Practical implementation of order parameter calculation for directed assembly of block copolymer thin films

A computational procedure is presented to quantify the order achieved in assembled block copolymer films when no disruptive defects are present (i.e., dislocations or disclinations). Both simulated and real systems were used to show that sub‐nm variation in the domain position, as well as the corresponding reciprocal lattice vectors, can reduce the accuracy in the quantification of the order of the system. The computational procedure in this work was based on fitting to the measured spatial location of the domain centroids, and incorporated a tolerance factor to account for domain position variation. The procedure was used to analyze the translational and orientational order parameters of block copolymer films assembled on a chemical pattern as well as their corresponding autocorrelation functions. The procedure was applied to a patterned substrate during three stages of a template forming process: an e‐beamed patterned photoresist, the domains of a block copolymer directed to assemble on this pattern, and the underlying structure after lift‐off. Use of the procedure demonstrated that the order of the block copolymer film could be retained in subsequent processing of the underlying template. © 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2010     

Advances in square arrays through self‐assembly and directed self‐assembly of block copolymers

This review covers recent advances in developing square arrays in thin films using block copolymers. Theoretical and experimental results from self‐assembly of block copolymers in bulk and thin films, directed self‐assembly of block copolymers confined in small wells, on substrates with arrays of posts, and on chemically nanopatterned substrates, as well as applications as nanolithography are reviewed. Some future work and hypothesis are discussed. © 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2013     

Controlling interfacial interactions for directed self assembly of block copolymers

Over the past 15 years, block copolymer lithography has emerged as its own research field within the broader block copolymer and polymer thin film communities. This distinction is associated with the unique requirements set by the semiconductor device industry, such as low-defect densities, precise feature registration, and complex pattern layouts. To achieve perfection in block copolymer lithography, the surface and substrate interactions must be carefully tuned to control domain ordering in three dimensions. This perspective discusses recent modeling efforts that underline the challenges of predicting interfacial interactions and the resulting block copolymer structures. We emphasize studies that facilitate the design and interpretation of experiments, including materials selection, guiding pattern geometry, and selecting tools for three-dimensional metrology. Finally, we propose that translation of block copolymer lithography to semiconductor manufacturing will require integrated experimental and modeling efforts to interrogate the vast parameter space that controls both lateral and out-of-plane ordering. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 96–102     

Covalent stabilization of nanostructures: Robust block copolymer templates from novel thermoreactive systems

Structurally robust block copolymer templates with feature sizes of approximately 10 nm were prepared from functionalized poly(methyl methacrylate)‐b‐polystyrene block copolymers. By the inclusion of benzocyclobutene crosslinking groups in the polystyrene block, the covalent stabilization of thin films to both thermal treatment and solvent exposure became possible. In addition, the crosslinking of the poly(styrene‐benzocyclobutene) domains at 220 °C, followed by the removal of poly(methyl methacrylate), provided a robust, crosslinked nanostructure with greater processing and fabrication potential. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 1028–1037, 2005     

Poly(styrene–b–ethylene/butylene–b–styrene)/cobalt ferrite magnetic nanocomposites

Magnetic nanoparticles were created in or around the sulfonated (s) polystyrene domains in a poly[styrene–b–(ethylene–co–butylene)–b–styrene)] block copolymer (BCP) using an in situ inorganic precipitation procedure. The sBCP was neutralized with a mixed iron/cobalt chloride electrolyte, and the doped samples were converted to their oxides by reaction with sodium hydroxide. Transmission electron microscopy indicated the presence of nanoparticles having diameters of 20–50 nm. Metal oxide particle structures were studied using wide angle X–ray diffraction, which revealed that they were inverse spinel cobalt iron oxide crystals. Thermogravimetric analysis provided the weight percent of the inorganic component and nanocomposite thermal decomposition profile. Modulated differential scanning calorimetry studies suggested that the inorganic inclusions were selectively grown in the polystyrene hard block phase. These nanocomposites were shown, using alternating gradient magnetometry, to be ferrimagnetic at room temperature. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 1475–1485, 2005     

