Study of intermixing and Zr-silicide formation using swift heavy ion irradiation

Swift heavy ion (SHI) beam induced irradiation is an established technique for investigating structural modifications in thin films depending on the S _e sensitivity of material. Intermixing due to 120 MeV Au ion irradiation at different fluences from 10¹² to 10¹⁴ ions/cm² has been reported as a function of ion fluence in a-Si/Zr/a-Si thin films on Si substrate. The samples are characterized before (pristine) and after irradiation using Grazing Incident X-ray Diffraction (GIXRD) and Rutherford Backscattering Spectroscopy (RBS), which confirm the formation of ZrSi at thin film interface. It is suggested that mixing is mainly due to electronic energy loss since the energy transferred from high energy ions seems to create a transient molten zone along the ion track. It is found that the interface mixing increases linearly with the increase in ion fluence. The mixing effect explained in the framework of Thermal spike model. The irradiation effect on the surface roughness of the system is measured using Atomic Force Microscopy (AFM) technique. The current conduction mechanism and Schottky barrier height are also calculated by taking I–V curves across the Metal/Si junction.     

Investigation of energetic ion-induced mixing in Bi/Ge system

The present study is carried out for the investigation of energetic ion beam mixing in the Bi/Ge system, induced by electronic excitation. The system Ge/Bi/C was deposited on Si substrate at room temperature in the high vacuum deposition system and irradiated using Au ions of 120?MeV at the fluences 1?×?10¹³, 5?×?10¹³ and 1?×?10¹⁴?ions/cm². The top layer of carbon was deposited as the protecting layer to avoid oxidation. The swift heavy ions (SHI)-induced interface mixing was studied by Rutherford backscattering spectroscopy (RBS) for depth profiles and compositions, grazing incidence X-ray diffraction (GIXRD) for phase identification and atomic force microscopy (AFM) for surface roughness. We have calculated the mixing rate, mixing efficiency and inter-diffusion coefficient for the Bi/Ge system. We observed that the thickness of the mixed region increased with increasing fluence. In the GIXRD pattern, no new crystalline phase formation was observed after irradiation, the mixed region may be in an amorphous form. The mixing effect is explained in the framework of the thermal spike model.     

Phase formation by ion beam mixing in the Ti/Si multilayer system

The irradiation effect of 350 MeV Au⁺ ions on Ti/Si multilayers has been studied using Rutherford backscattering spectroscopy, X-ray reflectivity (XRR) and grazing incidence X-ray diffraction (GIXRD). Intermixing effects have been studied as a function of fluences of 0.46 × 10¹⁴, 1.82 × 10¹⁴ and 4.62 × 10¹⁴ cm⁻². Rutherford backscattering spectra (RBS) confirm mixing at the interface. X-ray reflectivity patterns show damage at the interfaces with the absence of a continuous fringe pattern at high fluence doses in comparison to the pristine interface. Mixing leads to titanium di-silicide (TiSi₂) phase formation as a shown by grazing incidence X-ray diffraction patterns. The observed intermixing is attributed to energy deposited by the incident ions in the electronic system of the target. Swift heavy ion irradiation induced intermixing increases with fluence.     

Mixing of Au in Si induced by secondary and high-order recoil implantation

The mixing of Au in Si induced by secondary and high-order recoil implantation was investigated using 350 keV Ar⁺ and 350 keV Kr⁺ ions to fluences from 1?×?10¹⁶ to 3?×?10¹⁶ ions/cm² at room temperature. The thickness of the Au layer evaporated on Si substrate was ～2400 Å.The ranges of the Ar and Kr ions were chosen to be lower than the thickness of the Au layer in order to avoid the ballistic mixing produced by the primary knock-on atoms. Rutherford backscattering spectrometry (RBS) experiments were carried out to study the effects induced by Ar and Kr irradiation at the interface of Au–Si system. We observed that in the case of the irradiation with Ar⁺ ions, a broadening of the Au–Si interface occurred only at the fluence of 3?×?10¹⁶ Ar⁺/cm² and it is attributed to the surface roughening induced by ion bombardment. In contrast, the RBS analysis of a sample irradiated with 2?×?10¹⁶ Kr⁺/cm² clearly showed, in addition to the broadening effect, the formation of a mixed zone of Au and Si atoms at the interface. The mixing of Au in Si atoms can be explained by the secondary and high-order recoil implantation followed by subsequent collision cascades.     

