Fabrication and characterization of three-dimensional metallodielectric photonic crystals for infrared spectral region

We propose a technique for the realization of three-dimensional metallodielectric photonic crystals based on fabricating polymeric structures using the interference lithography followed by the magnetron deposition of a gold nanolayer. The infrared reflectance spectra of the fabricated photonic crystals are studied. The spectrometry and finite-difference time-domain modeling data show that there is a photonic band gap centered at the wavelength approximately equal to the photonic crystal period.     

大面积金纳米线光栅的制备

利用激光干涉光刻和金纳米颗粒胶体溶液制备了宽度在100 nm以下且总面积达到平方厘米量级的金纳米线光栅结构.制备过程中,首先在表面镀有厚度约为200 nm的铟锡氧化物薄膜的面积为1 cm×1 cm的玻璃基片表面旋涂光刻胶,然后利用紫外激光干涉光刻制备光刻胶纳米光栅结构.有效控制干涉光刻过程中的曝光量、显影时间,获得小占空比的光刻胶光栅.再以光刻胶纳米光栅作为模板,旋涂金纳米颗粒胶体溶液.充分利用金纳米颗粒胶体溶液在光刻胶表面浸润性差的特点,限制旋涂后留存在光刻胶光栅槽中金纳米颗粒的数量,从而达到限制金纳米线宽度的目的.最后在250℃将样品进行退火处理5 min.获得了周期为400 nm且占空比小于1:4的金纳米线光栅结构,其有效面积为1 cm².以波导共振模式与粒子等离子共振模式间耦合作用为特征的光谱学响应特性验证了波导耦合金属光子晶体的成功制备,为小传感体积新型生物传感器的开发提供了性能良好的金属光子晶体芯片.     

Lithography-free fabrication of large-area plasmonic nanostructures using colloidal gold nanoparticles

We report simple and efficient fabrication of large-area gold nanostructures using solution-processible gold nanoparticles, where lithography and vacuum evaporation techniques are not involved in the fabrication processes. These gold nanoisland structures exhibit strong particle plasmon resonance that is characterized by optical extinction spectroscopy in the visible spectral range. The tunability of the optical response is realized by controlling the annealing temperature and by changing the concentration of the colloidal solutions of gold nanoparticles. This enables a low-cost route for exploiting new photonic devices, biosensors, and optoelectronic devices with localized field-enhancement.     

Modified solution-processible fabrication of metallic photonic crystals with template removal

High-temperature annealing and pre-annealing lift-off procedures are employed to improve the solutionproeessible technique for the fabrication of one- （1D） and two-dimensional （2D） metallic photonic crystals （MPCs） based on colloidal gold nanoparticles. This enables the successful fabrication of gold nanowires or nanocylinder array structures with the photoresist template removed completely, which is crucial for the application of MPCs in biosensors and optoelectronic devices. Microscopic measurements show homogeneous 1D and 2D photonic structures with an area as large as 100 mm2. Plasmonic resonance of the gold nanostructures and its coupling with the resonance mode of the planar waveguide underneath the photonic structures are observed, implying the excellent optical properties of this kind of MPCs based on the improved fabrication technique.     

TE0导模干涉刻写周期可调亚波长光栅理论研究

通过棱镜耦合激发非对称金属包覆介质波导结构中的TE₀导波模式, 利用两束TE₀模的干涉从理论上实现了周期可调的亚波长光栅刻写. 分析了TE₀模式的色散关系, 刻写亚波长光栅的周期与激发光源、棱镜折射率、光刻胶薄膜厚度及折射率之间的关系. 用有限元方法数值模拟了金属薄膜、光刻胶薄膜和空气多层结构中TE₀导模的干涉场分布. 研究发现, 激发光源波长越短, TE₀ 模干涉刻写的亚波长光栅周期越小; 光刻胶越厚, 刻写的亚波长光栅周期越小; 高折射率光刻胶有利于更小周期亚波长光栅的刻写. 相较于表面等离子体干涉光刻, 基于TE₀ 模的干涉可在厚光刻胶条件下通过改变激发光源、棱镜折射率、光刻胶材料折射率、特别是光刻胶薄膜的厚度等多种方式实现对亚波长光栅周期的有效调控.     

Fabrication of near infrared metallodielectric photonic crystal using metal-coated dielectric spheres

A metallodielectric photonic crystal with photonic band gaps in near infrared regime has been constructed using layer-by-layer stacking of two-dimensional micro-size metal-coated dielectric spheres array. In transmission spectra two photonic band gaps are observed at 1.38 μm and 2.46 μm, which are in agreement with theoretical calculations. Experimental results show that the photonic band gaps can be realized with about ten layers. The structure with metallic microspheres provides us a novel way for fabrication of near infrared metallic photonic crystals.     

