首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Solid State Amorphisation in Magnetic Multilayers: the Interface Structure and the Electrical Transport Properties
Authors:T Stobiecki  M Kopcewicz  FJ Castao
Institution:1Department of Electronics, University of Mining and Metallurgy, al. Mickiewicza 30, 30-059 Kraków, Poland;2Institute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warszawa, Poland;3Institute of Applied Magnetism (IMA), Laboratorio Salvador Velayos Apartado de Correos, 155, 28230 Las Rozas, Madrid, Spain
Abstract:The structure and electrical conductivity properties of the R.F. sputtered Fe+45 degree ruleZr and Fe+45 degree ruleTi multilayers with ultrathin layer thicknesses, in as-deposited states, have been studied using X-ray diffraction, low-angle X-ray and neutron reflectometry, conversion electron Mössbauer spectroscopy (CEMS), resistivity and magnetoresistivity measurements. The thickness ratio (β=dFe+45 degree ruledZr and dFe+45 degree ruledTi) of analysed multilayers was 0.5 and 1, the values of the bilayer thickness (λ=dFe+dTi,Zr) was varied from 9 Å to 600 Å, maintaining constant the total thickness of the samples by controlling the number of bilayers. The results obtained from CEM-spectroscopy and X-ray diffraction show that Fe layers of the thickness below 20 Å are alloyed forming an amorphous phase during deposition. This amorphous phase is distributed in the plane between the crystalline sublayers as well as in the grain boundaries according with the proposed model of the interpretation of the electrical conductivity as a function of the bilayer thickness (λ).
Keywords:
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号