Template–polymer commensurability and directed self‐assembly block copolymer lithography

Block copolymer directed self‐assembly (BCP) with chemical epitaxy is a promising lithographic solution for patterning features with critical dimensions under 20 nm. In this work, we study the extent to which lamellae‐forming poly(styrene‐b‐methyl methacrylate) can be directed with chemical contrast patterns when the pitch of the block copolymer is slightly compressed or stretched compared to the equilibrium pitch observed in unpatterned films. Critical dimension small angle X‐ray scattering complemented with SEM analysis was used to quantify the shape and roughness of the line/space features. It was found that the BCP was more lenient to pitch compression than to pitch stretching, tolerating at least 4.9% pitch compression, but only 2.5% pitch stretching before disrupting into dislocation or disclination defects. The more tolerant range of pitch compression is explained by considering the change in free energy with template mismatch, which suggests a larger penalty for pitch stretching than compressing. Additionally, the effect of width mismatch between chemical contrast pattern and BCP is considered for two different pattern transfer techniques. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 595–603     

Brushless and controlled microphase separation of lamellar polystyrene‐b‐polyethylene oxide thin films for block copolymer nanolithography

Creating perpendicular alignment in lamellar block copolymer (BCP) systems has considerable industrial and commercial significance, most importantly for generating nanowire structures in electronic devices. In general, these lamellar systems require careful interface engineering to obtain vertical orientation of the blocks. To avoid the strong preferential adsorption of one block to either the substrate or the polymer/air interface, the surface must be “neutralized” by chemical brushes or external forces, for example, solvent fields. Reported here is a stepwise thermo/solvent annealing process allowing the formation of perpendicular domains of polystyrene‐b‐polyethylene oxide lamellar structures while avoiding brush or other surface modifications. This BCP has a relatively small minimum feature size and can be used to generate substrate patterns for use in fabrication of nanowire electronic device structures. © 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2012     

Synthesis and thin‐film orientation of poly(styrene‐block‐trimethylsilylisoprene)

The successful synthesis, characterization, and directed self‐assembly of a silicon‐containing block copolymer, poly(styrene‐block‐trimethylsilylisoprene) (P(S‐b‐TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene‐block‐methyl methacrylate) is reported. A Sakurai, Grignard‐type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S‐b‐TMSI) was successfully ordered and oriented by directed self‐assembly. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2013     

Morphology and mechanical properties of binary triblock copolymer blends

The influence of the morphology on the mechanical properties of binary styrene–butadiene (SB) triblock copolymer blends of a thermoplastic block copolymer and a thermoplastic elastomer (TPE) with different molecular architectures was studied with bulk samples prepared from toluene. Both block copolymers contained SB random copolymer middle blocks, that is, the block sequence S–SB–S. The two miscible triblock copolymers were combined to create a TPE with increased tensile strength without a change in their elasticity. The changes in the equilibrium morphology of the miscible triblock copolymer blends as a function of the TPE content (lamellae, bicontinuous morphology, hexagonal cylinders, and worms) resulted in a novel morphology–property correlation: (1) the strain at break and Young's modulus of blends with about 20 wt % TPE were larger than those of the pure thermoplastic triblock copolymer; (2) at the transition from bicontinuous structures to hexagonal structures (～35 wt % TPE), a change in the mechanical properties from thermoplastic to elastomeric was observed; and (3) in the full range of wormlike and hexagonal morphology (60–100 wt % TPE), elastomeric properties were observed, the strength greatly increasing and high‐strength elastomers resulting. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 429–438, 2005     

Combinatorial generation and replication-directed assembly of complex and varied geometries with thin films of diblock copolymers

Directed assembly of fine-scale, very complex patterns with a variety of features, including terminations, jogs, disclinations, acute and obtuse bends, and sharp radii of curvature, was achieved with a symmetric poly(styrene-block-methylmethacrylate) (PS-b-PMMA) copolymer. The complex pattern was generated spontaneously by spin coating and annealing a thin film of a lamellae-forming block copolymer on a chemically neutral surface. The resulting "fingerprint" pattern had a domain spacing of 47.5 nm. Oxygen plasma treatment of the block copolymer converted it into an insoluble chemical nanopattern that was quantified by XPS, goniometry, and the wetting behavior of the block copolymer. Spin coating a second thin film of the block copolymer and annealing resulted in directed assembly that replicated the fingerprint pattern, including the most complicated defect structures. A computer vision algorithm was developed and implemented to compare the patterns quantitatively, taking into account inherent differences in image contrast, scale, rotation, and translation.     

