Optical Emission Analysis of Atmospheric Pressure Methane Plasma Chemical Vapor Deposition |
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| Authors: | Chang Y.-C. Wu P.-Y. Jhuang J.-C. Huang C. |
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| Affiliation: | 1.Department of Chemical Engineering & Materials Science, Yuan Ze University, Chung-Li, 32003, Taiwan
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| Abstract: | Journal of Applied Spectroscopy - The distinctive glow features of low-temperature RF CH4/Ar plasma chemical vapor deposition and its correlation with plasma-deposited film characterizations were... |
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