低能离子注入育种中次级效应影响的模拟研究

低能离子注入育种作为一种有效的育种方法在实践中进行了大量的尝试并取得了一系列重要成果，但其作用机理一直都存在着巨大的争议，特别是射程很短的低能重离子如何穿透到种子内部触发生物效应。本研究利用SRIM、CASINO、Geant4模拟程序对低能离子注入生物样品的离子注入深度进行模拟和定量分析，并对次级粒子可能产生的影响进行了定量模拟研究。结果显示，低能重离子本身射程一般都小于1 μm，选用轻离子、提高注入能量、采用干种子进行注入，都有利于增加穿透深度。次级过程中，反冲质子的最大射程比初级入射离子的稍大，不能显著提升穿透能力。次级过程产生的粒子中只有X射线可以明显提高穿透种子的深度，只要剂量足够大，总会有少量X射线穿透到很深的地方。The breeding method by low-energy ion implantation has been proved to be a valuable breeding method by a large number of practical attempts, but the mechanism of the method has always been in a large dispute. The most difficult thing to be understood is how the low energy heavy ion with such a short range (normally shorter than 1 μm) can penetrate into the inner part of seeds to trigger the biological effects. In this paper, simulations with quantitative analysis were performed for the low energy ion implantating into biological samples and the effects caused by the secondary particles using SRIM, CASINO and Geant4 simulation programs. The results showed that the ranges of low energy heavy ions are normally less than 1 μm. The ranges can become longer if dry seeds and light ions are used with a higher energy. The ranges of recoil protons are only a little longer than that of the primary ions. Among the secondary particles produced in the ion implanting process, only the X-ray can obviously increase the penetration depth in seeds. There always will be a small amount of X-rays which can penetrate into the deeper place in the seed if the ion dose is high enough.

Simulation of the Secondary Effect of Low Energy Ions Implanting in Seeds

The breeding method by low-energy ion implantation has been proved to be a valuable breeding method by a large number of practical attempts, but the mechanism of the method has always been in a large dispute. The most difficult thing to be understood is how the low energy heavy ion with such a short range (normally shorter than 1 μm) can penetrate into the inner part of seeds to trigger the biological effects. In this paper, simulations with quantitative analysis were performed for the low energy ion implantating into biological samples and the effects caused by the secondary particles using SRIM, CASINO and Geant4 simulation programs. The results showed that the ranges of low energy heavy ions are normally less than 1 μm. The ranges can become longer if dry seeds and light ions are used with a higher energy. The ranges of recoil protons are only a little longer than that of the primary ions. Among the secondary particles produced in the ion implanting process, only the X-ray can obviously increase the penetration depth in seeds. There always will be a small amount of X-rays which can penetrate into the deeper place in the seed if the ion dose is high enough.