All fourteen Bravais lattices can be formed by interference of four noncoplanar beams

The interference of four noncoplanar beams (IFNB) is analyzed. It is shown that all 14 Bravais lattices can be formed by a holographic method of IFNB. The relationship among the three basis vectors of the lattice that are to be produced, the required wavelength, and the geometric arrangement of the four beams is derived. This analysis may lay the foundation for fabrication of three-dimensional photonic crystals by holographic lithography.     

Three-dimensional woodpile photonic crystal templates for the infrared spectral range

High-quality templates of three-dimensional woodpile photonic crystals are fabricated in photoresist SU-8 by use of femtosecond laser lithography. The samples have smooth surfaces, are mechanically stable, and are resistant to degradation under environmental and chemical influences. Fundamental and higher-order photonic stopgaps are identified in the wavelength range 2.0-8.0 microm. These templates can be used for subsequent infiltration by optically active or high-refractive-index materials.     

Photonic crystals for the visible spectrum by holographic lithography

We describe a general and flexible technique for the fabrication of three-dimensional photonic crystals that is particularly well adapted to the production of structures with the sub-micron periodicity required for applications in the visible optical spectrum. Three-dimensional microstructure is generated by using a four-beam laser interference pattern to expose a thick layer of photoresist. Exposed areas are rendered insoluble; unexposed areas are dissolved away leaving a three-dimensional photonic crystal formed of cross-linked polymer with air-filled voids. The polymeric structure may be used as a template for the production of photonic crystals with higher refractive index contrast. Photonic crystals made of polymer and of TiO₂ have been characterized by scanning electron microscopy and by optical diffraction measurements.     

双尺度织构的激光光刻工艺

搭建了双光束激光干涉光刻系统和激光快速扫描系统。利用干涉光刻系统,实现了不同周期、不同深度、大面积的表面规则光栅织构的构筑。利用激光快速扫描器的二维扫描功能,通过控制激光功率和扫描速度,对曝光量和填充线条间距进行了优化。提出了两种双尺度复合织构的制备方法:一种是在激光快速扫描系统中对抗蚀剂表面分别进行x, y方向的扫描光刻,然后在干涉光刻系统中进行双光束干涉光刻;另一种是在激光干涉光刻系统中进行两次曝光,每次曝光的入射角不同。实验结果表明:这两种方法在制备双尺度复合织构方面具有快速、廉价、操作简易等优点。     

Controlling microscopic and spectroscopic properties of metallic photonic crystals written by interference ablation

The microscopic and spectroscopic properties of the metallic photonic crystals (MPCs) are controlled by adjusting the annealing temperature after the direct writing process using interference ablation. Strong surface tension and possible nano-scale flowability of the molten gold nanoparticles enable reshaping and aspect-ratio adjustment of the gold nanostructures during the annealing processes. This consequently leads to the tuning of the spectroscopic response of localized surface plasmon resonance by changing the annealing temperature, thus enhancing the flexibility and extending the application of the fabrication technique using interference ablation.     

Direct laser writing defects in holographic lithography-created photonic lattices

As a well-established laser fabrication approach, holographic lithography, or multibeam interference patterning, is known for its capability to create long-range ordered large-volume photonic crystals (PhCs) rapidly. Its broad use is, however, hampered by difficulty in inducing artificially designed defects for device functions. We use pinpoint femtosecond laser ablation to remove and two-photon photopolymerization to add desired defective features to obtain photonic acceptors and photonic donors, respectively, in an otherwise complete PhC matrix produced by holographic lithography. The combined use of the two direct laser writing technologies would immediately make holographic lithography a promising industrial tool for PhC manufacture.     

Double-layer fabrication scheme for large-area polymeric photonic crystal membrane on silicon surface by multibeam interference lithography

We report on the fabrication of two-dimensional polymeric photonic crystal membranes on the surface of silicon using visible-light multibeam interference lithography. The structures are created by the interference of three beams of a green laser. A polymer buffer layer doped with a Rhodamine B laser dye, interlaid between the lithography layer and the silicon substrate, suppresses the effects of strong reflection and nonradiative absorption of silicon on the interference pattern. Large-area defect-free photonic crystal membranes are experimentally realized on silicon surface.     

Fabrication of semiconductor-and polymer-based photonic crystals using nanoimprint lithography

The technology of fabricating photonic crystals with the use of nanoimprint lithography is described. One-and two-dimensional photonic crystals are produced by direct extrusion of polymethyl methacrylate by Si moulds obtained via interference lithography and reactive ion etching. The period of 2D photonic crystals, which present a square array of holes, ranges from 270 to 700 nm; the aperture diameter amounts to the half-period of the structure. The holes are round-shaped with even edges. One-dimensional GaAs-based photonic crystals are fabricated by reactive ion etching of GaAs to a depth of 1 μm through a mask formed using nanoimprint lithography. The resulting crystals have a period of 800 nm, a ridge width of 200 nm, and smooth nearly vertical side walls.     

