含卤高聚物记录材料的研究——不同共聚单体对紫外光敏性的影响

研究了与偏二溴乙烯(VDBr,M_1)共聚的不同单体(M_2)——丙烯酸甲酯(MA)、甲基丙烯酸甲酯(MMA)和苯乙烯(St)的性质和共聚物的序列分布对记录材料紫外光敏性的影响。结果表明,含St的紫外光敏性最高,含MA的较差。对同一类共聚物记录材料而言,光敏性与共聚物的序列分布,主要是P_2(M_1M_2)有对应关系。本文还报道了VDBr与MA、MMA及St在55±0.2℃以偶氮二异丁腈为引发剂的自由基共聚反应竞聚率(r)分别为,VDBr-MA:r_1=0.72±0.05,r_1=0.72±0.05;VDBr-MMA:r_1=0.50±0.04,r_2=1.74±0.04;VDBr-St:r_1=0.40±0.04,r_2=1.12±0.04。

STUDY OF RECORDING MATERIALS CONTAINING HELOGEN COPOLYMER——THE EFFECT OF DIFFEEENT COMONOMEB ON UV SENSITIVITY

Vinylidene bromide (VDBr, M1) was copolymerized with different comonomera (M2), including methyl acrylate (MA), methyl methacrylate (MMA) and styrene (St). The influences of properties and sequence distributions of the resulting copolymers on the UV sensitivity of the recording materials have been investigated. It has been shown that UV sensitivity is the highest for copolymer cotaining St and lowest for that containing MA. For recording materials prepared from same copolymer, their UV sensitivity are related to the sequence distribution of the copolymer, especially P2(M1M2). The reactivity ratios (r) of different monomers in the free radical copolymerization of VDBr with MA, MMA and St at 55 ± 0.2℃, by using AIBN as initiator, were determined, i.e. for VDBr-MA, r 1= 0.72 ± 0.05, r2 = 0.72 ± 0.05; VDBr-MMA, r1 = 0.50± 0.04, r2 = 1.74 ±± 0.04; VDBr-St, r1 = 0.4 ± 0.04, r2 = 1.12 ± 0.04.