Synthesis and characterization of six‐arm star polystyrene‐block‐poly (3‐hexylthiophene) copolymer by combination of atom transfer radical polymerization and click reaction

A novel six‐arm star block copolymer comprising polystyrene (PS) linked to the center and π‐conjugated poly (3‐hexylthiophene) (P3HT) was successfully synthesized using a combination of atom transfer radical polymerization (ATRP) and click reaction. First, star‐shaped PS with six arms was prepared via ATRP of styrene with the discotic six‐functional initiator, 2,3,6,7,10,11‐hexakis(2‐bromoisobutyryloxy)triphenylene. Next, the terminal bromides of the star‐shaped PS were substituted with azide groups. Afterward, the six‐arm star block copolymer PS‐b‐P3HT was prepared using the click coupling reaction of azide‐terminated star‐shaped PS with alkynyl‐terminated P3HT. Various techniques including ¹H NMR, Fourier‐transform infrared and size‐exclusion chromatography were applied to characterize the chemical structures of the intermediates and the target block copolymers. Their thermal behaviors and optical properties were investigated using differential scanning calorimetry and UV–vis spectroscopy. Moreover, atomic force microscopy (AFM) was utilized to observe the morphology of the star block copolymer films. In comparison with two linear diblock copolymer counterparts, AFM results reveal the effect of the star block copolymer architecture on the microphase separation‐induced morphology in thin films. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012     

Synthesis of a well-defined glycopolymer by atom transfer radical polymerization

Controlled free radical polymerization of sugar-carrying methacrylate, 3-O-methacryloyl-1,2 : 5,6-di-O-isopropylidene-d-glucofuranose (MAIpGlc) was achieved by the atom transfer radical polymerization (ATRP) technique with an alkyl halide/copper-complex system in veratrole at 80°C. The time–conversion first-order plot was linear and the number-average molecular weight increased in direct proportion to the ratio of the monomer conversion to the initial initiator concentration, providing PMAIpGlc with a low polydispersity. The sequential addition of the two monomers styrene (S) and MAIpGlc afforded a block copolymer of the type PS-b-PMAIpGlc. The acidolysis of the homo- and block copolymers gave well-defined glucose-carrying water-soluble polymers PMAGlc and PS-b-PMAGlc, respectively. The amphiphilic PS-b-PMAGlc block copolymer exhibited a microdomain surface morphology with spherical PS domains in a PMAGlc matrix. © 1998 John Wiley & Sons, Inc. J. Polym. Sci. A Polym. Chem. 36: 2473–2481, 1998     

A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere‐forming block copolymer directed self‐assembly

Nanoimprint lithography is used to create large‐area two‐dimensional prepatterns with tunable topographic heights in a resist layer. The resist prepatterns are applied to direct the self‐assembly of sphere‐forming polystyrene‐block‐polydimethylsiloxane block copolymers so as to form sparse nonregular nanodot arrays with flexible pattern layouts from high‐topography prepattern or dense regular nanodot arrays with a multiplicative pattern density from low‐topography prepattern. By precisely controlling the topographic height in substrate prepatterns, the origin of directed self‐assembly of block copolymer spheres using low‐topography prepattern is found to be topographic contrast. High‐fidelity pattern transfer from spherical block copolymer nanotemplates to functional materials indicates a promising route to ultrahigh density nanodevices. Bit‐patterned media over 1 teradot/in on a 2.5‐inch disk are fabricated, thus presenting future magnetic data storage media with great areal density growth potential. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2014 , 52, 361–367     

