Design of near-unity transmittance dielectric/Ag/ITO electrodes for GaN-based light-emitting diodes

We designed a near-unity transmittance dielectric/Ag/ITO electrode for high-efficiency GaN-based light-emitting diodes by using the scattering matrix method. The transmittance of an ultrathin metal layer, sandwiched between a dielectric layer and an ITO layer, was investigated as a function of the thickness and the optical constant of each constituent layer. Three different metals (Ag, Au, and Al) were examined as the metal layer. The analytical simulation indicated that the transmittance of a dielectric/metal/ITO multilayer film is maximized with an approximately 10-nm-thick Ag layer. Additionally, the transmittance also tends to increase as the refractive index of the upper dielectric layer increases. By tailoring the thickness of the dielectric layer and the ITO layer, the dielectric/Ag/ITO structure yielded a transmittance of 0.97, which surpasses the maximum transmittance (0.91) of a single ITO film. Furthermore, this extraordinary transmittance was present for other visible wavelengths of light, including violet and green colors. A complex phasor diagram model confirmed that the transmittance of the dielectric/metal/ITO multilayer film is influenced by the interference of reflected partial waves. These numerical findings underpin a rational design principle for metal-based multilayer films that are utilized as transparent electrodes for the development of efficient light-emitting diodes and solar cell devices.     

Electro-optic spectroscopy of electrochromic processes in tungsten trioxide

The nature of the electrochromic processes in solid-state electrochromic devices (ECD) ITO/a-WO₃/a-SiO₂/Au is investigated by analysing their electro-optical behavior during the current pulses and the linear sweeping of the bias voltage. It is shown that the character of the current-coltage curve of the ECD is determined by passivation, by hydrogen/oxygen evolution on the counter electrode (Au) and by redox reactions on the electrochronic electrode (amorphous WO₃ film: a-WO₃). The light transmittance versus voltage and the high-frequency differential impedance of the active component versus voltage curves are dependent mainly on electrochromic reactions.     

Femtosecond laser patterning of Ta0.1W0.9Ox/ITO thin film stack

Selective laser patterning of thin films in a multilayered structure is an emerging technology for process development and fabrication of optoelectronics and microelectronics devices. In this work, femtosecond laser patterning of electrochromic Ta_0.1W_0.9O_x film coated on ITO glass has been studied to understand the selective removal mechanism and to determine the optimal parameters for patterning process. A 775 nm Ti:sapphire laser with a pulse duration of 150 fs operating at 1 kHz was used to irradiate the thin film stacks with variations in process parameters such as laser fluence, feedrate and numerical aperture of objective lens. The surface morphologies of the laser irradiated regions have been examined using a scanning electron microscopy and an optical surface profiler. Morphological analysis indicates that the mechanism responsible for the removal of Ta_0.1W_0.9O_x thin films from the ITO glass is a combination of blistering and explosive fracture induced by abrupt thermal expansion. Although the pattern quality is divided into partial removal, complete removal, and ITO film damage, the ITO film surface is slightly melted even at the complete removal condition. Optimal process window, which results in complete removal of Ta_0.1W_0.9O_x thin film without ablation damage in the ITO layer, have been established. From this study, it is found that focusing lens with longer focal length is preferable for damage-free pattern generation and shorter machining time.     

Electrochromic properties of nano-structured nickel oxide thin film prepared by spray pyrolysis method

In this study, we present a simple method to improve the electrochromic properties of a nickel oxide thin film. The method involves a three-step process—(a) conducting indium tin oxide (ITO) nano-particles were first sprayed onto a conducting substrate to form a porous nano-structured ITO layer, (b) nickel oxide film was then deposited onto the nano-structured ITO layer by a spray pyrolysis technique, and (c) the substrate, ITO nano-particles layer and nickel oxide film were annealed at high temperature of 300 °C to improve adhesion of these three layers. The microstructure of the resulting electrochromic cell was investigated using scanning electron microscopy. It is evident that the nickel oxide film covers the surface of the ITO nano-particle layer and forms a nano-structured nickel oxide (NSNO) film. The switching time and contrast were characterized by Autolab PGSTAT12 potentiostat and Jasco V-570 spectrophotometer. The results suggest that the transmittance contrast and switching time of NSNO are slightly superior to those of a conventional nickel oxide (CNO) film. However, the cycling durability of NSNO can be much better than that of CNO.     

