Microstructure and growth rate of chemical vapour deposited TiN films in a vertical cold wall reactor

TiN films were grown on SUS304 substrates heated by an induction furnace in a vertical cold wall reactor. Scanning electron microscopy, transmission electron microscopy and X-ray diffraction were used to characterize the microstructures of films obtained at different deposition conditions (temperature, gas flow rate and gas composition). Film structures obtained in the present vertical reactor had the following features compared with those in the tubular reactor: (1) Abnormally grown “star-shaped” crystals were observed on the surfaces of films deposited in the following ranges of total gas flow rate (Q_T), temperature (T) and partial pressures (P): 9.0×10⁻⁶ ≤ Q_T ≤ 1.6×10⁻⁵ m³ s⁻¹, 1223 ≤ T ≤ 1273 K, 0.92 ≤ P_TiCl4 ≤ 6.18 kPa, P_H2 = P_N2. The matrix grains were responsible for (211) preferred orientation. (2) Surface morphologies did not vary so much with P_TiCl4. On the other hand, a drastic change was brought about by adding HCl to the source gas, i.e., plate-shaped crystals dominated and the large “star-shaped” crystals were no longer present. (3) The apparent activation energy for deposition reaction was 230 kJ/mol (1173 ≤ T ≤ 1273 K) and 76.5 kJ/mol (1273 ≤ T ≤ 1373 K) at P_TiCl4 = 2.43 kPa and P_H2 = P_N2 = 49.45 kPa.     

Ionic transport and defect structure of vitreous beryllium fluoride

Vitreous BeF₂ was prepared by two techniques; (1) remelting of a technical grade material, and (2) vacuum distillation/fluoridation. Infrared spectroscopy studies have established that the first material contains about 0.5 wt.% hydroxyl, predicted to be coherently incorporated into the vitreous network as edge-linked [Be(OH)₄]²⁻ units. The distilled BeF₂ is water-free. The dc electrical conductivity of the remelted BeF₂ was measured as σ = (7.9 × 10³/T) exp(−24500 cal/mol/RT) ω⁻¹ cm⁻¹ and for the distilled BeF₂ as σ = (3.0 × 10⁵/T) exp(−36700 cal/mol/RT ω⁻¹ cm⁻¹ at temperatures to 280°C. Ionic transport studies utilizing a dc electrolysis polarization technique with N₂−F₂ and H₂−HF gas electrodes have demonstrated that the fluorine ion is the transport species. A general model for fluorine transport is proposed based upon a modified anti-Frenkel defect model. The difference in the fluorine transport process for the undistilled grade of BeF₂ is seen as a consequence of the anti-Frenkel defect pair interaction with the [Be(OH)₄[²⁻ groupings.     

Optical properties of hydrogenated amorphous silicon films doped with fluorinated gases

Doped amorphous silicon films were prepared by plasma-enhanced chemical vapour deposition of silane and hydrogen mixtures, using phosphorus pentafluoride (PF₅) and boron trifluoride (BF₃) as dopant precursors. The films were studied by UV-vis spectroscopy and their photo and dark conductivity were measured, the latter as a function of temperature. The optical gap of the n-type samples, doped with PF₅, diminished as the concentration of this gas in the plasma was increased. However, the optical gap of p-type samples, doped with BF₃, did not show any appreciable optical gap decrease as the concentration of BF₃ was varied from 0.04% to 4.7%. The dark conductivity of the p-type films at these extremes of the doping range were 7.6 × 10⁻¹⁰ and 3.5 × 10⁻¹ Ω⁻¹ cm⁻¹, respectively.     

