共查询到19条相似文献,搜索用时 921 毫秒
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利用Raman光谱对还原氮后的纳米磷化镓(GaP)粉体进行了表征。结果表明:纳米GaP粉体表面含有Ga-O,P-O和H-O化学键。此外,进行氮还原过程后,在Raman位移约为1700~3300cm-1范围内(相当于709~800nm或1.55~1.75eV),纳米GaP的Raman光谱出现了一个宽、强荧光发射峰;而在未进行通氮处理的纳米GaPRaman光谱中,没有观察到该荧光峰的存在。本文对该荧光发射峰的起因作了初步分析。 相似文献
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纳米磷化镓粉体还原氦过程的Raman光谱分析 总被引:2,自引:2,他引:0
利用Raman光谱对还原氮后的纳米磷化镓(GaP)粉体进行了表征。结果表明:纳米GaP粉体表面含有Ga-O,P-O和H-O化学键。此外,进行氮还原过程后,在Raman位移约为1700~3300cm^-1范围内(相当于709~800nm或1.55~1.75eV),纳米GaP的Raman光谱出现了一个宽、强荧光发射峰;而在未进行通氮处理的纳米GaP Raman光谱中,没有观察到该荧光峰的存在。本文对该荧光发射峰的起因作了初步分析。 相似文献
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分别采用具有和不具有弯曲弧磁过滤器的两种真空阴极弧离子镀方法,在不同工艺参量下制备了类金刚石碳膜.采用Raman光谱和X射线光电子能谱(XPS),分析了不同工艺参量下的类金刚石碳膜的键结构,通过对Raman光谱的D峰、G峰和C1s电子结合能峰位、强度的对比,详细讨论了沉积工艺参量对类金刚石碳膜结构的影响.研究发现,不同工艺下具有高强度D峰Raman光谱的类金刚石碳膜,其C1s电子结合能却分别位于284.15,285.50eV,表明高度石墨化和高度金刚石化两种状态类金刚石碳膜,都可以形成具有高强度D峰Raman光谱曲线
关键词:
类金刚石碳膜
Raman光谱
X射线光电子能谱 相似文献
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在电容耦合式PECVD系统中,以CH4和H2为气源,通过控制H2的流量制备了一系列氢化非晶碳膜(a-C:H)样品。利用傅里叶变换红外光谱(FTIR)、光致发光谱(PL)和吸收谱对a-C:H膜的结构及光学性质进行了研究。结果表明:氢稀释可以在一定程度上减少碳的sp^2团簇的形成,增大它的光学带隙,并改变薄的微结构。与此同时,光致发光峰随郑 光学带隙的增大而蓝移;当光学带隙增大2.72eV时,出现了2.4eV(绿光)和2.97eV(蓝光)组成的发光峰。 相似文献
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采用自行设计的液相法沉积装置,以甲醇有机溶剂作为碳源,利用液相电化学沉积技术在不锈钢及Si基底上制备了类金刚石薄膜;用扫描电镜、Raman光谱仪表征了沉积薄膜的表面形貌和结构;用UMT-2M摩擦磨损试验机对两种沉积薄膜进行了摩擦性能测试。结果表明:经电化学沉积的类金刚石薄膜均匀、致密,表面粗糙度小;Raman光谱在1 332cm-1处有强的谱峰,与金刚石的特征峰相吻合,其中不锈钢基底上薄膜的sp3含量更高;不锈钢基底沉积膜的摩擦系数为0.12,Si片基底沉积膜的摩擦系数为0.10;不锈钢基底沉积膜的耐磨性较Si片沉积膜高。 相似文献
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表面波等离子体沉积类金刚石膜结构的Raman光谱和XPS分析 总被引:6,自引:0,他引:6
本文使用Raman光谱和X 射线光电子能谱 (XPS)的分析方法对表面波等离子体沉积的类金刚石(DLC)薄膜的结构进行了研究。采用 4峰的高斯解谱的方法对不同沉积时间的膜的Raman谱进行处理 ,并由此对膜中sp3键的百分含量PD 进行了定量计算 ;同时还采用 3峰的高斯解谱方法对不同沉积时间的膜的光电子能谱进行处理 ,也对膜中sp3键的百分含量进行了计算。两种方法均得到膜中sp3含量在 2 0 %~ 4 0 %之间 ,且随沉积时间的增加而增加。 相似文献
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Effect of Chromium on Structure and Tribological Properties of Hydrogenated Cr/a-C:H Films Prepared via a Reactive Magnetron Sputtering System 下载免费PDF全文
《中国物理快报》2016,(2)
Hydrogenated Cr-incorporated carbon films(Cr/a-C:H) are deposited successfully by using a dc reactive magnetron sputtering system.The structure and mechanical properties of the as-deposited Cr/a-C:H films are characterized systematically by field-emission scanning electron microscope,x-ray diffraction,Raman spectra,nanoindentation and scratch.It is shown that optimal Cr metal forms nanocrystalline carbide to improve the hardness,toughness and adhesion strength in the amorphous carbon matrix,which possesses relatively higher nano-hardness of 15.7GPa,elastic modulus of 126.8 GPa and best adhesion strength with critical load(L_c) of36 N for the Cr/a-C:H film deposited at CH_4 flow rate of 20 sccm.The friction and wear behaviors of as-deposited Cr/a-C:H films are evaluated under both the ambient air and deionized water conditions.The results reveal that it can achieve superior low friction and anti-wear performance for the Cr/a-C:H film deposited at CH_4 flow rate of 20 sccm under the ambient air condition,and the friction coefficient and wear rate tested in deionized water condition are relatively lower compared with those tested under the ambient air condition for each film.Superior combination of mechanical and tribological properties for the Cr/a-C:H film should be a good candidate for engineering applications. 相似文献
