Formation of Ti and TiN ultra-thin films on Si by ion beam sputter deposition

Ultra-thin titanium and titanium nitride films on silicon substrate were obtained by ion beam sputtering of titanium target in vacuum and nitrogen atmosphere, using argon ions with energy of 5 keV and 15 μA target current. Elemental composition and chemical state of obtained films were investigated by X-ray photoelectron spectroscopy with using Mg-Kα X-ray radiation (photon energy 1253.6 eV). It was shown that it is possible to form both ultra-thin titanium films (sputtering in vacuum) and ultra-thin titanium nitride films (sputtering in nitrogen atmosphere) in the same temperature conditions. Photoelectron spectra of samples surface, obtained in different steps of films synthesis, detailed spectra of photoelectron emission from Si 2p, Ti 2p, N 1s core levels and also X-ray photoelectron spectra of Auger electrons emission are presented.     

First-principles study of structural and opto-electronic characteristics of ultra-thin amorphous carbon films

Most amorphous carbon(a-C)applications require films with ultra-thin thicknesses;however,the electronic structure and opto-electronic characteristics of such films remain unclear so far.To address this issue,we developed a theoretical model based on the density functional theory and molecular dynamic simulations,in order to calculate the electronic structure and opto-electronic characteristics of the ultra-thin a-C films at different densities and temperatures.Temperature was found to have a weak influence over the resulting electronic structure and opto-electronic characteristics,whereas density had a significant influence on these aspects.The volume fraction of sp3 bonding increased with density,whereas that of sp2 bonding initially increased,reached a peak value of 2.52 g/cm³,and then decreased rapidly.Moreover,the extinction coefficients of the ultra-thin a-C films were found to be density-sensitive in the long-wavelength regime.This implies that switching the volume ratio of sp2 to sp3 bonding can effectively alter the transmittances of ultra-thin a-C films,and this can serve as a novel approach toward photonic memory applications.Nevertheless,the electrical resistivity of the ultra-thin a-C films appeared independent of temperature.This implicitly indicates that the electrical switching behavior of a-C films previously utilized for non-volatile storage applications is likely due to an electrically induced effect and not a purely thermal consequence.     

采用椭偏法结合分光光度法研究极薄银的光学常数

极薄银在滤光片、高反射镜等中有广泛的应用,其光学常数严重影响着膜系的特性。在室温条件下,采用电阻热蒸发技术分别在硅和玻璃基底上沉积5.3 nm~26 nm不同厚度的极薄银薄膜,用TalySurfCCI非接触式轮廓仪测量了薄膜的厚度,研究了不同厚度银薄膜的光学常数n和k。镀制厚度5.3 nm、7.9 nm、14.1 nm、26.0 nm的银薄膜,结果显示极薄银的光学常数与块状银光学常数不同,当膜厚小于14.1 nm时,折射率n在380 nm~600 nm随波长增加而增加,在600 nm~1 600 nm随波长增加缓慢减小至趋于稳定值2.6;消光系数k在380 nm~500 nm随着波长增加而增加,在500 nm~1 600 nm随波长增加而缓慢减小至趋于0不变;当膜厚大于14.1 nm时,折射率随波长增加而增加,消光系数随波长近似呈线性增加。整体上,膜厚增加时折射率减小且趋于块状银的折射率,k随厚度增加而增加并最终趋于块状膜。用此拟合的光学常数代入TFc膜系设计软件计算其透射率,发现与分光光度计测得的透射率吻合较好。     

The protective properties of ultra-thin diamond like carbon films for high density magnetic storage devices

With the increase of magnetic storage density, the thickness of the protective diamond like carbon (DLC) film on the surfaces of head and disk is required as thin as possible. In this paper, the structure, mechanical properties and corrosion and oxidation resistance of ultra-thin DLC films are investigated. The ultra-thin DLC films were deposited by using filtered cathodic vacuum arc (FCVA) technique. The exact thickness of the ultra-thin DLC film was determined by high resolution transmission electron microscope (HRTEM). Raman analysis indicates that the ultra-thin DLC film presents ta-C structure with high sp³ fraction. In the wear test, a diamond tip was used to simulate a single-asperity contact with the film surface and the wear marks were produced on the film surface. The wear depths decrease with film thickness increasing. If the film thickness was 1.4 nm or above, the wear depth was much lower than that of Si substrate. This indicates that the ultra-thin DLC film with thickness of 1.4 nm shows excellent wear resistance. Corrosion tests in water and oxidation tests in air were carried out to investigate the diffusion barrier effect of the ultra-thin DLC films. The results show that the DLC film with thickness of 1.4 nm provides adequate coverage on the substrate and has good corrosion and oxidation resistance.     

