和在磁记录、磁性传感器等方面的广泛应用前景 ,引起了人们的极大关注．继多层膜之后 ,人们在金属颗粒膜如Ｃｏ Ａｇ［２］,Ｃｏ Ｃｕ［３,４］等中也相继发现了巨磁电阻效应．颗粒膜是微颗粒镶嵌于薄膜中所构成的复合材料体系．原则上 ,颗粒的组成与薄膜的组成在制备条件上应互不固溶 ,因此颗粒膜区别于合金、化合物 ,属于非均匀相组成的材料．磁性颗粒膜是磁性粒子分布在非磁性金属材料薄膜中．在磁性颗粒与非…     

Ce4+离子对电沉积金属铬的影响

用电沉积方法从含有CrO。及少量HzSO。的电解液中制备的金属铬镀层，具有极好的反光性能及装饰性能，应用十分广泛．但长期以来，一直采用高CrO。浓度（2509·L－‘以上）、高温度（50”C以上）的工艺，加上该工艺阴极电流效率极低（10％左右）＊；环境污染、材料和能源浪费严重．近年来，在改善镇铬工艺方面的研究取得了很大的进展，其中使用各种添加剂的尝试得到了一定的成效，如使用含有卤素化合物的添加剂可提高镀铝的阴极电流效率［2－1使用含稀土化合物的添加剂可以使电解液中CrO。浓度和操作温度大大降低，而阴极电流效率却有所…     

化学溶液沉积法制备自取向BiFeO3多铁薄膜

通过化学溶液沉积法在氧化铟锡(ITO)/导电玻璃上生长了BiFeO₃多晶薄膜.利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、X射线光电子能谱分析仪(XPS)、磁性测量系统(MPMS)和铁电测试仪对样品的结构、形貌、元素价态、铁磁性和铁电性进行研究.结果表明, 薄膜为自取向生长, 具有良好的[101] 生长取向和平整的表面.室温下, 样品呈铁磁性, 沿样品取向方向为易磁化轴方向.铁电测试结果表明, 其饱和电极化强度达到51.3 μC/cm².     

Manganese oxide thin films prepared by potentiodynamic electrodeposition and their supercapacitor performance

Manganese oxide film for supercapacitor applications was prepared by potentiodynamic electrodeposition in a manganese acetate plating solution. The effects of the potential sweep rate on the oxide microstructure, crystallinity, and chemical states were examined using a scanning electron microscope, an X-ray diffractometer, and an X-ray photoelectron spectrometer, respectively. Electrochemical performance of the film electrodes was evaluated using a cyclic voltammetric measurement. The experimental results indicate that the deposition potential sweep rate significantly affected the material properties of the prepared oxide films. The oxide-specific capacitance increased from 262 to 337 F/g when the sweep rate was increased from 100 to 400 mV/s. The key material factors that govern the specific capacitance and cyclic stability of the oxide electrodes were discussed.     

Thermal decomposition route for synthesis of Mn3O4 nanoparticles in presence of a novel precursor

The synthesis of manganese oxide (Mn₃O₄) nanoparticles by using thermal decomposition and its physicochemical characterization are being reported in present investigation. As a new precursor, [bis(2-hydroxy-1-naphthaldehydato)manganese(II)] complex was used in the presence of oleylamine (C₁₈H₃₇N) as both surfactant and solvent to control the size of resulting nanoparticle. The products were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), Fourier transform infrared (FT-IR) spectroscopy, thermogravimetric analysis (TGA), X-ray photoelectron spectroscopy (XPS) and Raman spectrum. Synthesized manganese oxide nanoparticles have a tetragonal structure with average size of 9–24 nm. The phase pure samples were characterized by using X-ray photoelectron spectroscopy (XPS) for Mn 2p level. The values of binding energies are consistent with the relative values are reported in the literature. As a comparison between two methods, the novel precursor thermally was treated in solid state reaction in different temperature, 400, 500, and 600 °C and the products were characterized by SEM images. Magnetic property of the as-prepared Mn₃O₄ nanoparticle shows a ferromagnetic behavior with high saturation magnetization and coercivity.     

