热处理对尼龙1010固态结晶和玻璃态热松驰的影响

本文用DSC首先论证淬火尼龙1010试样在DSC曲线上出现的放热峰是冷结晶峰,然后研究淬火尼龙1010在不同热处理条件下,冷结晶峰和玻璃态热松驰峰的变化规律。实验结果表明,等温结晶时间较短,试样的固态结晶速率较快;等温结晶时间较长,固态结晶速率较慢,这可能与在Tg区域等温所形成的新氢键有关。当升高等温温度时,固态结晶速率加快。在低于Tg的不同温度退火,玻璃态热松弛峰的峰高及热焓在281K达最大值,进而确定对玻璃态热松驰影响最敏感的温度区间是277～284K。

THE INFLUENCE OF HEAT TREATMENTS ON SOLID-STATE CRYSTALLIZATION AND THERMAL RELAXATION IN NYLON-1010

It has been demonstrated that the exothermic peak on DSC curve for quenched Nylon-1010 is a cold crystallization peak, and the changes of the cold crystallization peak and thermal relaxation peak for quenched Nylon-1010 through different heat-treatments have been studied by using DSC. The experimental results indicate that the solid-state crystallization rate of the sample is faster in a short time of isothermal crystallization than that in a long time. It is possible relative to thenew hydrogen-bond formed during annealing a tTg rang.The solid-state crystallization rate become fast when the isothermal temperature is raised. The height and enthalpy of the thermal relaxation peak reach to the maximua at 281K after the samples are annealed at diffent temperature below Tg. Thereby, the temperature range sensitive to the thermal relaxation is determined to be 277～284K.