Materials modification at zirconium–silicon interface using swift heavy ions

The reactivity of the Zr/Si interface induced by swift heavy ion beams of Au has been investigated in the present work. Zirconium was evaporated on a clean silicon substrate in ultra high vacuum (UHV) at a pressure of 10^?8 Torr by the electron beam evaporation technique and the final layer was a thin film of Au to avoid oxidation of zirconium. The Zr/Si system was irradiated by 350 MeV Au²⁶⁺ ions at liquid nitrogen temperature at different fluences (0.46×10¹⁴, 1.85×10¹⁴ and 4.62×10¹⁴ ions/cm²). Rutherford back scattering (RBS) spectroscopy using 2 MeV He ions was used to monitor the Zr and Si concentration profiles and interdiffusion at the interfaces. The irradiation at the Zr/Si interface showed mixing. X-ray diffraction measurements confirmed the formation of the ZrSi₂ phase. Thermal spike formation and melting in the tracks was found to be the dominant process at the interfaces.     

Conversion Electron Mössbauer Study of Mixing Induced by Swift Heavy Ions at the Fe/Si Interface

Conversion Electron Mössbauer Spectroscopy (CEMS) was employed in order to study the mixing induced by swift Au and Ag ions at the Fe/Si interface in the Fe/Fe⁵⁷/Si system. An increase in the amount of mixing with ion fluence and electronic energy loss (S _e) has been observed. Atomic Force Microscopy (AFM) results provided indirect evidence to support the above observations.     

Effect of ion velocity on SHI-induced mixing in Ti/Bi system

Energetic ion beams are proving to be versatile tools for modification and depth profiling of materials. The energy and ion species are the deciding factor in the ion-beam-induced materials modification. Among the various parameters such as electronic energy loss, fluence and heat of mixing, velocity of the ions used for irradiation plays an important role in mixing at the interface. The present study is carried out to find the effect of the velocity of swift heavy ions on interface mixing of a Ti/Bi bilayer system. Ti/Bi/C was deposited on Si substrate at room temperature by an electron gun in a high-vacuum deposition system. Carbon layer is deposited on top to avoid oxidation of the samples. Eighty mega electron volts Au ions and 100?MeV Ag ions with same value of S_e for Ti are used for the irradiation of samples at the fluences 1?×?10¹³–1?×?10¹⁴ ions/cm². Different techniques like Rutherford backscattering spectroscopy, atomic force microscopy and grazing incidence X-ray diffraction were used to characterize the pristine and irradiated samples. The mixing effect is explained in the framework of the thermal spike model. It has been found that the mixing rate is higher for low-velocity Au ions in comparison to high-velocity Ag ions. The result could be explained as due to less energy deposition in thermal spike by high-velocity ions.     

RBS and TEM studies of indium phosphide irradiated with 100 keV Au ions

Transmission Electron Microscopy (TEM) and Rutherford Backscattering (RBS) have been used to observe the spatially isolated disordered zones in InP resulting from 100 keV Au ion irradiation at room temperature. Studies were carried out in interval of irradiation fluences less than lower value of full amorphization fluence. Such a value of fluence, as was established in the studies, can be estimated of order ∼2.5 × 10¹³cm⁻². The accumulation of damage due to the 100 keV Au ion irradiation was described in this material using a composite theoretical model accounting for both homogeneous and heterogeneous amorphization processes.     