Growth and spectral properties of Nd:LaVO4 crystal

This paper reports the growth and spectral properties of 3.5 at% Nd³⁺:LaVO₄ crystal with diameter of 20×15 mm² which has been grown by the Czochralski method. The spectral parameters were calculated based on Judd–Ofelt theory. The intensity parameters Ω_λ are: Ω₂=2.102×10⁻²⁰ cm², Ω₄=3.871×10⁻²⁰ cm², Ω₆=3.235×10⁻²⁰ cm². The radiative lifetime τ_r is 209 μs and calculated fluorescence branch ratios are: β₁(0.88μm)=45.2, β₂(1.06μm)=46.7, β₃(1.34μm)=8.1. The measured fluorescence lifetime τ_f is 137 μm and the quantum efficiency η is 65.6%. The absorption band at 808 nm wavelength has an FWHM of 20 nm. The absorption and emission cross sections are 3×10⁻²⁰ and 6.13×10⁻²⁰ cm², respectively.     

Growth and properties of (Pb0.90La0.10)TiO3 thick films prepared by RF magnetron sputtering with a PbO buffer layer

The (Pb_0.90La_0.10)TiO₃ [PLT] thick films (3.0 μm) with a PbO buffer layer were deposited on the Pt(1 1 1)/Ti/SiO₂/Si(1 0 0) substrates by RF magnetron sputtering method. The PLT thick films comprise five periodicities, the layer thicknesses of (Pb_0.90La_0.10)TiO₃ and PbO in one periodicity are fixed. The PbO buffer layer improves the phase purity and electrical properties of the PLT thick films. The microstructure and electrical properties of the PLT thick films with a PbO buffer layer were studied. The PLT thick films with a PbO buffer layer possess good electrical properties with the remnant polarization (P_r=2.40 μC cm⁻²), coercive field (E_c=18.2 kV cm⁻¹), dielectric constant (ε_r=139) and dielectric loss (tan δ=0.0206) at 1 kHz, and pyroelectric coefficient (9.20×10⁻⁹ C cm⁻² K⁻¹). The result shows the PLT thick film with a PbO buffer layer is a good candidate for pyroelectric detector.     

Boron-doped a-SiOx:H films prepared by photo-CVD technique

The optoelectronic and structural properties of p-type a-SiO_x:H films have been studied. The deposition parameters e.g. chamber pressure and diborane to silane ratio are optimized to get a film with dark conductivity (σ_d) 7.9×10⁻⁶ S cm⁻¹ and photoconductivity 9.3×10⁻⁶ S cm⁻¹ for an optical gap (E₀₄) of 1.94 eV. The decrease of optical gap accompanied by the increase of conductivity is due to less oxygen incorporation in the film, which is substantiated by the decrease of the intensity of SiO absorption spectra. The properties are very much effected by the chamber pressure and diborane to silane ratio.     

Surface diffusion kinetics of GaAs and AlAs metalorganic vapor-phase epitaxy

We have investigated the surface kinetics during metalorganic vapor-phase epitaxy (MOVPE), using high-vacuum scanning tunneling microscopy (STM) observation of two-dimensional (2D) nuclei and denuded zones. Using Monte Carlo simulations based on the solid-on-solid model, from 2D nucleus densities we estimated the surface diffusion coefficients of GaAs and AlAs to be 2 × 10⁻⁶ and 1.5 × 10⁻⁷ cm²/s at 530°C, and the energy barriers for migration to be 0.62 and 0.8 eV, respectively. The 2D nucleus size in the [110] direction was about two times larger than that in the [ 10] direction. The size anisotropy is caused primarily by a difference in the lateral sticking probability (P_s) between steps along the [ 10] direction (A steps) and steps along the [110] direction (B steps). The P_s ratio was estimated to be more than 3:1. Denuded zone widths on upper terraces were 2 ± 0.5 times wider than those on lower terraces. This showed that P_s at descending steps was 10 to 3 × 10² times larger than P_s at ascending steps.     