Multiscale dewetting of triblock copolymer thin film induced by solvent vapor

Multiscale dewetting of poly(styrene‐b‐ethylene/butylenes‐b‐styrene) (SEBS) triblock copolymer thin films induced by volatile solvent vapor treatment were observed in this study. Film rupture occurred at first and produced macroscopic holes. Near‐regular droplets (which represented a compromise between complete disorder and perfect order) could be formed at the last stage. The mechanism of solvent‐driven dewetting was discussed by comparing with that of thermal‐induced dewetting. Similar to thermal‐induced dewetting, the block copolymer thin films initially break up through the nucleation of holes that perforated the films. The rapid growing holes became unstable and formed nonequilibrium fingering patterns. The films exhibit autophobic or autodewetting phenomena. The velocity of the holes growth was nearly a constant (3.3 μm/min). The stages of the dewetting were quite similar to that found for homopolymer and block copolymer thin films dewetting on solid or liquid substrates under thermal treatment. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 2874–2884, 2005     

Mechanical properties of gradient copolymers of styrene and n‐butyl acrylate

The mechanical properties of linear and V‐shaped compositional gradient copolymer of styrene and n‐butyl acrylate with composition of around 55 wt % styrene were investigated by comparing with their block copolymer counterparts. Compared with their block copolymer counterparts, the gradient copolymers showed lower elastic modulus, much larger elongation at break, and similar ultimate tensile strength at room temperature. This performance could be ascribed to that the local moduli continuously change from the hardest nanodomains to the softest nanodomains in the gradient copolymer, which alleviates the stress concentration during tensile test. Compared with the V‐shaped gradient (VG) copolymer, the linear gradient copolymer showed much higher elastic modulus but lower elongation at break. The mechanical properties of the gradient copolymers were more sensitive to the change in temperature from 9 °C to 75 °C. With recovery temperature increased from 10 °C to 60 °C, the strain recovery of VG copolymer would change steadily from 40% to 99%. However, the elastic recovery of linear and triblock copolymer was poor even at 60 °C. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 860–868     

End‐grafting copolymers of styrene and 4‐vinylpyridine on an interacting solid surface

Copolymers of styrene and 4‐vinylpyridine with a styrene fraction f varying from 1 to 0 were grafted onto a silicon substrate in the melt. The grafting reaction and the stability of the grafted chains were investigated by Fourier transform infrared and X‐ray photoelectron spectroscopy. The thickness and surface morphology of the grafted copolymer layers were characterized with ellipsometry and atomic force microscopy (AFM). The copolymer chains were successfully grafted to the surface of the silicon substrate by a reaction between the hydroxyl groups of the nitroxide moiety at the end of the copolymers and the silanol groups on the surface of the silicon wafer. A measurement of the thickness of the grafted copolymer layers showed that the ratio of grafted‐layer thickness to the unperturbed chain radius of gyration decreased with the increasing fraction of 4‐vinylpyridine in the copolymer; this indicated that the grafted layer was strongly attracted to the substrate. In addition, an accelerated grafting process was observed at grafting times ranging from 48 to 72 h for pure poly(4‐vinylpyridine) and copolymers with f values of 0.3 and 0.5. AFM observation revealed that the grafted layers densely and homogeneously covered the silicon substrate. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 1332‐1343, 2005     

Compatabilization of polystyrene/polypropylene blends by styrene–butadiene block copolymers with differing polystyrene block lengths

Compatibilization of polystyrene/polypropylene (PS/PP) blends, by use of a series of butadiene–styrene block copolymers was studied by means of small‐angle X‐ray scattering (SAXS) and transmission electron microscopy (TEM). The compatibilizers used differ in molar mass and the number of blocks. It was shown that the ability of a block copolymer (BC) to participate in the formation of an interfacial layer (and hence in compatibilization) is closely associated with the molar mass of styrene blocks. If the styrene blocks are long enough to form entanglements with the styrene homopolymer in the melt, then the BC is trapped inside this phase of the PS/PP blends, and its migration to the PS/PP interface is difficult. In this case, the BC does not participate in the formation of the interfacial layer nor, consequently, in the compatibilization process. On the other hand, the BC's with the molar mass of the PS blocks below the critical value are proved to be localized at the PS/PP interface. This preferable entrapping of some styrene–butadiene BC's in the PS phase of the PS/PP blend is, of course, connected to the differing miscibility of the BC blocks with corresponding components of this blend. Although the styrene block is chemically identical to the styrene homopolymer in the blend, the butadiene block is similar to the PP phase. © 1999 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 37: 1647–1656, 1999     