Holographic design of hexagonal photonic crystals of irregular columns with large full band gap

The shape and size of the dielectric columns or particles (“atoms”) of photonic crystals (PhCs) formed by holographic lithography are determined by the isointensity surfaces of the interference field; consequently the PhCs’ photonic band gap (PBG) properties are closely related to their fabrication design. Here we have proposed a new structure of two-dimensional (2-D) hexagonal lattice with irregular columns, which can yield a 2-D complete relative band gap of 24.0% in case of the dielectric columns of ε = 13.6 in air, about 27% increase compared with that of the same lattice with regular triangular columns. This band gap size is among the largest for all the possible 2-D PhCs reported until now. The relationship between band gap properties of resultant structure and the specific fabrication conditions such as structure design and the choice of optimum intensity threshold and filling ratio are systematically discussed. The optical design for making this structure by two exposures is explained. This work may demonstrate the unique feature and advantages of photonic crystals made by holographic method and provide a guideline for their design and experimental fabrication.     

非对称光束干涉制备二维微纳光子结构研究

研究了基于不同偏振组合的非对称4束和5束光干涉制备二维微纳光子结构.通过改变光束的参数组合获得了枝节状、波形状等结构.在非对称光束干涉中,光束的构型和偏振改变了波矢差分布,从而改变晶格形貌和对比度.利用CHP-C感光胶开展了全息光刻实验制备,获得了与模拟一致的光子结构.该研究为制备新颖光子结构提供了有效途径,此类光子结构还可以为制备不同类型的金属点阵结构提供模板,对新型光子器件的制备和应用研究具有一定的促进作用.     

Large-area metallic photonic crystal fabrication with interference lithography and dry etching

Large-area one-dimensional periodic metallic structures were fabricated on a waveguide layer with interference lithography and dry etching. As narrow as 115-nm gold nanowires were obtained with a period of 395 nm, covering a homogeneous area as large as 5 × 5 mm². Extinction measurements demonstrate the strong coupling between waveguide mode and gold-particle plasmon resonance. We demonstrate good agreement with a scattering-matrix theory. The dispersion of the metallic photonic crystals was obtained by angle-resolved measurements. This method represents a simple and low-cost way to fabricate large-area metallic photonic crystals.     

Interference lithography: a powerful tool for fabricating periodic structures

In this review the basic principles of interference lithography (IL) are described. IL is emerging as one of the most powerful yet relatively inexpensive methodologies for creating large‐area patterns with micron‐ to sub‐micron periodicities. N‐dimensional periodic structures (N ≤ 3) can be obtained by interfering (N + 1) non‐coplanar beams in a photoresist. The symmetry and shape of the “unit cell” can be conveniently controlled by varying the intensities, geometries, polarizations, and phases of the beams involved. IL done with shorter wavelength lasers and/or liquid immersion lithography can create features with sub‐50 nm dimensions. Such periodic structures are beginning to find wide use in photonic crystal science, optical telecommunications, data storage, and the integrated circuit industry. Newer innovations such as diffraction element assisted lithography or DEAL and phase‐controlled IL for making two‐dimensional structures are also discussed.     

二维光子晶体的软平板印刷技术制作研究

分析了软平板印刷技术制作二维光子晶体的特点和方法.利用绝缘PDMS模板,采用软平板印刷技术制造了三角晶系结构的二维聚合物光子晶体,采用同样的技术成功制成尺寸为150~500 nm,纵横比达1.25的高密度二维光子晶体.与其他制作技术相比,平板印刷技术具有大尺寸和易于制作的优点.结果表明,制作获得的微结构有很高的保真度.     

光全息制作的变形面心立方结构光子晶体的带隙

四束激光从空气直接入射到平面结构的感光树脂所制备的面心立方结构实际上是一种不但晶格沿[111]方向拉伸,而且其格点也在[111]方向被拉长的变形面心立方结构。在对这种变形面心立方结构的光子晶体的晶格形状及能带分布的研究中,通过利用麻省理工学院的光子晶体能带计算程序计算了各种参量对此变形面心立方结构的蛋白石和反蛋白石的能带分布的影响,发现在一定条件下该结构的蛋白石会出现完全光子带隙。用激光全息聚合法在正胶的环氧树脂中可制作反蛋白石模板,若用此模板制作硅蛋白石,当晶格沿[111]方向拉伸2.1倍和硅的占空比为13.7%时出现最大的带隙宽度。此最大带隙宽度的结构的制作光路是三角锥形光路,对称地环绕中央光束的三束外围激光束之间夹角为54.0°,三束外围激光束与中央激光束夹角为31.6°。