Charging of glassy chalcogenide semiconductors in corona discharge and its effect on holographic grating formation |
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Authors: | A M Nastas A M Andriesh V V Bivol A M Prisakar and G M Tridukh |
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Institution: | (1) Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea |
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Abstract: | Recording of optical holographic gratings based on photostructural transformations in thin (≈ 1 μm) As2S3 and As2S3 semiconductor layers in the presence and absence of a corona discharge and also chemical etching of these gratings are studied.
Initiation of a corona at the stage of interference grating recording is shown to improve the exposure contrast of metal-glassy
chalcogenide semiconductor thin-film structures. The holographic sensitivity, diffraction efficiency, dynamic range, and contrast
are also improved severalfold. When phase relief gratings formed in these layers are selectively etched in a chemical etchant
in the presence of a corona, their profile becomes more regular and deeper by 25–30% and the diffraction efficiency increases
by 30–50%. |
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