Monte Carlo simulations of Meyer-Neldel effect on carrier time-of-flight in a-Si:H

We present Monte Carlo simulations of multiple-trapping transport with Meyer-Neldel effect in a-Si:H assuming exponential band tails. The transit time t_T, and the dispersion parameters, ₁ and ₂, before and after the transit time, are extracted from the simulated currents. The simulations show that including the Meyer-Neldel effect improves the agreement of ₁ and ₂ with experimental data, both at low and high temperatures and fits the time-of-flight drift mobility measurements. Best fits to the data yield T₀ = 263 K, T_{MN = 464 K}, v₀₀ = 5 × 10⁹ s⁻¹ and μ₀ = 4 cm² V⁻¹ s⁻¹ for electrons and T₀ = 409 K, T_{MN = 809 K}, v₀₀ = 6.5 × 10¹⁰ s⁻¹ and μ₀ = 0.5 cm² V⁻¹ for holes.     

Li conductivity in lithium niobate: silica glasses

Glasses of composition 65 mol% LiNbO₃:: 35 mol% SiO₂ have been shown to be Li⁺ ion conductors with a conductivity at 200°C > 1 × 10⁻⁵ (η cm)⁻¹ and an activation energy of 0.54 eV. The addition of approximately 0.1 mol% Fe₂O₃ leads to an enhancement of conductivity to ≈10⁻³ (η cm)⁻¹ at 200°C and an activation energy of 0.67 eV. The effect of Fe is shown to be in the control of microstructure in the glass, with Fe₂O₃ concentrations < 1 mol% acting as a grain growth inhibitors and larger concentrations acting as a nucleating agents. A model for this process based on the expected stoichiometry of the melt and the effect of Fe²⁺ and Fe³⁺ in charge compensation is in excellent agreement with experimental data from electron spin resonance.     

Heavily carbon-doped p-type (In)GaAs grown by gas-source molecular beam epitaxy using diiodomethane

Heavily carbon-doped p-type In_xGa_1−xAs (0≤x<0.49) was successfully grown by gas-source molecular beam epitaxy using diiodomethane (CH₂I₂), triethylindium (TEIn), triethylgallium (TEGa) and AsH₃. Hole concentrations as high as 2.1×10²⁰ cm⁻³ were achieved in GaAs at an electrical activation efficiency of 100%. For In_xGa_1−xAs, both the hole and the atomic carbon concentrations gradually decreased as the InAs mole fraction, x, increased from 0.41 to 0.49. Hole concentrations of 5.1×10¹⁸ and 1.5×10¹⁹ cm⁻³ for x = 0.49 and x = 0.41, respectively, were obtained by a preliminary experiment. After post-growth annealing (500°C, 5 min under As₄ pressure), the hole concentration increased to 6.2×10¹⁸ cm⁻³ for x = 0.49, probably due to the activation of hydrogen-passivated carbon accepters.     

Density and surface tension of molten calcium fluoride

The density and the surface tension of molten calcium fluoride have been measured in the temperature range from 1690 to 1790 K by an improved Archimedian method and a ring depressing technique (J. Crystal Growth 187 (1998) 391), respectively. The ring depressing technique was demonstrated as an effective technique to measure the surface tension in comparison with the conventional ring pulling technique. The density varied with the temperature change corresponding to a linear relationship: ρ=3.767−6.94×10⁻⁴T (K). The density of the CaF₂ melt at the melting point is 2.594 g/cm³, which is equal to the result obtained by Shiraishi and Watanabe (Bull. Res. Inst. Miner. Dressing Metal, Tohoku Univ. 34 (1978) 1), but the temperature coefficient of the density is different from the results obtained by other investigators. The thermal expansion coefficient of calcium fluoride melt linearly increases with temperature heating. The surface tension of molten calcium fluoride indicates a negative linear relationship as a function of the melt temperature: γ(T)=442.4−0.0816×T(K) (mN/m). The surface tension measured using the ring depressing technique is larger than those results obtained by other techniques.     

