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Effect of substituents at silicon on the oxidative addition of trisubstituted silanes to [RhCl(cod)PPh3]
Authors:Wojciech Duczmal  Beata Maciejewska  Elżbieta Śliwińska  Bogdan Marciniec
Affiliation:(1) Faculty of Chemistry, A. Mickiewicz University, Grunwaldzka 6, 60-780 Pozna"nacute", Poland
Abstract:Summary Trisubstituted silanes, HSiR3–nXn (R = Me, Et, Pr or Bu; X = Cl, OEt or Ph; and n = 0–3) readily undergo oxidative addition to complex [RhCl(cod)PPh3] (where cod = cycloocta-1,5-diene).The quantitative correlation between rate constants, k1, of the reaction, followed spectrophotometrically at 20 °C in benzene solutions, and the structure of tri-substituted silanes represented by stereoelectronic parameters chi, theta and EPrime of the substituents, was established: logk1 = a + bchi + ctheta + dEPrime. The reaction rate is accelerated by electron-withdrawing substituents at silicon and retarded by the bulk and ppgrrarrdpgr donation of nonalkyl substituents.Author to whom all correspondence should be directed.
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