Control of self‐organized low‐dimensional morphology in poly(styrene‐b‐4vinylpyridine)/polystyrene blend thin films

The surface morphologies of poly(styrene‐b‐4vinylpyridine) (PS‐b‐P4VP) diblock copolymer and homopolystyrene (hPS) binary blend thin films were investigated by atomic force microscopy as a function of total volume fraction of PS (?_PS) in the mixture. It was found that when hPS was added into symmetric PS‐b‐P4VP diblock copolymers, the surface morphology of this diblock copolymer was changed to a certain degree. With ?_PS increasing at first, hPS was solubilized into the corresponding domains of block copolymer and formed cylinders. Moreover, the more solubilized the hPS, the more cylinders exist. However, when the limit was reached, excessive hPS tended to separate from the domains independently instead of solubilizing into the corresponding domains any longer, that is, a macrophase separation occurred. A model describing transitions of these morphologies with an increase in ?_PS is proposed. The effect of composition on the phase morphology of blend films when graphite is used as a substrate is also investigated. © 2004 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 42: 3496–3504, 2004     

Self-Assembly of Rod-Coil Block Copolymers for Photovoltaic Applications

Summary: Two different approaches to obtain electron donor-acceptor interfaces via self-assembly of block copolymer systems are discussed, where the donor domains are formed by a π-conjugated rod-like polymer and the acceptor domains result from a coiled polymer modified by C₆₀ fullerenes. In the first strategy, C₆₀ is chemically grafted onto the coil polymer, typically a statistical copolymer of styrene and chloromethyl styrene. This has as major effect the increase in molecular weight and volume fraction of the coil block, which can markedly perturb the self-assembled block copolymer final morphologies and eventually suppress any microseparated nanostructure in favour of fully isotropic homogeneous phases. We discuss how the presence of free homopolymer rods in the system can help recovering a microphase separated morphology suitable for photovoltaic applications. In the second approach we discuss the poly(diethylhexyl-p-phenylenevinylene-b-4-vinylpyridine) (PPV-P4VP) rod-coil block copolymer system and we argue how supramolecular interactions among P4VP and free C₆₀ can be exploited to blend rod-coil block copolymers and C₆₀ preserving the original lamellar phase.     

Brush macro‐RAFT agent mediated dispersion polymerization of styrene in the alcohol/water mixture

Dispersion RAFT polymerization of styrene in the alcohol/water mixture mediated with the brush macro‐RAFT agent of poly[poly(ethylene oxide) methyl ether vinylphenyl‐co‐styrene] trithiocarbonate [P(mPEGV‐co‐St)‐TTC] with similar molecular weight but different chemical composition is investigated. Well‐controlled RAFT polymerization including an initial slow homogeneous polymerization and a subsequent fast heterogeneous polymerization at almost complete monomer conversion is achieved. The molecular weight of the synthesized block copolymer increases linearly with the monomer conversion, and the polydispersity is relatively narrow (PDI < 1.3). The RAFT polymerization kinetics is dependent on the chemical composition in the brush macro‐RAFT agents, and those with high content of hydrophobic segment lead to fast RAFT polymerization. The growth of the block copolymer nano‐objects during the RAFT polymerization is explored, and various block copolymer nano‐objects such as nanospheres, worms, vesicles and large‐compound‐micelle‐like particles are prepared. The parameters such as the chemical composition in the brush macro‐RAFT agent, the chain length of the solvatophobic block, the concentration of the feeding monomer and the solvent character affecting the size and morphology of the block copolymer nano‐objects are investigated. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2013, 51, 3177–3190