Growth and spectral properties of Nd-doped Sr3Y(BO3)3 crystal

A new crystal of Nd³⁺:Sr₃Y(BO₃)₃ with dimension up to 25×35 mm² was grown by Czochralski method. Absorption and emission spectra of Nd³⁺: Sr₃Y(BO₃)₃ were investigated . The absorption band at 807 nm has a FWHM of 18 nm. The absorption and emission cross sections are 2.17×10⁻²⁰ cm² at 807 nm and 1.88×10⁻¹⁹ cm² at 1060 nm, respectively. The luminescence lifetime τ_f is 73 μs at room temperature     

On the mechanism of electrical relaxation in Na-conductive phosphate glasses

The crossover from a frequency independent to a frequency dependent ac response has been studied in glasses with the composition 37.2Na₂O-12.8CaO₅ · 50P₂O₅ and 30Na₂O-5CaO-7.5Al₂O₃-57.5P₂O₅ (mol%) containing 5 × 10⁻³ ≤ mol% Ag₂O ≤ 5 × 10⁻¹. Recently, we have established that in these glasses the diffusion coefficient of guest silver ions varies in space. In this case, as a first approximation, the diffusion coefficient may be considered as a constant within regions whose size is no less than 10 nm across. We assume that the diffusion of sodium ions can be given by the D(r) coefficient with the same spatial dispersion as that of silver ions. It is demonstrated that the frequency dependence of ac response is in fair agreement with the assumption.     

Photoassisted growth and nitrogen doping of ZnSe

ZnSe was grown on GaAs(100) substrates by photoassisted MOVPE using the precursors dimethylzinc-triethylamine (DMZn-TEN) and ditertiarybutylselenide (DtBSe). The optimal growth temperature was T_g = 300°C. Above 300°C no enhancement of growth rate was observed under illumination. Furthermore, nitrogen doping experiments were performed using phenylhydrazine, allylamine and tert-butylamine as nitrogen precursors. Nitrogen concentrations up to 10¹⁹ cm⁻³ (SIMS) were achieved with input flow ratios as low as [PhHz]/[Se] = 4 × 10⁻⁴. All as-grown samples were highly compensated. Successful nitrogen incorporation was also observed with allylamine. However, the use of tert-butylamine together with the adduct compound DMZn-TEN showed no incorporation of nitrogen.     

Oscillator strength of the infrared absorption band near 1080 cm in SiO2 films

It has been well known that the absorption maximum of the peak near 1080 cm⁻¹ in amorphous SiO₂ films shifts continuously with variation of thickness and properties such as stress. This is a first report on the oscillator strength of the absorption against frequency at the absorption maximum. SiO₂ films on silicon wafers were prepared by thermal growth in either dry O₂ or an O₂/H₂ mixture or liquid-phase deposition in HF saturated with silica gel. The oscillator strength continuously decreased from 1×10⁻⁴ down to 1×10⁻⁵ with the frequency shift from 1099 to 1063 cm⁻¹.     

Heavily carbon-doped p-type InGaAs by MOMBE

Carbon-doped In_xGa_1−xAs layers (x=0−0.96) were grown by metalorganic molecular beam epitaxy (MOMBE) using trimethylgallium (TMG), solid arsenic (As₄) and solid indium (In) as sources of Ga, As and In, respectively. The carrier concentration is strongly affected by growth temperature and indium beam flux. Heavy p-type doping is obtained for smaller In compositions. The hole concentration decreases with the indium composition from 0 to 0.8, and then the conductivity type changes from p to n at x=0.8. Hole concentrations of 1.0×10¹⁹ and 1.2×10¹⁸ cm^-3 are obtained for x=0.3 and 0.54, respectively. These values are significantly higher than those reported on carbon-doped In_xGa_1−xAs by MBE. Preliminary results on carbon-doped GaAs/In_xGa_1−xAs strained layer superlattices are also discussed.     

