Simulation of surface structural relaxation kinetics in silica glass accelerated by water vapor

It is known that surface structural relaxation of silica glass takes place more rapidly than bulk structural relaxation, especially in the presence of water vapor. The effect of water vapor pressure, heat-treatment temperature and initial fictive temperature on the surface structural relaxation kinetics in silica glasses was investigated by measuring the change of the surface fictive temperature determined from the IR reflection peak shift of silica structural bands. The superimposed component of bulk structural relaxation was subtracted from the measured surface structural relaxation data to isolate the true surface structural relaxation kinetics. The obtained surface structural relaxation data as a function of fictive temperature, heating temperature and water vapor pressure were simulated with a model based on the diffusion equation with time-dependent surface concentration. The simulation model was used to predict the surface structural relaxation kinetics of the optical fiber having a high fictive temperature of ～ 1650 °C at 950 °C under 355 torr of water vapor, and it was confirmed that the present model can simulate surface structural relaxation of the fiber reasonably well.     

The study of removing hydroxyl from silica glass

The removal of hydroxyl from silica glass produced by melting quartz powder under an atmosphere containing hydrogen was investigated. After heat-treatment at the temperature range (700–1200 °C) in nitrogen atmosphere, the effective hydrogen diffusion coefficients were evaluated based on the law of nonsteady-state diffusion. The activation energy obtained is 254 kJ mol⁻¹ for the dehydroxylation process in the heat-treatment temperature range of 700–900 °C, and a different activation energy calculated is 32 kJ mol⁻¹ in the temperature range of 900–1200 °C. The activation energies for the dehydroxylation process at the temperature (700–900 °C) and the higher temperature (900–1200 °C) correspond to the binding energy of SiO–H bond and the activation energy for the diffusion of hydrogen in silica glass respectively, which indicate there is a change of mechanism for dehydroxylation with heat-treatment temperature.     

Size effect on surface structural relaxation kinetics of silica glass sample

It is known that surface structural relaxation takes place more rapidly than bulk structural relaxation, especially in the presence of water vapor. The surface structural relaxation kinetics of the silica glass fiber and plates was compared at 950 °C and the surface structural relaxation kinetics of silica glass fiber was found to be faster than that of the silica glass plate, even though the composition and initial fictive temperatures of the samples were the same. The observed difference of the surface structural relaxation kinetics between silica glass fiber and silica glass plate can be accounted for using a diffusion equation with time-dependent surface concentration. The analysis indicates that there is a general size effect on the surface structural relaxation kinetics, with smaller sized samples exhibiting faster relaxation kinetics.     

Fictive temperature measurement of amorphous SiO2 films by IR method

The structure and properties of amorphous materials, in general, change with their thermal history. This is usually explained using the concept of fictive temperature, i.e., the temperature at which the super-cooled liquid state turned into a glassy state. In earlier studies, a simple IR method was used to determine the fictive temperature of silica glasses, both bulk and fiber. In the present study the applicability of the same technique for thin amorphous silica films on silicon was examined. It was found that the IR absorption as well as reflection peak wavenumber of the silica structural band can be used to determine the fictive temperature of amorphous silica films on silicon with an unknown thermal history. Specifically, IR absorbance spectra of an amorphous silica film of thickness greater than 0.5 μm grown on silicon can be taken before and after etching a thin surface layer of 20–30 nm and the peak wavenumber of the difference signal can be compared with the pre-determined calibration curve to convert the peak wavenumber to the fictive temperature. For a film thicker than ∼2 μm, IR reflection peak wavenumber can be converted directly to the fictive temperature of the film by using the calibration curve.     

Thermal expansion of synthetic fused silica as a function of OH content and fictive temperature

A matrix of synthetic fused silica samples with OH contents from 30 to 1300 ppm and of a fictive temperature from 1000 to 1300 °C has been characterized regarding their thermal expansion with high precision. The thermal expansion increases with fictive temperature and drops with OH content. Although fictive temperature and OH are coupled due to the influence of OH on the relaxation of the network, an independent influence of the OH content on thermal expansion has been observed. This may provide a deeper insight into the impact of impurities incorporated into the fused silica network.     

