Sub-ps laser microstructuring of soft X-ray Mo/Si multilayer gratings |
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Authors: | E Majkova S Luby R Senderak Y Chushkin M Jergel I Zergioti D Papazoglou A Manousaki C Fotakis |
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Institution: | (1) Institute of Physics, Slovak Academy of Sciences, 84228 Bratislava, Slovak Republic, SV;(2) Institute of Electronic Structure and Laser, Foundation for Research and Technology, Hellas, P.O. Box 1527, 71110 Heraklion, Greece, GR |
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Abstract: | The sub-picosecond laser microstructuring of multilayer gratings is presented in this paper. A micromachining system operating
with a 0.5 ps KrF laser at 248 nm was used to etch grating structures with a groove width of 1–2 μm in Mo/Si and Si/Mo multilayers.
Atomic force microscopy, scanning electron microscopy and X-ray reflectivity were used to characterize the microetched patterns.
The ω-scans around the 1st Bragg maximum show symmetric satellites up to 3rd order, with positions corresponding to the grating
period. The use of sub-picosecond laser pulses minimizes the thermally affected zone and enhances the quality of the etched
features. Short pulse laser processing is advantageous for the fabrication of high spatial resolution microstructures required
in X-ray optics.
Received: 21 May 2002 / Accepted: 19 August 2002 / Published online: 15 January 2003
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ID="*"Corresponding author. Email: dpapa@iesl.forth.gr |
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Keywords: | PACS: 41 50 +h 68 65 Ac 61 10 Kw 07 85 Fv 81 20 Wk |
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