Spatial distribution of electron characteristic in argon rf glow discharges |
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Authors: | Zhu Zu-Song Lin Kui-Xun Lin Xuan-Ying Qiu Gui-Ming Yu Yun-Peng and Luo Yi-Lin |
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Affiliation: | Department of Physics, Shantou University, Shantou 515063, China |
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Abstract: | The spatial distributions of the electron density and the mean electron
energy of argon radio frequency (rf) glow discharge plasma in a
plasma-enhanced chemical vapour deposition (PECVD) system have been
investigated using an established movable Langmuir probe. The results
indicate that in the axial direction the electron density tends to peak at
midway between the two electrodes while the axial variation trend of
mean electron energy is different from that of the electron density, the
mean electron energy is high near the electrodes. And the mean electron
energy near the cathode is much higher than that near the anode. This
article focuses on the radial distribution of electron density and mean
electron energy. A proposed theoretical model distribution agrees well with
the experimental one: the electron density and the mean electron energy both
increase from the centre of the glow to the edge of electrodes. This is
useful for better understanding the discharge mechanism and searching for a
better deposition condition to improve thin film quality. |
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Keywords: | spatial distribution of electron characteristic a movable Langmuir probe radio frequency glow discharge |
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