Fabrication and characterization of Pt intermediate transparent and conducting ITO/Pt/ITO multilayer films

Platinum intermediate transparent and conducting ITO/metal/ITO (IMI) multilayered films were deposited by RF and DC magnetron sputtering on polycarbonate substrates without intentional substrate heating. Changes in the microstructure and optoelectrical properties of the films were investigated with respect to the thickness of the intermediate Pt layer in the IMI films. The thickness of Pt film was varied from 5 to 20 nm.In XRD measurements, neither ITO single-layer films nor IMI multilayer films showed any characteristic diffraction peaks for In₂O₃ or SnO₂. Only a weak diffraction peak for Pt (1 1 1) was obtained in the XRD spectra. Thus, it can be concluded that the Pt-intermediated films in the IMI films did not affect the crystallinity of the ITO films. However, equivalent resistivity was dependent on the presence and thickness of the Pt-intermediated layer. It decreased as low as 3.3×10⁻⁴ Ω cm for ITO 50 nm/Pt 20 nm/ITO 30 nm films. Optical transmittance was also strongly influenced by the Pt-intermediated layer. As Pt thickness in the IMI films increased, optical transmittance decreased to as low as 30% for ITO 50 nm/Pt 20 nm/ITO 30 nm films.     

新型无铟透明导电-电致变色双功能MoO_3/Ag/MoO_3薄膜的制备及性能研究

研制了集电致变色和透明导电功能为一体的MoO_3/Ag/MoO_3(MAM)双功能薄膜。MAM薄膜采用电子束热蒸发技术在室温下制备。作为透明电极,MAM薄膜显示出良好的光电性能,可见光平均透过率为59.4%,方块电阻为12.2Ω/□。作为电致变色材料,MAM薄膜具有较快的响应时间(着色时间4.3 s,褪色时间11.1s),25%的光学对比度(528 nm),良好的稳定性(100次循环),以及较高的着色效率(40.5 cm~2·C~(-1)),在已报道的MoO_3着色效率中处于较高的水平。     

Enhanced Efficiency of Polymer： Fullerene Bulk Heterojunction Solar Cells with the Insertion of Thin TiO2 Layer near the LiF/A1 Electrode

The insertion layer of TiO2 between polymer-fullerene blend and LiF/AI electrode is used to enhance the shortcircuit current Isc and fill factor （FF）. The solar cell based on the blend of poly[2-methoxy-5-（2＇-ethylhexyloxy）- 1,4-phenylenevinylene] （MEH-PPV） and C60 with the modifying layer of TiO2 （about 20nm） shows the open- circuit Voc of about 0.62 V, short circuit current Isc of about 2.35 mA/cm^2, filling factor FF of about 0.284, and the power conversion efficiency （PCE） of about 2.4% under monochromatic light （50Onto） photoexcitation of about 17mW/cm^2. Compared to ceils without the TiO2 layer, the power conversion efficiency increases by about 17.5%. Similar effect is also obtained in cells with the undoped MEH-PPV structure of ITO/PEDOT：PASS/MEH- PPV/（TiO2）LiF/AI. The improved solar cell performance can be attributed to enhanced carrier extraction efficiency at the active layer/electrode interfaces when TiO2 is inserted.     

Characteristic difference between ITO/ZrCu and ITO/Ag bi-layer films as transparent electrodes deposited on PET substrate

The metallic-glass film of ZrCu layer deposited by co-sputtering was utilized as the metallic layer in the bi-layer structure transparent conductive electrode of ITO/ZrCu (IZC) deposited on the PET substrate using magnetron sputtering at room temperature. In addition, the pure Ag metal layer was applied in the same structure of transparent conductive film, ITO/Ag, in comparison with the IZC film. The ZrCu layer could form a continuous and smooth film in thickness lower than 6 nm, compared with the island structure of pure Ag layer of the same thickness. The 30 nm ITO/3 nm ZrCu films could show the optical transmittance of 73% at 550 nm wavelength. The 30 nm ITO/12 nm ZrCu films could show the better sheet resistance of 20 Ω/sq, but it was still worse than that of the ITO/Ag films. It was suggested that an alloy system with lower resistivity and negative mixing heat between atoms might be another way to form a continuous layer in thickness lower than 6 nm for metal film.     