Low temperature ion beam mixing of Co/Si systems

Co/Si systems were ion beam mixed at 77 K using a 100 keV Ar beam. The formation of different phases as a function of irradiation dose has been studied, using Mössbauer spectroscopy (MS) and Rutherford backscattering spectroscopy (RBS). It was found that Co₂Si, CoSi and CoSi₂ are formed subsequently in parallel layers. After high dose irradiation, a phase with stoichiometry Co∶Si equal to 1∶3 was observed, suggesting CoSi₃ has been formed. However, MS gave clear evidence that this phase consists of precipitates of CoSi₂ and Si. Finally, we found that the amount of mixing scales linearly with the square root of the fluence, with a mixing rate of 1.0×10⁴Å⁴.     

Ion-beam induced mixing of Cu/Au bilayer thin film (kinematics and formation of solid solutions)

Ion-beam induced atomic mixing of Cu/Au bilayer thin film is studied using combined electrical resistivity measurements and Rutherford Backscattering Spectrometry (RBS). 400 keV Kr⁺ ion irradiation with fluences ranging from 3.3×10¹⁵ to 7.6×10¹⁶ ions/cm² at room temperature have been used. Ion beam mixing lead to a uniformly mixed metal alloy. The formation of Cu/Au solid solutions depends on the initial composition and on the fluence of irradiating ions. For an initial composition of Cu₄₂Au₅₈, a Cu-rich solid solution of composition Cu₇₂Au₂₈ is formed after irradiation with 7.6×10¹⁶ ions/cm². The kinematics of the intermixing process is also studied by in situ electrical resistivity measurements which confirmed the formation of the Cu/Au solid solutions.     

Effect of nitrogen ions on the structural,optical, and thermal properties of polyvinyl alcohol/starch blend

This work examines the properties of polyvinyl alcohol (PVA)/starch film containing glycerol as a plasticizer under exposure to different nitrogen ion fluence. The prepared PVA/starch blend was irradiated with ion fluence from 3 × 10¹⁷ to 12 × 10¹⁷ ions.cm⁻². From FTIR, the ion beam irradiation attack and weakens the C–H bond in PVA/starch blend. From XRD findings, the crystallite size of the blend decreased at 3 × 10¹⁷ ions/cm² while it increased at higher fluence up to 9 × 10¹⁷ ions/cm². This indicates the degradation of the blend at low ion fluence compared to crosslinking at high ion fluence. Also, the optical bandgap of the blend was decreased with an increase in ion fluence. Furthermore, the effect of N⁺ ions on some optical dispersion parameters is studied. The thermal stability of the PVA/starch blend shows a decrease in thermal stability upon irradiation with 3 × 10¹⁷ ions/cm² compared to higher thermal stability at higher doses up to 9 × 10¹⁷ ions/cm².     

Effect of Si ion irradiation on polycrystalline CdS thin film grown from novel photochemical deposition technique

CdS thin films have been deposited from aqueous solution by photochemical reactions. The solution contains Cd(CH₃COO)₂ and Na₂S₂O₃, and pH is controlled in an acidic region by adding H₂SO₄. The solution is illuminated with light from a high-pressure mercury-arc lamp. CdS thin films are formed on a glass substrate by the heterogeneous nucleation and the deposited thin films have been subjected to high-energy Si ion irradiations. Si ion irradiation has been performed with an energy of 80 MeV at fluences of 1×10¹¹, 1×10¹², 1×10¹³ and 1×10¹⁴ ions/cm² using tandem pelletron accelerator. The irradiation-induced changes in CdS thin films are studied using XRD, Raman spectroscopy and photoluminescence. Broadening of the PL emission peak were observed with increasing irradiation fluence, which could be attributed to the band tailing effect of the Si ion irradiation. The lattice disorder takes place at high Si ion fluences.     

