Energy transfer under impact load studied by molecular dynamics simulation

The process of amorphous silica clusters impact on a crystal silicon substrate is studied by molecular dynamics simulation, focusing on the energy transfer between clusters and the substrate under different impact conditions such as cluster size, impact velocity, and incidence angle. The impact process is divided into cluster deformation stage, cluster resilience stage, and cluster rebound stage according to the courses of energy change during the impact process. The simulation elucidates that the time of impact process of every cluster is only related to cluster size and is independent of impact velocity and incidence angle. The translational energy loss of the cluster and the potential energy increment of the substrate during cluster deformation stage, and the dissipation energy of system are independent of cluster size under the same impact energy and incidence angle. And the translational energy loss of the cluster during cluster rebound stage changes from energy absorption to energy release after the incidence angle becomes more than 60°. The rotational energy of the cluster may be omitted when the incidence angle is less than 15°. The ratios of the rotational energy increment of the cluster, the kinetic energy increment, and the potential energy increment of the substrate to the translational energy loss of the cluster are obviously influenced by impact conditions. And the ratios of the increment of the other categories of energy to the translational energy loss of the cluster are not sensitive to impact conditions.     

Hyperthermal cluster-surface scattering

Using molecular-dynamics simulation, we study the processes occurring after impact of clusters on a rigid wall. Comparing the impact of model clusters consisting of 13 atoms, or of 13 diatomic molecules with varied bond strength, the systematics in the results of the collision process are investigated. Four regimes of impact-induced cluster fragmentation are identified: intact reflection, shattering into large fragments, complete fragmentation, and molecule dissociation. The effect of the number of degrees of freedom activated in the collision on the translational and internal energies of the reflected fragments is discussed in detail. As a rule, with increasing number of degrees of freedom which can be activated in the collision, the translational energy sinks. On the other hand, for weak intramolecular bonding, intramolecular vibrations are easily excited at small impact energies, reducing the resulting translational energy. The presence of even a very weak attractive well epsilon_w at the surface has a major influence on the sticking behavior of the clusters — and hence also on the absolute reflected energies — even at impact energies E₀ ≫ epsilon_w.     

Hyperthermal surface-collisions of water cluster cations

Size-selected, protonated water cluster cations (H₂O)_nH⁺, 4 n 32, are scattered at normal incidence from the surface of a diamond-coated silicon wafer at collision energies 0 E _coll 500 eV. The size distribution of collision-induced fragment-ions and the ion yield of scattered particles are analyzed, using a secondary time-of-flight mass spectrometer, as a function of the cluster size, n, and the collision energy, E _coll. Even at low impact energies only very small fragment-ions can be detected, with a maximum fragment size of 35% of the colliding parent cluster ions. For clusters consisting of more than 10 molecules, the protonated water dimer (H₂O)₂H⁺ becomes the predominant fragment-ion. The total charge survival yield obeys a nonlinear increase with cluster size; for the largest clusters investigated, more than 35% of the impacting ions survive the surface collision in the cationic charge state.     

Dynamics of cluster deposition on Ar surface

Using a combined quantum mechanical/classical method, we study the dynamics of deposition of small Na clusters on Ar(001) surface. We work out basic mechanisms by systematic variation of substrate activity, impact energy, cluster orientations, cluster sizes, and charges. The soft Ar material is found to serve as an extremely efficient shock absorber which provides cluster capture in a broad range of impact energies. Reflection is only observed in combination with destruction of the substrate. The kinetic energy of the impinging cluster is rapidly transfered at first impact. The distribution of the collision energy over the substrate proceeds very fast with velocity of sound. The full thermalization of ionic and atomic energies goes at a much slower pace with times of several ps. Charged clusters are found to have a much stronger interface interaction and thus get in significantly closer contact with the surface.     