Electrochromic properties of WO3 thin film onto gold nanoparticles modified indium tin oxide electrodes

Gold nanoparticles (GNPs) thin films, electrochemically deposited from hydrogen tetrachloroaurate onto transparent indium tin oxide (ITO) thin film coated glass, have different color prepared by variation of the deposition condition. The color of GNP film can vary from pale red to blue due to different particle size and their interaction. The characteristic of GNPs modified ITO electrodes was studied by UV-vis spectroscopy, scanning electron microscope (SEM) images and cyclic voltammetry. WO₃ thin films were fabricated by sol-gel method onto the surface of GNPs modified electrode to form the WO₃/GNPs composite films. The electrochromic properties of WO₃/GNPs composite modified ITO electrode were investigated by UV-vis spectroscopy and cyclic voltammetry. It was found that the electrochromic performance of WO₃/GNPs composite films was improved in comparison with a single component system of WO₃.     

An electrochromic device (ECD) cell characterization on electron beam evaporated MoO3 films by intercalating/deintercalating the H+ ions

Thin films of molybdenum oxide (MoO₃) is one of the most interesting layered intercalation materials because of its excellent application in solid state batteries, large-area window and display systems. In recent years there has been considerable interest in variable transmittance electrochromic devices (ECD) based on Li⁺, H⁺ and K⁺ intercalation in transition metal oxide (MoO₃) thin films. In the present investigation, thin films of MoO₃ were prepared by electron beam evaporation technique on microscopic glass and fluorine doped tin oxide (FTO) coated glass substrates for the application in electrochromic device cells. The compositional stoichiometry of the films was studied by X-ray photoelectron spectroscopy (XPS). The electrochromic nature of the films has been analyzed by inserting H⁺ ions from the H₂SO₄ electrolyte solution using the cyclic-voltammetry (CV) technique. We studied the electrochromic device cells (ECD) incorporating an evaporated MoO₃ thin films as electrochromic layers. The devices exhibit good optical properties with low transmittance values in the colored state, which make them suitable for large-area window applications. The maximum coloration efficiency of the cell was observed at about 70 cm²/C.     

Dependence of intermediated noble metals on the optical and electrical properties of ITO/metal/ITO multilayers

Sn doped In₂O₃ (ITO) single layer and a sandwich structure of ITO/metal/ITO (IMI) multilayer films were deposited on a polycarbonate substrate using radio-frequency and direct-current magnetron sputtering process without substrate heating. The intermediated metal films in the IMI structure were Au and Cu films and the thickness of each layer in the IMI films was kept constant at 50 nm/10 nm/40 nm. In this study, the ITO/Au/ITO films show the lowest resistivity of 5.6 × 10⁻⁵ Ω cm.However the films show the lower optical transmission of 71% at 550 nm than that (81%) of as deposited ITO films. The ITO/Cu/ITO films show an optical transmittance of 54% and electrical resistivity of 1.5 × 10⁻⁴ Ω cm. Only the ITO/Au/ITO films showed the diffraction peaks in the XRD pattern. The figure of merit indicated that the ITO/Au/ITO films performed better in a transparent conducting electrode than in ITO single layer films and ITO/Cu/ITO films.     

