中国物理B ›› 2006, Vol. 15 ›› Issue (5): 969-974.doi: 10.1088/1009-1963/15/5/017

• GENERAL • 上一篇    下一篇

Spatial distribution of electron characteristic in argon rf glow discharges

祝祖送, 林揆训, 林璇英, 邱桂明, 余云鹏, 罗以琳   

  1. Department of Physics, Shantou University, Shantou 515063, China
  • 收稿日期:2005-12-26 修回日期:2006-03-03 出版日期:2006-05-20 发布日期:2006-05-20
  • 基金资助:
    Project supported by the State Key Development Program for Basic Research of China (Grant No G2000028208).

Spatial distribution of electron characteristic in argon rf glow discharges

Zhu Zu-Song (祝祖送), Lin Kui-Xun (林揆训), Lin Xuan-Ying (林璇英), Qiu Gui-Ming (邱桂明), Yu Yun-Peng (余云鹏), Luo Yi-Lin (罗以琳)   

  1. Department of Physics, Shantou University, Shantou 515063, China
  • Received:2005-12-26 Revised:2006-03-03 Online:2006-05-20 Published:2006-05-20
  • Supported by:
    Project supported by the State Key Development Program for Basic Research of China (Grant No G2000028208).

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摘要： The spatial distributions of the electron density and the mean electron energy of argon radio frequency (rf) glow discharge plasma in a plasma-enhanced chemical vapour deposition (PECVD) system have been investigated using an established movable Langmuir probe. The results indicate that in the axial direction the electron density tends to peak at midway between the two electrodes while the axial variation trend of mean electron energy is different from that of the electron density, the mean electron energy is high near the electrodes. And the mean electron energy near the cathode is much higher than that near the anode. This article focuses on the radial distribution of electron density and mean electron energy. A proposed theoretical model distribution agrees well with the experimental one: the electron density and the mean electron energy both increase from the centre of the glow to the edge of electrodes. This is useful for better understanding the discharge mechanism and searching for a better deposition condition to improve thin film quality.

Abstract: The spatial distributions of the electron density and the mean electron energy of argon radio frequency (rf) glow discharge plasma in a plasma-enhanced chemical vapour deposition (PECVD) system have been investigated using an established movable Langmuir probe. The results indicate that in the axial direction the electron density tends to peak at midway between the two electrodes while the axial variation trend of mean electron energy is different from that of the electron density, the mean electron energy is high near the electrodes. And the mean electron energy near the cathode is much higher than that near the anode. This article focuses on the radial distribution of electron density and mean electron energy. A proposed theoretical model distribution agrees well with the experimental one: the electron density and the mean electron energy both increase from the centre of the glow to the edge of electrodes. This is useful for better understanding the discharge mechanism and searching for a better deposition condition to improve thin film quality.

Key words: spatial distribution of electron characteristic, a movable Langmuir probe, radio frequency glow discharge

中图分类号:  (Glow; corona)

  • 52.80.Hc
52.25.-b (Plasma properties) 52.70.Ds (Electric and magnetic measurements) 52.77.Dq (Plasma-based ion implantation and deposition) 82.45.Fk (Electrodes)