Mechanism of crystallization of fast fired mullite-based glass–ceramic glazes for floor-tiles

The mechanism of crystallization from a B₂O₃-containing glass, with composition based in the CaO–MgO–Al₂O₃–SiO₂ system, to a glass–ceramic glaze was studied by different techniques. Glass powder pellets were fast heated, simulating current industrial tile processing methods, at several temperatures from 700 to 1200 °C with a 5 min hold. Microstructural study by field emission scanning electron microscopy revealed that a phase separation phenomenon occurred in the glass, which promoted the onset of mullite crystallization at 900 °C. The amount of mullite in the glass heated between 1100 and 1200 °C was around 20 wt%, as determined by Rietveld refinement. The microstructure of the glass–ceramic glaze heated at 1160 °C consisted of interlocked, well-shaped, acicular mullite crystals longer than 4 μm, immersed in a residual glassy phase.     

Influence of thermal and thermoelectric treatments on structure and electric properties of B2O3–Li2O–Nb2O5 glasses

A transparent glass with the composition 60B₂O₃–30Li₂O–10Nb₂O₅ (mol%) was prepared by the melt quenching technique. The glass was heat-treated with and without the application of an external electric field. The as-prepared sample was heat-treated (HT) at 450, 500 and 550 °C and thermoelectric treated (TET) at 500 °C. The following electric fields were used: 50 kV/m and 100 kV/m. Differential thermal analysis (DTA), X-ray diffraction (XRD), scanning electron microscopy (SEM), Raman, dc and ac conductivity, as a function of temperature, were used to investigate the glass and glass-ceramics properties. LiNbO₃ crystals were detected, by XRD, in the 500 °C HT, 550 °C HT and 500 °C TET samples. The presence of an external electric field, during the heat-treatment process, improves the formation of LiNbO₃ nanocrystals at lower temperatures. However, in the 550 °C HT and in the TET samples, Li₂B₄O₇ was also detected. The value of the σ_dc decreases with the rise of the applied field, during the heat-treatment. This behavior can indicate an increase in the fraction of the LiNbO₃ crystallites present in these glass samples. The dc and ac conduction processes show dependence on the number of the ions inserted in the glass as network modifiers.The Raman analysis suggests that the niobium ions are, probably, inserted in the glass matrix as network formers.These results reflect the decisive effect of temperature and electric field applied during the thermoelectric treatment in the structure and electric properties of glass-ceramics.     

In situ crystallization of lithium disilicate glass: Effect of pressure on crystal growth rate

Crystallization of a Li₂O · 2SiO₂ (LS₂) glass subjected to a uniform hydrostatic pressure of 4.5 and 6 GPa was investigated up to a temperature of 750 °C. The density of the compressed glass is ∼2% greater at 4.5 GPa than 1 atm and, depending on the processing temperature, up to 10% greater at 6 GPa. Crystal growth rates investigated as a function of temperature and pressure show that lithium disilicate crystal growth is an order of magnitude slower at 4.5 GPa than 1 atm resulting in a shift of +45 °C (±10 °C) in the growth rate curve at high pressure compared to 1 atm conditions. At 6 GPa lithium disilicate crystallization is suppressed entirely, while a new high pressure lithium metasilicate crystallizes at temperatures 95 °C (±10 °C) higher than those reported for lithium disilicate crystallization at 1 atm. The observed decrease in crystal growth rate with increasing pressure for the lithium disilicate glass up to 750 °C is attributed to an increase in viscosity with pressure associated with fundamental changes in glass structure accommodating densification.     