Optimized Performances of Thick Film Organic Lighting-Emitting Diodes

The performance of organic light-emitting diodes (OLEDs) with thick film is optimized. The alternative vanadium oxide (V₂O₅) and N,N'-di(naphthalene-1-yl)-N,N'-diphenyl-benzidine (NPB) layers are used to enhance holes in the emissive region, and 4,7-dipheny-1,10-phenanthroline (Bphen) doped 8-tris-hydroxyquinoline aluminium (Alq₃) is used to enhance electrons in the emissive region, thus ITO/V₂O₅ (8nm)/NPB (52nm)/V₂O₅ (8nm)/NPB (52nm)/Alq₃ (30 and 45nm)/Alq₃:Bphen (30wt%, 30 and 45nm)/LiF (1nm)/Al (120nm) devices are fabricated. The thick-film devices show the turn-on voltage of about 3V and the maximal power efficiency of 4.5lm/W, which is 1.46 times higher than the conventional thin-film OLEDs.     

Transport Behaviour of La0.8Sr0.2AlO3 Thin Film on Oxygen Deficient SrTiO3 Substrate

La_0.8Sr_0.2AlO₃ (LSAO) thin films are grown on SrTiO₃ (STO) and MgO substrates by laser molecular beam epitaxy. The LSAO thin film on oxygen deficient STO substrate exhibits metallic behaviour over the temperature range of 80--340K. The optical transmittance spectrum indicates that theLSAO thin films on MgO substrate are insulating at room temperature. The transport properties of LSAO thin films on STO substrates deposited in different oxygen pressure are compared. Our results indicate that oxygen vacancies in STO substrates should be mainly responsible for the transport behaviour of LSAO thin films.     

Efficient electrochromic device based on sol–gel prepared WO<Subscript>3</Subscript> films

Tungsten oxide (WO₃) films were prepared on indium–tin oxide (ITO) glass by sol–gel method. The influence of annealing temperature on the structural, morphological, optical, electrochemical, and electrochromic properties has been investigated. The film annealed at 250 °C with an amorphous structure exhibits a noticeable electrochromic performance, such as the highest optical modulation of 58.5 % at 550 nm, high electrochemical stability, and excellent reversibility (Q _b/Q _c?=?96.3 %). An electrochromic (EC) device based on WO₃/NiO complementary structure shows improved performance. It exhibits high optical transmittance modulation of 62 % at 550 nm, excellent cycling stability, and relatively fast electrochromic response time (10 s for coloration and 19 s for bleaching).     

Electrical and optical properties of indium tin oxide thin films grown by pulsed laser deposition

Indium tin oxide (ITO) thin films (200-400 nm in thickness) have been grown by pulsed laser deposition (PLD) on glass substrates without a post-deposition anneal. The electrical and optical properties of these films have been investigated as a function of substrate temperature and oxygen partial pressure during deposition. Films were deposited at substrate temperatures ranging from room temperature to 300 °C in O₂ partial pressures ranging from 0.1 to 100 mTorr. For 300 nm thick ITO films grown at room temperature in oxygen pressure of 10 mTorr, the electrical conductivity was 2.6᎒^-3 Q^-1cm^-1 and the average optical transmittance was 83% in the visible range (400-700 nm). For 300 nm thick ITO films deposited at 300 °C in 10 mTorr of oxygen, the conductivity was 5.2᎒^-3 Q^-1cm^-1 and the average transmittance in the visible range was 87%. Atomic force microscopy (AFM) measurements showed that the RMS surface roughness for the ITO films grown at room temperature was ~7 Å, which is the lowest reported value for the ITO films grown by any film growth technique at room temperature.     

Electrochromic properties of WO3 as a single layer and in a full device: From the visible to the infrared

Most of the applications of electrochromic devices (ECDs) concern the visible whereas there is a significant need for ECDs active in the infrared (IR) region. After optimization, WO₃ thin films show significant variation in emissivity, as high as 78% and 49% in the MW (3-5 μm) band and LW (8-12 μm) band, respectively. The incorporation of the EC WO₃ layer in ECDs is discussed in terms (i) of device configuration (i.e. position of the active layer on top or bottom of the device), (ii) of the choice of materials including the transparent conductive layer, electrolyte, counter electrode, and (iii) of the thickness of each layer. Initial trends in optical modulation of the ECDs are deduced from simulation of the optical indexes (n and k). Experimental data based on half-cell assembly confirm the modulation in emissivity in the IR region for WO₃/Ta₂O₅/NiO-based devices with however lower values than the predicted ones.     