Isomerization and dissociation of small (CH <Emphasis Type="Bold">3</Emphasis>CN) <Emphasis Type="Bold">n</Emphasis> molecular clusters: a computational study

The isomerization and evaporation processes in the neutral homogeneous (CH₃CN)_n molecular clusters (n = 2-7) have been investigated using classical molecular dynamics simulations. The evaporation rate constants and the kinetic energy release in the dissociation have been analysed as a function of the cluster size and as a function of the internal energy in the parent cluster. The competition between monomer and dimer ejections has been also carefully studied. All the dynamical properties in these dissociative processes have been discussed in relation to the static properties of the clusters involved in the dissociation and also in relation to the solid-liquid like transition which appears in these homogeneous molecular clusters. Received 19 November 2002 / Received in final form 5 February 2003 Published online 29 April 2003 RID="a" ID="a"e-mail: pascal.parneix@ppm.u-psud.fr RID="b" ID="b"Laboratoire associé à l'université Paris-Sud.     

几何构型不同的Na团簇碰撞动力学研究

采用距离相关紧密束缚的分子动力学模型,在不同碰撞能量以及不同的碰撞参数下,研究了两种构型的Na6(2D),Na6(3D)与Na8团簇间的碰撞.讨论了反应机制的变化,即全融合、深度非弹、非弹性碰撞过程.结果表明:构型不同的团簇与相同的靶碰撞显示了不同的特征.低能时Na6(3D)易融合;DIC反应时,易于形成大的团簇 关键词： Na团簇 原子团簇碰撞 紧束缚模型     

Electron-cluster interactions

Beam depletion spectroscopy has been used to measure absolute total inelastic electron-sodium cluster collision cross sections in the energy range fromE0.1 toE6 eV. The investigation focused on the closed shell clusters Na₈, Na₂₀, and Na₄₀. The measured cross sections show an increase for the lowest collision energies where electron attachment is the primary scattering channel. The electron attachment cross section can be understood in terms of Langevin scattering, connecting this measurement with the polarizability of the cluster. For energies above the dissociation energy the measured electron-cluster cross section is energy independent, thus defining an electron-cluster interaction range. This interaction range increases with the cluster size.     

Processes involved in the formation of silver clusters on silicon surface

We analyze scanning electron microscopy measurements for structures formed in the deposition of solid silver clusters onto a silicon(100) substrate and consider theoretical models of cluster evolution onto a surface as a result of diffusion and formation of aggregates of merged clusters. Scanning electron microscopy (SEM) data are presented in addition to energy dispersive X-ray spectrometry (EDX) measurements of the these films. Solid silver clusters are produced by a DC magnetron sputtering source with a quadrupole filter for selection of cluster sizes (4.1 and 5.6 nm or 1900 and 5000 atoms per cluster in this experiment); the energy of cluster deposition is 0.7 eV/atom. Rapid thermal annealing of the grown films allows analysis of their behavior at high temperatures. The results exhibit formation of cluster aggregates via the diffusion of deposited solid clusters along the surface; an aggregate consists of up to hundreds of individual clusters. This process is essentially described by the diffusion-limited aggregation (DLA) model, and thus a grown porous film consists of cluster aggregates joined by bridges. Subsequent annealing of this film leads to its melting at temperatures lower than to the melting point of bulk silver. Analysis of evaporation of this film at higher temperatures gives a binding energy in bulk silver of ɛ₀= (2.74 ± 0.03) eV/atom. The text was submitted by the authors in English.     

Cluster–surface interaction studied by time-resolved two-photon photoemission

n ⁺ clusters (n=2-9)deposited onto highly oriented pyrolytic graphite (HOPG) substrates at liquid nitrogen temperatures. The deposition was carried out with variable kinetic energies of the clusters. Clusters deposited with high kinetic energy (up to 60 eV/cluster) become fragmented upon impact. For low deposition energies (1–4 eV/cluster) the size dependence of the photoelectron spectra reveals a pronounced odd/even effect, which is well known for gas phase silver clusters. This indicates that the soft deposited clusters retain their size and identity on the sample. The phase of the odd/even effect suggests that transient negatively charged cluster ions serve as an intermediate step in the two-photon photoemission process. The lifetime of the anions rises with cluster size. This is attributed to an increasing electronic density of states for larger clusters. Received: 26 October 1998 / Revised version: 16 December 1998     