Relaxation of polaronic charge carriers in lithium manganese spinels

Lithium manganese spinels Li_1+xMn_2−xO₄, 0 ⩽ x ⩽ 0.33, were prepared by wet chemistry technique followed by heat-treatment at 750 °C or 800 °C. Differential scanning calorimetry was used to reveal phase transitions. Electrical properties were studied by impedance spectroscopy. LiMn₂O₄ exhibited phase transition below room temperature. The transition, seen as an exothermic event in DSC and a steep decrease of conductivity upon cooling, was sharp in sample sintered at 800 °C and broadened over a range of temperature in sample sintered at 750 °C. In the low temperature phase of LiMn₂O₄, two relaxations of similar strength were observed in the frequency dependent permittivity. The low frequency process was identified as relaxation of charge carriers since the relaxation frequency followed the same temperature dependence as the dc conductivity. The high frequency process exhibited milder temperature dependence and was attributed to dipolar relaxation in the charge-ordered structure. The dipolar relaxation was barely visible in Li substituted samples, x ⩾ 0.05, which did not undergo structural phases transition. Measurements extended to liquid nitrogen temperature showed gradual lowering of the activation energy of conductivity and relaxation frequencies, behavior typical for phonon-assisted hopping of small polarons.     

PbO–B2O3–SiO2 glass powders with spherical shape prepared by spray pyrolysis

PbO–B₂O₃–SiO₂ glass powders were directly prepared using spray pyrolysis. The powders were spherical and fine-sized. One glass particle was obtained from one droplet by melting the precursors inside a hot wall tubular reactor. The characteristics of these powders were compared with those of the commercial product, which was prepared using the conventional melting process. The spherical powders, which were prepared using spray pyrolysis at 1000 °C, had broad peaks at around 28° in the XRD spectrum. The glass phase was formed during the spray pyrolysis process even within a short residence time of the powders inside the hot wall tubular reactor. The mean size of the prepared glass powders was 1 μm. The dielectric layers formed from the spherical, fine-sized glass powders had a high transparency at firing temperatures above 520 °C. The maximum transparency of the dielectric layer formed from the glass powders obtained from spray pyrolysis was 95.3% at the firing temperature of 560 °C. The dielectric layer formed from the spherical, fine-sized glass powders had a smooth surface and no void inside the dielectric layer.     

Interfacial polarization in piezoelectric fibre–polymer composites

Polymer composites of an epoxy resin matrix filled with PZT fibres were studied by means of dielectric spectroscopy in the frequency range 0.1 Hz to 100 kHz and temperature interval from 80 °C to 170 °C. An interfacial or a Maxwell–Wagner–Sillars relaxation process was revealed in the frequency range between 0.1 Hz and 10 Hz and temperatures above the glass transition. This interfacial relaxation was found to follow the Debye law for the distribution of relaxation times.     

Lead sulfide quantum dots in glasses controlled by silver diffusion

Precipitation of PbS quantum dots (QDs) in silicate glasses controlled by Ag⁺ ion diffusion was investigated. Ag⁺ ions penetrated ~ 0.5 μm into the glass when the glass was immersed in the AgNO₃ solution at 80 °C. Ag nano-particles (NPs) and PbS QDs were formed after heat-treatment at temperatures of 420–460 °C for 10 h. PbS QDs in Ag⁺-diffused regions photoluminesced at longer wavelengths than did those in Ag⁺-free regions. This indicates that PbS QDs thus formed in regions containing Ag NPs were larger than those in Ag⁺-free regions and this size difference was confirmed from the transmission electron microscope images. PbS QDs can grow at temperature as low as 420 °C in Ag⁺-diffused regions and this implies that PbS QDs form preferentially using Ag NPs as nucleating agents.     