Transparent conductive ITO/Ag/ITO multilayer electrodes deposited by sputtering at room temperature

ITO/Ag/ITO multilayers have been prepared onto conventional soda lime glass substrates by sputtering at room temperature. The optical and electrical characteristics of single layer and multilayer structures have been investigated as a function of the Ag and ITO film thicknesses. Transmittance and sheet resistance values are found mainly dependent on the Ag film thickness; whereas the wavelength range at which the maximum transmittance is achieved can be changed by adjusting the ITO films thickness. ITO/Ag/ITO electrodes with sheet resistance below 6 Ω/sq have been obtained for Ag film thickness above 10 nm and ITO layers thickness in the 30-50 nm range. These multilayers also show high transmittance in the visible spectral region, above 90% by discounting the glass substrate, with a maximum that is located at higher wavelengths for thicker ITO.     

Application of nickel oxide nanoparticles in electrochromic materials

This study presents the application of NiO nanoparticles in electrochromic materials field. The monodisperse NiO nanoparticles ranged from 5 to 8 nm were synthesized by hot-injection method and the NiO films were prepared by dip-coating technique on ITO glass. The structure, electrochemical as well as optical performance was investigated systematically. NiO films composing of nanoparticles maintained the porous microstructure and exhibited excellent electrochromic performance. It was clear that the film annealed at 300 °C exhibited the highest electrochemical activity and improved transmittance modulation (?T), while maintaining faster response time.     

Structural, optical and electrochromic properties of nickel oxide thin films grown from electrodeposited nickel sulphide

Nickel oxide thin films were grown onto FTO-coated glass substrates by a two-step process: electrodeposition of nickel sulphide and their thermal oxidation at 425, 475 and 525 °C. The influence of thermal oxidation temperature on structural, optical, morphological and electrochromic properties was studied. The structural properties undoubtedly revealed NiO formation. The electrochromic properties were studied by means of cyclic voltammetry. The films exhibited anodic electrochromism, changing from a transparent state to a coloured state at +0.75 V versus SCE, i.e. by simultaneous ion and electron ejection. The transmittance in the coloured and bleached states was recorded to access electrochromic quality of the films. Colouration efficiency and electrochromic reversibility were found to be maximum (21 mC/cm² and 89%, respectively) for the films oxidized at 425 °C. The optical band gap energy of nickel oxide slightly varies with increase in annealing temperature.     

Preparation of UV curing crosslinked polyviologen film and its photochromic and electrochromic performances

Polyether urethane diacrylate matrix (PEUDA) and acrylate-functional viologen (ACV²⁺) were successfully synthesized and characterized in detail by FTIR and ¹H NMR spectra, respectively. Subsequently, they were used to prepare UV curing crosslinked polyviologen film in combination with 2-hydroxyethyl methacrylate (HEMA), trimethylolpropane ethoxylate triacrylate (TMPTA) and diphenyl (2, 4, 6-trimethylbenzoyl) phosphine oxide (TPO). UV curing approach confined the polyviologen film on ITO electrode, which imparted the film excellent adhesion ability to ITO glass, good solvent resistance, excellent chemical stability, excellent optical and electrochemical properties. The crosslinked PACV²⁺ film exhibited excellent photochromic and electrochromic performances. After UV illumination for 60 s, the crosslinked PACV²⁺ film can swiftly change its color from pale yellow to deep blue, while the optical transmission of crosslinked PACV²⁺ film at 610 nm did not change significantly and still retained about 63.6% after 30 cycles. Simultaneously, the cyclic voltammetry experiment showed the PACV²⁺ film can undergo repeatable electrochemical redox reactions with good reversibility beyond the 10th scan. Furthermore, the electrochromic device composed of the PACV²⁺ film and gel electrolyte film can undergo reversible color change in response to the external voltages of −2.0 V and 2.0 V, respectively, while the contrast of EC device at 610 nm did not change significantly and still retained about 39.5% after 10 cycles. This UV curing approach to preparing viologen-functional film offers a method to preparing large-scale photo- and electrochromic device, which is relatively simple, high productivity, energy saving, and environmental protection.