Coarsening of mass-selected Au clusters on amorphous carbon at room temperature

Low-energy cluster beam deposition was used to deposit mass-selected Au_n clusters (n = 4, 6, 13 and 20) on amorphous carbon (a-C) substrates. The resulting samples were stored at room temperature under ambient conditions for time periods up to 32 months to analyze the coarsening behaviour of the clusters. Cluster-size distributions were measured in regular time intervals by transmission electron microscopy (TEM). The TEM experiments show a significant increase of the average cluster size with time analogous to classical surface Ostwald ripening (OR). The coarsening of Au clusters can be well described by steady-state diffusion-limited kinetics. The derived surface mass-transport diffusion coefficients at room temperature range between 1.1 and 3.8·10⁻²⁵ m² s⁻¹ for our samples. A detailed analysis of values suggests that, the rate of the surface OR for mass-selected Au_n clusters increases with the cluster size in the sequence: Au₄ ≈ Au₆ < Au₁₃ < Au₂₀ for the investigated range of Au clusters. Given that the initial, on-surface cluster-size distributions are nominally monodisperse, classical OR with cluster coarsening based only on the Gibbs-Thomson effect cannot explain the observed coarsening. The activation of the coarsening process is rationalized by initial variations of the cluster sizes due to the deposition process itself and/or the interaction of the clusters with the substrate. Moreover, the presence of initial deposited Au clusters as different isomers with slightly different chemical potential on the substrate, may also initiate the coarsening by surface OR. Furthermore, we find that the coarsening is most pronounced for the paucidispersed sample with Au_m (10 ? m ? 20) clusters. A possible explanation of this behaviour is the presence of an initial distribution of different cluster sizes directly after deposition.     

Simulation on the Effect of Brownian Motion on Nanoparticle Trajectories in a Pulsed Microplasma Cluster Source

We describe a simulation of the nanoparticle trajectories in a pulsed cluster beam source. Clusters, formed by condensation of atomic vapor in a helium bath, and considered here as rigid spheres having a diameter of 1.5nm, were tracked during their travel inside the source cavity, an aerodynamic lens, and a cylindrical nozzle. Steady state supersonic laminar flow of helium is considered in an axi-symmetric geometry aiming to simulate, within some limitations, the conditions under which cluster formation takes place in a pulsed microplasma cluster source. In spite of the unsteady nature of the pulsed source, the time scale characterizing particle motion in the flow field is significantly smaller than the characteristic time constant for the evolution of gas pressure in the source. For this reason, a steady simulation can shed some light on the understanding of processes governing nanoparticle motion in a pulsed vaporization source. The extent to which the Brownian diffusion can affect the particle extraction from the source is investigated. Simulations have shown that the Brownian motion perturbs the clusters from the trajectories dictated by the carrier gas and increases the rate of cluster deposition on the source internal walls. However, it does not hinder the aerodynamic focalization produced by the lens even in nano-size cluster regime. This result is qualitatively confirmed by experiment.     

Cooling efficiency in collisions between Pd and He,Ne, Ar and Kr

The cooling of the metal cluster Pd₁₃ in an atmosphere of rare gas has been studied by means of computer simulation. By simulation, the average energy transfer in collisions between one cluster and one gas atom has been obtained. Emphasis has been placed on conditions when the temperatures of the colliding species are almost equal. All modes of motion, inclusive the translation, must be considered in order to obtain vanishing energy transfer at equilibrium. A simulation scheme is presented by which the energy transfer is zero to the cluster when the gas and the cluster temperatures are equal. At equilibrium the energy transfer does however not vanish for all impact parameters. In the collisions with Pd₁₃, the cluster is heated by collisions with a small impact parameter but equally cooled by collisions with a large impact parameter. Argon and krypton are found to cool Pd₁₃ equally efficiently while neon and helium are less efficient cooling agents. Received 28 September 2001 / Received in final form 8 August 2002 Published online 12 November 2002 RID="a" ID="a"e-mail: JanW@phc.gu.se     