Zircon formation from amorphous powder and melt in the silica-rich region of the alumina–silica–zirconia system

Chemically homogeneous amorphous powders were prepared by sol–gel method from alkoxide mixtures in the silica-rich region of the alumina–silica–zirconia system. A glass with the same composition was obtained by quenching in water from the melt. The evolution with temperature in the range up to 1625 °C was studied by means of X-ray diffraction, infrared and UV-Raman spectroscopy, scanning electron microscopy and energy-dispersive X-ray analysis. Zircon crystallization and stability at temperatures higher than the liquidus temperature were confirmed in both melt-quenched and gel-glasses. Crystallization of cristobalite from the amorphous gel-glasses was observed above 1200 °C. The crystallization of zircon particles was observed after thermal treatment at 1550 °C. At 1625 °C zircon was the only stable crystalline phase due to the complete melting of the silica-rich matrix. The XRD pattern of the ternary gel treated at 1625 °C shows clearly the disappearance of the cristobalite phase, while at 1550 °C there is already partial melting. These results can help to determine the phase equilibrium in the ternary system.     

Electrical and dielectric properties of glass system NaPO3–KHSO4

Glass samples have been prepared in the NaPO₃–KHSO₄ binary system with the classical melting, casting and annealing steps. Electrical and dielectrical properties of glass samples were studied. Measurements of DC and AC conductivity and complex electrical permittivity of xNaPO₃–(100 ? x)KHSO₄ glass system were carried out at temperatures ranging from room temperature to temperature located 15 °C below glass transition temperature T_g. Results showed that changes of NaPO₃ concentration considerably affect values of observed parameters. DC conductivity of glass increases as NaPO₃ concentration grows until concentration x = 60. However, beyond this value a sharp decrease of DC conductivity was observed. In addition relaxation times showed abrupt changes at concentration x = 60, corresponding to the lowest relaxation times at the temperature 90 °C.     

Ex situ XRD,TEM, IR,Raman and NMR spectroscopy of crystallization of lithium disilicate glass at high pressure

The structure of Li₂O · 2SiO₂ (LS₂) glass was investigated as a function of pressure and temperature up to 6 GPa and 750 °C, respectively, using XRD, TEM, IR, Raman and NMR spectroscopy. Glass densified at 6 GPa has an average Si–O–Si bond angle ∼7° lower than that found in glass processed at 4.5 GPa. At 4.5 GPa, lithium disilicate crystallizes from the glass, while at 6 GPa new high pressure form of lithium metasilicate crystallizes. This new phase, while having lithium metasilicate crystal symmetry, contains at least four different Si sites. NMR results for 6 GPa indicate the presence of Q⁴ species with (Q⁴)Si–O–Si(Q⁴) bond angles of ∼157°. This is the first reported occurrence of Q⁴ species with such large bond angles in alumina free alkali silicate glass. No five- or six-coordinated Si are found.     

High-quality AlN layers grown by hot-wall MOCVD at reduced temperatures

We report on a growth of AlN at reduced temperatures of 1100 °C and 1200 °C in a horizontal-tube hot-wall metalorganic chemical vapor deposition reactor configured for operation at temperatures of up to 1500–1600 °C and using a joint delivery of precursors. We present a simple route—as viewed in the context of the elaborate multilayer growth approaches with pulsed ammonia supply—for the AlN growth process on SiC substrates at the reduced temperature of 1200 °C. The established growth conditions in conjunction with the particular in-situ intervening SiC substrate treatment are considered pertinent to the accomplishment of crystalline, relatively thin, ～700 nm, single AlN layers of high-quality. The feedback is obtained from surface morphology, cathodoluminescence and secondary ion mass spectrometry characterization.     

Microstructure and properties of spark plasma sintered Fe–Cr–Mo–Y–B–C bulk metallic glass

Fabrication of Fe-based amorphous alloy using spark plasma sintering (SPS) process has been reported. Fully amorphous compacts with ～95% relative density were successfully sintered at temperature about 100 °C lower than glass transition temperature (T_g: 575 °C). Formation of crystalline Fe₂₃(C, B)₆ phases within near-fully dense (～99%) amorphous matrix is observed at sintering temperatures (>550 °C) close to glass transition temperature. Microstructure evolution in sintered compacts indicated that density, degree of crystallinity, and mechanical properties can be effectively controlled by optimizing SPS parameters.     