铝诱导层交换超薄多晶硅薄膜制备及压阻特性

超薄多晶硅薄膜具有优异的压敏特性。铝诱导层交换(ALILE)制备多晶硅薄膜具有成膜温度低薄膜性能优良等特点。利用ALILE方法在玻璃基底上低温条件下制备了50 nm超薄多晶硅(poly-Si)薄膜,并对薄膜微观结构及压阻特性进行了研究。Raman光谱在521 cm-1出现尖锐、对称的特征峰,表明超薄多晶硅薄膜晶化状态良好。此外,在拉曼光谱480 cm-1处没有明显出现a-Si的Raman特征峰也说明制备的poly-Si薄膜样品完全结晶;XRD光谱表明ALILE制备薄膜在(111)和(220)晶向择优生长,晶粒尺寸约5 μm;霍尔效应测试结果表明：ALILE制备薄膜为p型掺杂,空穴浓度为9×1018～6×1019 cm-3;压阻特性研究表明：ALILE超薄多晶硅薄膜应变系数(GF)达到了60以上,且与薄膜厚度相关;应变温度相关系数(TCGF)在-0.17～0%℃范围内;电阻温度相关系数(TCR)在-0.2～-0.1%℃范围内。ALILE超薄多晶硅薄膜具有GF大、TCGF小和TCR小等特点。因此,有望在压力传感器领域得到应用。     

Hydrophilicity of amorphous TiO2 ultra-thin films

The UV-light-induced hydrophilicity of amorphous titanium dioxide thin films obtained by radio frequency magnetron sputtering deposition was studied in relation with film thickness. The effect of UV light irradiation on the film hydrophilicity was fast, strong and did not depend on substrate or thickness for films thicker than a threshold value of about 12 nm, while for thinner films it was weak and dependent on substrate or thickness. The weak effect of UV light irradiation observed for the ultra-thin films (with thickness less than 12 nm) is explained based on results of measurements of surface topography, UV-light absorption and photocurrent decay in vacuum. Comparing to thicker films, the ultra-thin films have a smoother surface, which diminish their real surface area and density of defects, absorb partially the incident UV light radiation, and exhibit a longer decay time of the photocurrent in vacuum, which proves a spatial charge separation. All these effects may contribute to a low UV light irradiation effect on the ultra-thin film hydrophilicity.     

Fabrication Techniques and Characteristics of Ultra-Thin Optical Polarizing Films Using Gold Island Films

Fabrication techniques of ultra-thin optical polarizing films using gold island films have been investigated for the near-infrared region. The polarizing films are fabricated by stretching the periodic multilayers consisting of gold island layers and glass layers. We have experimentally investigated the optimum fabricating conditions necessary to induce large optical anisotropy into the gold island layers and have formed submicrometer-thick polarizing films with an extinction ratio of ≥20 dB in a near-infrared region longer than 800 nm. These polarizing films could be useful micro-polarizers for fiber-embedded in-line optical devices, micro-optics, and hybrid integrated optics.     

Thickness effects on the optical properties of layer-by-layer poly(p-phenylene vinylene) thin films and their use in energy-modulated structures

Poly(p-phenylene vinylene) (PPV) thin films were produced by layer-by-layer (LbL) method, using soluble PPV-precursor and dodecylbenzenesulfonate salt (DBS). The amount of deposited layers strongly influences the optical properties of the thermally converted PPV film. The absorbance and luminescence spectra of ultra-thin films (consisting of only two or three PPV layers) are shifted to smaller wavelengths with respect to spectra of thicker films. This is related to the smaller average conjugation length of polymer chains, resulting in a higher HOMO-LUMO gap energy of the material. However, if a thick film is produced by repeating the deposition process and thermal conversion of ultra-thin layers, the optical spectra are still displaced to higher energies in comparison with those of thicker films produced by the conventional continuous deposition of layers. This result enabled the production of multilayered polymeric films with modulated energy profile, taking the number of deposited layers as the only variable in the manufacturing process of the structure. The aim is to guide the excitation to specific regions of the material through the Förster-type energy transfer processes. Such systems can be used at interfaces electrode/polymer and/or electrode/polymeric active layers in order to improve the performance of organic optoelectronic devices.     