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Raman spectra of amorphous carbon nitride films (a-C:N) resemble those of typical amorphous carbon (a-C), and no specific features in the spectra are shown due to N doping. The present work provides a correlation between the microstructure and vibrational properties of a-C:N films from first principles. The six periodic model structures of 64 atoms with various mass densities and nitrogen contents are generated by the liquid-quench method using Car-Parinello molecular dynamics. By using Raman coupling tensors calculated with the finite electric field method, Raman spectra are obtained. The calculated results show that the vibrations of C=N could directly contribute to the Raman spectrum. The similarity of the Raman line shapes of N-doped and N-free amorphous carbons is due to the overlapping of C=N and C=C vibration bands. In addition, the origin of characteristic Raman peaks is also given. 相似文献
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F. L. Freire Jr. C. A. Achete D. F. Franceschini G. Mariotto 《Applied Physics A: Materials Science & Processing》1994,59(6):667-672
Amorphous carbon films (a-C:H) and nitrogen incorporated carbon films [a-C:H(N)] deposited by a self-bias glow discharge have been implanted with 70 keV nitrogen ions at fluences of 0.6, 1 and 2×1017 N/cm2. The in-depth modifications caused by ion implantation were determined by means of nuclear techniques, such as Rutherford Backscattering Spectrometry (RBS), Nuclear Reaction Analysis (NRA) and Elastic Recoil Detection Analysis (ERDA), as well as by Auger Electron Spectroscopy (AES) and Raman scattering. ERDA profiles show that nitrogen implantation causes hydrogen depletion, the amount of which depends on the film composition and on the ion fluence. In a-C:H(N) films nitrogen loss was also measured. The induced structural modifications in both a-C:H and a-C:H(N) films were followed by both AES, using factor analysis, and microprobe Raman spectroscopy. They turn out to be related to the energy deposited by the incident ions. Our results indicate that the ion-beam bombardment causes in both a-C:H and a-C:H(N) films an increase of either the degree of disorder or the ratio between sp2/sp3 bonds across the hydrogen-depleted layer, which depends on the ion fluence. 相似文献
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采用脉冲激光沉积(PLD)技术在Si(100)衬底上生长了Nd∶YAG薄膜以及Nd∶Glass薄膜,利用扫描电子显微镜(SEM)、能谱仪(EDS)、傅里叶变换红外光谱仪(FTIR)、光学掺量振荡器(OPO)以及光栅光谱仪等测试装置分析了薄膜的表面和断面结构形貌、组成成分、光学吸收谱以及光致发光谱。结果表明:在室温衬底温度下生长的Nd∶YAG薄膜以及Nd∶Glass薄膜均呈无规则非定型结构,没有明显的取向性微晶生长;PLD生长的Nd∶YAG薄膜中存在0.15 at.%化学计量比的Nd元素;Nd∶YAG块体靶材在750和808 nm有两个明显的吸收峰,而薄膜没有明显的吸收峰;Nd∶YAG薄膜在808 nm波长泵浦光下没有明显的光致发光谱峰,而Nd∶Glass薄膜在877和1 064 nm波长处有明显的光致发光谱峰。说明在室温衬底温度下生长的Nd∶Glass薄膜中Nd元素以Nd3+光学活性离子形式掺杂进玻璃基质中,而Nd∶YAG薄膜中的Nd元素没有以Nd3+光学活性离子形式掺杂进YAG基质中。 相似文献
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Hongliang Zhang Weidong Wu Chengshi Gong Wei Wang Zhibing He Jun Li Xin Ju Yongjian Tang Erqing Xie 《Applied Physics A: Materials Science & Processing》2010,98(4):895-900
Fe-doped hydrogenated amorphous carbon (a-C:H:Fe) films were deposited from a gas mixture of trans-2-butene/ferrocene/H2 by plasma enhanced metal organic chemical vapor deposition. X-ray photoelectron spectroscopy, Fourier transform infrared
spectra and Raman spectra were used to characterize the composition and the bonding structure of the a-C:H:Fe and a-C:H films.