Electroless Copper Plating on Liquid Crystal Polymer Films Using Dimethylamine Borane as Reducing Agent

Dimethylamine borane (DMAB) was used in electroless copper plating on liquid crystal polymer (LCP) films. An orthogonal test was applied to optimize the plating condition. With Cu film resistivity as the evaluation index, the optimum plating condition is: 10 g/L of CuSO₄ ? 5H₂O, 14 g/L of EDTA‐2Na, 6 g/L of DMAB, 9.5 of pH value and 50 °C. As pH value increases, the Cu film resistivity decreases and the depo‐ sition rate increases. As temperature increases, the Cu film resistivity decreases first and then increases with a minimum at 50 °C while the deposition rate increases first and then decreases with a maximum at 50 °C. The decreased Cu film resistivity can be attributed to the occurrence of CuO. The adhesive strength of copper layer to LCP film is constant at pH values lower than 8.5 and decreases slightly with the increase in pH value. As temperature increases, the adhesive strength decreases slightly. The decreased adhesive strength with both pH and temperature may be a result of an increased corrosion attack from the bath to the surface of LCP films. Low Cu film resistivity and high deposition rate as well as high adhesive strength can be obtained using DMAB reducing agent.     

氯化钯掺杂的羧基丁苯胶乳薄膜的制备及用于化学镀铜性能

利用羧基丁苯胶乳优良的成膜性能,并通过氯化钯掺杂使薄膜具备催化化学镀的活性,在其表面进行化学镀铜研究,选用次亚磷酸钠和硼氢化钠为还原剂,将硫酸铜还原成单质铜。 采用扫描电子显微镜（SEM）、能量色散谱（EDS）和X射线衍射（XRD）等对其形貌、成分进行表征。 测试了胶膜的增重率、表面金属及沉积层的结合牢度。 结果表明,薄膜的表面形成均匀致密、导电性优良和结合力良好的铜层。 该方法可应用于平面非金属材料如聚酯透明材料、装饰板材等,获得了良好导电表面,形成具有电磁屏蔽功能的面型材,具有广阔应用前景。     

二苯胺-4-偶氮磺酸盐及其树脂的制备和光、热分解性质

从二苯胺 4 重氮盐(DS)和3 甲氧基二苯胺 4 重氮盐(MDS)以及重氮树脂(DR)和硝基重氮树脂(NDR)与亚硫酸钠反应,在水溶液中制备了相应的二苯胺 4 偶氮磺酸盐DSS和MDSS(简称偶氮磺酸盐)及相应的重氮树脂的偶氮磺酸盐DRS和NDRS(简称偶氮磺酸盐树脂).对它们在水溶液和固相膜中的光、热反应进行了研究.结果表明偶氮磺酸盐与偶氮磺酸盐树脂有很好的感光性能,而热稳定性比相应的重氮盐和重氮树脂好很多,其中二苯胺上有硝基取代的偶氮磺酸盐树脂具有突出的热稳定性,其水溶液在70℃加热6h,其固相膜在100℃加热11天几乎观察不到分解.对偶氮磺酸盐及偶氮磺酸盐树脂的光、热分解机理作了初步分析.     

Comparison of properties of titanium aluminium nitride film produced by using two different types of Ti–Al target

This work aims to study the influence of two different types of Ti–Al target (sintered and melted) which have same nominal composition (50 at% Ti, 50 at% Al) on the properties of thin films coated by using arc ion plating (AIP) method. The hardness of the melted target was of higher value than that of the sintered target. The property of the film is related to the microstructure and phase analysis of both types of target that have quite different phases. Ti and Al metals were found as major phases and TiAl₂ as minor phase in the sintered target but only TiAl compound was found in the melted target. After film coating at the same operation parameters, it was found that although the phase structures of the sintered and melted targets were quite different, the coated thin films using these targets showed the same phase structure of Ti_0.5 Al_0.5 N. However, the microstructure of films coated by using the sintered target showed higher density of droplets and pores than those of film produced by using the melted target. As a result, the hardness and adhesion strength of thin film produced by using the melted target were slightly higher than those values of film produced by using the sintered target. Copyright © 2009 John Wiley & Sons, Ltd.