Conversion between kinetic energy and potential energy in the classical nonlocal Boltzmann equation

An important property of the classical Boltzmann equation is that kinetic energy is conserved. This is closely connected to the fact that the Boltzmann equation describes the nonequilibrium properties of an ideal gas. Generalizations of the Boltzmann equation to higher density involve, among other things, allowing the colliding particles to be at different positions. This spatial nonlocality is known to contribute to the density corrections of gas transport properties. For soft potentials such a spatial separation of the particles also leads to a conversion between kinetic and potential energy. In evaluating these effects the classical dynamics of the whole collision trajectory must be taken into account, involving also the time for the collision process. The resulting time nonlocality has usually been reinterpreted in terms of a spatial nonlocality. However, for a homogeneous system this is not possible and only the time nonlocality remains, this then being responsible for the conversion between kinetic and potential energy. This paper aims to clarify these properties of the nonlocal corrections to the classical mechanical Boltzmann collision term. Comments on the corresponding problem for the quantum Boltzmann equation are also made.     

低能Pt原子团簇沉积过程的分子动力学模拟

利用分子动力学模拟系统研究了低能Pt38,Pt141和Pt266原子团簇与Pt(001)表面的相互作用过程,详细分析了初始原子平均动能为0.1,1.0和10eV的原子团簇的沉积演化过程及其对基体表面形貌的影响.研究表明,初始原子平均动能是描述低能原子团簇的重要参量.当团簇的平均原子动能较低时,团簇对基体表层原子点阵损伤较小,基本属于沉积团簇;随着入射团簇的原子平均动能的增加,团簇对表层原子点阵结构的破坏能力增强,当团簇的原子平均动能增加到10eV时,团簇已经显现出注入特征.低能原子团簇对基体表面形貌的影响 关键词： 分子动力学模拟 低能原子团簇 载能沉积     

Low pressure chemical vapor deposition of niobium coating on silicon carbide

Nb coatings were prepared on a SiC substrate by low pressure chemical vapor deposition using NbCl₅. Thermodynamic calculations were performed to study the effect of temperature and partial pressure of NbCl₅ on the final products. The as-deposited coatings were characterized by scanning electron microscopy, X-ray diffraction, and energy dispersive spectroscopy. The Nb coatings are oriented and grow in the preferred (2 0 0) plane and (2 1 1) plane, at 1173 K and 1223-1423 K, respectively. At 1123-1273 K, the deposition is controlled by the surface kinetic processes. The activation energy is found to be 133 kJ/mol. At 1273-1373 K, the deposition is controlled by the mass transport processes. The activation energy is found to be 46 kJ/mol. The growth mechanism of the chemical vapor deposited Nb is also discussed based on the morphologies and the deposition rates.     

VUV-photoelectron spectroscopy on lead clusters deposited from the pulsed arc cluster ion source (PACIS)

Lead clusters grown in a pulsed arc cluster ion source (PACIS) are soft-landed under UHV conditions on cooled polycrystalline silver targets. VUV-photoelectron spectroscopy with light from the synchrotron BESSY applied to mass-selected clusters on cold (160 K) substrates shows that the Pb 5d core level binding energies depend on cluster size and-only beyond a critical amount of deposited clusters-on the coverage . A decreasing particle size induces a core level shift towards lower binding energy with respect to the bulk value, the maximum shift being –0.33 eV. The same value is achieved by atom deposition and can be explained by a Born-Haber cycle. The limits for small two-dimensional and large three-dimensional clusters will qualitatively be discussed by the same model. Deposition on a warm substrate, however, leads-at least for small systems-to a gradual line shift with .     

Molecular dynamics simulation of Pt on a vitreous silica surface

The molecular dynamics (MD) computer simulation technique was used to simulate the deposition and cluster growth processes of Pt on a vitreous silica surface. Using a combination of a modified Born-Mayer-Huggins potential (for the substrate) and a Lennard-Jones potential (for the adatoms), the structural features of clusters resulting from four different deposition processes were analyzed and compared to EXAFS results of a similar system. Two of the four deposition processes allowed cluster growth with little interaction with the substrate (by physical separation) and showed comparable results to the EXAFS data. In the two remaining deposition processes, cluster formation occuring with increasing interaction with the substrate resulted in smaller, less three-dimensional particles. This result is in accordance with experimental and theoretical calculations suggesting limited mobility of metal atoms to diffuse once in contract with the amorphous surface.     