PtSi超薄膜厚度的一种检测方法研究

介绍了采用角分辨X-射线光电子解谱(angle resolved X-ray photoelectric spectrum(ARXPS))测试薄膜不同角度光电子能谱强度,计算电子平均自由程,从而计算出PtSi超薄膜厚度的方法,并给出其透射电子显微镜(TEM)晶格象验证结果.实验表明该方法简单易行,适用于其他超薄膜厚度的测量 关键词： PtSi超薄膜 小角度X射线电子能谱 TEM晶格象     

Study of MgO tunnel barriers with conducting atomic force microscopy

The local topographic and conducting properties of ultra-thin MgO films with polycrystalline Ru and amorphous CoFeB as lower electrodes were investigated. The local conductance and topography of the ultra-thin MgO films (from 0.5 to 1.0 nm) were simultaneously measured with a modified conducting atomic force microscope (CAFM). The imaging force was carefully chosen in order to avoid structural damages in the insulating layers. The promising results include the decrease of the density of hotspots with large conductance with the thickness of MgO and show that an insulating barrier is obtained at 1 nm thickness.     

Anomalous aging and strain induced time dependent phenomena in ultra-thin La0.65Ca0.35MnO3 films

We have shown that ultra-thin La_0.65Ca_0.35MnO₃ films exhibit strong metastable behavior. The resistance can vary with time significantly, suggesting that a state of dynamic phase separation exists whereby one phase grows at the expense of another. Physical properties associated with the metastable behavior have been investigated on the films grown on different substrates. We have found that ultra-thin films age much faster than the thicker counterparts and more interestingly the metastability in the resistance of these films enhanced when aged.     

MgB2 超薄膜的制备和性质研究

利用混合物理化学气相沉积法在6H-SiC(001)衬底上制备干净的MgB₂超导超薄膜.在本底气体压强、载气氢气流量等条件一定的情况下,改变B₂H₆流量及沉积时间,制备得到不同厚度的系列MgB₂超薄膜样品,并研究了超导转变温度T_c、剩余电阻率ρ_(42K)、上临界磁场H_c2等与膜厚的关系.该系列超薄膜沿c轴外延生长,随膜厚度的变小,T_c(0)降低,ρ_(42K)升高.膜在衬底上的生长遵循Volmer-Weber岛状生长模式.对于厚度为7.5 nm的MgB₂超薄膜,T_c(0) =32.8 K,ρ_(42K) =118 μΩcm,是迄今为止所观测到的厚度为7.5 nm的MgB₂超薄膜最高的T_c值;对于厚度为10 nm的MgB₂膜,T_c(0)=35.5 K,ρ_(42K)=17.7 μΩcm,上临界磁场μ₀H_c2估算为12 T左右,零磁场、4 K时的临界电流密度J_c=1.0×10⁷ A/cm²,是迄今为止10 nm厚MgB₂超薄膜的最高J_c值,且其表面连接性良好,均方根粗糙度为0.731 nm.这预示MgB₂超薄膜在超导纳米器件上具有广阔的应用前景. 关键词： 2超薄膜')" href="#">MgB₂超薄膜 薄膜生长 氢气流量 混合物理化学气相沉积     

不同厚度的MgB_2超薄膜的制备和性质研究

本文报导了利用混合物理化学气相沉积法(Hybrid physical-chemical vapor deposition,HPCVD)在SiC(0001)衬底上制备干净的MgB2超薄膜.在背景气体压强、载气H2流量等条件一定的情况下,改变B2H6流量及沉积时间,制备不同厚度的MgB2超薄膜样品,并研究了超导转变温度Tc、剩余电阻率ρ(42K)、上临界场Hc2等与膜厚的关系.这系列超薄膜生长沿c轴外延,随膜厚度的变小Tc(0)降低,ρ(42K)升高.膜在衬底上的生长遵循Volmer-Weber岛状生长模式.对于10nm厚的膜,Tc(0)~32.4K,ρ(42K)~124.92μΩ·cm,其表面连接性良好,平均粗糙度为2.72nm,上临界磁场Hc2(0K)~12T,零场4K时的临界电流密度Jc~107A/cm2,为迄今为止所观测到的10nm厚MgB2超薄膜的最高Jc值,这也证明了10nm厚的MgB2膜在超导纳米器件上具有很强的应用潜力.     

Layer structure variations of ultra-thin HfO2 films induced by post-deposition annealing

To meet challenges for a smaller transistor feature size, ultra-thin HfO₂ high-k dielectric has been used to replace SiO₂ for the gate dielectric. In order to accurately analyze the ultra-thin HfO₂ films by grazing incidence X-ray reflectivity (GIXRR), an appropriate material model with a proper layer structure is required. However, the accurate model is difficult to obtain, since the interfaces between layers of the ultra-thin HfO₂ films are not easily identified, especially when post-deposition annealing process is applied. In this paper, 3.0 nm HfO₂ films were prepared by atomic layer deposition on p-type silicon wafer, and annealed in Ar environment with temperatures up to 1000 °C. The layer structures and the role of the interfacial layer of the films in the post-deposition annealing processes were evaluated by X-ray diffraction and X-ray photoelectron spectroscopy (XPS). The experimental results and analysis showed that layer thicknesses, crystal phases and chemical structures of the ultra-thin HfO₂ films were significantly dependent on annealing temperatures. The binding energy shifts of Hf 4f, O 1s, and Si 2p elements revealed the formation of Hf silicate (Hf-O-Si bonding) with increasing annealing temperatures. Due to the silicate formation and increasing silicon oxide formation, the interface broadening is highly expected. The structure analysis of the GIXRR spectra using the modified material structure model from the XPS analysis confirmed the interfacial broadening induced by the post-deposition annealing.     