Influence of oxygen contamination during Si low presure vapour phase epitaxy on epitaxial layer quality

The influence of oxygen contamination on Si low pressure vapour phase epitaxy (LPVPE) at 800°C in the SiCl₂H₂−H₂ system has been investigated. O₂ was added intentionally with partial pressures between 10⁻⁸ and 2×10⁻⁴ mbar. The quality of the epitaxially grown silicon layers was determined by comparing surface morphology, defect density, Schottky diode characteristics and SIMS measurements. These four parameters are correlated and they reveal a drastic decrease in epitaxial layer quality for O₂ pressures above 15×10⁻⁶ mbar. The critical oxygen pressure which has been until now considered as a limit for epitaxial growth can therefore be exceeded by one order of magnitude.     

Ion-implanted treatment of (Ba,Sr)TiO3 films for DRAM applications

The effects of ion implantation on the properties of spin-on sol–gel Ba_0.7Sr_0.3TiO₃ (BST) thin films were studied by implanted Ar⁺, N⁺, and F⁺ doses. The F⁺-implanted BST samples present leakage current density <10⁻⁶ A/cm² at 2.5 V and dielectric constant 450. The leakage current of F⁺-implanted BST samples was reduced about one order of magnitude as compared with that of samples with implanted Ar⁺, N⁺ or without implantation. The thickness shrinkage from 135 to 115 nm was observed in F⁺-implanted BST films (before annealing treatment) and a respective increase in the refractive index from 1.84 to 2.05 was measured. After annealing the implanted samples, the changes of thickness and refractive index depend on the concentration of implanted dose. Based on an infrared transmission study of the samples we suggest that the ion-implanted samples with smaller dose (5×10¹⁴ cm⁻²) have fewer −OH contaminants than the non-implanted or implanted samples with the larger doses (1×10¹⁵ cm⁻²). Based on the results presented, we conclude that suitable ion implantation densifies the spin-on sol–gel BST films and reduces the −OH contaminants in the films.     

Water and the glass transition temperature of silicate melts

Literature data on the effect of water on the glass transition in silicate melts are gathered for a broad range of total water content c_w from 3 × 10⁻⁴ to 27 wt%. In terms of a reduced glass transition temperature T_g^*=T_g/T_g^GN, where T_g^GN is T_g of the melt containing c_w≈0.02 wt% total water, a uniform dependence of T_g^* on total water content (c_w) is evident for silicate melts. T_g^* decreases steadily with increasing water content, most strongly at the lowest water content where H₂O is dominantly dissolved as OH. For water-rich melts, the variation of T_g^* is less pronounced, but it does not vanish even at the largest water contents reported (≈27 wt%). T_g^* vs. c_w is fitted by a three-component model. This approach accounts for different transition temperatures of the dry glass, hydroxyl and molecular water predicting T_g^* as a weighted linear combination of these temperatures. The required but mostly unknown water speciation in the glasses was estimated using IR-spectroscopy data for hydrous sodium trisilicate and rhyolite.     

Dynamical properties of an alkali chloride mixture in the glassy and liquid states

Molecular dynamics calculations have been carried out to reveal the dynamical properties of an alkali chloride mixture (50 mol% LiCl---40KCl---10CsCl) and pure LiCl in the liquid and glassy states. It is found that the mobility of Li⁺ ions in the mixture is significantly lower than that in LiCl, not only in liquid state but also in the glassy state. The partial dynamic structure factors, S_Li---Li (Q, ω) and S_{Cl---Cl (Q, ω)}, are evaluated to investigate the dynamical correlation between the Li⁺ and Cl⁻ ions. In LiCl glass, it is shown that the motions of the Li⁺ and Cl⁻ ions are highly correlated with each other, and both the acoustic and optic modes are spatially delocalized (Q < 1.8 Å⁻¹). On the other hand, in the mixture glass, the motion of the Li⁺ ions is almost independent of that of the Cl⁻ ions, and at small wavelengths there are the intense vibrations localized on single Li⁺ ions similar to an Einstein oscillation.