Optical properties were investigated by the UV–visible spectroscopy and the photoluminescence (PL) spectra. The Fe-doped films
contain more aromatic structures and C=C bonds than the undoped films. The sp
2 carbon content and sp
2 clustering of the films increase, and aromatic-like rings’ structures become richer after Fe-doping. The Tauc optical gap
of the a-C:H:Fe films become narrower by 0.3 eV relative to the value of the a-C:H films. The PL peak shifts from 2.35 eV
of the a-C:H films to 1.95 eV of the a-C:H:Fe films, and the PL intensity of the a-C:H:Fe films is greatly enhanced. A deep
level emission peak around 2.04 eV of the a-C:H:Fe films is observed. 相似文献
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Field emission properties of a-C and a-C:H films deposited on silicon surfaces modified with nickel nanoparticles 下载免费PDF全文
The a-C and a-C:H films are deposited on silicon surfaces modified with and without nickel nanoparticles by using mid-frequency magnetron sputtering. The microstructures and morphologies of the films are analyzed by Raman spectroscopy and atomic force microscopy. Field emission behaviors of the deposited films with and without nickel nanoparticles modification are comparatively investigated. It is found that the hydrogen-free carbon film exhibits a high field emission current density and low turn-on electric field compared with the hydrogenated carbon film. Nickel modifying could increase the current density, whereas it has no significant effect on the turn-on electric field. The mechanism of field electron emission of a sample is discussed from the surface morphologies of the films and nickel nanoparticle roles in the interface between film and substrate. 相似文献
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采用等离子体增强化学气相沉积技术,以N2掺入到SiH4和H2的沉积方式,分别在玻璃和N型单晶硅片(100)衬底上制备富硅氮化硅薄膜。通过紫外-可见光吸收光谱、傅里叶变换红外吸收光谱(FTIR光谱)、拉曼光谱和光致发光谱(PL谱)分别表征掺氮硅薄膜材料的带隙、结构及其发光特性的变化。结果表明:在氢气的氛围中,随着氮气流量的增加,氢原子能够对薄膜缺陷起到抑制作用,并使较低的SiH4/N2流量比下呈现富硅态,但却不利于硅团簇的形成。随着氮原子的掺入,Si—N键的含量增大,带隙增大,薄膜内微结构的无序度也增大,薄膜出现了硅与氮缺陷相关的缺陷态发光;随着氮原子进一步增加,出现了带尾态发光,进一步讨论了发光与结构之间的关联。这些结果有助于采用PECVD制备富硅氮化硅对材料发光与结构特性的优化。 相似文献
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采用对靶磁控反应溅射技术,以氢气作为反应气体在不同的氢稀释比条件下制备了氢化非晶硅薄膜.利用台阶仪、傅里叶红外透射光谱、Raman谱和紫外-可见光透射谱测量研究了不同氢稀释比对氢化非晶硅薄膜生长速率和结构特性的影响.分析结果发现,利用对靶磁控溅射技术能够实现低温快速沉积高质量氢化非晶硅薄膜的制备.随着氢稀释比不断增加,薄膜沉积速率呈现先减小后增大的趋势.傅里叶红外透射光谱表明,氢化非晶硅薄膜中氢含量先增大后变小.而Raman谱和紫外-可见光透射谱分析发现,氢稀释比的增加使氢化非晶硅薄膜有序度和光学带隙均先增大后减小.可见,此技术通过改变氢稀释比R能够实现氢化非晶硅薄膜结构的有效控制. 相似文献
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The effect of substrate bias on X-ray photoelectron spectroscopy (XPS) study of nitrogen incorporated amorphous carbon (a-C:N) films embedded with nanoparticles deposited by filtered cathodic jet carbon arc technique is discussed. High resolution transmission electron microscope exhibited initially the amorphous structure but on closer examination the film was constituted of amorphous phase with the nanoparticle embedded in the amorphous matrix. X-ray diffraction study reveals dominantly an amorphous nature of the film. A straight forward method of deconvolution of XPS spectra has been used to evaluate the sp3 and sp2 contents present in these a-C:N films. The carbon (C 1s) peaks have been deconvoluted into four different peaks and nitrogen (N 1s) peaks have been deconvoluted into three different peaks which attribute to different bonding state between C, N and O. The full width at half maxima (FWHM) of C 1s peak, sp3 content and sp3/sp2 ratio of a-C:N films increase up to −150 V substrate bias and beyond −150 V substrate bias these parameters are found to decrease. Thus, the parameters evaluated are found to be dependent on the substrate bias which peaks at −150 V substrate bias. 相似文献