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Lead films produced by laser vapor deposition
Authors:M. S. Chiu  K. P. Shen  Y. K. Ku
Affiliation:(1) Shanghai Institute of Laser Technology, Yue Yang Road 319, 200031 Shanghai, P.R. China
Abstract:The deposition of lead film on quartz substrates by photolysing tetraethyl lead vapor with a laser is reported. The dependence of the deposition rate on the pressure of tetraethyl lead, on the light intensity and on the pressure of the buffer gas is measured. Deposition phenomena at low light intensity are discussed.
Keywords:82.65  82.50
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