Solid State Amorphisation in Magnetic Multilayers: the Interface Structure and the Electrical Transport Properties |
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Authors: | T Stobiecki M Kopcewicz FJ Castao |
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Institution: | 1Department of Electronics, University of Mining and Metallurgy, al. Mickiewicza 30, 30-059 Kraków, Poland;2Institute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warszawa, Poland;3Institute of Applied Magnetism (IMA), Laboratorio Salvador Velayos Apartado de Correos, 155, 28230 Las Rozas, Madrid, Spain |
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Abstract: | The structure and electrical conductivity properties of the R.F. sputtered FeZr and FeTi multilayers with ultrathin layer thicknesses, in as-deposited states, have been studied using X-ray diffraction, low-angle X-ray and neutron reflectometry, conversion electron Mössbauer spectroscopy (CEMS), resistivity and magnetoresistivity measurements. The thickness ratio (β=dFedZr and dFedTi) of analysed multilayers was 0.5 and 1, the values of the bilayer thickness (λ=dFe+dTi,Zr) was varied from 9 Å to 600 Å, maintaining constant the total thickness of the samples by controlling the number of bilayers. The results obtained from CEM-spectroscopy and X-ray diffraction show that Fe layers of the thickness below 20 Å are alloyed forming an amorphous phase during deposition. This amorphous phase is distributed in the plane between the crystalline sublayers as well as in the grain boundaries according with the proposed model of the interpretation of the electrical conductivity as a function of the bilayer thickness (λ). |
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