SHI induced silicide formation and surface morphology at Co/Si system

Ion beam mixing is a useful technique to produce modifications at the surface and interface of the solid material. In the present work, ion beam induced modifications at Co/Si interface using 120 MeV Au-ion irradiation has been studied at ion fluences in the range of 10¹² to 10¹⁴ ions/cm² by secondary ion mass spectroscopy (SIMS) technique and calculated mixing efficiency at the interface. Silicide formation has been discussed on the basis of swift heavy ion (SHI) irradiation induced effects. Surface morphology and roughness of irradiated system with fluence 5 × 10¹³ and 1 × 10¹⁴ ions/cm² is studied by scanning tunneling microscopy (STM). Roughness of the surface shows marks of melting process and confirms the appearance of some pinholes in the reacted Co/Si system. Comparative study was also undertaken on annealed sample at 300 °C and then irradiated at a dose 1 × 10¹⁴ ions/cm².     

Li3+ ion irradiation effects on ionic conduction in P(VDF–HFP)–(PC + DEC)–LiClO4 gel polymer electrolyte system

Swift heavy ion irradiation of P(VDF–HFP)–(PC + DEC)–LiClO₄ gel polymer electrolyte system with 48 MeV Li³⁺ ions having five different fluences was investigated with a view to increase the Li⁺ ion diffusivity in the electrolyte. Irradiation with swift heavy ion (SHI) shows enhancement of conductivity at lower fluences and decrease in conductivity at higher fluences with respect to unirradiated polymer electrolyte films. Maximum room temperature (303 K) ionic conductivity is found to be 2.2 × 10^− 2 S/cm after irradiation with fluence of 10¹¹ ions/cm². This interesting result could be ascribed to the fluence-dependent change in porosity and to the fact that for a particular ion beam with a given energy higher fluence provides critical activation energy for cross-linking and crystallization to occur, which results in the decrease in ionic conductivity. The XRD results show decrease in the degree of crystallinity upon ion irradiation at low fluences (≤ 10¹¹ ions/cm²) and increase in crystallinity at high fluences (> 10¹¹ ions/cm²). The scanning electron micrographs (SEM) exhibit increased porosity of the polymer electrolyte films after low fluence ion irradiation.     

Nanoscale ion-beam mixing in Au–Si and Ag–Si eutectic systems

MeV ion induced mixing in the nanoscale regime for Au and Ag nanoislands on silicon substrates has been studied. Au and Ag nanoislands are grown on silicon substrates at room temperature and irradiated with 1.5-MeV Au²⁺ ions at various fluences. Cross-sectional high-resolution transmission electron microscopy and Rutherford backscattering spectrometry (RBS) are used to study the ion-beam mixing in Au/SiO_x/Si and Ag/SiO_x/Si systems. We observe a metastable mixed phase for the Au–Si system at a fluence of 1×10¹⁴ ionscm^-2, while no mixed phase is formed for the Ag–Si system. For both Au–Si and Ag–Si systems, a part of the islands is pushed into the substrate. The mixed phase of the Au–Si system is found to be crystalline in nature. The higher eutectic temperature and lower heat of mixing of the Ag–Si system compared to the Au–Si system could be responsible for the lack of mixing and silicide formation in the Ag–Si system. PACS 61.80.Jh; 61.82.Rx; 68.37.Lp; 64.75.+g; 61.46.+w     

Mössbauer Optimization of the Direct Synthesis of β-FeSi2 by Ion Beam Mixing of Fe/Si Bilayers

At present, there is an increasing interest in the iron di-silicide phase -FeSi₂, which is supposed to be a direct band gap semiconductor and one of the most promising materials for silicon-based optoelectronics, e.g., light-emitting devices, solar cells, and photo detectors. But this phase is very difficult to be produced. Here, the successful direct synthesis of this phase by ion beam mixing of Fe/Si bilayers at temperatures in the range of 400 to 600°C is reported. The aim of the experiments was to achieve a complete reaction of the deposited Fe layer with the Si substrate that results in the formation of a pure, single-phased -FeSi₂ surface layer. The obtained silicide layers, their structure and composition are investigated by conversion electron Mössbauer spectroscopy (CEMS), Rutherford backscattering spectrometry (RBS), and X-ray diffraction (XRD). The fraction of the -FeSi₂ formed is determined by CEMS as function of ion species, energy, fluence and temperature. Complete growth and formation of a single-phased -FeSi₂ layer was achieved by 205 keV Xe ion irradiation at a fluence of 2×10¹⁶ ions/cm² at 600°C.     

