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Morphological and compositional evolution of polymeric colloidal monolayer during UV irradiation
Authors:Mun Ho Kim  Jong-Jin Lee  Hyo Sang EomJi-Eun You  Kil-Yeong ChoiDoo-Jin Byun
Affiliation:Reliability Assessment Center for Chemical Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-ro, Yuseong-gu, Daejeon 305-600, Republic of Korea
Abstract:In this study, we investigated the morphological and compositional evolution polymeric colloidal monolayer during UV irradiation. A PS colloidal monolayer with interparticle bridges was prepared and exposed to the UV light. As a consequence of photochemical reactions containing chain-scission, UV irradiation induced morphological changes in the monolayer surface including changes in the size, shape, and packing structure of PS particles. By manipulating the UV irradiation time, fine tuning of size and shape of the interstice in the monolayer was achieved. In these procedures, the interparticle bridges play an important role. The UV irradiation induced the formation of polar groups in the PS particle surface and thus the particle surface became highly hydrophilic.
Keywords:Colloidal crystal   Colloidal lithography   Photooxidation   PS latex   Surface characterization
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