Parallel two-photon photopolymerization of microgear patterns

We report parallel two-photon photopolymerization of microgear patterns by exposing a photoresist to holographically generated optical vortices. The optical vortices are created by imparting a helical pitch onto the incident light using a programmable lithographic phase mask realized with a computer addressable phase-only spatial light modulator. By varying the phase levels of the spatial light modulator, the truncated helical phase of an optical vortex results in output intensity patterns that typifies that of microgears instead of perfect doughnut beams. Our experiments and simulations are in good agreement implying a more efficient and highly parallel two-photon photopolymerization scheme that can be subsequently used for non-scanning fabrication of microgears.