Metastable SiCN glass matrices studied by energy-filtered electron diffraction pattern analysis

Bulk SiCN glasses, derived from polymer precursors with tailored architectures, were characterized upon pyrolysis at 1000 °C and subsequent annealing at 1400 °C and 1540 °C. The characterization tools employed were high-resolution transmission electron microscopy (HRTEM) imaging and energy-filtered selected area electron diffraction (EF-SAED). Main emphasis of this work was to verify as to whether the intrinsic amorphous structure of polymer-derived bulk materials exhibits different structural features upon pyrolysis, that depend on the functionalities of the pre-ceramic polymer, and whether such characteristic features are maintained upon high-temperature anneal. HRTEM imaging did not reveal any pronounced variation between the different SiCN glass structures after the organic–inorganic transition at 1000 °C or even upon heat treatment at 1400 °C. However, EF-SAED analysis showed differences in the amorphous structure of the four polymer-derived SiCN glasses studied even upon thermolysis at 1000 °C. The evolution of the electron diffraction intensity profiles of the EF-SAED patterns after subsequent thermal treatment at elevated temperatures showed clear evidence of structural rearrangements within the SiCN glass networks upon annealing at temperatures exceeding the pyrolysis temperature. The experimental results provide evidence that the metastable glass structure of polymer-derived SiCN ceramics depends on the starting polymer employed and, in addition, that the intrinsic glass architecture affects the thermal stability (onset of crystallization) of the amorphous matrix.     

Vapor hydration of SON68 glass from 90 °C to 200 °C: A kinetic study and corrosion products investigation

Corrosion of nuclear waste glass in unsaturated conditions is expected to occur upon the closure of the repository galleries during disposal cell saturation in the proposed French disposal site. The objectives of the present work were to determine the alteration kinetics of the SON68 reference in such conditions. Vapor hydration tests were conducted using thin, polished SON68 glass coupons contained in stainless steel autoclaves. Temperatures ranged between 90 °C and 200 °C and the relative humidity (RH) was maintained at 91 ± 1%. Additional experiments at 175 °C and 80, 85, 90 and 95% RH were also conducted to assess the role of RH on the glass corrosion rate. The nature and extent of corrosion have been determined by characterizing the reacted glass surface with scanning electron microscopy (SEM), transmission electron microscopy (TEM), and energy dispersive X-ray spectroscopy (EDS). Elemental profiling of the glass hydrated at 90 °C was studied by TOF-SIMS. The chemical composition of the external layer depends on experimental conditions. The hydration rate at 90 °C (TOF-SIMS analysis) is 10 × higher than the generally accepted final rate of SON68 in water at 90 °C (~ 10^? 4 g m^? 2 d^? 1). This may indicate that the glass hydration process cannot be simulated by experiments in aqueous solution with a high S/V ratio. Subsequent leaching (corrosion in an aqueous solution) of samples weathered in water vapor showed dissolution rate values higher than those of pristine glass. This result indicates that mobile elements are trapped within the alteration products during the hydration step and it gives insight into mobility variations of the considered elements.     

In situ high temperature 27Al NMR study of structure and dynamics in a calcium aluminosilicate glass and melt

The temperature dependence (25–1400 °C) of ²⁷Al NMR spectra and spin–lattice relaxation time constants T₁ have been studied for a calcium aluminosilicate (43.1CaO–12.5Al₂O₃–44.4SiO₂) glass and melt using an in situ high temperature probe, and the glass has been characterized by ambient temperature, high field MAS NMR. The peak positions and the line widths show a consistent behavior as motional averaging of the quadrupolar satellites increases with increasing temperature. The rate of decrease with temperature of T₁ drastically increases near the glass transition temperature T_g, which suggests a change in NMR relaxation process from vibrational to translational motions. Above the T₁ minimum (≈1200 °C), NMR correlation times obtained from T₁ are in good agreement with shear relaxation times estimated from viscosity, suggesting that microscopic nuclear spin relaxation is controlled by the same dynamics as macroscopic structural relaxation, and thus that atomic-scale motion is closely related to macroscopic viscous flow.