MgO(111)衬底MgB2 超薄膜的制备和性质研究

利用混合物理化学气相沉积法(HPCVD)在MgO(111)衬底上制备了干净的MgB₂超导超薄膜. 在背景气体压强, 载气氢气流量以及沉积时间一定的情况下, 改变B₂H₆的流量, 制备得到不同厚度系列的MgB₂超导薄膜样品, 并测量了其超导转变温度 T_c, 临界电流密度J_c等临界参量. 该系列超导薄膜沿c轴外延生长, 表面具有良好的连接性, 且有很高的超导转变温度T_c(0) ≈ 35-38 K和很小的剩余电阻率ρ(42 K) ≈ 1.8-20.3 μΩ·cm^-1. 随着膜厚的减小而减小, 临界温度变低, 而剩余电阻率变大. 其中20 nm的样品在零磁场, 5K时的临界电流密度J_c ≈ 2.3×10⁷ A/cm². 表明了利用HPCVD在MgO(111)衬底上制备的MgB₂超薄膜有很好的性能, 预示了其在超导电子器件中广阔的应用前景. 关键词： MgO(111)衬底 2超薄膜')" href="#">MgB₂超薄膜 混合物理化学气相沉积     

超薄金属膜在太赫兹波段的光学特性研究

超薄金属膜在太赫兹波段的探测器、反射镜、波导器件以及太赫兹量子级联激光器中得到了广泛应用。超薄金属膜的光学常数不仅是这些器件设计中不可缺少的参数,而且是开发新型光电材料的一个重要依据。文章运用太赫兹差分时域光谱技术对超薄金属铬、镍和钛膜的光学特性研究,获得其在太赫兹波段的折射率和消光系数,并根据菲涅尔公式计算入射介质为高阻GaAs时,GaAs/Metal界面的反射谱,三种金属在0.3～1.5THz的波段范围内的平均反射率均超过80%。研究超薄金属膜在太赫兹波段的反射特性,为设计性能优良的太赫兹辐射源、探测器及太赫兹光学元件奠定基础。     

Grazing incidence X-ray studies of ultra-thin Lumogen films

Lumogen^® Yellow S0790 films have been produced on silicon wafer substrates via physical vapour deposition (PVD) and spin-coating (SC) methods. These coatings were characterised with X-ray reflectometry (XRR) and grazing incidence X-ray diffraction (GIXD) techniques. The results show that ultra-thin (less than 12 nm) PVD films coat amorphously, with crystallinity becoming increasingly apparent with increasing film thickness. In contrast, measurements of ultra-thin (less than ∼2 nm) spin-coated films reveal a second, apparently stable crystalline structure.     

Finite size effect and phase diagram of ultra-thin La0.7Sr0.3MnO3

La_0.7Sr_0.3MnO₃ (LSMO) ultra-thin films have been grown by pulsed laser deposition in conditions optimized for cation stoichiometry and bulk-like physical properties in the thick limit. Through electrical transport and magnetic measurements, a phase diagram is constructed as a function of film thickness. With decreasing thickness, the LSMO films cross over at high temperatures from a paramagnetic metal to a paramagnetic insulator, and at low temperatures from a ferromagnetic metal to a ferromagnetic insulator, in close similarity to that observed for varying the electronic bandwidth in bulk manganites.     

基于金属孔阵列的聚酰亚胺薄膜太赫兹探测

优化设计了多种不同孔径和形状的太赫兹波段的亚波长金属孔阵列结构,结合超薄低折射率的聚酰亚胺（PI）薄膜,探索了太赫兹时域光谱技术对超薄低折射率的探测灵敏性。利用飞秒微加工技术制备了一系列亚波长金属孔阵列结构,利用太赫兹时域光谱技术测试了阵列结构的反射波谱,获得了强烈的反射共振现象。然后在亚波长金属孔阵列结构背面叠加PI薄膜,结果表明太赫兹反射峰出现了显著低频移动现象。利用这一现象,实现了低至10 m的PI薄膜的有效探测,说明亚波长金属孔阵列结构在太赫兹传感领域对检测超薄低折射率薄膜材料有极强敏感性。收稿日期:; 修订日期: