用第一性原理研究K空位对KDP晶体激光损伤的影响

 用基于密度泛函理论及超软赝势的第一性原理研究了KH­­­₂PO₄(KDP)晶体中K空位的电子结构、形成能及驰豫构型。讨论了K空位形成后电荷密度的重新分布、相应的电子态密度和能带结构等性质。计算得到中性K空位的形成能为6.5 eV, 远小于间隙K原子点缺陷形成能13.07 eV。K空位的存在使晶胞体积增大, 分别沿结晶学轴a方向增大近0.8%, b方向增大近0.87%, c方向增大近1.2%，同时使与之配位的8个氧原子发生较大位移，使这8个氧形成的空腔体积增大近3.2%。空腔体积的增大不仅促进了各种点缺陷的扩散迁移，而且有利于其它杂质原子的填隙。K原子迁移率的增大会引起离子电导率的增大，因而会降低KDP的激光损伤阈值，因此从这个方面讲，K空位的存在是不利的。但是如果能从实验上（如热退火）利用K空位所造成的扩散通道排出或改善缺陷结构，则可提高KDP晶体的光学质量。     

Towards understanding the carbon trapping mechanism in copper by investigating the carbon-vacancy interaction

We propose a vacancy trapping mechanism for carbon-vacancy (C-V) complex formation in copper (Cu) according to the first-principles calculations of the energetics and kinetics of C-V interaction. Vacancy reduces charge density in its vicinity to induce C nucleation. A monovacancy is capable of trapping as many as four C atoms to form CnV (n=1,2,3,4) complexes. A single C atom prefers to interact with neighboring Cu at a vacancy with a trapping energy of 0.21 eV. With multiple C atoms added, they are preferred to bind with each other to form covalent-like bonds despite of the metallic Cu environment. For the CnV complexes, C2V is the major one due to its lowest average trapping energy (1.31 eV). Kinetically, the formation of the CnV complexes can be ascribed to the vacancy mechanism due to the lower activation energy barrier and the larger diffusion coefficient of vacancy than those of the interstitial C.     

Oxygen self-diffusion in alpha-quartz

We have studied the formation energy of the simplest oxygen defects in alpha-quartz, the oxygen vacancy and interstitial, by an ab initio approach based on density functional theory in the local density approximation. We have determined the formation energies and entropies and the migration paths and energies. From our results we can conclude that oxygen diffuses in quartz by an interstitial mechanism: the interstitial has a dumbbell structure; one of the constitutive atoms jumps towards a neighboring oxygen site. The activation energy amounts to 4.7 eV in the intrinsic regime and 2.8 eV in the extrinsic regime.     

GaN中与C和O有关的杂质能级第一性原理计算

用局域密度泛函线性丸盒轨道大型超原胞方法(32个原子),对纯纤锌矿结构的GaN用调节计算参数(如原子球与“空球”的占空比)在自洽条件下使Eg的计算值(323eV)接近实验值(35eV).然后以原子替代方式自洽计算杂质能级在Eg中的相对位置.模拟计算了六角结构GaN中自然缺陷以及与C和O有关的杂质能级位置,包括其复合物.计算结果表明,单个缺陷如镓空位VGa、氮空位VN、氧代替氮ON、炭代替氮CN、炭代替镓CGa等与已有的计算结果基本一致.计算结果表明杂质复合物会导致单个杂质能级位置的相对变化.计算了CNON,CGaCN,CNOV和CGaVGa,其中CNON分别具有深受主与浅施主的特征,是导致GaN黄光的一种可能的结构. 关键词： GaN 杂质能级 电子结构     

单原子Al修饰空位缺陷V2C（MXene）对H2气体表面吸附的第一性原理研究

基于第一性原理计算方法,对含空位缺陷的V₂C(MXene)在不同位点修饰单原子Al的相关性能进行系统研究.研究表明,几何优化后得到含空位缺陷的V₂C稳定结构表面能为-3075.53 J/m²,单原子Al修饰本征V₂C单原子的吸附能为1.5511eV、单原子Al修饰空位缺陷V₂C的吸附能为-2.0763 eV,这表明含空位缺陷的V₂C,由于单原子Al的修饰可以明显改善晶体结构稳定性.进一步从态密度、分波态密度、吸氢能力研究发现,各体系态密度和分波态密度均出现分波越过费米能级的现象,表现出较强的金属性;V₂C吸附H₂气体分子吸附能为-7.5867 eV,而空位缺陷V₂C和单原子Al修饰空位缺陷V₂C两个体系对H₂气体分子的吸附能仅为-0.9851 eV、-2.7130 eV,均未能进一步改善V₂C对H₂气体分...     

Formation energies and electronic structures of native point defects in potassium dihydrogen phosphate

The formation energies and the equilibrium concentration of vacancies,interstitial H,K,P,O and antisite structural defects with P and K in KH 2 PO 4 (KDP) crystals are investigated by ab initio total-energy calculations.The formation energy of interstitial H is calculated to be about 2.06 eV and we suggest that it may be the dominant defect in KDP crystal.The formation energy of an O vacancy (5.25 eV) is much higher than that of interstitial O (0.60 eV).Optical absorption centres can be induced by defects of O vacancies,interstitial O and interstitial H.We suggest that these defects may be responsible for the lowering of the damage threshold of the KDP.A K vacancy defect may increase the ionic conductivity and therefore the laser-induced damage threshold decreases.     

杂质对Nb2GeC性质影响的第一性原理研究

为进一步研究Nb₂GeC在辐照环境中的稳定性, 本文研究了O, H和He杂质在Nb₂GeC中的稳定情况. 所有杂质的研究都是从替代和间隙两个方面来进行的, 计算得到了替代和间隙的形成能, 存在替代和间隙时Nb₂GeC的晶格常数, 以及单胞体积, 并且与完美的晶胞进行了比较. 此外, 通过电荷密度分布和Mulliken 布居, 分析了O, H, He杂质对Nb₂GeC 的电子性质的影响.     

First-Principles Study on Native Defect Complexes in InN

We present first-principles calculations of the formation energy of different native defects and their complexes in wurtzite InN using density-functional theory and the pseudopotential plane-wave method. Our calculations are aimed in the three cases： N/In = 1, N/In 〉 1 （N-rich）, and N/In 〈 1 （In-rich）. Our results indicate that the antisite defect has the lowest formation energy under N/In = 1. The formation energy of nitrogen interstitial （nitrogen vacancy） defect is significantly low under the N-rich （In-rich） condition. Thus the antisite defect is an important defect if N/In = 1, and the nitrogen interstitial （nitrogen vacancy） defect is a vital defect under the N-rich （In-rich） condition. The atomic site relaxation around the nitrogen interstitial and vacancy is investigated. Our calculations show that the nitrogen vacancy cannot be observed although it is one of the most important defects in InN. Our results are confirmed by experiments.     

Early stages of vanadium deposition on Si(1 1 1)-7 × 7

We investigate the low-coverage regime of vanadium deposition on the Si(1 1 1)-7 × 7 surface using a combination of scanning tunnelling microscopy (STM) and density-functional theory (DFT) adsorption energy calculations. We theoretically identify the most stable structures in this system: (i) substitutional vanadium atoms at silicon adatom positions; (ii) interstitial vanadium atoms between silicon adatoms and rest atoms; and (iii) interstitial vanadium - silicon adatom vacancy complexes. STM images reveal two simple vanadium-related features near the Si adatom positions: bright spots at both polarities (BB) and dark spots for empty and bright spots for filled states (DB). We relate the BB spots to the interstitial structures and the DB spots to substitutional structures.     

Aluminum and nitrogen impurities in Wurtzite ZnO: first-principles studies

First-principles calculations have been performed to investigate the doping behaviors of Al and N dopant impurities in ZnO. According to the results, in the Al mono-doping case, the impurity states are quite delocalized, the corresponding effective masses are small, and the formation energy is as low as −9.71 eV. In the N mono-doping case, the impurity states are localized, the effective masses are large, and the formation energy is high (4.55 eV in the most favorable extreme O-rich conditions). In the Al-N codoping case, the corresponding effective masses are marked decreased compared to the N mono-doping situations, and the formation energy of the N-Al-N system is as low as −2.54 eV in the O-rich condition. The above results can explain the electrical behaviors of the doped or codoped ZnO systems observed in experiments.     

Interaction between impurity nitrogen and tungsten: a first-principles investigation

We investigate the stability, diffusion, and impurity concentration of nitrogen in intrinsic tungsten single crystal employing a first-principles method, and find that a single nitrogen atom is energetically favourable for sitting at the octahedral interstitial site. A nitrogen atom prefers to diffuse between the two nearest neighboring octahedral interstitial sites with a diffusion barrier of 0.72 eV. The diffusion coefficient is determined as a function of temperature and expressed as D(N)=1.66×10^-7exp (-0.72/kT). The solubility of nitrogen is estimated in intrinsic tungsten in terms of Sieverts' law. The concentration of the nitrogen impurity is found to be 4.82×10^-16 Å^-3 at a temperature of 600 K and a pressure of 1 Pa. A single nitrogen atom can easily sit in an off-vacancy-centre position close to the octahedral interstitial site. There exists a strong attraction between nitrogen and a vacancy with a large binding energy of 1.40 eV. We believe that these results can provide a good reference for the understanding of the behaviour of nitrogen in intrinsic tungsten.     

KDP晶体本征中性点缺陷的第一性研究

 用第一性原理研究了KH2PO4(KDP)晶体中性本征点缺陷的形成能并计算了常温下点缺陷的浓度。计算得到中性填隙氢原子的形成能为2.05 eV,进而得到298 K下的浓度约为1.21×10^-17 mol/L。由于填隙氢原子在带隙中形成缺陷能级,并使能隙降低了2.6 eV, 因此消除填隙氢原子有利于提高晶体在355 nm附近的激光损伤阈值。计算得到的氧间隙、氧空位、钾空位和氢空位的形成能分别为0.60、5.25、6.50 和6.58 eV,常温下它们在晶体中也以较高的浓度存在。钾空位使晶胞体积增大约3.2%,并可能提高晶体电导率,从而降低光损伤阈值。P取代K的反位结构缺陷形成能尽管较低(4.1 eV), 但由于晶体生长溶液中P是以PO4四面体的形式存在,故此点缺陷的存在几率很小。     

First-principles study of single intrinsic vacancy formation and its effect on the electronic density states and magnetic moment of V-doped ZnO

We calculated the formation energy of single vacancy in V-doped ZnO in different conditions (oxygen or zinc rich) by first principles. Effect of an intrinsic vacancy on the electronic density of states and magnetic moment of V-doped ZnO (Zn₁₅VO₁₆) with and without single vacancy was also calculated. Our calculation was performed by the CASTEP program within spin-polarized GGA approximation implemented in materials studio software. The formation energy showed that oxygen vacancy inclined to stay far from vanadium (V) and zinc vacancy preferred to stay at a position near V. The calculated formation energy also showed that a zinc vacancy may automatically occur but an oxygen vacancy may not appear automatically. Vanadium doping introduced spin-polarization around Fermi level. For an energy favorable vacancy, an oxygen vacancy had little effect on the electronic density of states. A zinc vacancy made the spin-polarization peaks around Fermi level broaden and decreased their magnitude. For the magnetic moment in energy favorable configurations, an oxygen vacancy had little effect on the magnetic moment; a zinc vacancy significantly decreased the magnetic moment (as high as 63.7%). Changes in magnetic moments were consistent with electronic density of states. Our calculation may interpret various experimental magnetic moment values. Our work also provided a reference for preparing V-doped ZnO-based dilute magnetic semiconductors.     

The Formation of Defect Complexes in a ZnO Grain Boundary

The microscopic properties a ZnO grain boundary containing extrinsic point defects are studied using a density functional computational approach. The results show that the grain boundary acts as a sink for native defects, such as the zinc vacancy and the oxygen interstitial, and also for bismuth substitutional impurities. The defects tend to accumulate at under-coordinated sites in the boundary core and prefer to form small clusters. In particular the segregation of Bi promotes the formation of the other native defects by lowering their formation energies in the boundary. Individually, the native defects and the Bi impurity do not produce deep interface states in the band gap which are electrically active. However, when the defects cluster to form a Bi_Zn-V_Zn-O_i complex, new gap states are created of acceptor type. It is suggested that these new states are caused by defect interactions which compensate one another resulting in the depletion of an occupied impurity state and new bond formation. The results are discussed in terms of the Schottky barrier model commonly used to describe the electrical characteristics of ZnO varistors.     

Sites and diffusion for muons and hydrogen in titanium hydrides

Low temperature sites for muons implanted in TiHx have been found to be a mixture of interstitial and substitutional sites, with substitutional occupancy determined by the probability that a muon in an interstitial site will have a vacant nearest neighbor substitutional site. As with ZrHx, activation from the interstitial site is observed below 300 K. From the depolarization rate in the substitutional site, the muon likely displaces the neighboring H atoms by about 0.1 A. Diffusion for the substitutional muons occurs above room temperature with an activation of about 0.38 eV, which is less than the 0.505 eV for hydrogen vacancy motion observed by NMR. To explain this the muon transition rate to a vacancy must be less than that of hydrogen.     

