平转动运动方式下环形抛光盘的去除函数研究

为保证加工精度和提高抛光效率，推导了盘式动压抛光所用的环形抛光盘在平转动运动方式下的去除函数。在平转动运动方式下，与应用最为广泛的圆形抛光盘相比较，环形抛光盘的最大趋近因子提高了10.25%，更加趋近脉冲函数的特性，减少光学元件表面的中高频误差。给定初始面形误差，以相同的参数采用脉冲迭代法计算驻留时间和残留误差，经过50次迭代，仿真加工结果表明，环形抛光盘相比于圆形抛光盘的表面残留误差降低了3.65%，提高了抛光去除效率。

Removal function of annular polishing pad based on translation-rotation motion

In order to asure high machining precision and improve polishing efficiency, a new removal function of annular polishing pad based on translation-rotation motion was investigated and deduced, which was needed in disc hydrodynamic polishing. Based on translation-rotation motion, compared with the round polishing pad which is the most widely used, the highest tending factor of annular polishing pad improves by 10.25% and its form of removal function is more closer to the impulse function form. Therefore, it can reduce the convolution effect and smooth out mid-to-high spatial frequency errors. Setting the initial surface error, the pulse iteration method was used to compute the residual error and the dwell time with the same parameters. After 50 times iteration, the simulation result proves that the residual error of annular polishing pad reduces by 3.65% than round polishing pad. The polishing removal efficiency can be improved.