Structural modification of poly(methyl methacrylate) by proton irradiation

A general survey is presented on the structural modification of poly(methyl methacrylate) (PMMA) by proton implantation. The implanted PMMA films were characterized by FT-IR attenuated total reflection (FT-IR ATR), Raman, Rutherford backscattering spectroscopy (RBS), gel permeation chromatography (GPC) and surface profiling. The ion fluence of 350 keV protons ranged from 2×10¹⁴ to 1×10¹⁵ ions/cm². The IR and Raman spectra showed the reduction of peaks from the pendant group of PMMA. The change of absorption and composition was observed by UV–VIS and RBS, respectively. These results showed that the pendant group is readily decomposed and eliminated by proton irradiation. The change of molecular weight distribution was also measured by GPC and G-value of scission was estimated to be 0.67.     

Ion induced modification in structural and magnetic properties of Pt/Cr/Co multilayers

This paper reports on the change in the magnetic and the structural properties of Pt/Cr/Co multilayers due to 1 MeV N⁺-ion irradiation at room temperature. We observe irradiation induced formation of the CoCrPt ternary alloy phase at a fluence of 1×10¹⁶ ions cm^?2. Phase formation is accompanied by an enhancement in the coercivity. The enhancement in the coercivity is attributed to inhomogeneous alloying and possible mixing-induced strain. These findings are explained in the light of ion beam induced recoil mixing and ionization events.     

Tuning of ripple patterns and wetting dynamics of Si (100) surface using ion beam irradiation

Ripple patterns on Si (100) surface have been fabricated using 200 keV Ar⁺ oblique ion beam irradiation. Dynamical evolution of patterns is studied for the fluences ranging from 3 × 10¹⁷ ions/cm² to 3 × 10¹⁸ ions/cm². AFM study reveals that the exponential growth of roughness with stable wavelength of ripples up to higher fluence values is lying in the linear regime of Continuum models. Stylus Profilometer measurement was carried out to emphasize the role of sputtering induced surface etching in ripple formation. Rutherford Backscattering Spectroscopy shows the incorporation of Ar in the near surface region. Observed growth of ripples is discussed in the framework of existing models of surface patterning. Role of ion beam sputtering induced surface etching is emphasized in formation of ripples. In addition, the wetting study is performed to demonstrate the possibility of engineering the hydrophilicity of ripple patterned Si (100) surface.     

Mechanism of ion-induced mixing phenomena in Gold–Nickel bilayer on Si substrate

Gold/Nickel bilayer thin films deposited on Si(100) substrates are bombarded by 100 keV ⁴⁰Ar⁺, 260 and 300 keV ⁸⁴Kr²⁺ and 400 keV ¹³²Xe³⁺ ions which deposit maximum energy across the Gold/Nickel interface and hence produce maximum atomic transport within two sides of the interface. However, due to the energy of the projectile ions some Si atoms have also gained energy, which, in turn, displaces the atoms. The atomic displacements caused by the projectile in the system has been analyzed using RBS, XRD, SEM/EDS and AFM/MFM techniques. The relative change in the variance of the intermixed region across the Au–Ni–Si interfaces excluding the irradiation-induced surface roughness has been calculated and it was observed that it increases linearly with ion fluence. The measured athermal mixing rates which vary between 3.7 and 6.9 nm⁴, have been explained by various existing phenomenological models. It shows that local or global thermal spike models are most suitable for explaining the ion beam-induced mixing of systems with strong thermochemical properties of the constituents. The mixing efficiency of this system has been calculated and found to be 1.2 nm⁵/keV.