SIMULATION OF MULTIPLE FRACTAL AND COMPACT GROWTH OF ULTRA-THIN FILMS ON HEXAGONAL SUBSTRATE

The multiple cluster growth of ultra-thin films with different deposition rate and different substrate temperature has been studied by kinetic Monte-Carlo simulation. With increasing diffusion rate along cluster edges (corresponding to an increasing substrate temperature), pattern structures change smoothly from fractal islands, compact islands with random shapes, to regular islands, and the average branch width of clusters increases continuously up to some constant value in the compact island limit. The formation of the multiple fractal and compact clusters can be described quantitatively by multifractal. The results of multifractal analysis show that with pattern change from fractal to compact islands, the Hausdorff dimension D₀, the information dimension D₁, and the correlation dimension D₂ decrease, while the width and height of the multifractal spectra increase.     

The Effect of Substrate Temperature on the Properties of Nanostructured Silicon Carbide Films Deposited by Hypersonic Plasma Particle Deposition

Nanostructured silicon carbide films have been deposited on molybdenum substrates by hypersonic plasma particle deposition. In this process a thermal plasma with injected reactants (SiCl₄ and CH₄) is expanded through a nozzle leading to the nucleation of ultrafine particles. Particles entrained in the supersonic flow are then inertially deposited in vacuum onto a temperature-controlled substrate, leading to the formation of a consolidated film. In the experiments reported, the deposition substrate temperature T_s has ranged from 250°C to 700°C, and the effect of T_s on film morphology, composition, and mechanical properties has been studied. Examination of the films by scanning electron microscopy has shown that the grain sizes in the films did not vary significantly with T_s. Micro-X-ray diffraction analysis of the deposits has shown that amorphous films are deposited at low T_s, while crystalline films are formed at high T_s. Rutherford backscattering spectrometry has indicated that the films are largely stoichiometric silicon carbide with small amounts of chlorine. The chlorine content decreases from 8% to 1.5% when the deposition temperature is raised from 450°C to 700°C. Nanoindentation and microindentation tests have been performed on as-deposited films to measure hardness, Young's modulus and to evaluate adhesion strength. The tests show that film adhesion, hardness and Young's modulus increase with increasing T_s. These results taken together demonstrate that in HPPD, as in vapor deposition processes, the substrate temperature may be used to control film properties, and that better quality films are obtained at higher substrate temperatures, i.e. T_s700°C.     

Evaluation of copper Chemical-Vapor-Deposition films on glass and Si(100) substrates

Thin films of pure copper have been deposited on glass and Si(100) substrates using copper acetylacetonate [Cu(acac)₂] and copper HexaFluoroAcetylacetonate [Cu(HFA)₂] sources. A thermal, cold-wall, reduced pressure (3325–5985 Pa) Metal-Organic Chemical Vapor Deposition (MOCVD) process was employed. The effect of H₂O vapor on the grain size, deposition rate, and resistivity was examined. Electrical resistivities of 2.4 cm for copper films deposited on Si(100) and 3.44 cm for copper films deposited on glass at substrate temperatures of 265° C and a [Cu(acac)₂] source temperature of 147° C with the use of H₂O vapor were measured. When [Cu(HFA)₂] was used, the substrate temperature was 385° C and the source temperature was 85° C. An activation energy for the copper film deposition process was calculated to be 22.2 kJ/mol in the case of the [Cu(acac)₂] source. A deposition rate of 11 nm/min was obtained with Cu(acac)₂ as the source and the rate was 44.4 nm/min with the Cu(HFA)₂ source; both were obtained with the use of H₂O vapor. No selectivity was observed with either source for either substrate. The deposited films were fully characterized using XRD, LVSEM, SAXPS, and RBS.