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LED用硅掺杂GaAs晶体的生长与表征
引用本文:金敏,徐家跃,房永征,何庆波,周鼎,申慧. LED用硅掺杂GaAs晶体的生长与表征[J]. 人工晶体学报, 2012, 41(3): 594-598
作者姓名:金敏  徐家跃  房永征  何庆波  周鼎  申慧
作者单位:上海应用技术学院材料科学与工程学院,上海,200235
基金项目:National Natural Science Foundation of China,Shanghai Science and Technology Committee,Shanghai Education Commission
摘    要:采用坩埚下降法生长了LED用硅掺杂<511>取向的GaAs晶体.选用带籽最槽的PBN坩埚作为生长容器,密封在石英安瓶中以防止生长过程中As蒸汽挥发.研究了掺杂工艺、固液界面形貌和生长缺陷.结果表明:孪晶化是硅掺杂GaAs晶体生长的主要问题.探讨了孪晶形成机理,优化了生长工艺,成功获得了直径2英寸高质量的硅掺杂GaAs晶体,双摇摆曲线显示所得晶体的FWHM为40 arcsec.

关 键 词:GaAs  晶体生长  坩埚下降法  硅掺杂  孪晶,

Growth and Characterization of Si-doped GaAs Crystals for LED Application
JIN Min , XU Jia-yue , FANG Yong-zheng , HE Qing-bo , ZHOU Ding , SHEN Hui. Growth and Characterization of Si-doped GaAs Crystals for LED Application[J]. Journal of Synthetic Crystals, 2012, 41(3): 594-598
Authors:JIN Min    XU Jia-yue    FANG Yong-zheng    HE Qing-bo    ZHOU Ding    SHEN Hui
Affiliation:(School of Materials Science and Engineering,Shanghai Institute of Technology,Shanghai 200235,China)
Abstract:Si-doped <511>orientation GaAs crystal was grown by Bridgman method.PBN crucible with a seed well was used and quartz ampoule was adopted to protect the evaporation of As in the process of growth.The doping technology,solid-liquid interface morphology and growth defects were investigated.The twinning was a crucial problem for the pulling-down growth of Si-doped <511> GaAs crystal.The formation mechanism of the twins was suggested and the growth parameters were optimized.2-inch Si-doped GaAs crystal has been grown successfully and X-ray rocking curve showed that FWHM was about 40 arcsec.
Keywords:GaAs  crystal growth  pulling-down method  Si-doped  twins
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