Defect stability in thorium monocarbide:An ab initio study

The elastic properties and point defects of thorium monocarbide(ThC) have been studied by means of density functional theory based on the projector-augmented-wave method. The calculated electronic and elastic properties of ThC are in good agreement with experimental data and previous theoretical results. Five types of point defects have been considered in our study, including the vacancy defect, interstitial defect, antisite defect, schottky defect, and composition-conserving defect. Among these defects, the carbon vacancy defect has the lowest formation energy of 0.29 eV. The second most stable defect(0.49 eV) is one of composition-conserving defects in which one carbon is removed to another carbon site forming a C2 dimer. In addition, we also discuss several kinds of carbon interstitial defects, and predict that the carbon trimer configuration may be a transition state for a carbon dimer diffusion in Th C.     

六方氮化硼单层中一种(CN)3VB缺陷的第一性原理计算

二维六方氮化硼(hBN)的点缺陷最近被发现可以实现室温下的单光子发射,而成为近年的研究热点.尽管其具有重要的基础和应用研究意义,hBN中发光缺陷的原子结构起源仍然存在争议.本文采用基于密度泛函理论的第一性原理计算,研究hBN单层中一种B空位附近3个N原子被C替代的缺陷(CN)3VB.在hBN的B空位处,3个N原子各自带一个在平面内的悬挂键及相应的未配对电子,而通过C替换可以消除未配对的电子.系统研究了(CN)3VB缺陷的几何结构、电子结构以及光学性质,结果表明,缺陷可以由一个对称的亚稳态经过原子结构弛豫变成1个非对称的、3个C原子连在一起的基态结构.缺陷的形成在hBN中引入了一些由缺陷悬挂σ键及重构的π键贡献的局域缺陷态.这些缺陷态可以导致能量阈值在2.58 eV附近的可见光内部跃迁.本文的工作有助于进一步理解hBN中点缺陷的构成及光学性质,为实验上探讨发光点缺陷的原子结构起源及其性质提供理论依据.     

Electronic structures and optical properties of rutile TiO2 with different point defects from DFT + U calculations

The electronic states and formation energies of four types of lattice point defects in rutile TiO₂ are studied using the first-principles calculations. The existence of oxygen vacancy leads to a deep donor defect level in the forbidden band, while the Ti interstitial forms two local states. It is predicted that oxygen vacancy prefers to combine with Ti-interstitial to form V_O–Ti_i dimer by a partial 3d electron transfer from the Ti_i to its neighboring V_O. The charge distribution between a Ti interstitial and its neighboring Ti ions partially shields the Coulomb interactions. Lastly, optical properties of these defective lattices are discussed.     

Effect of interstitial impurities on positronium formed in voids of vanadium

Angular correlation of two-photon annihilation radiation (ACAR) measurements have been performed to study the effect of interstitial impurities (O, C and D) on positronium (Ps) formation in irradiation-induced voids of vanadium. It has been observed that Ps formation is sensitively affected by doping with the interstitial impurities, irradiation dose, irradiation temperature, and also by post-irradiation annealing. The Ps component intensity is found to be related to segregation of the interstitial impurities and provides a new experimental method to study void surfaces.     

Thermoelectric power measurements in polycrystalline AgI: Cd system

Thermoelectric power of polycrystalline AgI: Cd system was measured as a function of temperature from 50 to 180°C. The heat of transport $\text{Q}{}^1$, intrinsic vacancy concentration c_o and ratio of interstitial to vacancy mobilities in the β phase were deduced under the assumption of no association. The heat of transport $\text{Q}{}^1$ was also temperature dependent in β-AgI: 0.27 eV at 80°C, 0.21 eV at 100°C and 0.17 eV at 120°C. It was estimated that the formation energy of the defect pair h_F was 0.66 ± 0.06 eV and the activation energies for motion of vacancies and interstitials were 0.55 ± 0.03 and 0.38 ± 0.03 eV, respectively. These approximately agree with data reported up to date in single and poly- crystal β-AgI. The heat of transport of vacancies was approximately equal to the activation energy of vacancy migration.